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    • 77. 发明授权
    • Nitride compound semiconductor light emitting device
    • 氮化物半导体发光元件
    • US06242761B1
    • 2001-06-05
    • US09026941
    • 1998-02-20
    • Hidetoshi FujimotoJohn RennieMasahiro YamamotoMasayuki IshikawaShinya NunoueLisa Sugiura
    • Hidetoshi FujimotoJohn RennieMasahiro YamamotoMasayuki IshikawaShinya NunoueLisa Sugiura
    • H01L2972
    • H01L33/145H01L33/32H01S5/2205H01S5/2206H01S5/2214H01S5/2226H01S5/2231H01S5/32341
    • In order to remove the problems in conventional nitride compound semiconductor laser structures, namely, high operation voltage caused by a high resistance in a p-type layer and a high contact resistance of an electrode, damage to the crystal caused by dry etching, insufficient current injection, and the need for a high current density, a nitride compound semiconductor light emitting device has current blocking layers made of n-type B(1−x−y−z)InxAlyGazN (0≦x≦1, 0≦y≦1, 0≦z≦1) single crystal containing an oxide of a predetermined metal, carbon and impurities exhibiting p-type and n-type conductivity, or i-type B(1−x−y−z)InxAlyGazN (0≦x≦1, 0≦y≦1, 0≦z≦1) single crystal in which carriers are inactivated by hydrogen or oxygen to realize an internal current blocking structure without the need for dry etching. By applying a reverse bias voltage, the semiconductor can be activated only along a current path, and the remainder region is utilized as a current blocking layer. When the n-side electrode has a unique three-layered structure, a reduction in contact resistance and good wire bonding are promised.
    • 为了消除常规氮化物化合物半导体激光器结构中的问题,即由p型层中的高电阻引起的高操作电压和电极的高接触电阻,由干蚀刻引起的晶体损坏,电流不足 注入,并且需要高电流密度,氮化物化合物半导体发光器件具有由n型B(1-xyz)In x AlyGazN(0≤x≤1,0<= y <= 1)形成的电流阻挡层 ,0 <= z <= 1)含有预定金属的氧化物的单晶,碳和表现出p型和n型导电性的杂质,或i型B(1-xyz)In x AlyGazN(0 <= x < 1,0 <= y <= 1,0 <= z <= 1)其中载体被氢或氧灭活以实现内部电流阻挡结构而不需要干法蚀刻的单晶。 通过施加反向偏置电压,半导体只能沿着电流路径被激活,并且剩余区域被用作电流阻挡层。 当n侧电极具有独特的三层结构时,承诺了接触电阻的降低和良好的引线接合。
    • 79. 发明授权
    • Gallium nitride compound semiconductor light-emitting device
    • 氮化镓化合物半导体发光器件
    • US5905275A
    • 1999-05-18
    • US876739
    • 1997-06-16
    • Shinya NunoueMasahiro Yamamoto
    • Shinya NunoueMasahiro Yamamoto
    • H01L33/00H01L33/32H01L33/38H01L23/13
    • H01L33/382H01L33/0079H01L33/32H01L33/24
    • A gallium nitride compound semiconductor light-emitting device uses a sapphire substrate as a support and has n- and p-type electrodes on the top and bottom surfaces. A trench is formed in the sapphire substrate. This trench has two side wall surfaces which extend from the top surface to the bottom surface and so incline as to converge downward. A buffer layer is formed on the sapphire substrate. A gallium nitride compound semiconductor multiple layer having an n-type layer and a p-type layer are formed on the buffer layer. This semiconductor multiple layer has two side portions arranged along the two side wall surfaces of the trench and a central portion positioned between these two side portions and formed integrally with the two side portions. N- and p-type electrodes are so formed as to oppose each other on the two sides of the central portion of the semiconductor multiple layer.
    • 氮化镓系化合物半导体发光元件使用蓝宝石基板作为支撑体,在上下表面具有n型和p型电极。 在蓝宝石衬底中形成沟槽。 该沟槽具有从顶表面延伸到底表面的两个侧壁表面,因此倾斜以向下会聚。 在蓝宝石衬底上形成缓冲层。 在缓冲层上形成具有n型层和p型层的氮化镓化合物半导体多层。 该半导体多层具有沿着沟槽的两个侧壁表面布置的两个侧面部分和位于这两个侧部之间的中心部分并且与两个侧部分一体地形成。 N型和p型电极在半导体多层的中心部分的两侧形成为彼此相对。
    • 80. 发明授权
    • Semiconductor light emitting device
    • 半导体发光器件
    • US09105810B2
    • 2015-08-11
    • US13404607
    • 2012-02-24
    • Toshihide ItoHiroshi KatsunoShinya Nunoue
    • Toshihide ItoHiroshi KatsunoShinya Nunoue
    • H01L33/00H01L33/32H01L33/40
    • H01L33/32H01L33/0075H01L33/405H01L33/44H01L2933/0016H01L2933/0025
    • According to one embodiment, a semiconductor light emitting device includes a first semiconductor layer, a light emitting unit, a second semiconductor layer, a reflecting electrode, an oxide layer and a nitrogen-containing layer. The first semiconductor layer is of a first conductivity type. The light emitting unit is provided on the first semiconductor layer. The second semiconductor layer is provided on the light emitting unit and is of a second conductivity type. The reflecting electrode is provided on the second semiconductor layer and includes Ag. The oxide layer is provided on the reflecting electrode. The oxide layer is insulative and has a first opening. The nitrogen-containing layer is provided on the oxide layer. The nitrogen-containing layer is insulative and has a second opening communicating with the first opening.
    • 根据一个实施例,半导体发光器件包括第一半导体层,发光单元,第二半导体层,反射电极,氧化物层和含氮层。 第一半导体层是第一导电类型。 发光单元设置在第一半导体层上。 第二半导体层设置在发光单元上并且是第二导电类型。 反射电极设置在第二半导体层上并且包括Ag。 氧化物层设置在反射电极上。 氧化物层是绝缘的并且具有第一开口。 含氧层设置在氧化物层上。 含氮层是绝缘的,并且具有与第一开口连通的第二开口。