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71. 发明授权

US07651829B2 Positive resist material and pattern formation method using the same 有权
标题翻译：正抗蚀剂材料和使用其的图案形成方法
公开(公告)号：US07651829B2
公开(公告)日：2010-01-26
申请号：US10854568
申请日：2004-05-26
申请人： Yoshitaka Hamada , Fujio Yagihashi , Mutsuo Nakashima , Kazumi Noda , Katsuya Takemura
发明人： Yoshitaka Hamada , Fujio Yagihashi , Mutsuo Nakashima , Kazumi Noda , Katsuya Takemura
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/36 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0757 , Y10S430/143
摘要： Provided is a positive resist material, particularly a chemically amplified positive resist material having higher sensitivity, higher resolution, a higher exposure latitude and better process adaptability than conventional positive resist materials, and providing a good pattern profile after exposure, particularly having lessened line edge roughness and exhibiting excellent etching resistance. These materials may contain, preferably an organic solvent and acid generator, more preferably a dissolution inhibitor or a basic compound and/or a surfactant. Provided is a positive resist material comprising a polymer comprising at least one monomer unit selected from a group consisting of a monomer unit (A), a monomer unit (B) and a monomer unit (C) represented by the following formula (1); and having a glass transition temperature (Tg) of 100° C. or greater.
摘要翻译：本发明提供了正电阻材料，特别是具有比常规正性抗蚀剂材料更高的灵敏度，更高分辨率，更高的曝光宽容度和更好的工艺适应性的化学放大的正性抗蚀剂材料，并且在曝光之后提供良好的图案轮廓，特别是具有减小的线边缘粗糙度并具有优异的耐蚀刻性。这些材料可以优选含有有机溶剂和酸产生剂，更优选含有溶解抑制剂或碱性化合物和/或表面活性剂。提供一种正性抗蚀剂材料，其包含包含选自由下式（1）表示的单体单元（A），单体单元（B）和单体单元（C））组成的组中的至少一种单体单元的聚合物; 玻璃化转变温度（Tg）为100℃以上。

72. 发明授权

US06730453B2 High molecular weight silicone compounds, resist compositions, and patterning method 有权
标题翻译：高分子量硅氧烷化合物，抗蚀剂组合物和图案化方法
公开(公告)号：US06730453B2
公开(公告)日：2004-05-04
申请号：US09887320
申请日：2001-06-25
申请人： Mutsuo Nakashima , Ichiro Kaneko , Toshinobu Ishihara , Junji Tsuchiya , Jun Hatakeyama , Shigehiro Nagura
发明人： Mutsuo Nakashima , Ichiro Kaneko , Toshinobu Ishihara , Junji Tsuchiya , Jun Hatakeyama , Shigehiro Nagura
IPC分类号： G03F7075
CPC分类号： G03F7/0045 , C08G77/14 , C08G77/38 , C08G77/388 , C08G77/50 , G03F7/0392 , G03F7/0757
摘要： The invention provides a high molecular weight silicone compound comprising recurring units of formula (1) and having a weight average molecular weight of 1,000-50,000. Some or all of the hydrogen atoms of carboxyl groups or carboxyl and hydroxyl groups in the silicone compound may be replaced by acid labile groups. Z is a di- to hexavalent, non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; Z is a di- to hexavalent, normal or branched hydrocarbon group or non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; x, y and z are integers of 1-5 corresponding to the valence of Z and Z′; R1 is —OCHR—R′—OH or —NHCHR—R′—OH; R2 is alkyl or alkenyl or a monovalent, non-aromatic, polycyclic hydrocarbon or bridged cyclic hydrocarbon group; p1, p2, p3 and p4 are 0 or positive numbers. A resist composition comprising the high molecular weight silicone compound as a base resin is sensitive to actinic radiation and has a high sensitivity and resolution so that it is suitable for microfabrication with electron beams or deep UV. Since the composition has low absorption at the exposure wavelength of an ArF or KrF excimer laser, a finely defined pattern having walls perpendicular to the substrate can be readily formed.
摘要翻译：本发明提供了包含式（1）的重复单元并且具有1,000-50,000重均分子量的高分子量硅氧烷化合物。硅氧烷化合物中的羧基或羧基和羟基的一些或全部氢原子可被酸不稳定基团取代.Z为二价至六价，非芳香族，单环或多环烃或桥环状烃基; Z是二价至六价，正或支链烃基或非芳香族单环或多环烃或桥环状烃基; x，y和z是对应于Z和Z'的化合价的1-5的整数; R 1是-OCHR-R'-OH或-NHCHR-R'-OH; R 2是烷基或烯基或单价，非芳族，多环烃或桥连环烃基; p1，p2，p3和p4为0或正数。包含作为基础树脂的高分子量硅氧烷化合物的抗蚀剂组合物对光化辐射敏感，并且具有高灵敏度和分辨率，使得它适合于用电子束或深紫外线的微细加工。由于组成在ArF或KrF准分子激光器的曝光波长处具有低吸收，因此可以容易地形成具有垂直于衬底的壁的精细限定图案。

73. 发明授权

US06512067B2 Polymer, resist composition and patterning process 有权
公开(公告)号：US06512067B2
公开(公告)日：2003-01-28
申请号：US09998200
申请日：2001-12-03
申请人： Tsunehiro Nishi , Mutsuo Nakashima , Tomohiro Kobayashi
发明人： Tsunehiro Nishi , Mutsuo Nakashima , Tomohiro Kobayashi
IPC分类号： C08F12400
CPC分类号： G03F7/0395 , C08F32/08 , G03F7/0045
摘要： A polymer comprising recurring units of formula (1-1) or (1-2) wherein R1, R2, R3 and R4 are H or C1-15 alkyl, R1 and R2, and R3 and R4, taken together, may form a ring; R5 and R6 are H, C1-15 alkyl, acyl or alkylsulfonyl groups or C2-15 alkoxycarbonyl or alkoxyalkyl groups which may have halogen substituents; and k=0 or 1, and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.

74. 发明授权

US06461791B1 Polymers, chemical amplification resist compositions and patterning process 有权
标题翻译：聚合物，化学放大抗蚀剂组合物和图案化工艺
公开(公告)号：US06461791B1
公开(公告)日：2002-10-08
申请号：US09686955
申请日：2000-10-12
申请人： Jun Hatakeyama , Yuji Harada , Jun Watanabe , Mutsuo Nakashima
发明人： Jun Hatakeyama , Yuji Harada , Jun Watanabe , Mutsuo Nakashima
IPC分类号： G03F7039
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0382
摘要： Polymers of a fluorinated backbone having recurring units of formula (1) are novel: R1 is H, F, C1-20 alkyl or fluorinated C1-20 alkyl, R2 is F, C1-20 alkyl or fluorinated C1-20 alkyl, and R3 is C6-20 aryl which may have attached thereto a hydroxyl group and/or a hydroxyl group substituted with an OR4 group wherein R4 is an acid labile group. Using such polymers, resist compositions featuring transparency to excimer laser light and alkali solubility are obtained.
摘要翻译：具有式（1）重复单元的氟化主链的聚合物是新颖的：R1是H，F，C1-20烷基或氟化C1-20烷基，R2是F，C1-20烷基或氟化C1-20烷基，R3 是可以与其连接羟基和/或被OR4基团取代的羟基的C6-20芳基，其中R4是酸不稳定基团。使用这种聚合物，获得具有对准分子激光的透明度和碱溶性的抗蚀剂组合物。

75. 发明授权

US06369279B1 Styrene derivatives 有权
标题翻译：苯乙烯衍生物
公开(公告)号：US06369279B1
公开(公告)日：2002-04-09
申请号：US09657515
申请日：2000-09-07
申请人： Mutsuo Nakashima , Jun Hatakeyama , Jun Watanabe , Yuji Harada
发明人： Mutsuo Nakashima , Jun Hatakeyama , Jun Watanabe , Yuji Harada
IPC分类号： C07C4312
CPC分类号： C07C69/017 , C07C43/225 , C07C43/313 , C07C69/712 , C07C69/96 , C07F7/1804 , Y02P20/55
摘要： Styrene derivatives of formula (1) are novel wherein R1 is hydrogen, C1-20 alkyl, fluoro-substituted C1-20 alkyl, chloro, or trichloromethyl, R2 is a phenol protecting group, p, q and r are integers in the range of 0≦p
摘要翻译：式（1）的苯乙烯衍生物是新的，其中R 1是氢，C 1-20烷基，氟取代的C 1-20烷基，氯或三氯甲基，R 2是苯酚保护基，p，q和r是在 0 <= p <5,0 <= q <5,0

76. 发明授权

US06309796B1 High molecular weight silicone compounds resist compositions, and patterning method 有权
标题翻译：高分子量硅氧烷化合物抵抗组合物和图案化方法
公开(公告)号：US06309796B1
公开(公告)日：2001-10-30
申请号：US09129950
申请日：1998-08-06
申请人： Mutsuo Nakashima , Ichiro Kaneko , Toshinobu Ishihara , Junji Tsuchiya , Jun Hatakeyama , Shigehiro Nagura
发明人： Mutsuo Nakashima , Ichiro Kaneko , Toshinobu Ishihara , Junji Tsuchiya , Jun Hatakeyama , Shigehiro Nagura
IPC分类号： G03F7075
CPC分类号： G03F7/0045 , C08G77/14 , C08G77/38 , C08G77/388 , C08G77/50 , G03F7/0392 , G03F7/0757
摘要： The invention provides a high molecular weight silicone compound comprising recurring units of formula (1) and having a weight average molecular weight of 1,000-50,000. Some or all of the hydrogen atoms of carboxyl groups or carboxyl and hydroxyl groups in the silicone compound may be replaced by acid labile groups. Z is di- to hexavalent, non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; Z′ is a di- to hexavalent, normal or branched hydrocarbon group or non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; x, y and z are integers of 1-5 corresponding to the valence of Z and Z′; R1 is —OCHR—R′ —OH or —NHCHR—R′ —OH; R2 is alkyl or alkenyl or a monovalent, non-aromatic, polycyclic hydrocarbon or bridged cyclic hydrocarbon group; p1, p2, p3 and p4 are 0 or positive numbers. A resist composition comprising the high molecular weight silicone compound as a base resin is sensitive to actinic radiation and has a high sensitivity and resolution so that it is suitable for microfabrication with electron beams or deep UV. Since the composition has low absorption at the exposure wavelength of an ArF or KrF excimer laser, a finely defined pattern having walls perpendicular to the substrate can be readily formed.
摘要翻译：本发明提供了包含式（1）的重复单元并且具有1,000-50,000重均分子量的高分子量硅氧烷化合物。硅烷化合物中的羧基或羧基和羟基的一部分或全部氢原子可被酸不稳定基团取代.Z为二价至六价，非芳香族，单环或多环烃基或桥环状烃基; Z'是二价至六价，正或支链烃基或非芳香族单环或多环烃或桥连环烃基; x，y和z是对应于Z和Z'的化合价的1-5的整数; R 1是-OCHR-R'-OH或-NHCHR-R'-OH; R2是烷基或链烯基或单价，非芳族，多环烃或桥连环烃基; p1，p2，p3和p4为0或正数。包含作为基础树脂的高分子量硅氧烷化合物的抗蚀剂组合物对光化辐射敏感，并且具有高灵敏度和分辨率，使得它适合于用电子束或深紫外线的微细加工。由于组成在ArF或KrF准分子激光器的曝光波长处具有低吸收，因此可以容易地形成具有垂直于衬底的壁的精细限定图案。

77. 发明申请

US20080038664A1 Silsesquioxane compound mixture, method of making, resist composition, and patterning process 审中-公开
标题翻译：倍半硅氧烷复合混合物，制备方法，抗蚀剂组合物和图案化工艺
公开(公告)号：US20080038664A1
公开(公告)日：2008-02-14
申请号：US11882664
申请日：2007-08-03
申请人： Yoshitaka Hamada , Mutsuo Nakashima
发明人： Yoshitaka Hamada , Mutsuo Nakashima
IPC分类号： G03F7/075 , C08F2/01 , C08G77/04 , C08G77/24 , G03C1/04
CPC分类号： G03F7/0757 , C08G77/045 , G03F7/0045 , H01L21/3122
摘要： A silsesquioxane compound mixture having a high proportion of silsesquioxane compounds bearing bulky substituent groups on side chain and having a degree of condensation of substantially 100% is prepared by a first stage wherein a silane feed comprising a trifunctional silane bearing a bulky substituent group on side chain represented by formula (1): wherein Y is an aliphatic or aromatic organic group optionally having a functional group, X1, X2 and X3 are H, halogen, alkoxy or aryloxy is hydrolyzed in the presence of an acid or base catalyst, and a second stage wherein dehydrating condensation is carried out in the presence of a strong base catalyst while removing the water resulting from condensation out of the reaction system.
摘要翻译：通过第一阶段制备具有高比例的在侧链上具有大体积取代基且具有基本上100％的缩合度的倍半硅氧烷化合物的倍半硅氧烷化合物混合物，其中包含在侧链上具有大体积取代基的三官能硅烷的硅烷进料由式（1）表示：其中Y是任选具有官能团的脂族或芳族有机基团，X 1，X 2和X 3 O 在酸或碱催化剂的存在下，H，卤素，烷氧基或芳氧基被水解，第二步是在强碱催化剂的存在下进行脱水缩合，同时除去由反应物凝结出来的水系统。

78. 发明申请

US20070190457A1 Resist composition and patterning process using the same 有权
标题翻译：抗蚀剂组成和图案化工艺使用相同
公开(公告)号：US20070190457A1
公开(公告)日：2007-08-16
申请号：US11702658
申请日：2007-02-06
申请人： Mutsuo Nakashima , Yoshitaka Hamada , Katsuya Takemura , Kazumi Noda
发明人： Mutsuo Nakashima , Yoshitaka Hamada , Katsuya Takemura , Kazumi Noda
IPC分类号： G03C1/00
CPC分类号： G03F7/0757 , G03F7/0045 , Y10S430/114
摘要： A resist composition is provided comprising a silicone resin, a photoacid generator, a nitrogen-containing organic compound, and a solvent. The silicone resin is obtained through cohydrolytic condensation of a mixture of three silane monomers containing a fluorinated norbornane group, an organic group having a carboxyl group protected with an acid labile group, and a lactone ring-bearing organic group, respectively. The resist composition has satisfactory resolution and overcomes the problem of a low selective etching ratio between resist film and organic film during oxygen reactive etching.
摘要翻译：提供了包含有机硅树脂，光酸产生剂，含氮有机化合物和溶剂的抗蚀剂组合物。有机硅树脂通过含有氟化降冰片烷基的三种硅烷单体和具有酸不稳定基团保护的羧基的有机基团和含有内酯环的有机基团的混合物的共水解缩合而获得。抗蚀剂组合物具有令人满意的分辨率，并且克服了在氧反应蚀刻期间抗蚀剂膜和有机膜之间的选择性蚀刻比低的问题。

79. 发明申请

US20060224009A1 Silsesquioxane compound mixture, method of making, resist composition, and patterning process 有权
标题翻译：倍半硅氧烷复合混合物，制备方法，抗蚀剂组合物和图案化工艺
公开(公告)号：US20060224009A1
公开(公告)日：2006-10-05
申请号：US11393911
申请日：2006-03-31
申请人： Yoshitaka Hamada , Mutsuo Nakashima
发明人： Yoshitaka Hamada , Mutsuo Nakashima
IPC分类号： C07F7/00
CPC分类号： G03F7/0757 , C08G77/045 , G03F7/0045 , H01L21/3122
摘要： A silsesquioxane compound mixture having a high proportion of silsesquioxane compounds bearing bulky substituent groups on side chain and having a degree of condensation of substantially 100% is prepared by a first stage wherein a silane feed comprising a trifunctional silane bearing a bulky substituent group on side chain represented by formula (1): wherein Y is an aliphatic or aromatic organic group optionally having a functional group, X1, X2 and X3 are H, halogen, alkoxy or aryloxy is hydrolyzed in the presence of an acid or base catalyst, and a second stage wherein dehydrating condensation is carried out in the presence of a strong base catalyst while removing the water resulting from condensation out of the reaction system.
摘要翻译：通过第一阶段制备具有高比例的在侧链上具有大体积取代基且具有基本上100％的缩合度的倍半硅氧烷化合物的倍半硅氧烷化合物混合物，其中包含在侧链上具有大体积取代基的三官能硅烷的硅烷进料由式（1）表示：其中Y是任选具有官能团的脂族或芳族有机基团，X 1，X 2和X 3 O 在酸或碱催化剂的存在下，H，卤素，烷氧基或芳氧基被水解，第二步是在强碱催化剂的存在下进行脱水缩合，同时除去由反应物凝结出来的水系统。

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