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71. 发明申请

US20090225241A1 PHASE DIFFERENCE COMPENSATING ELEMENT, LIQUID CRYSTAL DEVICE, AND PROJECTION TYPE DISPLAY APPARATUS 失效
标题翻译：相位差补偿元件，液晶装置和投影型显示装置
公开(公告)号：US20090225241A1
公开(公告)日：2009-09-10
申请号：US11995358
申请日：2006-07-07
申请人： Takamichi Fujii
发明人： Takamichi Fujii
IPC分类号： G02F1/13363 , G02B1/08 , G02F1/1335
CPC分类号： G02B5/3083 , G02F1/13363 , G02F2203/66 , G02F2413/02 , G02F2413/07 , G02F2413/10 , G02F2413/11
摘要： A phase difference compensation element comprises at least one birefringent laminate, which contains a light transmissive base material and “a” number, where a≧2, of inorganic oblique incidence vacuum deposited films varying in direction of oblique evaporation and having been laminated on a surface of the light transmissive base material. The birefringent laminate satisfies the conditions represented by Formula (i) and Formula (ii): Re(1)
摘要翻译：相位差补偿元件包括至少一个双折射层压板，其包含透光基材和“a”数，其中a = 2，无机倾斜入射真空沉积膜在倾斜蒸发方向上变化并且层压在透光基材的表面。双折射层压板满足由式（i）和式（ii）表示的条件：<？in-line-formula description =“In-line formula”end =“lead”？> Re（1） <？in-line-formula description =“In-line Formulas”end =“lead”？> Re（b- 1）<= Re（b）（ii）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中b是满足条件2的任意整数<= b <=其中 Re（i）表示在形成“a”数个无机倾斜入射真空沉积膜的阶段之间在成膜的第i阶段形成的无机倾斜入射真空沉积膜的延迟值d.Deltan ，其中1 <= i <= a，d表示膜厚度，Deltan表示双折射指数。

72. 发明申请

US20090163703A1 Phase difference plate comprising polymer film containing compound having rod-shaped molecular structure 有权
公开(公告)号：US20090163703A1
公开(公告)日：2009-06-25
申请号：US12379145
申请日：2009-02-13
申请人： Hiroshi Takeuchi , Hiroaki Sata , Hiroyuki Kawanishi , Takamichi Fujii
发明人： Hiroshi Takeuchi , Hiroaki Sata , Hiroyuki Kawanishi , Takamichi Fujii
IPC分类号： C08B3/00
CPC分类号： G02B5/3083 , G02F2001/133638 , Y10T428/1005 , Y10T428/1036 , Y10T428/105
摘要： A phase difference plate which comprises one sheet of polymer film containing a compound having a rod-shaped molecular structure and exhibiting a maximum absorption wavelength (λmax) of less than 250 nm in an ultraviolet spectrum of its solution and which exhibits a retardation value as measured at a wavelength of 450 nm (Re450) of 60 to 135 nm and a retardation value as measured at a wavelength of 590 nm (Re590) of 100 to 170 nm, where the relationship: Re590−Re450≧2 nm is satisfied. The phase difference plate functions as a λ/4 plate.

73. 发明授权

US07443562B2 Display device 失效
标题翻译：显示设备
公开(公告)号：US07443562B2
公开(公告)日：2008-10-28
申请号：US11004944
申请日：2004-12-07
申请人： Takamichi Fujii , Shinichiro Sonoda
发明人： Takamichi Fujii , Shinichiro Sonoda
IPC分类号： G02F1/07 , G02F1/133
CPC分类号： G02B26/004
摘要： A display device includes a porous body impregnated with electroendosmosis liquid, a transparent plate which is opposed to the porous body with a space intervening therebetween and is provided on its side facing the porous body with a light diffusive reflection surface and on the other side opposite to the one side with a light transmission surface, and an electric field forming system which forms an electric field acting on the electroendosmosis liquid and controls whether the electroendosmosis liquid is brought into contact with the light diffusive reflection surface by changing the electric field to selectively move the electroendosmosis liquid toward the porous body or the space.
摘要翻译：显示装置包括浸渍有电渗液的多孔体，与多孔体相对的透明板，其间插入有空隙，并且在其面向多孔体的一侧上设置有光扩散反射面，在与另一侧相反的另一侧具有透光表面的一侧和形成作用在电沉积液上的电场的电场形成系统，并且通过改变电场来控制电沉积液与光扩散反射表面接触以选择性地移动电渗液朝向多孔体或空间。

74. 发明申请

US20080079783A1 Piezoelectric film, process of manufacturing the same and piezoelectric element 审中-公开
标题翻译：压电膜，制造工艺及压电元件
公开(公告)号：US20080079783A1
公开(公告)日：2008-04-03
申请号：US11905101
申请日：2007-09-27
申请人： Takamichi Fujii
发明人： Takamichi Fujii
IPC分类号： H01L41/187 , B41J2/045 , H05H1/24
CPC分类号： B41J2/161 , B41J2/1646 , C23C14/088 , C23C14/34 , C23C14/541 , H01L41/0805 , H01L41/1876 , H01L41/316
摘要： A piezoelectric film forming method includes the step of forming on a substrate, a piezoelectric film formed by the elements of a target by opposing a target having a composition according to the composition of film to be formed, and releasing the elements from the target by a vapor phase growth method using plasma. The following formulae (1) and (2) or (3) and (4) are satisfied. 400≦Ts(° C.)≦500 (1) 30≦D(mm)≦80 (2) 400≦Ts(° C.)≦600 (3) 30≦D(mm)≦100 (4) wherein Ts (° C.) and D (mm) respectively represent the film-forming temperature and the distance between the substrate and the target.
摘要翻译：压电薄膜形成方法包括以下步骤：在基板上形成由目标元素形成的压电薄膜，所述压电薄膜通过使具有根据所形成的薄膜的组成的成分的靶材相对，并将元素从靶材中释放出来使用等离子体的气相生长法。满足下列公式（1）和（2）或（3）和（4）。 <？in-line-formula description =“In-line Formulas”end =“lead”？> 400 <= Ts（°C。）<= 500（1）<？in-line-formula description =“In-line 公式“end =”tail“？> <？in-line-formula description =”In-line Formulas“end =”lead“？> 30 <= D（mm）<= 80（2）公式description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> 400 <= Ts（°C）<= 600 （3）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line formula”end =“lead”？> 30 <= 其中，Ts（℃）和D（mm）分别表示成膜（成膜）温度和基板与目标之间的距离。

75. 发明申请

US20080048278A1 Method of forming pattern of inorganic material film and structure containing the pattern 有权
标题翻译：形成无机材料膜图案的方法和包含图案的结构
公开(公告)号：US20080048278A1
公开(公告)日：2008-02-28
申请号：US11889646
申请日：2007-08-15
申请人： Yoshikazu Hishinuma , Takamichi Fujii
发明人： Yoshikazu Hishinuma , Takamichi Fujii
IPC分类号： H01L29/84 , H01L21/00
CPC分类号： H03H3/02 , B81B2201/0271 , B81C1/00396 , H03H2003/023
摘要： A method of forming a pattern of an inorganic material film, which method is more versatile, easy, and practical. The method includes the steps of: (a) forming a sacrifice layer having a pattern on a substrate by employing a material having a different thermal expansion coefficient from that of an inorganic material of the inorganic material film; (b) forming an inorganic material layer on the substrate, on which the sacrifice layer has been formed, at a predetermined deposition temperature by employing the inorganic material; (c) lowering a temperature of at least the inorganic material layer to produce cracks in the inorganic material layer formed on the sacrifice layer; and (d) removing the sacrifice layer and the inorganic material layer formed thereon.
摘要翻译：形成无机材料膜的图案的方法，该方法更通用，容易和实用。该方法包括以下步骤：（a）通过使用具有与无机材料膜的无机材料不同的热膨胀系数的材料，在基板上形成具有图案的牺牲层; （b）通过使用无机材料在预定的沉积温度下在已经形成有牺牲层的基板上形成无机材料层; （c）降低至少所述无机材料层的温度，以在所述牺牲层上形成的无机材料层中产生裂纹; 和（d）除去在其上形成的牺牲层和无机材料层。

76. 发明申请

US20070236104A1 Piezoelectric device, process for producing the piezoelectric device, and inkjet recording head 有权
标题翻译：压电元件，压电元件的制造方法以及喷墨记录头
公开(公告)号：US20070236104A1
公开(公告)日：2007-10-11
申请号：US11783221
申请日：2007-04-06
申请人： Takamichi Fujii
发明人： Takamichi Fujii
IPC分类号： H01L41/187
CPC分类号： B41J2/161 , B41J2/1628 , B41J2/1646 , H01L41/0477 , H01L41/0973 , H01L41/1876 , H01L41/316 , H01L41/319 , Y10T29/42
摘要： A process for producing a piezoelectric device constituted by a first electrode, at least one second electrode, and a piezoelectric film sandwiched between the first electrode and the at least one second electrode so that an electric field can be applied to the piezoelectric film. First, a seed layer of a material containing at least one element is formed on a substrate, and then the first electrode is formed on the seed layer. Next, the at least one element is diffused through the first electrode so that the at least one element precipitates on a surface of the first electrode on the opposite side to the seed layer, and then the piezoelectric film is formed on the first electrode.
摘要翻译：一种由第一电极，至少一个第二电极和夹在第一电极和至少一个第二电极之间的压电薄膜构成的压电装置的制造方法，使得可以向压电薄膜施加电场。首先，在基板上形成含有至少一种元素的材料种子层，然后在种子层上形成第一电极。接下来，至少一个元件通过第一电极扩散，使得至少一个元件在与籽晶层相反的一侧的第一电极的表面上沉淀，然后在第一电极上形成压电膜。

77. 发明授权

US07180677B2 Display device 失效
标题翻译：显示设备
公开(公告)号：US07180677B2
公开(公告)日：2007-02-20
申请号：US10768670
申请日：2004-02-02
申请人： Takamichi Fujii , Atsushi Oosawa
发明人： Takamichi Fujii , Atsushi Oosawa
IPC分类号： G02B1/06
CPC分类号： G09G3/3433 , G02B26/005 , G09G3/348
摘要： A display device includes a first substrate, a first electrode provided on the first substrate, an insulation layer provided on the first electrode, a second electrode provided on the insulation layer, a cavity partition surrounding the second electrode with an interval therebetween, a second substrate provided on the cavity partition, and a droplet of a coloring liquid sealed in the cavity partition. In the display device, a third electrode for promoting restoration of the droplet of a coloring liquid to a spherical shape is provided. In the display device, the insulation layer includes a insulator film and a low surface energy film; the insulator film assumes a specific inductive capacity of three or more and a thickness of 10 nm to 100 nm; and the low surface energy film assumes a thickness of 100 nm or less.
摘要翻译：显示装置包括第一基板，设置在第一基板上的第一电极，设置在第一电极上的绝缘层，设置在绝缘层上的第二电极，围绕第二电极的间隔隔开的空腔隔板，第二基板设置在空腔隔板上，以及密封在空腔隔板中的着色液体的液滴。在显示装置中，提供了用于促进着色液体的液滴恢复为球形的第三电极。在显示装置中，绝缘层包括绝缘膜和低表面能膜; 该绝缘膜具有三个或更多的比电感和10nm至100nm的厚度; 低表面能膜的厚度为100nm以下。

78. 发明申请

US20060092358A1 Phase difference compensating device and liquid crystal apparatus using the same 失效
公开(公告)号：US20060092358A1
公开(公告)日：2006-05-04
申请号：US11254685
申请日：2005-10-21
申请人： Takamichi Fujii , Kenichi Nakagawa
发明人： Takamichi Fujii , Kenichi Nakagawa
IPC分类号： G02F1/1335
CPC分类号： G02F1/133634 , G02F1/133632 , G02F1/1396
摘要： A transparent base plate supports a first compensating layer, which is adapted to compensate for a phase difference due to liquid crystal molecules having undergone normal orientation in a liquid crystal layer of a TN liquid crystal display device, and second compensating layers, which are adapted to compensate for the phase difference due to the liquid crystal molecules having undergone hybrid orientation in the liquid crystal layer. Each of the second compensating layers is constituted of one of oblique incidence vacuum deposited films, which are formed on opposite surfaces of the base plate with oblique incidence vacuum evaporation of an inorganic material. An azimuthal angle and/or a polar angle of a direction of vacuum evaporation with respect to a plane of vacuum evaporation is set to be different between the second compensating layers.

79. 发明授权

US08710716B2 Actuator, actuator structure and method of manufacturing actuator 有权
标题翻译：执行机构，执行机构结构及其制造方法
公开(公告)号：US08710716B2
公开(公告)日：2014-04-29
申请号：US13032181
申请日：2011-02-22
申请人： Takamichi Fujii , Yasutoshi Hirabayashi
发明人： Takamichi Fujii , Yasutoshi Hirabayashi
IPC分类号： H01L41/22
CPC分类号： H01L41/094 , H01L41/1876 , H01L41/313 , H01L41/316
摘要： An actuator includes: a diaphragm having a thickness equal to or greater than 0.5 μm and equal to or less than 20 μm; a piezoelectric body layer which is provided on a first surface side of the diaphragm, and receives stress from the diaphragm; a pair of electrodes which is provided on the first surface side of the diaphragm together with the piezoelectric body layer, and is mutually opposing via the piezoelectric body layer; and a stress adjusting layer which is provided on a second surface side of the diaphragm on an opposite side to the first surface of the diaphragm, and receives stress from the diaphragm in a same direction as the stress that the piezoelectric body layer receives from the diaphragm.
摘要翻译：致动器包括：厚度等于或大于等于或等于20μm的隔膜; 压电体层，其设置在所述隔膜的第一表面侧，并承受来自所述隔膜的应力; 一对电极，其与压电体层一起设置在隔膜的第一表面侧上，并且经由压电体层彼此相对; 以及应力调整层，其设置在所述隔膜的与所述隔膜的第一面相反的一侧的第二表面侧，并且以与所述压电体层从所述隔膜接收的应力相同的方向受到所述隔膜的应力。

80. 发明授权

US08551369B2 Wiring material, method of manufacturing wiring, and nano-particle dispersion 有权
标题翻译：接线材料，制造布线的方法和纳米颗粒分散体
公开(公告)号：US08551369B2
公开(公告)日：2013-10-08
申请号：US13250142
申请日：2011-09-30
申请人： Takamichi Fujii
发明人： Takamichi Fujii
IPC分类号： H01B1/12 , H01B1/02 , B05D5/12
CPC分类号： H01B1/026 , B82Y30/00 , H05K1/097 , H05K3/125 , H05K3/1283
摘要： A wiring material contains copper, nitrogen, and a dopant which is more readily oxidized than copper in an Ellingham diagram, the dopant being added to the wiring material at a rate of not less than 0.5 at. % and not more than 10 at. %.
摘要翻译：在Ellingham图中，布线材料含有铜，氮和掺杂剂，其比铜更容易氧化，掺杂剂以不小于0.5的速率加入到布线材料中。％，不超过10。％。

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