专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

71. 发明授权

US08789626B2 Ultra hard/hard composite materials 有权
标题翻译：超硬/硬复合材料
公开(公告)号：US08789626B2
公开(公告)日：2014-07-29
申请号：US13141042
申请日：2009-12-18
申请人： Antionette Can , Geoffrey John Davies , Johannes Lodewikus Myburgh
发明人： Antionette Can , Geoffrey John Davies , Johannes Lodewikus Myburgh
IPC分类号： E21B10/46
CPC分类号： C04B35/62886 , A61F2/0059 , A61F2/78 , C04B35/528 , C04B35/5831 , C04B35/6265 , C04B35/62818 , C04B35/62831 , C04B35/645 , C04B2235/3217 , C04B2235/3839 , C04B2235/3886 , C04B2235/427 , C04B2235/786 , C09K3/1409 , C23C28/027 , C23C28/324 , C23C28/347 , C23C30/005
摘要： The invention provides for an ultra hard or hard composite material comprising a primary ultra hard or hard particulate material and at least one secondary ultra hard or hard particulate material dispersed in a matrix material. The primary ultra hard or hard particulate material has a thermal expansion coefficient lower than that of the matrix material and the at least one secondary ultra hard or hard particulate material has a thermal expansion coefficient greater than that of the matrix material.
摘要翻译：本发明提供一种超硬或硬复合材料，其包含主要的超硬或硬颗粒材料和分散在基体材料中的至少一种次级超硬或硬颗粒材料。初级超硬或硬颗粒材料的热膨胀系数低于基体材料的热膨胀系数，并且至少一种次级超硬或硬颗粒材料的热膨胀系数大于基体材料的热膨胀系数。

72. 发明申请

US20140182216A1 PARTICULATE MATERIALS AND METHODS OF FORMING SAME 有权
标题翻译：颗粒材料及其形成方法
公开(公告)号：US20140182216A1
公开(公告)日：2014-07-03
申请号：US14143656
申请日：2013-12-30
申请人： Saint-Gobain Ceramics & Plastics, Inc.
发明人： Tracy H. Panzarella , Doruk O. Yener , Michael D. Kavanaugh , Alan J. Brandes
IPC分类号： C09K3/14
CPC分类号： C09K3/1436 , C01F7/021 , C01F7/16 , C01G17/00 , C01P2004/03 , C01P2004/82 , C04B35/62802 , C04B35/62813 , C04B2235/3217 , C09K3/1409 , C09K3/1418
摘要： A particulate material having a body including a first phase having at least about 70 wt % alumina for a total weight of the first phase, and a second phase comprising phosphorus, wherein the body includes at least about 0.1 wt % of the second phase for the total weight of the body, and wherein the second phase has an average grain size of not greater than about 1 micron.
摘要翻译：一种具有主体的颗粒材料，该主体包括第一相，其具有至少约70重量％的氧化铝用于第一相的总重量，以及包含磷的第二相，其中该主体包含至少约0.1重量％的第二相，用于身体的总重量，其中第二相具有不大于约1微米的平均粒度。

73. 发明授权

US08764865B2 Shaped abrasive particles with grooves 有权
标题翻译：带凹槽的成型磨料颗粒
公开(公告)号：US08764865B2
公开(公告)日：2014-07-01
申请号：US12627567
申请日：2009-11-30
申请人： John T. Boden , Dwight D. Erickson , Scott R. Culler , Negus B. Adefris , John D. Haas
发明人： John T. Boden , Dwight D. Erickson , Scott R. Culler , Negus B. Adefris , John D. Haas
IPC分类号： B24D3/02 , C09C1/68 , C09K3/14
CPC分类号： C09K3/1409 , B24D3/00 , B24D11/00 , B24D18/0009 , Y10T428/24364 , Y10T428/257 , Y10T428/2982
摘要： Abrasive particles comprising shaped abrasive particles each having a sidewall, each of the shaped abrasive particles comprising alpha alumina and having a first face and a second face separated by a sidewall and having a maximum thickness, T; and the shaped abrasive particles further comprising a plurality of grooves on the second face.
摘要翻译：研磨颗粒包括各自具有侧壁的成形磨料颗粒，每个成形磨料颗粒包含α氧化铝，并且具有由侧壁分隔并具有最大厚度T的第一面和第二面; 并且所述成形磨料颗粒还包括在所述第二面上的多个凹槽。

74. 发明授权

US08764863B2 Composite shaped abrasive particles and method of forming same 有权
标题翻译：复合成形磨料颗粒及其形成方法
公开(公告)号：US08764863B2
公开(公告)日：2014-07-01
申请号：US13731793
申请日：2012-12-31
申请人： Doruk O. Yener , Paul Braun
发明人： Doruk O. Yener , Paul Braun
IPC分类号： B24D3/00 , B24D11/00 , B24D18/00 , C09K3/14
CPC分类号： C09K3/1409 , C04B35/1115 , C04B35/64 , C04B2235/3244 , C04B2235/94 , C04B2235/96 , C09K3/1436
摘要： A method of forming a shaped abrasive particle includes forming a first mixture and a second mixture in a single forming process into an integral precursor shaped abrasive particle, wherein the first mixture has a different composition than a composition of the second mixture.
摘要翻译：形成成形磨料颗粒的方法包括在单一成型过程中将第一混合物和第二混合物形成为整体的前体成形磨料颗粒，其中第一混合物具有与第二混合物的组合物不同的组成。

75. 发明申请

US20140179203A1 ABRASIVE PARTICLES HAVING A UNIQUE MORPHOLOGY 有权
公开(公告)号：US20140179203A1
公开(公告)日：2014-06-26
申请号：US14194138
申请日：2014-02-28
申请人： DIAMOND INNOVATIONS, INC.
发明人： Timothy Francis Dumm , Kan-Yin Ng
IPC分类号： C09K3/14
CPC分类号： C09K3/1445 , B24B37/042 , C01B21/064 , C01B25/165 , C01B32/20 , C01B32/25 , C01B32/28 , C01P2004/61 , C01P2004/62 , C01P2004/80 , C01P2004/90 , C09K3/1409 , C09K3/1436 , C30B29/04 , C30B33/08 , Y10T428/2982 , Y10T428/2991
摘要： An abrasive particle having an irregular surface, wherein the surface roughness of the particle is less than about 0.95. A method for producing modified abrasive particles, including providing a plurality of abrasive particles, providing a reactive coating on said particles, heating said coated particles; and recovering modified abrasive particles.

76. 发明申请

US20140109489A1 STRUCTURED ABRASIVE ARTICLES AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：结构磨料制品及其制造方法
公开(公告)号：US20140109489A1
公开(公告)日：2014-04-24
申请号：US14123790
申请日：2012-06-25
申请人： Michihiro Ohishi , Yoko Nakamura
发明人： Michihiro Ohishi , Yoko Nakamura
IPC分类号： B24D3/28 , B24D18/00
CPC分类号： B24D3/28 , B24D18/0009 , C09K3/1409
摘要： A structured abrasive article having an extensible base member; a three-dimensional element including abrasive particles and binder therefore; and a resin layer that binds the extensible base member and the three-dimensional element.
摘要翻译：一种结构化的磨料制品，具有可延伸的基底构件; 因此，包括磨料颗粒和粘合剂的三维元素; 以及结合可延伸基材和三维元件的树脂层。

77. 发明申请

US20140051335A1 ABRASIVE AND POLISHING COMPOSITION 审中-公开
标题翻译：磨料和抛光组合物
公开(公告)号：US20140051335A1
公开(公告)日：2014-02-20
申请号：US13981231
申请日：2012-01-19
申请人： Hitoshi Morinaga , Eiichi Yamada , Kazusei Tamai , Tomoaki Ishibashi , Taira Otsu , Naoyuki Ishihara , Youhei Takahashi
发明人： Hitoshi Morinaga , Eiichi Yamada , Kazusei Tamai , Tomoaki Ishibashi , Taira Otsu , Naoyuki Ishihara , Youhei Takahashi
IPC分类号： C09K3/14 , B24B37/04
CPC分类号： C09K3/1409 , B24B37/044 , C09G1/02 , C09K3/1463
摘要： Provided is a polishing composition containing an abrasive and water. The abrasive content in the polishing composition is no less than 0.1% by mass. The abrasive contains zirconium oxide particles. The zirconium oxide particles have a specific surface area of from 1 to 15 m2/g. The zirconium oxide particles preferably have a purity of no less than 99% by mass. The polishing composition is used in, for example, polishing a hard and brittle material, such as sapphire, silicon nitride, silicon carbide, silicon oxide, glass, gallium nitride, gallium arsenide, indium arsenide, and indium phosphide.
摘要翻译：提供含有磨料和水的抛光组合物。抛光组合物中的磨料含量不小于0.1质量％。研磨剂含有氧化锆颗粒。氧化锆粒子的比表面积为1〜15m 2 / g。氧化锆粒子的纯度优选为99质量％以上。抛光组合物用于例如抛光硬质脆性材料，例如蓝宝石，氮化硅，碳化硅，氧化硅，玻璃，氮化镓，砷化镓，砷化铟和磷化铟。

78. 发明申请

US20140017892A1 COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF SILICON NITRIDE MATERIALS 有权
标题翻译：氮化硅材料的选择性抛光的组合物和方法
公开(公告)号：US20140017892A1
公开(公告)日：2014-01-16
申请号：US13546552
申请日：2012-07-11
申请人： William WARD
发明人： William WARD
IPC分类号： H01L21/306 , C09K13/00
CPC分类号： H01L21/31053 , C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/31116 , H01L21/32139
摘要： The present invention provides an acidic aqueous polishing composition suitable for polishing a silicon nitride-containing substrate in a chemical-mechanical polishing (CMP) process. The composition, at point of use, preferably comprises about 0.01 to about 2 percent by weight of at least one particulate ceria abrasive, about 10 to about 1000 ppm of at least one non-polymeric unsaturated nitrogen heterocycle compound, 0 to about 1000 ppm of at least one cationic polymer, optionally, 0 to about 2000 ppm of at least one polyoxyalkylene polymer, and an aqueous carrier therefor. The cationic polymer preferably is selected from a poly(vinylpyridine) polymer, a quaternary ammonium-substituted acrylate polymer, a quaternary ammonium-substituted methacrylate polymer, or a combination thereof. Methods of polishing substrates and of selectively removing silicon nitride from a substrate in preference to removal of polysilicon using the compositions are also provided.
摘要翻译：本发明提供了一种适用于在化学机械抛光（CMP）工艺中抛光含氮化硅的衬底的酸性水性抛光组合物。组合物在使用时优选包含约0.01至约2重量％的至少一种颗粒二氧化铈磨料，约10至约1000ppm的至少一种非聚合不饱和氮杂环化合物，0至约1000ppm的至少一种阳离子聚合物，任选的0至约2000ppm的至少一种聚氧化烯聚合物及其水性载体。阳离子聚合物优选选自聚（乙烯基吡啶）聚合物，季铵取代的丙烯酸酯聚合物，季铵取代的甲基丙烯酸酯聚合物或其组合。还提供了抛光衬底和从衬底中选择性去除氮化硅的方法，优选使用组合物去除多晶硅。

79. 发明授权

US08628597B2 Method of sorting abrasive particles, abrasive particle distributions, and abrasive articles including the same 有权
标题翻译：研磨颗粒，磨料颗粒分布以及包括其的磨料制品的分选方法
公开(公告)号：US08628597B2
公开(公告)日：2014-01-14
申请号：US12491681
申请日：2009-06-25
申请人： Gary M. Palmgren , Brian D. Goers
发明人： Gary M. Palmgren , Brian D. Goers
IPC分类号： B24D3/00 , B24D11/00 , B24D18/00 , C09K3/14 , B24B1/00 , B24D3/02 , C09C1/68
CPC分类号： C09K3/1409 , B07B1/00 , B24D18/00 , C25D7/00
摘要： A method of making an abrasive particle distribution includes: sorting an initial lot of abrasive particles into a plurality of sublots including first and second sublots of the abrasive particles according to their average particle diameter and aspect ratio, and combining the first and second sublots. The initial lot conforms to an abrasives industry specified nominal grade. The first sublot has an average particle diameter and aspect ratio less than the second sublot. A sum of the first sublot and the second sublot contains fewer abrasive particles than the initial lot. The resultant abrasive particle distribution and abrasive articles including the same are also disclosed.
摘要翻译：制造磨料颗粒分布的方法包括：根据它们的平均粒径和纵横比，将初始批次的研磨颗粒分选成包括研磨颗粒的第一和第二子图的多个分区，以及组合第一和第二分区。初始批次符合磨料行业规定的标称等级。第一子区具有小于第二子区的平均粒径和纵横比。第一个子区域和第二个子区域的总和包含比初始批次更少的磨料颗粒。还公开了所得的磨料颗粒分布和包括其的磨料制品。

80. 发明申请

US20140000176A1 LAYERED PARTICLE ELECTROSTATIC DEPOSITION PROCESS FOR MAKING A COATED ABRASIVE ARTICLE 有权
标题翻译：用于制造涂层磨具的层状静电沉积工艺
公开(公告)号：US20140000176A1
公开(公告)日：2014-01-02
申请号：US14016368
申请日：2013-09-03
申请人： 3M INNOVATIVE PROPERTIES COMPANY
发明人： Louis S. Moren , Brian G. Koethe , Ernest L. Thurber
IPC分类号： B24D11/00 , B24D11/08
CPC分类号： B24D11/005 , B05B5/00 , B05C19/00 , B05D3/14 , B05D2252/02 , B05D2451/00 , B24D3/34 , B24D11/001 , B24D11/08 , C09K3/1409 , B05D2401/40 , B05D2401/32
摘要： Disclosed is a method of applying particles to a coated backing. A first layer of particles is created over a second layer of particles on a support surface and the first layer of particles is different in at least one property from the second layer of particles. A coated backing is positioned above the first and second layer of particles. An electrostatic field is applied simultaneously to the first and second layer of particles such that the first layer of particles closer to the coated backing are preferentially attracted to the coated backing first before the second layer of particles.
摘要翻译：公开了一种将颗粒施加到涂覆的背衬上的方法。在载体表面上的第二层颗粒上形成第一层颗粒，并且第一层颗粒在至少一个性质上与第二层颗粒不同。涂覆的背衬位于第一和第二层颗粒之上。静电场同时施加到第一和第二层颗粒，使得更靠近涂覆的背衬的第一层颗粒首先在第二层颗粒之前首先被吸引到涂覆的背衬上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式