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    • 83. 发明授权
    • Resistance change memory device
    • 电阻变化记忆装置
    • US07729158B2
    • 2010-06-01
    • US11761282
    • 2007-06-11
    • Haruki TodaKoichi Kubo
    • Haruki TodaKoichi Kubo
    • G11C11/00
    • G11C5/02G11C7/18G11C13/0004G11C13/0007G11C2213/31G11C2213/71G11C2213/72H01L27/2409H01L27/2481H01L45/06H01L45/085H01L45/1233H01L45/1253H01L45/126H01L45/147
    • A resistance change memory device including: a semiconductor substrate; cell arrays stacked above the substrate, each having memory cells, bit lines and word lines; a read/write circuit formed on the semiconductor substrate; first and second vertical wirings disposed to connect the bit lines to the read/write circuit; and third vertical wirings disposed the word lines to the read/write circuit. The memory cell includes a variable resistance element for storing as information a resistance value, which has a recording layer composed of a composite compound containing at least two types of cation elements, at least one type of the cation element being a transition element having “d” orbit, in which electrons are incompletely filled, the shortest distance between adjacent cation elements being 0.32 nm or less.
    • 一种电阻变化存储器件,包括:半导体衬底; 单元阵列堆叠在衬底上,每个阵列具有存储单元,位线和字线; 形成在半导体衬底上的读/写电路; 布置成将位线连接到读/写电路的第一和第二垂直布线; 并且第三垂直布线将字线布置到读/写电路。 存储单元包括用于存储作为信息的电阻值的可变电阻元件,电阻值具有由包含至少两种阳离子元素的复合化合物组成的记录层,至少一种类型的阳离子元素是具有“d “轨道,其中电子不完全填充,相邻阳离子元素之间的最短距离为0.32nm或更小。