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71. 发明授权

US5246767A High light-transmissive dust-proof body and method of preparing same 失效
标题翻译：高光透射防尘体及其制备方法
公开(公告)号：US5246767A
公开(公告)日：1993-09-21
申请号：US449000
申请日：1989-12-12
申请人： Tokinori Agou , Hiroaki Nakagawa
发明人： Tokinori Agou , Hiroaki Nakagawa
IPC分类号： G02B1/11 , G03F1/62
CPC分类号： G03F1/62 , G02B1/113 , Y10T428/24942 , Y10T428/265
摘要： A high light-transmissive dust-proof body equipped with a holding frame to be mounted on a mask substrate and a transparent light-transmissive film mounted on the holding frame, wherein the light-transmissive film comprises an inorganic film having a thickness of 0.2 .mu.m to less than 10 .mu.m and transmitting light having wavelengths of 240 to 500 nm at an average light transmittance of at least 85%, wherein the light-transmissive film forms (i) a three-layer structure of a low refractive index layer/high refractive index layer/base layer, or (ii) a five-layer structure comprising a low refractive index layer/high refractive index layer/base layer/high refractive index layer/low refractive index layer, the high refractive index layer being an inorganic layer and the low refractive index layer being an organic polymer.

72. 发明授权

US5059451A Reflection-preventive pellicle film and process for preparation thereof 失效
标题翻译：反射预防薄膜及其制备方法
公开(公告)号：US5059451A
公开(公告)日：1991-10-22
申请号：US544699
申请日：1990-06-27
申请人： Tokinori Agou , Hitomi Matsuzaki , Masaaki Kawasaki
发明人： Tokinori Agou , Hitomi Matsuzaki , Masaaki Kawasaki
IPC分类号： B32B23/08 , C08J3/09 , C08J7/04 , G02B1/11 , G03F1/62
CPC分类号： C08J7/047 , B32B23/08 , C08J3/091 , G02B1/111 , G03F1/62 , C08J2301/08 , C08J2333/16 , C08J2433/00 , Y10T428/3154
摘要： A reflection-preventive layer composed of a specific polyfluoro(meth)acrylate is formed on one or both of the surfaces of a transparent film of a cellulose derivative. In this reflection-preventive pellicle film, the minimum light transmission in wavelengths of 350 to 450 nm is improved and the average light transmission is improved, and the adhesion of the reflection-preventive layer to the cellulose derivative layer is excellent.

73. 发明授权

US4676614A Apparatus for regulating the optical characteristics of a projection optical system 失效
标题翻译：用于调节投影光学系统的光学特性的装置
公开(公告)号：US4676614A
公开(公告)日：1987-06-30
申请号：US744175
申请日：1985-06-13
申请人： Koichi Ohno
发明人： Koichi Ohno
IPC分类号： H01L21/30 , G03F1/62 , G03F7/20 , H01L21/027 , G03B3/10
CPC分类号： G03F7/70241 , G03F7/70883
摘要： An optical apparatus for projecting a pattern on a first plane onto a second plane comprises a projection optical system disposed between the first plane and the second plane to form an imaging optical path, a structure for forming a space independent from the ambient space and filled with a gas between the first plane and the second plane in such a manner that the imaging optical path passes therethrough, the structure including a first transparent flat member perpendicular to the optic axis of the projection optical system and forming the entrance surface of the imaging light beam to the independent space and a second transparent flat member parallel to the first transparent flat member and forming the exit surface of the imaging light beam from the independent space, the gas filling the independent space having a refractive index different from the refractive index of the ambient space, and a device for regulating the distance between the first transparent flat member and the second transparent flat member and varying the thickness of the independent space in the direction of the optic axis.
摘要翻译：一种用于将第一平面上的图案投影到第二平面上的光学装置包括设置在第一平面和第二平面之间的投影光学系统，以形成成像光路，用于形成与环境空间无关的空间并填充有第一平面和第二平面之间的气体，使得成像光路穿过其中，该结构包括垂直于投影光学系统的光轴的第一透明平面构件并且形成成像光束的入射表面独立空间和平行于第一透明平板部件的第二透明平板部件，并且从独立空间形成成像光束的出射表面，填充独立空间的气体具有不同于环境的折射率的折射率空间和用于调节第一透明平板构件与第二透明平板构件之间的距离的装置透明的平坦构件，并且在光轴的方向上改变独立空间的厚度。

74. 发明授权

US4637714A Inspection system for pellicalized reticles 失效
标题翻译：透明掩模版检验系统
公开(公告)号：US4637714A
公开(公告)日：1987-01-20
申请号：US793599
申请日：1985-10-31
申请人： Alexander L. Flamholz
发明人： Alexander L. Flamholz
IPC分类号： G01N21/88 , G01N21/93 , G01N21/956 , G03F1/62 , G03F1/84 , G03F7/20 , H01L21/027 , H01L21/30 , H01L21/66 , G03B27/32
CPC分类号： G03F1/84 , G03F7/70616 , G03F1/62
摘要： A method of detecting defects in a reticle used to fabricate semiconductor circuits by enhancing the image of a defect in one chip site without appreciably changing all other chip site images. In a step-and-repeat alignment system, a first chip site is exposed under normal intensities to print the reticle pattern at a proper exposure level. At a second chip site, exposure takes place using the same reticle (or a second identical reticle) at lower intensity levels. Given this underexposure, residual photoresist will remain at defect sites. The optical imagery at the two chip sites is different allowing comparator techniques to be used.
摘要翻译：一种检测用于制造半导体电路的掩模版中的缺陷的方法，通过增强一个芯片位置的缺陷图像，而不会明显地改变所有其它芯片位置图像。在步进重复对准系统中，第一芯片部位在正常强度下暴露以将掩模版图案以适当的曝光水平打印。在第二个芯片部位，曝光在较低强度水平下使用相同的掩模版（或第二个相同的掩模版）进行。鉴于这种曝光不足，残留的光致抗蚀剂将保留在缺陷部位。两个芯片位置的光学图像是不同的，允许使用比较器技术。

75. 发明授权

US4623676A Protective coating for phototools 失效
公开(公告)号：US4623676A
公开(公告)日：1986-11-18
申请号：US692780
申请日：1985-01-18
申请人： John F. Kistner
发明人： John F. Kistner
IPC分类号： G03F7/027 , C08F2/46 , C08F2/48 , C08F2/50 , C08G59/00 , C08G59/18 , C08G59/20 , C08G59/30 , C08G59/40 , C08G85/00 , G03F1/62 , G03F7/004 , G03F7/028 , G03F7/038 , G03F7/075 , H05K3/06 , G03C1/68 , C08F8/00 , C08F30/08
CPC分类号： G03F1/62
摘要： A radiation-curable composition suitable for use as a protective coating for a photographic element comprises a polymerizable acrylic compound, a polymerizable epoxy-functional silane compound, a free-radical photoinitiator capable of initiating polymerization of said acrylic compound, and 0 to 2 percent of the total composition on a weight basis of a cationic photoinitiator capable of initiating polymerization of said epoxy-functional silane compound, said composition containing epoxy functionality only in a silane compound.

76. 发明授权

US4539070A Exposure of photo resist 失效
标题翻译：曝光抗蚀剂
公开(公告)号：US4539070A
公开(公告)日：1985-09-03
申请号：US563837
申请日：1983-12-21
申请人： Richard Jarocinski , William R. Keaton , Joseph L. Magennis
发明人： Richard Jarocinski , William R. Keaton , Joseph L. Magennis
IPC分类号： G03F1/48 , G03F1/62 , G03F7/20 , H05K3/00 , C23F1/02 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号： G03F1/62 , G03F1/48 , G03F7/2008 , G03F7/70583 , H05K3/0082
摘要： A method and apparatus for limiting the interference caused by shadows of minute particles of opaque matter that settles on the surface of an assembly of a metal substrate, a resist and an overlay by placing a second glass overlay on top of the assembly to raise the surface to a level where the shadows of any particles resting there will be diffused.
摘要翻译：一种用于限制由不透明物质的微小颗粒的阴影引起的干扰的方法和装置，其通过将第二玻璃覆盖物放置在组件的顶部上而沉积在金属基底，抗蚀剂和覆盖层的组件的表面上，以使表面到一个水平，任何在这里的颗粒的阴影将被扩散。

77. 发明授权

US4499162A Photomask and method of using same 失效
标题翻译：光掩模及其使用方法
公开(公告)号：US4499162A
公开(公告)日：1985-02-12
申请号：US507371
申请日：1983-06-24
申请人： Edward L. Banks , Thomas S. Ellington, IV , Birol Kuyel
发明人： Edward L. Banks , Thomas S. Ellington, IV , Birol Kuyel
IPC分类号： G03F1/00 , G03F1/48 , G03F1/62 , G03F9/00 , G03C5/06
CPC分类号： G03F1/62 , G03F1/48 , G03F1/50 , Y10T428/24868 , Y10T428/24917
摘要： A photomask (60) used to form patterns on a resist coated semiconductor wafer is comprised of a light transmissive baseplate (62) having a thin metallic pattern (63) thereon; a plasma deposited coating (66) covering the patterned baseplate (62); a light transmissive, planar coverplate (68) in intimate contact with the coating (66) with an index matching fluid (72) interposed therebetween.
摘要翻译：用于在抗蚀剂涂覆的半导体晶片上形成图案的光掩模（60）由其上具有薄金属图案（63）的透光基板（62）组成; 覆盖图案化基板（62）的等离子体沉积涂层（66）; 透明的平面覆盖物（68），其与涂层（66）紧密接触，并具有插入其间的折射率匹配流体（72）。

78. 发明授权

US4476172A Pellicle compositions and pellicles thereof for projection printing 失效
标题翻译：用于投影印刷的防护薄膜组合物及其薄膜
公开(公告)号：US4476172A
公开(公告)日：1984-10-09
申请号：US486082
申请日：1983-04-18
申请人： Irl E. Ward
发明人： Irl E. Ward
IPC分类号： C08F8/00 , C08F8/42 , C08J5/18 , G03F1/62 , H01L21/027 , C08L83/06
CPC分类号： G03F1/62 , Y10T428/31663 , Y10T428/31942
摘要： A pellicle for use in projection printing comprises a pellicle in which the transparent film is formed from the novel film forming reaction product of a polyvinyl butyral resin with a silane. Pellicles employing such films are useful in the near, mid and deep UV regions.
摘要翻译：用于投影印刷的防护薄膜组件包括由聚乙烯醇缩丁醛树脂与硅烷的新型成膜反应产物形成透明膜的防护薄膜组件。使用这种膜的薄膜可用于近，中，深UV区域。

79. 发明申请

US20230101021A1 EUV PHOTOMASK ARCHITECTURES FOR PATTERNING OF INTEGRATED CIRCUITS 有权
公开(公告)号：US20230101021A1
公开(公告)日：2023-03-30
申请号：US17956042
申请日：2022-09-29
申请人： Astrileux Corporation
发明人： Supriya JAISWAL
IPC分类号： G03F1/24 , G03F1/26 , G03F1/62 , G03F1/60
摘要： The present disclosure provides masks suitable for Extreme Ultraviolet (EUV) and X-ray lithography by including a non-reflective region combined with a reflective multilayer. This non-reflective region replaces a typical absorber layer used to provide the pattern for integrated circuits.

80. 发明授权

US11506971B2 Pellicle and method of using the same 有权
公开(公告)号：US11506971B2
公开(公告)日：2022-11-22
申请号：US16867280
申请日：2020-05-05
申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
发明人： Chue San Yoo , Hsin-Chang Lee , Pei-Cheng Hsu , Yun-Yue Lin
IPC分类号： G03F1/64 , G03F1/62 , G03F7/20
摘要： A pellicle includes a frame. The frame includes a check valve, wherein the check valve is configured to permit gas flow from an interior of the pellicle to an exterior of the pellicle; and a bottom surface of the frame defines only a single recess therein. The pellicle further includes a gasket configured to fit within the single recess.

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