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81. 发明授权

US08088537B2 Resist top coat composition and patterning process 有权
标题翻译：抵抗面漆组合和图案化工艺
公开(公告)号：US08088537B2
公开(公告)日：2012-01-03
申请号：US12320183
申请日：2009-01-21
申请人： Jun Hatakeyama , Yuji Harada
发明人： Jun Hatakeyama , Yuji Harada
IPC分类号： G03F7/26 , G03F7/11 , C08L33/02
CPC分类号： G03F7/11 , G03F7/2041
摘要： The present invention relates to a resist top coat composition and a patterning process adopting such a material, which resist top coat composition is provided for forming a top coat on a photoresist film so as to protect the photoresist film, in liguid immersion photolithography. The present invention provides a resist top coat composition for forming a top coat on a photoresist film, wherein the resist top coat composition comprises, at least: a polymer I including a repeating unit a represented by the following general formula (1); and a polymer II including repeating unit having a sulfonic acid or an amine salt of a sulfonic acid:
摘要翻译：本发明涉及一种抗蚀剂面漆组合物和采用这种材料的图案化方法，其抗蚀面漆组合物用于在光致抗蚀剂膜上形成顶涂层以保护光致抗蚀剂膜，在液体浸渍光刻中。本发明提供了一种用于在光致抗蚀剂膜上形成顶涂层的抗蚀剂面漆组合物，其中抗蚀剂面漆组合物至少包含：包含由以下通式（1）表示的重复单元的聚合物I; 和包含具有磺酸或磺酸胺盐的重复单元的聚合物II：

82. 发明申请

US20100136482A1 RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀组合物和方法
公开(公告)号：US20100136482A1
公开(公告)日：2010-06-03
申请号：US12628794
申请日：2009-12-01
申请人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa , Kazunori Maeda , Tomohiro Kobayashi
发明人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa , Kazunori Maeda , Tomohiro Kobayashi
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： A resist composition is provided comprising (A) an additive polymer of acyl-protected hexafluoroalcohol structure, (B) a base polymer having a structure derived from lactone ring, hydroxyl group and/or maleic anhydride, the base polymer becoming soluble in alkaline developer under the action of acid, (C) a photoacid generator, and (D) an organic solvent. The additive polymer is transparent to radiation of wavelength up to 200 nm, and its properties can be tailored by a choice of the polymer structure.
摘要翻译：提供了抗蚀剂组合物，其包含（A）酰基保护的六氟醇结构的添加剂聚合物，（B）具有衍生自内酯环，羟基和/或马来酸酐的结构的基础聚合物，所述基础聚合物在碱性显影剂中变得可溶酸的作用，（C）光致酸发生剂，和（D）有机溶剂。添加剂聚合物对波长高达200nm的辐射是透明的，并且其性质可以通过选择聚合物结构来定制。

83. 发明授权

US07592407B2 Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process 有权
标题翻译：可聚合氟化合物，制备方法，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07592407B2
公开(公告)日：2009-09-22
申请号：US11259179
申请日：2005-10-27
申请人： Yuji Harada , Jun Hatakeyama , Takeru Watanabe , Takeshi Kinsho
发明人： Yuji Harada , Jun Hatakeyama , Takeru Watanabe , Takeshi Kinsho
IPC分类号： C07C69/52
CPC分类号： G03F7/0397 , C07D309/10 , C08F220/24 , G03F7/0046 , G03F7/0392 , Y02P20/55
摘要： A polymerizable fluorinated compound having formula (2a) or (2b) wherein R1 and R2 are H or C1-C20 alkyl or fluoroalkyl, R3 is H, F or C1-C4 alkyl or fluoroalkyl, and R is H or a protective group is polymerized into a fluorinated polymer which is used as a base polymer to formulate a resist composition having transparency to laser light of wavelength≦300 nm, alkali development amenability, and dry etch resistance.
摘要翻译：具有式（2a）或（2b）的可聚合氟化化合物，其中R 1和R 2是H或C 1 -C 20烷基或氟代烷基，R 3是H，F或C 1 -C 4烷基或氟代烷基，R是H或保护基团是聚合的转化成氟化聚合物，其用作基础聚合物以配制对波长<= 300nm的激光具有透明度的抗蚀剂组合物，碱显影易化性和耐干蚀刻性。

84. 发明授权

US07474548B2 Semiconductor memory device and method for manufacturing the same 有权
标题翻译：半导体存储器件及其制造方法
公开(公告)号：US07474548B2
公开(公告)日：2009-01-06
申请号：US11637939
申请日：2006-12-13
申请人： Yoshiya Moriyama , Yuji Harada , Keita Takahashi
发明人： Yoshiya Moriyama , Yuji Harada , Keita Takahashi
IPC分类号： G11C5/06
CPC分类号： H01L27/115 , H01L27/11521 , H01L27/11568
摘要： A semiconductor memory device includes: a memory cell array region formed in a semiconductor region of a first conductivity type and having a plurality of memory cells arranged in rows and columns; a plurality of word lines each of which collectively connects ones of the plurality of memory cells aligned in the same row; and a protective diode region formed in the semiconductor region to be separated from the memory cell array region. In the protective diode region, a protective diode element is constructed by making a junction between a first diffusion layer of a second conductivity type formed in the upper portion of the semiconductor region and the semiconductor region. Each of the word lines extends to the protective diode region and is brought into direct connection to the first diffusion layer of the second conductivity type, thereby making electrical connection to the protective diode element.
摘要翻译：半导体存储器件包括：存储单元阵列区域，形成在第一导电类型的半导体区域中，并具有以行和列排列的多个存储单元; 多个字线，其各自共同连接在同一行中排列的多个存储单元中的一个; 以及形成在半导体区域中以与存储单元阵列区域分离的保护二极管区域。在保护二极管区域中，通过在半导体区域的上部形成的第二导电类型的第一扩散层与半导体区域之间形成接合来构成保护二极管元件。每条字线延伸到保护二极管区，并与第二导电类型的第一扩散层直接连接，从而与保护二极管元件电连接。

85. 发明授权

US07378218B2 Polymer, resist composition and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07378218B2
公开(公告)日：2008-05-27
申请号：US11345325
申请日：2006-02-02
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
IPC分类号： G03F7/004 , G03F7/32
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/24 , C08F220/26 , C08F220/28 , C08F232/08 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1, and 0
摘要翻译：提供了包含式（1a）至（1d）的重复单元并且Mw为1,000-500,000的含氟聚合物。 R 1是酸不稳定基团，R 2是单键或亚甲基，a1，a2，a3和a4是大于0至小于1的数，并且0

86. 发明申请

US20080085466A1 Polymer, resist protective coating material, and patterning process 有权
标题翻译：聚合物，抗蚀剂保护涂层材料和图案化工艺
公开(公告)号：US20080085466A1
公开(公告)日：2008-04-10
申请号：US11905727
申请日：2007-10-03
申请人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa
发明人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa
IPC分类号： G03C1/73 , C08G63/06 , G03F7/20
CPC分类号： G03F7/11 , C09D133/066 , C09D133/16 , G03F7/0046 , G03F7/2041
摘要： A resist protective coating material comprises a polymer comprising repeat units having formulae (1a) and (1b) and having a Mw of 1,000-500,000. R1a and R1b are H, F or alkyl or fluoroalkyl, R2a, R2b, R3a and R3b are H or alkyl, or R2a and R2b, and R3a and R3b may bond together to form a ring, 0
摘要翻译：抗蚀剂保护涂层材料包括包含具有式（1a）和（1b）的重复单元并且具有1,000-500,000的Mw的聚合物。 R 1a和R 1b是H，F或烷基或氟代烷基，R 2a，R 2b，R b， R 3a和R 3b是H或烷基，或R 2a和R 2b和R 3a， / SUP>和R 3b可以键合在一起形成环，0

87. 发明授权

US07332616B2 Polymerizable compound, polymer, positive-resist composition, and patterning process using the same 有权
标题翻译：可聚合化合物，聚合物，正性抗蚀剂组合物和使用其的图案化工艺
公开(公告)号：US07332616B2
公开(公告)日：2008-02-19
申请号：US11672917
申请日：2007-02-08
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai
IPC分类号： C07D333/64 , C07D333/72 , C07D409/02 , C07D307/00 , C07C69/52 , C07C67/02 , C07C43/18
CPC分类号： G03F7/0046 , C07C69/54 , C07C2602/42 , C08F220/18 , C08F220/28 , G03F7/0397
摘要： The present invention provides a polymer which has at least one or more of a repeating unit represented by a following general formula (1a), a repeating unit represented by a following general formula (2a) and a repeating unit represented by a following general formula (3b), and a repeating unit represented by a following general formula (1c), and a positive resist composition which contains as a base resin the polymer. Thereby, there can be provided a positive-resist composition having high sensitivity and high resolution in exposure with a high energy beam, wherein line edge roughness is small since swelling at the time of development is suppressed, and the residue after development is few.
摘要翻译：本发明提供一种聚合物，其具有以下通式（1a）表示的重复单元，下述通式（2a）表示的重复单元和下述通式（ 3b）和由以下通式（1c）表示的重复单元和含有聚合物作为基础树脂的正性抗蚀剂组合物。因此，可以提供一种在高能量束曝光时具有高灵敏度和高分辨率的正光刻胶组合物，其中线边缘粗糙度小，因为在显影时的膨胀被抑制，并且显影后的残留物很少。

88. 发明申请

US20070231738A1 Resist composition and patterning process using the same 有权
标题翻译：抗蚀剂组成和图案化工艺使用相同
公开(公告)号：US20070231738A1
公开(公告)日：2007-10-04
申请号：US11730289
申请日：2007-03-30
申请人： Tatsushi Kaneko , Jun Hatakeyama , Yuji Harada
发明人： Tatsushi Kaneko , Jun Hatakeyama , Yuji Harada
IPC分类号： G03C1/00
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0395 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： There is disclosed a resist composition comprising, at least, a polymer including repeating units represented by the following general formula (1). There can-be provided a resist composition that has a good barrier property against water, prevents resist components from leaching to water, has high receding contact angle against water, does not require a protective film, has an excellent process applicability, suitable for the liquid immersion lithography and makes it possible to form micropatterns with high precision.
摘要翻译：公开了一种抗蚀剂组合物，其至少包含由以下通式（1）表示的重复单元的聚合物。可以提供对水具有良好的阻隔性的抗蚀剂组合物，防止抗蚀剂成分浸出到水中，对水具有高后退接触角，不需要保护膜，具有优异的工艺适用性，适用于液体浸没式光刻技术，可以高精度地形成微图案。

89. 发明授权

US07276623B2 Polymerizable ester compounds 有权
标题翻译：可聚合的酯化合物
公开(公告)号：US07276623B2
公开(公告)日：2007-10-02
申请号：US11440107
申请日：2006-05-25
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
IPC分类号： C07C69/00 , G03C1/00
CPC分类号： G03F7/0397 , G03F7/0046
摘要： Ester compounds having formula (1) wherein R1 is fluorine or C1-C10 fluoroalkyl, R2 is C1-C10 alkylene or fluoroalkylene, and R3 is an acid labile group are novel. They can be polymerized into polymers which are used to formulate resist compositions, which are processed by the lithography involving ArF exposure, offering many advantages including improved resolution and transparency, minimal line edge roughness, improved etch resistance, and especially minimal surface roughness after etching.
摘要翻译：式（1）其中R 1是氟或C 1 -C 10氟烷基的酯化合物，其中R 1是氢或C 1 -C 10 - 是C 1 -C 10亚烷基或氟代亚烷基，R 3是酸不稳定基团是新的。它们可以聚合成用于配制抗蚀剂组合物的聚合物，其通过涉及ArF曝光的光刻加工，提供许多优点，包括改进的分辨率和透明度，最小的线边缘粗糙度，改善的耐蚀刻性，以及蚀刻后特别是最小的表面粗糙度。

90. 发明申请

US20060269871A1 Polymer, resist composition and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US20060269871A1
公开(公告)日：2006-11-30
申请号：US11440126
申请日：2006-05-25
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
IPC分类号： G03C1/00
CPC分类号： G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A polymer comprising recurring units of formula (1) wherein R1 is F or fluoroalkyl, R2 is alkylene or fluoroalkylene, and R3 is an acid labile group and having a Mw of 1,000-500,000 is used to formulate a resist composition, which is processed by the lithography involving ArF exposure and offers many advantages including resolution, minimal line edge roughness, etch resistance, and minimal surface roughness after etching. The composition performs well when processed by the ArF immersion lithography with liquid interposed between the projection lens and the wafer.
摘要翻译：包含式（1）的重复单元的聚合物，其中R 1是F或氟代烷基，R 2是亚烷基或氟代亚烷基，R 3是使用Mw为1,000-500,000的酸不稳定基团来配制抗蚀剂组合物，其通过涉及ArF曝光的光刻进行处理，并提供许多优点，包括分辨率，最小线边缘粗糙度，耐蚀刻性和蚀刻后的最小表面粗糙度。当通过ArF浸没式光刻法处理介于投影透镜和晶片之间的液体时，组合物表现良好。

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