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71. 发明授权

US08864936B2 Apparatus and method for processing substrate 有权
标题翻译：基板处理装置及方法
公开(公告)号：US08864936B2
公开(公告)日：2014-10-21
申请号：US12810915
申请日：2008-12-10
申请人： Young Ki Han , Young Soo Seo
发明人： Young Ki Han , Young Soo Seo
IPC分类号： C23F1/00 , H01L21/306 , C23C16/00 , H01J37/20 , H01J37/32
CPC分类号： H01J37/20 , H01J37/3244 , H01J37/32449 , H01J2237/2002 , H01J2237/20235
摘要： There are provided an apparatus and method for processing a substrate. By using the apparatus and method, plasma processing can be individually performed on each of edge and rear regions of a substrate in a single chamber. The apparatus includes a chamber providing a reaction space; a stage installed in the chamber; a plasma shielding unit installed opposite to the stage in the chamber; a support unit for supporting a substrate between the stage and the plasma shielding unit; a first supply pipe provided at the stage to supply a reaction or non-reaction gas to one surface of the substrate; and second and third supply pipes provided at the plasma shielding unit, the second supply pipe supplying a reaction gas to the other surface of the substrate, the third supply pipe supplying a non-reaction gas to the other surface.
摘要翻译：提供了一种用于处理基板的装置和方法。通过使用该装置和方法，可以在单个室中对基板的边缘区域和后部区域各自进行等离子体处理。该装置包括提供反应空间的室; 安装在室内的舞台; 等离子体屏蔽单元，其安装在所述室中与所述台相对; 支撑单元，用于在所述载物台和所述等离子体屏蔽单元之间支撑基板; 设置在所述阶段以将反应或非反应气体供应到所述基板的一个表面的第一供给管; 以及设置在所述等离子体屏蔽单元处的第二和第三供应管，所述第二供应管向所述基板的另一表面供应反应气体，所述第三供应管向另一表面供应非反应气体。

72. 发明授权

US08785883B2 Transmission electron microscope, and method of observing specimen 有权
标题翻译：透射电子显微镜，观察样品的方法
公开(公告)号：US08785883B2
公开(公告)日：2014-07-22
申请号：US12918619
申请日：2009-04-27
申请人： Eiko Nakazawa , Hiroyuki Kobayashi , Susumu Kuwabata
发明人： Eiko Nakazawa , Hiroyuki Kobayashi , Susumu Kuwabata
IPC分类号： G01N23/00 , G21K5/08 , H01J37/26 , H01J37/30
CPC分类号： H01J37/20 , G01N1/2813 , G01N23/04 , G01N23/2251 , G01N2001/4027 , H01J37/26 , H01J37/261 , H01J37/3007 , H01J2237/2002 , H01J2237/20214 , H01J2237/204 , H01J2237/206
摘要： Provided is means which enables observation of the shape of a specimen as it is without deforming the specimen. Observation is made by allowing a specimen-holding member having an opening (for example, microgrid and mesh) to hold an ionic liquid and charging a specimen thereto, to allow the specimen to suspend in the ionic liquid. Furthermore, in the proximity of the specimen-holding member, a mechanism of injecting an ionic liquid (ionic liquid introduction mechanism) and/or an electrode are provided. When a voltage is applied to the electrode, the specimen moves or deforms in the ionic liquid. How the specimen moves or deforms can be observed. Furthermore, in the proximity of specimen-holding member, an evaporation apparatus is provided to enable charge of the specimen into the ionic liquid while evaporating. Furthermore, in the proximity of the specimen-holding member, a microcapillary is provided to charge a liquid-state specimen into the ionic liquid. Note that the specimen-holding member is designed to be rotatable.
摘要翻译：提供能够在不使样本变形的情况下观察样本的形状的装置。通过允许具有开口的样本保持构件（例如，微网和网格）来保持离子液体并向其中充入试样以允许样品悬浮在离子液体中进行观察。此外，在试样保持构件附近设置有注入离子液体（离子液体导入机构）和/或电极的机构。当电极施加电压时，样品在离子液体中移动或变形。可以观察样品移动或变形。此外，在试样保持构件附近，设置蒸发装置，以使得能够在蒸发时将试样充入离子液体中。此外，在样本保持构件附近，提供微毛细管以将液态样本充入离子液体中。注意，试样保持构件被设计成可旋转。

73. 发明申请

US20140105794A1 Nano-Pipet Fabrication 审中-公开
公开(公告)号：US20140105794A1
公开(公告)日：2014-04-17
申请号：US13671282
申请日：2012-11-07
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人： Stefan Harrer , John A. Ott , Stanislav Polonsky
IPC分类号： B01L3/02 , B29C67/00 , B82Y99/00
CPC分类号： C03C23/005 , H01J2237/2002
摘要： A hollow high aspect ratio sample, such as a nano-test-tube, with a tip that is closed off is secured in a particle beam device, such as a transmission electron microscope. The tip is engaged with the particle beam of the particle beam device until a hole opens up on the tip, thereby turning the high aspect ratio sample into a nano-pipet. Alternatively, a nano-pipet having a hole that does not meet desired parameter values is secured in a particle beam device. The nano-pipet is engaged with the particle beam to attain the desired values of the hole parameters.

74. 发明授权

US08698098B2 In situ holder assembly 有权
标题翻译：原位支架装配
公开(公告)号：US08698098B2
公开(公告)日：2014-04-15
申请号：US13466947
申请日：2012-05-08
申请人： Pushkarraj V. Deshmukh , Jeffrey J. Gronsky , Paul E. Fischione
发明人： Pushkarraj V. Deshmukh , Jeffrey J. Gronsky , Paul E. Fischione
IPC分类号： G01N21/01 , G01N23/00
CPC分类号： G01N21/01 , G01N21/0303 , G01N23/00 , H01J37/20 , H01J37/228 , H01J2237/2002 , H01J2237/2003 , H01J2237/206 , H01J2237/2065
摘要： An in situ optical specimen holder is disclosed which allows imaging and analysis during dynamic experimentation. This holder assembly includes a set of focusing and reflection optics along with an environmental cell. Electromagnetic radiation can be used to optically excite the specimen in the presence or absence of fluid and the source of such radiation may be located within the body of the holder itself. The spot size of the irradiation at the specimen surface can be varied, thus exciting only a specific region on the specimen. The window type cell provides a variable fluid path length ranging from the specimen thickness to 500 μm. The holder has the provision to continuously circulate fluids over the specimen. The pressure within the cell can be regulated by controlling the flow rate of the fluids and the speed of the pumps.
摘要翻译：公开了一种在动态实验中进行成像和分析的原位光学样本架。该支架组件包括一组聚焦和反射光学器件以及环境细胞。在存在或不存在流体的情况下，电磁辐射可以用于光学激发样品，并且这种辐射源可以位于保持器本体的主体内。样品表面的照射点尺寸可以变化，从而仅激发样品上的特定区域。窗型细胞提供从样品厚度到500μm的可变流体路径长度。支架具有使流体在试样上连续循环的条件。可以通过控制流体的流量和泵的速度来调节电池内的压力。

75. 发明授权

US08604429B2 Electron beam device and sample holding device for electron beam device 有权
标题翻译：用于电子束装置的电子束装置和样品保持装置
公开(公告)号：US08604429B2
公开(公告)日：2013-12-10
申请号：US13201820
申请日：2010-01-20
申请人： Toshie Yaguchi , Yasuhira Nagakubo , Takeo Kamino , Akira Watabe
发明人： Toshie Yaguchi , Yasuhira Nagakubo , Takeo Kamino , Akira Watabe
IPC分类号： H01J37/08 , H01J37/18
CPC分类号： H01J37/20 , H01J2237/006 , H01J2237/2002 , H01J2237/2003 , H01J2237/2004
摘要： An object of the invention is to provide an electron beam device and a sample holding device for the electron beam device that can observe the reaction between a sample and a gas at high resolution while a gas atmosphere is maintained even by using thin diaphragms.To solve one of the problems described above, in an electron beam device having the function of separately exhausting an electron beam irradiation portion of an optical column, a sample chamber and an observation chamber, a gas supply means for supplying a gas to a sample and an exhaust means for exhausting a gas are provided to sample holding means, diaphragms are disposed above and below the sample to separate the gas atmosphere and vacuum of the sample chamber and to constitute a cell sealing the atmosphere around the sample, and a mechanism for spraying a gas is provided to the outside of the diaphragms. The gas sprayed outside the diaphragms has low electron beam scattering performance such as hydrogen, oxygen or nitrogen. The diaphragm is an amorphous film formed of a light element such as a carbon film, an oxide film and a nitride film capable of transmitting the electron beam.
摘要翻译：本发明的目的是提供一种用于电子束装置的电子束装置和样品保持装置，其可以在通过使用薄隔膜保持气体气氛的同时以高分辨率观察样品和气体之间的反应。为了解决上述问题之一，在具有分别排出光学柱的电子束照射部分，样品室和观察室的功能的电子束装置中，向样品供应气体的气体供给装置和向样品保持装置提供用于排出气体的排气装置，在样品上方和下方设置隔膜以分离样品室的气体气氛和真空，并构成密封样品周围的气氛的单元，以及用于喷射的机构气体被提供到隔膜的外部。喷射在隔膜外部的气体具有低电子束散射性能，例如氢，氧或氮。隔膜是由诸如碳膜，氧化膜和能够透射电子束的氮化物膜的光元件形成的非晶膜。

76. 发明授权

US08497476B2 Inspection device 有权
标题翻译：检查装置
公开(公告)号：US08497476B2
公开(公告)日：2013-07-30
申请号：US13420731
申请日：2012-03-15
申请人： Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Yoshihiko Naito , Yasushi Toma , Tsutomu Karimata , Takehide Hayashi , Kiwamu Tsukamoto , Tatsuya Kohama , Noboru Kobayashi
发明人： Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Yoshihiko Naito , Yasushi Toma , Tsutomu Karimata , Takehide Hayashi , Kiwamu Tsukamoto , Tatsuya Kohama , Noboru Kobayashi
IPC分类号： G01N23/225
CPC分类号： H01J37/073 , G01N23/22 , G01N23/223 , G01N23/2251 , G01N2223/611 , H01J1/34 , H01J37/09 , H01J37/10 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/265 , H01J37/28 , H01J37/29 , H01J2237/0048 , H01J2237/022 , H01J2237/032 , H01J2237/038 , H01J2237/045 , H01J2237/0458 , H01J2237/0473 , H01J2237/0492 , H01J2237/061 , H01J2237/06333 , H01J2237/166 , H01J2237/186 , H01J2237/2002 , H01J2237/2007 , H01J2237/2008 , H01J2237/2448 , H01J2237/2482 , H01J2237/2485 , H01J2237/2817 , H01J2237/2855 , H01J2237/2857
摘要： An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.
摘要翻译：用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

77. 发明申请

US20130098292A1 Processing System 有权
公开(公告)号：US20130098292A1
公开(公告)日：2013-04-25
申请号：US13708936
申请日：2012-12-08
申请人： Emmerich Bertagnolli , Heinz Wanzenboeck , Wolfram Buehler , Camille Stebler , Ulrike Zeile , Alexander Rosenthal
发明人： Emmerich Bertagnolli , Heinz Wanzenboeck , Wolfram Buehler , Camille Stebler , Ulrike Zeile , Alexander Rosenthal
IPC分类号： C23C16/48
CPC分类号： H01J37/3178 , C23C16/486 , C23C16/487 , H01J37/16 , H01J37/20 , H01J37/261 , H01J37/30 , H01J37/3056 , H01J2237/188 , H01J2237/2002 , H01J2237/2602 , H01J2237/303 , H01J2237/31744
摘要： A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.

78. 发明授权

US08299432B2 Scanning transmission electron microscope using gas amplification 有权
标题翻译：扫描透射电子显微镜使用气体放大
公开(公告)号：US08299432B2
公开(公告)日：2012-10-30
申请号：US12264805
申请日：2008-11-04
申请人： Milos Toth , William Ralph Knowles , Rae Knowles, legal representative
发明人： Milos Toth , William Ralph Knowles
IPC分类号： G01N23/00
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2002 , H01J2237/2444 , H01J2237/24445 , H01J2237/2449 , H01J2237/2605 , H01J2237/2802
摘要： A scanning transmission electron microscope operated with the sample in a high pressure environment. A preferred detector uses gas amplification by converting either scattered or unscattered transmitted electrons to secondary electrons for efficient gas amplification.
摘要翻译：扫描透射电子显微镜在高压环境下与样品一起操作。优选的检测器通过将散射或未散射的透射电子转换成二次电子来进行气体放大，用于有效的气体放大。

79. 发明申请

US20110057100A1 Transmission Electron Microscope, and Method of Observing Specimen 有权
标题翻译：透射电子显微镜和观察样品的方法
公开(公告)号：US20110057100A1
公开(公告)日：2011-03-10
申请号：US12918619
申请日：2009-04-27
申请人： Eiko Nakazawa , Hiroyuki Kobayashi , Susumu Kuwabata
发明人： Eiko Nakazawa , Hiroyuki Kobayashi , Susumu Kuwabata
IPC分类号： G01N23/04 , G01N23/00
CPC分类号： H01J37/20 , G01N1/2813 , G01N23/04 , G01N23/2251 , G01N2001/4027 , H01J37/26 , H01J37/261 , H01J37/3007 , H01J2237/2002 , H01J2237/20214 , H01J2237/204 , H01J2237/206
摘要： Provided is means which enables observation of the shape of a specimen as it is without deforming the specimen. Observation is made by allowing a specimen-holding member having an opening (for example, microgrid and mesh) to hold an ionic liquid and charging a specimen thereto, to allow the specimen to suspend in the ionic liquid. Furthermore, in the proximity of the specimen-holding member, a mechanism of injecting an ionic liquid (ionic liquid introduction mechanism) and/or an electrode are provided. When a voltage is applied to the electrode, the specimen moves or deforms in the ionic liquid. How the specimen moves or deforms can be observed. Furthermore, in the proximity of specimen-holding member, an evaporation apparatus is provided to enable charge of the specimen into the ionic liquid while evaporating. Furthermore, in the proximity of the specimen-holding member, a microcapillary is provided to charge a liquid-state specimen into the ionic liquid. Note that the specimen-holding member is designed to be rotatable.
摘要翻译：提供能够在不使样本变形的情况下观察样本的形状的装置。通过允许具有开口的样本保持构件（例如，微网和网格）来保持离子液体并向其中充入试样以允许样品悬浮在离子液体中进行观察。此外，在试样保持构件附近设置有注入离子液体（离子液体导入机构）和/或电极的机构。当电极施加电压时，样品在离子液体中移动或变形。可以观察样品移动或变形。此外，在试样保持构件附近，设置蒸发装置，以使得能够在蒸发时将试样充入离子液体中。此外，在样本保持部件附近，设置微毛细管，以将液态标本充入离子液体。注意，试样保持构件被设计成可旋转。

80. 发明申请

US20100301236A1 Shorten Temperature Recovery Time of Low Temperature Ion Implantation 审中-公开
标题翻译：缩短低温离子植入的温度恢复时间
公开(公告)号：US20100301236A1
公开(公告)日：2010-12-02
申请号：US12472316
申请日：2009-05-26
申请人： Shih-Yung Shieh , Cheng-Hui Shen
发明人： Shih-Yung Shieh , Cheng-Hui Shen
IPC分类号： H01J37/08
CPC分类号： H01J37/3171 , H01J2237/2001 , H01J2237/2002 , H01L21/265
摘要： The present invention discloses a low temperature ion implantation by performing a heating process after the end of an implanting process and before the wafer is moved into the external environment. This invention actively raises wafer temperature at a time no later than implementation of the vacuum venting process, such that the condensed moisture induced by the temperature difference between a vacuum environment inside ion implanter and an external environment outside ion implanter is effectively minimized. The wafer can be heated at a loadlock, a robot for transferring wafer and/or an implantation chamber. The wafer can be heated by a gas, a liquid, a light and/or a heater embedded in a holder for holding the wafer.
摘要翻译：本发明公开了一种低温离子注入，通过在植入过程结束之后并且在晶片移动到外部环境中之前执行加热过程。本发明在不迟于实施真空排气过程的时候主动地提高晶片温度，使得离子注入机内的真空环境和离子注入机外部的外部环境之间的温度差引起的冷凝水分被有效地最小化。可以在负载锁上加热晶片，用于传送晶片和/或注入室的机器人。可以通过嵌入在用于保持晶片的保持器中的气体，液体，光和/或加热器来加热晶片。

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