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71. 发明授权

US07238429B2 Ultra-hard low friction coating based on A1MgB14 for reduced wear of MEMS and other tribological components and system 有权
标题翻译：基于A1MgB14的超硬低摩擦涂层，可减少MEMS和其他摩擦组件和系统的磨损
公开(公告)号：US07238429B2
公开(公告)日：2007-07-03
申请号：US10946051
申请日：2004-09-21
申请人： Bruce Allan Cook , Yun Tian , Joel Lee Harringa , Alan Paul Constant , Alan Mark Russell , Palaniappa A. Molian
发明人： Bruce Allan Cook , Yun Tian , Joel Lee Harringa , Alan Paul Constant , Alan Mark Russell , Palaniappa A. Molian
IPC分类号： B32B15/20 , C23C14/34 , C23C14/16 , C22C21/00
CPC分类号： C23C14/067 , B81B3/0075 , B81C2201/032 , C23C14/28 , Y10S428/938 , Y10T428/12736 , Y10T428/1275 , Y10T428/31678
摘要： Performance and reliability of microelectromechanical system (MEMS) components enhanced dramatically through the incorporation of protective thin film coatings. Current-generation MEMS devices prepared by the LIGA technique employ transition metals such as Ni, Cu, Fe, or alloys thereof, and hence lack stability in oxidizing, corrosive, and/or high temperature environments. Fabrication of a superhard, self-lubricating coating based on a ternary boride compound AlMgB14 is described in this letter as a potential breakthrough in protective coating technology for LIGA microdevices. Nanoindentation tests show that hardness of AlMgB14 films prepared by pulsed laser deposition ranges from 45 GPa to 51 GPa, when deposited at room temperature and 573 K, respectively. Extremely low friction coefficients of 0.04-0.05, which are thought to result from a self-lubricating effect, have also been confirmed by nanoscratch tests on the AlMgB14 films. Transmission electron microscopy studies show that the as-deposited films are amorphous, regardless of substrate temperature; however, analysis of FTIR spectra suggests that the higher substrate temperature facilitates formation of the B12 icosahedral framework, therefore leading to the higher hardness.
摘要翻译：微机电系统（MEMS）组件的性能和可靠性通过并入保护性薄膜涂层而显着提高。通过LIGA技术制备的当前一代MEMS器件采用过渡金属如Ni，Cu，Fe或其合金，因此在氧化，腐蚀性和/或高温环境中缺乏稳定性。在本文中描述了基于三元硼化物AlMgB 14的超硬自润滑涂层的制造，作为LIGA微型器件的保护涂层技术的潜在突破。纳米压痕测试显示，当分别在室温和573K下沉积时，通过脉冲激光沉积制备的AlMgB 14 N膜的硬度范围为45GPa至51GPa。认为是由自润滑效应引起的非常低的摩擦系数0.04-0.05也已经通过AlMgB 14膜的纳米尺度试验证实。透射电子显微镜研究表明，沉积膜是无定形的，不管基底温度如何; 然而，FTIR光谱的分析表明较高的底物温度有助于形成B 12二十面体骨架，因此导致更高的硬度。

72. 发明申请

US20060163527A1 Sp3 bond boron nitride emitting light in ultraviolet region, its producing method, and functional material using same 失效
标题翻译： Sp3键氮化硼在紫外线区域发射光，其制备方法和使用其的功能材料
公开(公告)号：US20060163527A1
公开(公告)日：2006-07-27
申请号：US10518644
申请日：2003-07-01
申请人： Shojiro Komatsu , Katsuyuki Okada , Yusuke Moriyoshi
发明人： Shojiro Komatsu , Katsuyuki Okada , Yusuke Moriyoshi
IPC分类号： C04B35/00 , B29C71/04
CPC分类号： C09K11/63 , C09K11/0883 , C23C14/0026 , C23C14/0647 , C23C14/28 , C23C16/342 , C23C16/482 , C23C16/50 , C23C16/513
摘要： The present invention provides a sp3-bonded boron nitride, represented by a general formula BN, having a hexagonal 5H or 6H polytypic form and having a property of emitting light in ultraviolet region. Its producing method comprises: introducing reaction mixed gas containing boron and nitrogen being diluted with dilution gas into a reaction chamber; and irradiating a surface of a substrate placed in the chamber, a growing surface on the substrate, and a growing spacing region about the growing surface with ultraviolet light to cause gas phase reaction, thereby generating, depositing, or growing the boron nitride on the substrate.
摘要翻译：本发明提供由通式BN代表的具有六方晶5H或6H多型形式并具有紫外区发光特性的sp 3键合氮化硼。其制备方法包括：将含有稀释气稀释的硼和氮的反应混合气引入反应室; 并且照射放置在所述室中的基板的表面，所述基板上的生长表面以及围绕所述生长表面的紫外线的生长间隔区域以引起气相反应，从而在所述基板上产生，沉积或生长所述氮化硼。

73. 发明申请

US20060153986A1 Evaporation method and apparatus using infrared guiding heater 有权
标题翻译：使用红外导热加热器的蒸发方法和装置
公开(公告)号：US20060153986A1
公开(公告)日：2006-07-13
申请号：US11030076
申请日：2005-01-07
申请人： Hitoshi Yamamoto
发明人： Hitoshi Yamamoto
IPC分类号： C23C16/00
CPC分类号： C23C14/228 , C23C14/12 , C23C14/28 , C23C14/52 , C23C14/54 , H01L51/0008
摘要： A method and apparatus for evaporating a solid organic material by sublimation using an infrared guiding heater which minimizes temperature gradients in the bulk of the organic target. The bulk is heated to a temperature below the sublimation temperature of the target. A localized area of the target is sublimated by the infrared guiding heater while regulating the temperature of the bulk. The vapor is then deposited over, and condensed on, a substrate to form a solid organic layer.
摘要翻译：一种通过使用红外引导加热器升华来蒸发固体有机材料的方法和装置，其使有机靶的大部分中的温度梯度最小化。将体积加热到低于目标的升华温度的温度。通过红外引导加热器升高目标的局部区域，同时调节体积的温度。然后将蒸气沉积在基底上并在其上冷凝以形成固体有机层。

74. 发明申请

US20060060297A1 Method of fabricating organic light emitting display 有权
公开(公告)号：US20060060297A1
公开(公告)日：2006-03-23
申请号：US11020660
申请日：2004-12-27
申请人： Jae-Ho Lee , Tae-Min Kang , Jin-Soo Kim , Seong-Taek Lee
发明人： Jae-Ho Lee , Tae-Min Kang , Jin-Soo Kim , Seong-Taek Lee
IPC分类号： B32B37/00
CPC分类号： H01L51/0013 , B23K26/067 , C23C14/048 , C23C14/28 , H01L51/56 , Y10T156/10
摘要： Provided is a method of fabricating an organic light emitting display. The method includes forming an organic layer pattern on a substrate by irradiating a predetermined region of a donor substrate with a laser beam using a laser irradiation apparatus, the laser irradiation apparatus having a spatial light modulator (SLM). The spatial light modulator is used to form the organic layer pattern using the LITI method. Accordingly, it is possible to adjust various types of incident light to homogeneous and to have a desired profile. Therefore, there is provided a method of fabricating an organic light emitting display which is capable of forming an organic layer pattern without using a mask.

75. 发明授权

US06994775B2 Multilayer composites and manufacture of same 失效
标题翻译：多层复合材料及其制造
公开(公告)号：US06994775B2
公开(公告)日：2006-02-07
申请号：US10209391
申请日：2002-07-31
申请人： Terry G. Holesinger , Quanxi Jia
发明人： Terry G. Holesinger , Quanxi Jia
IPC分类号： C23C14/34
CPC分类号： C23C14/28 , C23C14/087 , Y10S505/816
摘要： The present invention is directed towards a process of depositing multilayer thin films, disk-shaped targets for deposition of multilayer thin films by a pulsed laser or pulsed electron beam deposition process, where the disk-shaped targets include at least two segments with differing compositions, and a multilayer thin film structure having alternating layers of a first composition and a second composition, a pair of the alternating layers defining a bi-layer wherein the thin film structure includes at least 20 bi-layers per micron of thin film such that an individual bi-layer has a thickness of less than about 100 nanometers.
摘要翻译：本发明涉及一种沉积多层薄膜的方法，用于通过脉冲激光或脉冲电子束沉积方法沉积多层薄膜的盘形靶，其中盘形靶包括具有不同组成的至少两个片段，以及具有第一组合物和第二组合物的交替层的多层薄膜结构，一对限定双层的交替层，其中薄膜结构包括每微米薄膜至少20个双层，使得个体双层具有小于约100纳米的厚度。

76. 发明申请

US20060001012A1 Method for manufacturing nanostructured manganese oxide having dendritic structure, and oxygen reduction electrode comprising nanostructured transition metal oxide having dendritic structure 有权
公开(公告)号：US20060001012A1
公开(公告)日：2006-01-05
申请号：US11219714
申请日：2005-09-07
申请人： Nobuyasu Suzuki , Yasunori Morinaga , Hidehiro Sasaki , Yuka Yamada
发明人： Nobuyasu Suzuki , Yasunori Morinaga , Hidehiro Sasaki , Yuka Yamada
IPC分类号： H01B1/00
CPC分类号： C01G45/02 , C01P2004/04 , C01P2006/40 , C23C14/081 , C23C14/28 , H01M4/8825 , H01M4/9016 , Y10S977/811
摘要： An object of the present invention is to provide an oxygen reduction electrode having excellent oxygen reduction properties (oxygen reduction catalyst abilities). The present invention encompasses: (1) A method for manufacturing a nanostructured manganese oxide having a dendritic structure formed from an agglomeration of primary particles, wherein the method comprises the steps of: removing components from a target plate that comprises one or more kinds of manganese oxides by irradiating the target plate with laser light in an atmosphere comprising a mixed gas of inert gas and oxygen gas, the content of the oxygen gas in the mixed gas being no less than 0.05% but no more than 0.5% as measured by mass flow rate; and depositing the removed components on a substrate that is opposed to the target plate substantially in parallel to obtain the nanostructured manganese oxide, and (2) an oxygen reduction electrode comprising a nanostructured transition metal oxide having a dendritic structure formed from an agglomeration of primary particles.

77. 发明申请

US20050181116A1 Method for coating a medical device using a matrix assisted pulsed-laser evaporation technique and associated system and medical device 审中-公开
标题翻译：使用矩阵辅助脉冲激光蒸发技术和相关系统和医疗装置涂覆医疗装置的方法
公开(公告)号：US20050181116A1
公开(公告)日：2005-08-18
申请号：US10782056
申请日：2004-02-18
申请人： Rob Worsham
发明人： Rob Worsham
IPC分类号： B05D7/24 , C23C14/04 , C23C14/12 , C23C14/28 , A61L2/00 , B05D3/00 , C23C8/00
CPC分类号： C23C14/28 , B05D1/60 , C23C14/12
摘要： A method is provided for coating at least a portion of at least one medical device. The method includes arranging the at least one medical device in a vapor cone and directing an energy beam at a frozen target. The frozen target includes an agent and the energy beam vaporizes the agent into the vapor cone. A device is provided for coating at least one medical device. The device includes a target assembly, an energy beam directed at the target assembly, and an arrangement adapted to hold the at least one medical device in a vapor cone. The vapor cone originates at a target point that an energy beam beam contacts a frozen target in the target assembly. A medical device is provided having a coating applied by a method. The method includes arranging the medical device in a vapor cone and directing an energy beam at a frozen target. The frozen target includes an agent and the energy beam vaporizes the agent into the vapor cone.
摘要翻译：提供了一种用于涂覆至少一个医疗装置的至少一部分的方法。所述方法包括将所述至少一个医疗装置布置在蒸气锥体中并且将能量束引导到冷冻目标。冷冻的目标物包括试剂，能量束将试剂汽化成蒸气锥体。提供了用于涂覆至少一个医疗装置的装置。该装置包括目标组件，指向目标组件的能量束，以及适于将至少一个医疗装置保持在蒸气锥体中的装置。蒸气锥体起始于能量束束接触目标组件中的冻结目标的目标点。提供了具有通过一种方法施加的涂层的医疗装置。该方法包括将医疗装置布置在蒸汽锥体中并将能量束引导到冻结的目标。冷冻的目标物包括试剂，能量束将试剂汽化成蒸气锥体。

78. 发明申请

US20050176585A1 Process for producing oxide superconductive thin-film 审中-公开
标题翻译：生产氧化物超导薄膜的方法
公开(公告)号：US20050176585A1
公开(公告)日：2005-08-11
申请号：US10511268
申请日：2003-04-17
申请人： Shuji Hahakura , Kazuya Ohmatsu
发明人： Shuji Hahakura , Kazuya Ohmatsu
IPC分类号： C23C14/08 , C23C14/22 , C23C14/28 , H01L39/24 , H01B1/00
CPC分类号： C23C14/225 , C23C14/087 , C23C14/28 , H01L39/2448
摘要： Provided is a method of producing an oxide superconducting film on a single-crystal substrate by depositing, on the single-crystal substrate, substances scattered from a raw material due to irradiation with laser beams according to a pulsed-laser deposition method, wherein the irradiation of the raw material is performed in a manner such that the repetition frequency of the pulse irradiation of the laser beams is divided into at least two steps. Thus, an oxide superconducting film having a high critical current density can be produced by the method.
摘要翻译：提供一种通过在单晶衬底上沉积根据脉冲激光沉积方法由激光照射而从原料散射的物质在单晶衬底上制备氧化物超导膜的方法，其中照射以使得激光束的脉冲照射的重复频率被划分为至少两个步骤的方式执行原材料。因此，可以通过该方法制造具有高临界电流密度的氧化物超导膜。

79. 发明申请

US20050162043A1 Piezoelectric device, liquid jet head, and methods for manufacturing the same, and thin film forming apparatus 有权
标题翻译：压电元件，液体喷射头及其制造方法以及薄膜形成装置
公开(公告)号：US20050162043A1
公开(公告)日：2005-07-28
申请号：US11000517
申请日：2004-11-30
申请人： Takamitsu Higuchi , Setsuya Iwashita , Hiromu Miyazawa
发明人： Takamitsu Higuchi , Setsuya Iwashita , Hiromu Miyazawa
IPC分类号： B41J2/045 , B41J2/055 , B41J2/135 , B41J2/14 , B41J2/16 , C23C14/08 , C23C14/22 , C23C14/28 , H01L41/08 , H01L41/09 , H01L41/18 , H01L41/187 , H01L41/22 , H01L41/319 , H02N2/00
CPC分类号： B41J2/161 , B41J2/1623 , B41J2/1628 , B41J2/1634 , B41J2/1642 , B41J2/1645 , B41J2/1646 , C23C14/08 , C23C14/28 , H01L41/1876 , H01L41/316 , Y10T29/42 , Y10T29/435 , Y10T29/49005 , Y10T29/49007
摘要： A method is provided for effectively manufacturing a piezoelectric device equipped with a piezoelectric film with a crystal orientation that is aligned in a desired direction. An interlayer which partially has a layer formed by an ion beam assisted laser ablation method while controlling a temperature rise accompanied by an ion beam irradiation by a cooling device and is bi-axially oriented as a whole, is formed on a surface of a substrate. A lower electrode is formed on the interlayer. A piezoelectric film is formed on the lower electrode. An upper electrode is formed on the piezoelectric film. The lower electrode and the piezoelectric film are formed by epitaxial growth.
摘要翻译：提供了一种有效地制造具有在期望方向上排列的晶体取向的压电薄膜的压电装置的方法。在衬底的表面上形成部分地具有通过离子束辅助激光烧蚀法形成的层的中间层，同时控制伴随着冷却装置的离子束照射并且作为整体的双轴取向的温度升高。在中间层上形成下电极。在下电极上形成压电薄膜。在压电膜上形成上电极。下电极和压电膜通过外延生长形成。

80. 发明申请

US20050100748A1 Ultra-hard low friction coating based on AlMgB14 for reduced wear of MEMS and other tribological components and system 有权
标题翻译：基于AlMgB14的超硬低摩擦涂层，减少MEMS和其他摩擦组件和系统的磨损
公开(公告)号：US20050100748A1
公开(公告)日：2005-05-12
申请号：US10946051
申请日：2004-09-21
申请人： Bruce Cook , Yun Tian , Joel Harringa , Alan Constant , Alan Russell , Palaniappa Molian
发明人： Bruce Cook , Yun Tian , Joel Harringa , Alan Constant , Alan Russell , Palaniappa Molian
IPC分类号： B32B15/04 , B81B3/00 , B81B7/00 , C23C14/06 , C23C14/28 , C23C16/00
CPC分类号： C23C14/067 , B81B3/0075 , B81C2201/032 , C23C14/28 , Y10S428/938 , Y10T428/12736 , Y10T428/1275 , Y10T428/31678
摘要： Performance and reliability of microelectromechanical system (MEMS) components enhanced dramatically through the incorporation of protective thin film coatings. Current-generation MEMS devices prepared by the LIGA technique employ transition metals such as Ni, Cu, Fe, or alloys thereof, and hence lack stability in oxidizing, corrosive, and/or high temperature environments. Fabrication of a superhard, self-lubricating coating based on a ternary boride compound AlMgB14 is described in this letter as a potential breakthrough in protective coating technology for LIGA microdevices. Nanoindentation tests show that hardness of AlMgB14 films prepared by pulsed laser deposition ranges from 45 GPa to 51 GPa, when deposited at room temperature and 573 K, respectively. Extremely low friction coefficients of 0.04-0.05, which are thought to result from a self-lubricating effect, have also been confirmed by nanoscratch tests on the AlMgB14 films. Transmission electron microscopy studies show that the as-deposited films are amorphous, regardless of substrate temperature; however, analysis of FTIR spectra suggests that the higher substrate temperature facilitates formation of the B12 icosahedral framework, therefore leading to the higher hardness.
摘要翻译：微机电系统（MEMS）组件的性能和可靠性通过并入保护性薄膜涂层而显着提高。通过LIGA技术制备的当前一代MEMS器件采用过渡金属如Ni，Cu，Fe或其合金，因此在氧化，腐蚀性和/或高温环境中缺乏稳定性。在本文中描述了基于三元硼化物AlMgB 14的超硬自润滑涂层的制造，作为LIGA微型器件的保护涂层技术的潜在突破。纳米压痕测试显示，当分别在室温和573K下沉积时，通过脉冲激光沉积制备的AlMgB 14 N膜的硬度范围为45GPa至51GPa。认为是由自润滑效应引起的非常低的摩擦系数0.04-0.05也已经通过AlMgB 14膜的纳米尺度试验证实。透射电子显微镜研究表明，沉积膜是无定形的，不管基底温度如何; 然而，FTIR光谱的分析表明较高的底物温度有助于形成B 12二十面体骨架，因此导致更高的硬度。

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