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81. 发明授权

US5210058A Method for preparing organic silazane polymers and method for preparing ceramics from the polymers 失效
公开(公告)号：US5210058A
公开(公告)日：1993-05-11
申请号：US726578
申请日：1991-07-08
申请人： Yoshihumi Takeda , Akira Hayashida , Toshinobu Ishihara
发明人： Yoshihumi Takeda , Akira Hayashida , Toshinobu Ishihara
IPC分类号： C04B35/584 , C04B35/589 , C08G77/48 , C08G77/62
CPC分类号： C08G77/62 , C04B35/589
摘要： An organic silazane polymer is prepared by reacting ammonia gas with a mixture of a trihalosilane and a monohalosilane, for example, methyltrichlorosilane and trimethylchlorosilane in an organic solvent to form a silazane compound, and heating the silazane compound at 200 to 350.degree. C. for polymerization. By melting, shaping, infusibilizing, and firing the silazane polymer, there is obtained a ceramic material.

82. 发明授权

US5202452A Terminal perfluoroalkylsilane compound and a process for preparing the same 失效
标题翻译：末端全氟烷基硅烷化合物及其制备方法
公开(公告)号：US5202452A
公开(公告)日：1993-04-13
申请号：US753522
申请日：1991-09-03
申请人： Kazufumi Ogawa , Norihisa Mino , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
发明人： Kazufumi Ogawa , Norihisa Mino , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
IPC分类号： B05D1/18 , C07F7/12 , C07F7/18
CPC分类号： B82Y30/00 , B05D1/185 , B82Y40/00 , C07F7/12 , C07F7/182
摘要： A silane compound represented by the following general Formula (I) is described: ##STR1## wherein R.sup.1 is an alkyl group with 1 to 4 carbon atoms;A is oxygen atom (--O--), carboxyl group ##STR2## or an alkylsilylene group ##STR3## wherein each R.sup.2 and R.sup.3 is an alkyl group with 1 to 4 carbon atoms;x is a halogen atom, or an alkoxyl group;m is an integer from 1 to 8;n is an integer from 0 to 2;p is an integer from 5 to 25; andq is an integer from 0 to 2.The silane compound is useful as a coating agent for various base materials, to provide lubricity, in addition to stain-proofing property.
摘要翻译：描述由以下通式（I）表示的硅烷化合物：其中R 1是具有1至4个碳原子的烷基; A是氧原子（-O-），羧基基团或烷基亚甲硅基基团，其中每个R 2和R 3是具有1至4个碳原子的烷基; x是卤素原子或烷氧基; m是1至8的整数; n为0〜2的整数; p是5至25的整数; q为0〜2的整数。作为各种基材的涂布剂，除了防污性以外，还可以提供润滑性。

83. 发明授权

US5017715A Iodotrimethylsilane compositions 失效
标题翻译：碘代三甲基硅烷组合物
公开(公告)号：US5017715A
公开(公告)日：1991-05-21
申请号：US523878
申请日：1990-05-16
申请人： Katsuyuki Oikawa , Toshinobu Ishihara , Mikio Endo , Tohru Kubota
发明人： Katsuyuki Oikawa , Toshinobu Ishihara , Mikio Endo , Tohru Kubota
IPC分类号： C07B63/04 , C07F7/12 , C08K5/54
CPC分类号： C08K5/5406
摘要： A composition comprising iodotrimethylsilane in admixture with a polysiloxane is shelf stable for a long time and effective in various organic synthetic reactions.

84. 发明授权

US08367311B2 Method for producing hollow structure 有权
标题翻译：中空结构的制造方法
公开(公告)号：US08367311B2
公开(公告)日：2013-02-05
申请号：US12909329
申请日：2010-10-21
申请人： Wataru Kusaki , Toshinobu Ishihara
发明人： Wataru Kusaki , Toshinobu Ishihara
IPC分类号： G03F7/26
CPC分类号： B32B38/10
摘要： Provided is a fabrication method with which a laminate having a hollow structure can be produced more easily, while enabling to produce a multilayer structure as well. That is, a method for producing a hollow structure, a fabrication method by stacking-up a structural material among fabrication methods of a hollow structure on a substrate, the method including; a step of forming a structural material layer on a substrate, a step of forming a pattern on the structural material layer, a step of forming a sacrificial material layer by burying between the patterns with a water-soluble or an alkaline-soluble polymer as the sacrificial material to be buried between the patterns, a step of further laminating a structural material layer and forming a pattern on the structural material layer laminated, and a step of finally removing the sacrificial material after all of lamination is completed.
摘要翻译：提供了一种能够更容易地制造具有中空结构的层叠体的制造方法，同时能够制造多层结构。即，一种中空结构的制造方法，在基板的中空结构的制造方法中堆叠结构材料的制造方法，其特征在于，包括：在基材上形成结构材料层的步骤，在结构材料层上形成图案的步骤，通过用水溶性或碱溶性聚合物将图案之间埋入形成牺牲材料层的步骤牺牲材料被埋在图案之间，进一步层压结构材料层并在层压的结构材料层上形成图案的步骤，以及完成所有层压之后最终去除牺牲材料的步骤。

85. 发明申请

US20100086878A1 PATTERNING PROCESS 审中-公开
标题翻译：绘图过程
公开(公告)号：US20100086878A1
公开(公告)日：2010-04-08
申请号：US12575097
申请日：2009-10-07
申请人： Jun Hatakeyama , Masashi Iio , Takeru Watanabe , Takeshi Kinsho , Toshinobu Ishihara
发明人： Jun Hatakeyama , Masashi Iio , Takeru Watanabe , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： G03F7/20
CPC分类号： G03F7/405 , G03F7/0035 , H01L21/0273 , H01L21/0337 , H01L21/0338
摘要： A pattern is formed by applying a first positive resist material onto a substrate, heat treating, exposing to high-energy radiation, heat treating, then developing with a developer to form a first resist pattern; applying a protective coating solution comprising a hydrolyzable silicon compound having an amino group onto the first resist pattern and the substrate, heating to form a protective coating; and applying a second positive resist material thereon, heat treating, exposing to high-energy radiation, heat treating, and then developing with a developer to form a second resist pattern. By forming the second pattern in a space portion of the first pattern, this double patterning reduces the pattern pitch to one half.
摘要翻译：通过将第一正性抗蚀剂材料施加到基底上，热处理，暴露于高能量辐射，热处理，然后用显影剂显影以形成第一抗蚀剂图案，形成图案; 将包含具有氨基的可水解硅化合物的保护涂层溶液施加到第一抗蚀剂图案和基底上，加热形成保护涂层; 并在其上施加第二正性抗蚀剂材料，热处理，暴露于高能量辐射，热处理，然后用显影剂显影以形成第二抗蚀剂图案。通过在第一图案的空间部分中形成第二图案，该双重图案将图案间距减小到一半。

86. 发明申请

US20070099092A1 HALFTONE PHASE SHIFT MASK BLANK, AND METHOD OF MANUFACTURE 有权
标题翻译： HALFTONE相位移屏蔽空白及其制造方法
公开(公告)号：US20070099092A1
公开(公告)日：2007-05-03
申请号：US11613780
申请日：2006-12-20
申请人： Satoshi Okazaki , Toshinobu Ishihara
发明人： Satoshi Okazaki , Toshinobu Ishihara
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , C23C14/0676 , C23C14/08 , G03F1/68
摘要： A halftone phase shift mask blank has a phase shifter film on a transparent substrate. The phase shifter film is composed of a metal silicide compound containing Mo, at least one metal selected from Ta, Zr, Cr and W, and at least one element selected from O, N and C. The halftone phase shift mask blank has improved processability and high resistance to chemicals, especially to alkaline chemicals.
摘要翻译：半色调相移掩模板在透明基板上具有移相膜。移相器膜由含有Mo，选自Ta，Zr，Cr和W中的至少一种金属和选自O，N和C中的至少一种元素的金属硅化物化合物组成。半色调相移掩模毛坯具有改善的加工性耐化学品，特别是碱性化学品。

87. 发明授权

US07179545B2 Halftone phase shift mask blank, and method of manufacture 有权
标题翻译：半色调相移掩模空白及其制造方法
公开(公告)号：US07179545B2
公开(公告)日：2007-02-20
申请号：US10679264
申请日：2003-10-07
申请人： Satoshi Okazaki , Toshinobu Ishihara
发明人： Satoshi Okazaki , Toshinobu Ishihara
IPC分类号： B32B9/00
CPC分类号： G03F1/32 , C23C14/0676 , C23C14/08 , G03F1/68
摘要： A halftone phase shift mask blank has a phase shifter film on a transparent substrate. The phase shifter film is composed of a metal silicide compound containing Mo, at least one metal selected from Ta, Zr, Cr and W, and at least one element selected from O, N and C. The halftone phase shift mask blank has improved processability and high resistance to chemicals, especially to alkaline chemicals.
摘要翻译：半色调相移掩模板在透明基板上具有移相膜。移相器膜由含有Mo，选自Ta，Zr，Cr和W中的至少一种金属和选自O，N和C中的至少一种元素的金属硅化物化合物组成。半色调相移掩模毛坯具有改善的加工性耐化学品，特别是碱性化学品。

88. 发明申请

US20050244722A1 Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method 有权
标题翻译：半色调相移掩模空白，半色调相移掩模和图案转移方法
公开(公告)号：US20050244722A1
公开(公告)日：2005-11-03
申请号：US11093295
申请日：2005-03-30
申请人： Kimihiro Okada , Masahide Iwakata , Takashi Haraguchi , Mikio Takagi , Yuichi Fukushima , Hiroki Yoshikawa , Toshinobu Ishihara , Satoshi Okazaki , Yukio Inazuki , Tadashi Saga
发明人： Kimihiro Okada , Masahide Iwakata , Takashi Haraguchi , Mikio Takagi , Yuichi Fukushima , Hiroki Yoshikawa , Toshinobu Ishihara , Satoshi Okazaki , Yukio Inazuki , Tadashi Saga
IPC分类号： G03F1/00 , G03C5/00 , B32B9/00 , B32B17/06 , B32B17/10 , G03F9/00
CPC分类号： G03F1/32 , Y10T428/31616
摘要： In a halftone phase shift mask blank comprising a substrate, a light absorbing film, and a phase shifter film, the light absorbing film contains a metal element of Group 4A in a distribution having a higher metal element content in an upper region than in a lower region. Also provided is a halftone phase shift mask blank comprising a transparent substrate and a halftone phase shift film of a single layer or multiple layers having a preselected phase difference and transmittance, wherein at least one layer of the halftone phase shift film contains at least 90 atom % of silicon and a plurality of metal elements, typically Mo and Zr or Hf.
摘要翻译：在包括基板，光吸收膜和移相膜的半色调相移掩模坯料中，光吸收膜在上部区域中具有比在下部的金属元素含量高的分布中的4A族金属元素地区。还提供了一种半色调相移掩模坯料，其包括透明基板和具有预选相位差和透射率的单层或多层的半色调相移膜，其中至少一层半色调相移膜含有至少90个原子硅和多个金属元素，通常为Mo和Zr或Hf。

89. 发明申请

US20050217988A1 Film-depositing target and preparation of phase shift mask blank 有权
标题翻译：成膜沉积目标和相移掩模空白的准备
公开(公告)号：US20050217988A1
公开(公告)日：2005-10-06
申请号：US11093297
申请日：2005-03-30
申请人： Hiroki Yoshikawa , Toshinobu Ishihara , Satoshi Okazaki , Yukio Inazuki , Tadashi Saga , Kimihiro Okada , Masahide Iwakata , Takashi Haraguchi , Yuichi Fukushima
发明人： Hiroki Yoshikawa , Toshinobu Ishihara , Satoshi Okazaki , Yukio Inazuki , Tadashi Saga , Kimihiro Okada , Masahide Iwakata , Takashi Haraguchi , Yuichi Fukushima
IPC分类号： C23C14/06 , C23C14/34 , G03F1/32 , G03F1/54 , G03F1/68 , H01L21/027 , C23C14/32
CPC分类号： G03F1/32 , C23C14/06 , C23C14/3414 , C23C14/3464
摘要： For the manufacture of a halftone phase shift mask blank comprising a transparent substrate and a translucent film of one or more layers having a controlled phase and transmittance, at least one layer of the translucent film comprising Si, Mo and Zr at the same time, a target comprising at least Zr and Mo in a molar ratio Zr/Mo between 0.05 and 5 is useful.
摘要翻译：为了制造包括透明基板和具有受控相位和透射率的一层或多层的半透明膜的半色调相移掩模坯料，同时至少一层包括Si，Mo和Zr的半透明膜，包含Zr和Mo的摩尔比在0.05和5之间的至少Zr和Mo是有用的。

90. 发明授权

US06564570B2 Horizontal refrigerator 有权
标题翻译：卧式冰箱
公开(公告)号：US06564570B2
公开(公告)日：2003-05-20
申请号：US10005420
申请日：2001-12-04
申请人： Yasuhide Koike , Toshinobu Ishihara , Tomio Suyama , Kouichi Yamamoto
发明人： Yasuhide Koike , Toshinobu Ishihara , Tomio Suyama , Kouichi Yamamoto
IPC分类号： F25D2312
CPC分类号： A47F3/0439 , F25B5/02 , F25B40/00 , F25D11/022 , F25D17/06 , F25D23/021 , F25D23/061 , F25D2400/08
摘要： The cooling efficiency of a refrigerating chamber and a storage chamber is improved, and the cooling capability is prevented from degrading. A horizontal refrigerator 10 is comprised of an underlying refrigerator body 11 and an overlying show-case 12. The show-case 12 disposed on the top surface of a thermally insulated box 16 of the refrigerator body 11 is comprised of an outer box 37, an inner box 38 disposed within the outer box 37 spaced by a necessary space therefrom, and a heat insulating material 39 filled between both boxes 37, 38, and an opening 12a is formed only in a top portion. The opening 12a is opened and closed by a plurality of slidable doors 45. A cooling pipe 47 connected to a refrigerating mechanism is disposed in a meander form in contact with the outer surface on the insulating material side in the bottom and rear portions of the inner box 38, such that the entire inner box 38 is cooled by circulation of a coolant supplied from the refrigerating mechanism.
摘要翻译：提高了冷藏室和储藏室的冷却效率，防止了冷却能力的劣化。水平式冰箱10由下面的冰箱主体11和上层的展示箱12组成。展示箱12设置在冰箱主体11的隔热箱16的上表面由外箱37，设置在外箱37内的必要空间隔开的内箱38和填充在两箱37之间的隔热材料39 38，并且仅在顶部形成开口12a。开口12a由多个可滑动门45打开和关闭。连接到制冷机构的冷却管47以与内绝缘材料侧的绝缘材料侧的外表面接触的曲折形状盒38，使得整个内箱38通过从制冷机构供应的冷却剂的循环来冷却。

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