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    • 75. 发明申请
    • Array substrate, liquid crystal display device having the same, and manufacturing method thereof
    • 阵列基板,具有该基板的液晶显示装置及其制造方法
    • US20070296884A1
    • 2007-12-27
    • US11802537
    • 2007-05-23
    • Jin Wuk KimSang Yeup Lee
    • Jin Wuk KimSang Yeup Lee
    • G02F1/136H01L21/336H01L29/04
    • H01L27/1288G02F1/134363G02F2001/134318H01L27/1214
    • Provided is an array substrate, an LCD device having the same, and a manufacturing method thereof using IPP. The method includes forming a gate line and a gate electrode on a substrate using a first mold, forming a gate insulating layer over the substrate and the gate line, forming a first plane layer on first portions of the gate insulating layer, forming a semiconductor layer on second portions of the gate insulating layer using a second mold, forming a second plane layer over the first plane layer, forming a data line on the second plane layer and a source electrode and a drain electrode on the semiconductor layer using a third mold, forming a passivation layer having a contact hole using a fourth mold, and forming a pixel electrode on the passivation layer using a fifth mold, the pixel electrode electrically connected to the drain electrode via the contact hole.
    • 提供了一种阵列基板,具有该阵列基板的LCD装置及其使用IPP的制造方法。 该方法包括使用第一模具在衬底上形成栅极线和栅电极,在衬底和栅极线上形成栅极绝缘层,在栅极绝缘层的第一部分上形成第一平面层,形成半导体层 在所述栅绝缘层的第二部分上使用第二模具,在所述第一平面层上形成第二平面层,在所述第二平面层上形成数据线,以及使用第三模具在所述半导体层上形成源电极和漏电极, 使用第四模具形成具有接触孔的钝化层,并且使用第五模具在所述钝化层上形成像素电极,所述像素电极经由所述接触孔电连接到所述漏电极。
    • 79. 发明申请
    • Method for fabricating thin film pattern and method for fabricating flat panel display device using the same
    • 制造薄膜图案的方法和使用该方法制造平板显示装置的方法
    • US20070145004A1
    • 2007-06-28
    • US11494632
    • 2006-07-28
    • Jin Wuk Kim
    • Jin Wuk Kim
    • B29D11/00C23F1/00B44C1/22
    • G02F1/1362G02F2202/022
    • A method for fabricating a thin film pattern and a method for fabricating a flat panel display device using the same to form an organic material pattern by not using a photo process are disclosed. The method for fabricating the thin film pattern includes forming a first conductive thin film pattern on a substrate; forming a master mold provided with a second thin film pattern; coating an organic material on the master mold provided with the second thin film pattern; joining the substrate and the master mold to contact the first thin film pattern and a surface of the substrate with the organic material; hardening the organic material; separating the substrate and the master mold from each other to provide an organic thin film pattern having step coverage formed by the second thin film pattern on a substrate provided with the first thin film pattern.
    • 公开了一种制造薄膜图案的方法以及使用该方法制造平板显示装置以通过不使用光刻工艺形成有机材料图案的方法。 制造薄膜图案的方法包括在基板上形成第一导电薄膜图案; 形成具有第二薄膜图案的母模; 在具有第二薄膜图案的母模上涂覆有机材料; 使所述基板和所述主模具接合以与所述有机材料接触所述第一薄膜图案和所述基板的表面; 硬化有机材料; 将基板和母模彼此分离,以在具有第一薄膜图案的基板上提供具有由第二薄膜图案形成的台阶覆盖的有机薄膜图案。