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71. 发明授权

US07528929B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07528929B2
公开(公告)日：2009-05-05
申请号：US10986178
申请日：2004-11-12
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
IPC分类号： G03B27/53 , G03B27/54
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
摘要翻译：公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。

72. 发明申请

US20080302980A1 Extreme ultra-violet lithographic apparatus and device manufacturing method 有权
标题翻译：极紫外光刻设备及其制造方法
公开(公告)号：US20080302980A1
公开(公告)日：2008-12-11
申请号：US11808264
申请日：2007-06-07
申请人： Jan Bernard Plechelmus Van Schoot , Johannes Hubertus Josephina Moors
发明人： Jan Bernard Plechelmus Van Schoot , Johannes Hubertus Josephina Moors
IPC分类号： G21K5/00 , G03C5/04
CPC分类号： G03F7/70908 , G03F7/70191 , G21K1/10
摘要： An extreme ultra-violet lithographic apparatus for imaging a pattern onto a substrate includes a radiation system constructed and arranged to provide a beam of an extreme ultra-violet radiation, and an absorber arranged in the beam and constructed and arranged to absorb at least a portion of the radiation beam. The absorber has a volume configured to accommodate a flow of an absorbing gas. The flow is directed in a transverse direction with respect to the beam. The absorber includes a structure having an extreme ultra-violet radiation-transmissive beam entry area and an extreme ultra-violet radiation-transmissive beam exit area. The apparatus also includes a gas inlet actuator array configured to inject the gas into the volume and a gas outlet actuator array arranged to evacuate the gas from the volume.
摘要翻译：用于将图案成像到基板上的极紫外光刻设备包括构造和布置成提供极紫外辐射光束的辐射系统和布置在光束中的构造和布置成吸收至少一部分的辐射束。吸收器具有构造成容纳吸收气体流的体积。流动相对于梁的横向被引导。吸收器包括具有极紫外辐射透射光束入射区域和极紫外辐射透射光束出射区域的结构。该装置还包括配置成将气体注入容积的气体入口致动器阵列和布置成从体积排出气体的气体出口致动器阵列。

73. 发明申请

US20080212044A1 Debris Mitigation System with Improved Gas Distribution 有权
标题翻译：具有改善气体分布的碎片减缓系统
公开(公告)号：US20080212044A1
公开(公告)日：2008-09-04
申请号：US11917207
申请日：2006-06-06
申请人： Gunther Hans Derra , Thomas Krucken
发明人： Gunther Hans Derra , Thomas Krucken
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F7/70883 , G03F7/70908 , G03F7/70933
摘要： The present invention relates to a debris mitigation system, in particular for use in a radiation unit for EUV radiation and/or X-rays. The debris mitigation system comprises a foil trap (11) having several passages allowing a straight passage of radiation and one or several feed pipes (5) for gas supply of buffer gas (7) to said foil trap. The foil trap has at least one interior space (14) extending over several of said passages, wherein the feed pipes open into that space. The present debris mitigation system allows effective debris mitigation.
摘要翻译：本发明涉及一种碎片缓解系统，特别是用于EUV辐射和/或X射线的辐射单元。碎片缓解系统包括箔捕集器（11），其具有允许辐射的直线通过的多个通道和用于向所述箔捕获器供气缓冲气体（7）的一个或多个进料管（5）。箔阱具有至少一个在几个所述通道上延伸的内部空间（14），其中进料管打开到该空间中。目前的碎片减缓系统可以有效减少碎片。

74. 发明授权

US07397056B2 Lithographic apparatus, contaminant trap, and device manufacturing method 失效
标题翻译：平版印刷设备，污染物捕集器和器件制造方法
公开(公告)号：US07397056B2
公开(公告)日：2008-07-08
申请号：US11175036
申请日：2005-07-06
申请人： Leonid Aizikovitch Sjmaenok , Vadim Yevgenyevich Banine , Josephus Jacobus Smits , Lambertus Adrianus Van De Wildenberg , Alexander Alexandrovitch Schmidt , Arnoud Cornelis Wassink , Eric Louis Willem Verpalen , Antonius Johannes Van De Pas
发明人： Leonid Aizikovitch Sjmaenok , Vadim Yevgenyevich Banine , Josephus Jacobus Smits , Lambertus Adrianus Van De Wildenberg , Alexander Alexandrovitch Schmidt , Arnoud Cornelis Wassink , Eric Louis Willem Verpalen , Antonius Johannes Van De Pas
IPC分类号： H01J65/04
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70908 , G03F7/70916
摘要： A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.
摘要翻译：光刻设备包括包括用于产生辐射束的辐射源的辐射系统和布置在辐射束的路径中的污染物阱。污染物捕集器包括限定通道的多个箔或板，其基本上平行于所述辐射束的传播方向布置。箔或板相对于辐射束的光轴基本上径向定向。污染物陷阱设置有气体注射器，其被配置为至少在两个不同位置将气体喷射到污染物阱的至少一个通道中。

75. 发明授权

US07372049B2 Lithographic apparatus including a cleaning device and method for cleaning an optical element 失效
标题翻译：光刻设备包括清洁装置和清洁光学元件的方法
公开(公告)号：US07372049B2
公开(公告)日：2008-05-13
申请号：US11292312
申请日：2005-12-02
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Derk Jan Wilfred Klunder
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Derk Jan Wilfred Klunder
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70883 , G03F7/70908 , G03F7/70983
摘要： An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication with the hydrogen radical source. The cleaning device is configured to provide a flow of hydrogen radicals and the flow tube is arranged to provide a hydrogen radical flow at a predetermined position within the lithographic apparatus, for example for cleaning a collector mirror.
摘要翻译： EUV光刻设备包括EUV辐射源，光学元件和清洁装置。清洁装置包括氢自由基源和与氢根源连通的流管。清洁装置被配置为提供氢自由基流，并且流管布置成在光刻设备内的预定位置处提供氢自由基流，例如用于清洁收集镜。

76. 发明授权

US07253875B1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07253875B1
公开(公告)日：2007-08-07
申请号：US11366803
申请日：2006-03-03
申请人： Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Fransiscus Van Der Pasch , Ronald Van Der Ham , Niek Jacobus Johannes Roset
发明人： Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Fransiscus Van Der Pasch , Ronald Van Der Ham , Niek Jacobus Johannes Roset
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70858 , G03F7/70775 , G03F7/70908
摘要： A lithographic apparatus includes a measurement system to measure the position and/or movement of a substrate support relative to a reference frame. The measurement system includes a target mounted to one of the substrate support and the reference frame, a radiation source mounted to the other one of the substrate support and the reference frame and a sensor configured to detect a pattern of radiation propagating from the target, indicating the position or movement of the substrate support. The substrate support includes one or more gas outlets configured to provide a flow of gas that encapsulates the volume of space through which the beam of radiation propagates to the target.
摘要翻译：光刻设备包括用于测量衬底支撑件相对于参考框架的位置和/或运动的测量系统。测量系统包括安装到基板支撑件和参考框架中的一个的目标，安装到基板支撑件和参考框架中的另一个的辐射源以及被配置为检测从目标传播的辐射图案的传感器，指示衬底支撑件的位置或运动。衬底支撑件包括一个或多个气体出口，其构造成提供封装辐射束通过其传播到靶的空间体积的气体流。

77. 发明授权

US07233013B2 Radiation source for the generation of short-wavelength radiation 有权
标题翻译：用于产生短波长辐射的辐射源
公开(公告)号：US07233013B2
公开(公告)日：2007-06-19
申请号：US11393325
申请日：2006-03-30
申请人： Guido Hergenhan , Kai Gaebel , Thomas Brauner
发明人： Guido Hergenhan , Kai Gaebel , Thomas Brauner
IPC分类号： G01J3/10 , G01J1/00 , H05G2/00 , H01J65/04
CPC分类号： H05G2/003 , G03F7/70841 , G03F7/70858 , G03F7/70908 , G03F7/70916
摘要： In a radiation source for the generation of short-wavelength radiation, it is the object of the invention to effectively increase the protection of the collimator optics by a buffer gas without substantially reducing the radiation transmission. A vacuum chamber which encloses a radiation-emitting plasma and is outfitted with at least one feed line and one outlet line for a buffer gas in order to ensure protection against debris for at least one optical element which directs the radiation to a radiation outlet opening in the vacuum chamber has chamber areas with particle deceleration of varying magnitude by the buffer gas. The particle deceleration is greater at least in a first chamber area in which the optical element is arranged than in any other chamber area.
摘要翻译：在用于产生短波长辐射的辐射源中，本发明的目的是通过缓冲气体有效地增加对准直器光学元件的保护，而不会基本上减少辐射透射。包围发射辐射的等离子体的真空室，并配备有用于缓冲气体的至少一个进料管线和一个出口管线，以便确保防止碎片对于至少一个将辐射引导到辐射出口开口处的碎片真空室具有通过缓冲气体具有不同大小的粒子减速的腔室区域。至少在布置光学元件的第一室区域中，粒子减速度比在任何其它室区域中更大。

78. 发明申请

US20070125963A1 RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS 失效
标题翻译：辐射系统和光刻设备
公开(公告)号：US20070125963A1
公开(公告)日：2007-06-07
申请号：US11292310
申请日：2005-12-02
申请人： Maarten Marinus Johannes Van Herpen , Johannes Moors , Derk Klunder
发明人： Maarten Marinus Johannes Van Herpen , Johannes Moors , Derk Klunder
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70041 , G03F7/70191 , G03F7/7055 , G03F7/70908 , G21K1/043 , G21K1/062
摘要： A radiation system for generating a beam of radiation is disclosed. The radiation system includes a pulsed EUV source for generating EUV radiation, and a spectral filter mounted in front of the EUV source for selectively passing a spectral range of a beam of EUV radiation from the EUV source. The spectral filter is mounted on a movable mount configured to be moved in synchronicity with the pulsed EUV source to prevent debris traveling from the EUV source from impacting the spectral filter. Accordingly, the spectral filter is kept substantially free from contamination by the debris.
摘要翻译：公开了一种用于产生辐射束的辐射系统。辐射系统包括用于产生EUV辐射的脉冲EUV源和安装在EUV源前面的光谱滤波器，用于选择性地通过来自EUV源的EUV辐射束的光谱范围。光谱滤光器安装在可移动的安装座上，可移动的安装件被配置为与脉冲EUV源同步地移动，以防止从EUV源传播的碎屑撞击光谱滤波器。因此，光谱滤波器基本上不受碎屑的污染。

79. 发明申请

US20070018118A1 Lithographic apparatus, contaminant trap, and device manufacturing method 失效
标题翻译：平版印刷设备，污染物捕集器和器件制造方法
公开(公告)号：US20070018118A1
公开(公告)日：2007-01-25
申请号：US11481252
申请日：2006-07-06
申请人： Leonid Sjmaenok , Vadim Banine , Josephus Smits , Lambertus Wildenberg , Alexander Schmidt , Arnoud Wassink , Eric Verpalen , Antonius Van De Pas , Paul Peter Anna Brom
发明人： Leonid Sjmaenok , Vadim Banine , Josephus Smits , Lambertus Wildenberg , Alexander Schmidt , Arnoud Wassink , Eric Verpalen , Antonius Van De Pas , Paul Peter Anna Brom
IPC分类号： A61N5/00
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70908 , G03F7/70916
摘要： A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.
摘要翻译：光刻设备包括包括用于产生辐射束的辐射源的辐射系统和布置在辐射束的路径中的污染物阱。污染物捕集器包括限定通道的多个箔或板，其基本上平行于所述辐射束的传播方向布置。箔或板可以相对于辐射束的光轴基本上径向定向。污染物阱可以设置有气体注射器，其被配置为至少在两个不同位置将气体喷射到污染物阱的至少一个通道中。

80. 发明申请

US20070002292A1 Laminar flow gas curtains for lithographic applications 有权
标题翻译：用于平版印刷应用的层流气幕
公开(公告)号：US20070002292A1
公开(公告)日：2007-01-04
申请号：US11170067
申请日：2005-06-30
申请人： Herman Vogel , Michael Parisi
发明人： Herman Vogel , Michael Parisi
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70908
摘要： Laminar flow gas curtains for use in lithographic applications. In an embodiment, a gas curtain system includes a nozzle that enhances the fluidic purge process. The nozzle includes a first housing, a second housing, a flow distribution plate, and a plurality of flow conditioning channels. The first housing has an inlet for receiving a gas and encloses a first volume. The second housing encloses a second volume and is fluidly coupled to the first housing. The flow distribution plate controls the flow of gas from the first volume to the second volume. The plurality of flow conditioning channels are disposed within a portion of the second volume and are used to discharge the gas that forms the gas curtain. The length of the flow conditioning channels is selected to attenuate non-axial, gas velocity flow-vectors. The nozzle limits the gaseous mixing that occurs after the purge gas exits the nozzle channels and starts to purge a gaseous volume.
摘要翻译：用于光刻应用的层流气幕。在一个实施例中，气幕系统包括增强流体清洗过程的喷嘴。喷嘴包括第一壳体，第二壳体，流量分配板和多个流量调节通道。第一壳体具有用于接收气体并包围第一容积的入口。第二壳体包围第二容积并且流体地联接到第一壳体。流量分配板控制从第一体积到第二体积的气体流动。多个流动调节通道设置在第二容积的一部分内，并用于排出形成气幕的气体。选择流量调节通道的长度以衰减非轴向气体速度流矢量。喷嘴限制在吹扫气体离开喷嘴通道之后发生的气体混合并开始吹扫气体体积。

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