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    • 82. 发明申请
    • THIN FILM MAGNETIC HEAD THAT HAS SOLENOID TYPE RECORDING COIL
    • 具有电磁式记录线圈的薄膜磁头
    • US20070121247A1
    • 2007-05-31
    • US11564754
    • 2006-11-29
    • Kiyoshi Kobayashi
    • Kiyoshi Kobayashi
    • G11B5/127G11B5/147
    • G11B5/3163G11B5/17G11B5/3136
    • A thin film magnetic head is provided. The thin film magnetic head includes an upper coil wire group and a lower coil wire group. Two columns of coil contact groups that are formed on both end portions of individual coil wires of the upper coil wire group and the lower coil wire group and connect both end portions of the coil wires. An insulating resist layer buries a space between coil contacts of the coil contact groups. An inorganic insulating layer buries a space between the two columns of coil contact groups. The upper coil wire group, the lower coil wire group, and the two columns of coil contact groups form a thin film coil that applies a magnetic recording field to the magnetic material layer. The insulating resist layer and the inorganic insulating layer are located at the same lamination height as the two columns of coil contact groups.
    • 提供薄膜磁头。 薄膜磁头包括上线圈线组和下线圈线组。 形成在上线圈线组和下线圈线组的各个线圈线的两端部上并连接线圈线的两端的两列线圈接触组。 绝缘抗蚀剂层埋在线圈接触组的线圈接触之间的空间。 无机绝缘层埋在两列线圈接触组之间的空间。 上线圈线组,下线圈线组和两列线圈接触组形成向磁性体层施加磁记录场的薄膜线圈。 绝缘抗蚀剂层和无机绝缘层位于与两列线圈接触组相同的层叠高度处。
    • 88. 发明申请
    • Magnetic head and method for manufacturing the same
    • 磁头及其制造方法
    • US20050185340A1
    • 2005-08-25
    • US11051094
    • 2005-02-04
    • Kiyoshi Kobayashi
    • Kiyoshi Kobayashi
    • G11B5/31G11B5/147G11B5/33
    • G11B5/3116G11B5/1278Y10T29/49043Y10T29/49046Y10T29/49048Y10T29/49052
    • A first magnetic layer is formed on a first magnetic layer formation surface, and then a first material layer-forming layer is deposited on the first magnetic layer formation surface and on the sides and the top of the first magnetic layer and is etched to form first material layers so that the width dimension of each first material layer in the track width direction gradually decreases in the upward direction. Then, a second material layer is formed over the first material layer formation surface, the first material layers, and the first magnetic layer. Then, the first material layers, the second material layer, and the first magnetic layer are polished to expose the upper surface of the first magnetic layer and form the upper surfaces of the second material layer and the first magnetic layer as the same planarized surface.
    • 在第一磁性层形成表面上形成第一磁性层,然后在第一磁性层形成表面和第一磁性层的侧面和顶部上沉积第一材料层形成层,并且被蚀刻以形成第一磁性层 使得每个第一材料层在轨道宽度方向上的宽度尺寸在向上方向上逐渐减小。 然后,在第一材料层形成表面,第一材料层和第一磁性层上形成第二材料层。 然后,对第一材料层,第二材料层和第一磁性层进行抛光以暴露第一磁性层的上表面,并将第二材料层和第一磁性层的上表面形成为相同的平坦化表面。