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    • 87. 发明授权
    • Image developing apparatus having a toner scatter preventing unit and image forming apparatus
    • 具有调色剂散射防止单元和图像形成装置的图像显影装置
    • US07386248B2
    • 2008-06-10
    • US11439254
    • 2006-05-24
    • Seung-chan ParkMyoung-su BaekSoon-seok Kwon
    • Seung-chan ParkMyoung-su BaekSoon-seok Kwon
    • G03G15/08
    • G03G15/0898
    • An image developing apparatus includes an upper case, and a lower case having an opening and containing a developing agent on a lower side of the upper case. A photoconductive drum in the upper case forms an electrostatic latent image on a surface thereof. A charging roller charges the photoconductive drum. A developing roller having one part is exposed through the opening of the lower case to cooperate with the photoconductive drum for developing the electrostatic latent image. A scattering preventing unit disposed between the photoconductive drum and the developing roller, to prevent scattering of the developing agent. The scattering preventing unit includes a blocking curtain covering part of the opening and one side in contact with the outer circumference of the photoconductive drum.
    • 图像显影装置包括上壳体和具有开口并且在上壳体的下侧容纳显影剂的下壳体。 上壳体中的感光鼓在其表面上形成静电潜像。 充电辊对感光鼓充电。 具有一部分的显影辊通过下壳体的开口露出,以与感光鼓配合以使静电潜像显影。 设置在感光鼓和显影辊之间的防散射单元,以防止显影剂的飞散。 散射防止单元包括遮蔽窗口,其覆盖开口的一部分和与感光鼓的外周接触的一侧。
    • 88. 发明授权
    • Substrate processing apparatus using neutralized beam and method thereof
    • 使用中和束的基板处理装置及其方法
    • US07385183B2
    • 2008-06-10
    • US11335725
    • 2006-01-19
    • Sung-Chan ParkSung-Wook Hwang
    • Sung-Chan ParkSung-Wook Hwang
    • H05H3/02H01J37/26H01S1/00
    • H01J37/026H01J37/32357H01J2237/0042H01J2237/334
    • In a substrate processing apparatus using a neutralized beam and a method thereof, the substrate processing apparatus includes: an ion source for emitting an ion beam at an emitting angle; reflectors at which the ion beam emitted by the ion source is incident and subject to 2n collisions (where n is a positive integer) in first and second opposite directions to neutralize the ion beam as a neutralized beam and to restore a direction of propagation of the neutralized beam to the emitting angle of the ion beam; and a substrate at which the neutralized beam generated by the reflectors is incident on to perform a process. Accordingly, an incident angle of the resultant neutralized beam is perpendicular to a substrate, while the direction of propagation of the originating ion source and the surface of the substrate are maintained to be perpendicular to each other.
    • 在使用中和束的基板处理装置及其方法中,基板处理装置包括:用于以发射角发射离子束的离子源; 由离子源发射的离子束入射并且在第一和第二相反方向上经受2n次碰撞(其中n是正整数)的反射器,以将离子束中和作为中和的光束,并恢复所述离子束的传播方向 中和的束到离子束的发射角; 以及由反射器产生的被中和的光束入射的基板,以执行处理。 因此,所得中和束的入射角垂直于基板,而原始离子源和基板的表面的传播方向保持彼此垂直。