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    • 81. 发明授权
    • Vacuum processing apparatus
    • 真空加工设备
    • US5223001A
    • 1993-06-29
    • US978750
    • 1992-11-19
    • Hiroaki Saeki
    • Hiroaki Saeki
    • C23C14/56H01L21/677
    • H01L21/67748C23C14/566H01L21/67751Y10T29/41
    • The present invention is a vacuum processing apparatus provided with a vacuum processing chamber which implements a required processing to an object of processing, and a pre-vacuum chamber (load-lock chamber) configured so that it can be internally vacuum exhausted, with an object of processing being carried-in and -out of the vacuum processing chamber via the pre-vacuum chamber, in which a small space which can be airtightly sealed is provided inside the pre-vacuum chamber, so that the object of processing can be temporarily withdrawn into and housed in the small space when there is vacuum exhaust from the pre-vacuum chamber and when there is the introduction of air to the pre-vacuum chamber. Thus, it is possible to prevent the adhesion to the processing object of particles which rise when air is introduced to the load-lock chamber and when air is exhausted from the load-lock chamber, and without having to perform slow exhaust and slow venting, while increases the throughput and the yield at the same time.
    • 本发明是一种真空处理装置,其具有对处理对象进行所需处理的真空处理室,以及配置成能够在内部真空排空的预真空室(装载锁定室) 通过预真空室进行处理的真空处理室的加工和排出,其中可以气密密封的小空间设置在预真空室内,使得可以暂时取出加工对象 当来自预真空室的真空排气以及在预真空室中引入空气时,进入并容纳在小空间中。 因此,可以防止当空气被引入到装载锁定室中并且当空气从负载锁定室排出时上升的颗粒的加工对象的粘附,并且不必执行慢排气和缓慢排气, 同时提高吞吐量和产量。