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81. 发明授权

US6159655A Positive photoresist composition for exposure to far ultraviolet light 失效
标题翻译：用于暴露于远紫外光的正性光致抗蚀剂组合物
公开(公告)号：US6159655A
公开(公告)日：2000-12-12
申请号：US264036
申请日：1999-03-08
申请人： Kenichiro Sato
发明人： Kenichiro Sato
IPC分类号： C08F222/10 , C08F232/00 , G03F7/004 , G03F7/039 , H01L21/027 , G03C1/73 , G03C1/72
CPC分类号： G03F7/0395 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/107 , Y10S430/111 , Y10S430/115
摘要： A positive photoresist composition position for exposure to far ultraviolet light, which comprises a resin decomposing by the action of an acid to increase its solubility in an alkali, and a compound generating an acid by irradiation with an actinic ray or radiation; with the resin comprising repeating units having particular structures, including particular alicyclic structures, and groups decomposing by the action of an acid.
摘要翻译：用于暴露于远紫外光的正性光致抗蚀剂组合物位置，其包含通过酸的作用分解以增加其在碱中的溶解度的树脂和通过用光化射线或辐射照射产生酸的化合物; 所述树脂包含具有特定结构的重复单元，包括特定的脂环结构和通过酸的作用分解的基团。

82. 发明授权

US6103449A Negative working photoresist composition 有权
标题翻译：负性工作光致抗蚀剂组成
公开(公告)号：US6103449A
公开(公告)日：2000-08-15
申请号：US229684
申请日：1999-01-13
申请人： Kenichiro Sato
发明人： Kenichiro Sato
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039
摘要： A negative working photoresist composition which has high suitability for exposure to far ultraviolet and comprises an alkali-soluble resin, a compound capable of generating an acid upon irradiation with actinic rays or radiations, and a compound capable of lowering the solubility of the alkali-soluble resin in a developer in the presence of the acid, the alkali-soluble resin comprising a polymer containing at least the repeating units derived from norbornene skeleton-containing monomers and crosslinking groups. ##STR1##
摘要翻译：具有高度适用于远紫外线的负性光致抗蚀剂组合物，其包含碱溶性树脂，在光化射线或辐射照射时能够产生酸的化合物，以及能够降低碱溶性溶解度的化合物在酸存在下在显影剂中的树脂，所述碱溶性树脂包含至少含有衍生自含降冰片烯骨架的单体和交联基团的重复单元的聚合物。

83. 发明授权

US5534382A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US5534382A
公开(公告)日：1996-07-09
申请号：US411209
申请日：1995-03-27
申请人： Yasumasa Kawabe , Kenichiro Sato
发明人： Yasumasa Kawabe , Kenichiro Sato
IPC分类号： G03F7/022 , H01L21/027 , G03F7/021 , G03F7/30
CPC分类号： G03F7/022
摘要： Disclosed is a positive photoresist composition comprising an alkali-soluble resin and the 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonate acid ester of a polyhydroxy compound represented by formula (I): ##STR1## wherein R.sub.1 to R.sub.3 may be the same or different and each represents a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group, or an alkoxy group; and m, n and o each represent an integer of from 1 to 3. The photoresist composition has a high resolving power and a less layer thickness reliance of the resolving power, and a wide development latitude, is reluctant to form a development residue, and further has a very excellent storage stability, and does not deposit the photosensitive material and does not form microgels, i.e., shows no increase in the particles, with the passage of time.
摘要翻译：公开了一种正型光致抗蚀剂组合物，其包含碱溶性树脂和由式（I）表示的多羟基化合物的1,2-萘醌二叠氮基-5-（和/或-4-）磺酸酯：其中R 1至R 3可以相同或不同，并且各自表示氢原子，卤素原子，羟基，烷基或烷氧基; m，n和o各自表示1〜3的整数。光致抗蚀剂组合物具有高的分辨能力和更小的层厚依赖分辨能力，并且广泛的开发范围不愿形成显影残渣，进一步具有非常优异的储存稳定性，并且不沉积感光材料并且不形成微凝胶，即随着时间的推移，不显示颗粒的增加。

84. 发明授权

US08618585B2 Semiconductor apparatus including cooling base with projections 有权
标题翻译：包括具有突起的冷却基座的半导体装置
公开(公告)号：US08618585B2
公开(公告)日：2013-12-31
申请号：US13188918
申请日：2011-07-22
申请人： Kenichiro Sato
发明人： Kenichiro Sato
IPC分类号： H01L29/15 , H01L29/06 , H01L23/34
CPC分类号： H02M7/003 , H01L24/01 , H01L2224/48091 , H01L2924/12032 , H01L2924/1305 , H01L2924/13055 , H01L2924/13091 , Y02B70/1483 , H01L2924/00014 , H01L2924/00
摘要： A semiconductor apparatus according to embodiments of the invention can include a first semiconductor device made of silicon, the first semiconductor devices being arranged collectively, whereby to form a first device group, and a second semiconductor device made of silicon carbide, the second semiconductor devices being arranged collectively, whereby to form a second device group. The apparatus can also include a wiring conductor connecting the first semiconductor device and the second semiconductor device, a cooling fin base comprising a projection formed thereon, whereby to dissipate heat generated from the first and second semiconductor devices, and the projections arranged under the second device group being spaced apart from each other more widely than the projections arranged under the first device group.
摘要翻译：根据本发明的实施例的半导体装置可以包括由硅制成的第一半导体器件，第一半导体器件被集中布置，从而形成第一器件组，以及由碳化硅制成的第二半导体器件，第二半导体器件集体布置，从而形成第二装置组。该装置还可以包括连接第一半导体器件和第二半导体器件的布线导体，包括形成在其上的突起的散热片基座，从而散发从第一和第二半导体器件产生的热量，以及布置在第二器件下方的突起组比布置在第一装置组下方的突起部彼此间隔开。

85. 发明授权

US08241830B2 Positive resist composition and a pattern forming method using the same 有权
标题翻译：正型抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US08241830B2
公开(公告)日：2012-08-14
申请号：US11504040
申请日：2006-08-15
申请人： Kenichiro Sato
发明人： Kenichiro Sato
IPC分类号： G03F7/004 , G03F7/039 , G03F7/26
CPC分类号： G03F7/0397 , G03F7/0045
摘要： A positive resist composition comprises (A) a compound capable of generating sulfonic acid, bis(alkylsulfonyl)amide, or tris(alkylsulfonyl)methine upon irradiation with actinic ray or radiation, and (B) a resin capable of increasing the solubility in an alkali developer by action of an acid having specific repeating units, and a pattern forming method using the same.
摘要翻译：正型抗蚀剂组合物包含（A）在用光化射线或辐射照射时能够产生磺酸，双（烷基磺酰基）酰胺或三（烷基磺酰基）次甲基的化合物，和（B）能够增加在碱中的溶解度的树脂显影剂具有特定重复单元的酸的作用，以及使用其的图案形成方法。

86. 发明授权

US07712450B2 Ignition timing control apparatus and ignition timing control method for internal combustion engine 有权
标题翻译：点火正时控制装置和内燃机点火正时控制方法
公开(公告)号：US07712450B2
公开(公告)日：2010-05-11
申请号：US12128964
申请日：2008-05-29
申请人： Kenichiro Sato , Tomohiro Fujita , Akito Onishi , Mitsuhiro Nada
发明人： Kenichiro Sato , Tomohiro Fujita , Akito Onishi , Mitsuhiro Nada
IPC分类号： F02P5/00 , F02P1/00
CPC分类号： F02P5/152 , F02D41/2451 , Y02T10/46
摘要： In an ignition timing control apparatus for an engine, a KCS learning value learned when the engine is in a given operating state is used in an ignition timing control executed when the engine is in the other operating state. An estimated knocking occurrence ignition timing is set based on a most retarded ignition timing using the KCS learning value. A final ignition timing is set by changing a KCS feedback correction value based on whether knocking occurs when ignition is performed at the estimated knocking occurrence ignition timing. When a point indicating the engine operating state moves into a region where it is difficult to set the estimated knocking occurrence ignition timing, the KCS feedback correction value is changed to retard the final ignition timing, and the final ignition timing is set using the KCS learning value and the changed KCS feedback correction value.
摘要翻译：在用于发动机的点火正时控制装置中，当发动机处于其他运行状态时执行的点火正时控制中使用当发动机处于给定运行状态时学习的KCS学习值。基于使用KCS学习值的大多数延迟点火正时来设定估计的爆震发生点火正时。通过基于在估计的爆震发生点火正时进行点火时是否发生爆震来改变KCS反馈校正值来设定最终的点火正时。当指示发动机工作状态的点移动到难以设定估计的爆震发生点火正时的区域时，改变KCS反馈校正值以延迟最终点火正时，并且使用KCS学习来设定最终点火正时值和更改的KCS反馈校正值。

87. 发明授权

US07615324B2 Photosensitive composition, and cured relief pattern production method and semiconductor device using the same 有权
标题翻译：感光组合物和固化浮雕图案的制造方法以及使用其的半导体装置
公开(公告)号：US07615324B2
公开(公告)日：2009-11-10
申请号：US12048530
申请日：2008-03-14
申请人： Kenichiro Sato , Naoya Sugimoto
发明人： Kenichiro Sato , Naoya Sugimoto
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： H01L21/02118 , G03F7/0233 , G03F7/0392 , G03F7/0751 , G03F7/40 , H01L21/312
摘要： A photosensitive resin composition includes (a) a resin comprising a repeating unit represented by a following formula (1); (b) a photosensitive agent; (c) a thermo-acid generator; and (d) a compound having at least one of an alkoxymethyl group and an acyloxymethyl group, wherein R1 represents a divalent to octavalent organic group containing 2 or more carbon atoms, R2 represents a divalent to hexavalent organic group containing 2 or more carbon atoms, each of R0 and R3 independently represents a hydrogen atom or an organic group containing 1 to 20 carbon atoms, m represents an integer of 0 to 2, and each of p and q represents an integer of 0 to 4, provided that p+q>0.
摘要翻译：感光性树脂组合物包含（a）包含由下式（1）表示的重复单元的树脂; （b）感光剂; （c）热酸发生器; 和（d）具有烷氧基甲基和酰氧基甲基中的至少一个的化合物，其中R1表示含有2个或更多个碳原子的二价至八价的有机基团，R 2表示含有2个或更多个碳原子的二价至六价有机基团， R 0和R 3各自独立地表示氢原子或含有1〜20个碳原子的有机基团，m表示0〜2的整数，p和q各自表示0〜4的整数，条件是p + q> 0。

88. 发明申请

US20070212899A1 Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same 失效
标题翻译：光敏树脂组合物及其制造方法
公开(公告)号：US20070212899A1
公开(公告)日：2007-09-13
申请号：US11715883
申请日：2007-03-09
申请人： Tsukasa Yamanaka , Kenichiro Sato
发明人： Tsukasa Yamanaka , Kenichiro Sato
IPC分类号： H01L21/469 , G03C5/00
CPC分类号： G03F7/0233
摘要： A photosensitive resin composition comprises: a polybenzoxazole precursor (A); a naphthoquinone diazide photosensitizer (B); and a specific phenolic hydroxyl group-containing compound (C).
摘要翻译：光敏树脂组合物包含：聚苯并恶唑前体（A）; 萘醌二氮嗪光敏剂（B）; 和特定的含酚羟基的化合物（C）。

89. 发明申请

US20070172753A1 Photosensitive resin composition and manufacturing method of semiconductor device using the same 有权
标题翻译：光敏树脂组合物及使用其的半导体器件的制造方法
公开(公告)号：US20070172753A1
公开(公告)日：2007-07-26
申请号：US11655905
申请日：2007-01-22
申请人： Kenichiro Sato , Tsukasa Yamanaka
发明人： Kenichiro Sato , Tsukasa Yamanaka
IPC分类号： G03C5/18
CPC分类号： G03F7/0757 , G03F7/0046 , G03F7/022 , G03F7/0233
摘要： A positive photosensitive resin composition, which contains a polybenzoxazole precursor, a quinonediazide photosensitizer and a carbonate solvent, and a method of manufacturing a semiconductor device using the composition.
摘要翻译：含有聚苯并恶唑前体，醌二叠氮化物光敏剂和碳酸酯溶剂的正型感光性树脂组合物以及使用该组合物的半导体装置的制造方法。

90. 发明申请

US20070048656A1 Photosensitive resin composition and method for manufacturing semiconductor device using the same 失效
标题翻译：光敏树脂组合物及其制造方法
公开(公告)号：US20070048656A1
公开(公告)日：2007-03-01
申请号：US11511375
申请日：2006-08-29
申请人： Kenichiro Sato , Tsukasa Yamanaka
发明人： Kenichiro Sato , Tsukasa Yamanaka
IPC分类号： G03C5/18
CPC分类号： G03F7/022 , G03F7/0233 , G03F7/40
摘要： A photosensitive resin composition comprising: a quinone diazide sulfonic acid ester of a phenol compound represented by formula (I) as defined in the specification; and a polybenzoxazole precursor, and a method for manufacturing a semiconductor device using the same.
摘要翻译：一种光敏树脂组合物，其包含：如说明书中定义的由式（I）表示的酚化合物的醌二叠氮磺酸酯; 和聚苯并恶唑前体，以及使用其制造半导体器件的方法。

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