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    • 72. 发明授权
    • Brake system
    • 刹车系统
    • US06491356B2
    • 2002-12-10
    • US09771777
    • 2001-01-29
    • Osamu KanazawaYoshiyasu TakasakiMichio KobayashiHiroshi OhsakiMasahiro IkedaHiroyuki OkaHiroaki NiinoKazuya MakiMamoru Sawada
    • Osamu KanazawaYoshiyasu TakasakiMichio KobayashiHiroshi OhsakiMasahiro IkedaHiroyuki OkaHiroaki NiinoKazuya MakiMamoru Sawada
    • F15B1316
    • B60T13/57B60T8/3275B60T13/575B60T13/72
    • The invention relates to a brake system including a brake booster. A pneumatic pressure operated brake booster VBB or a liquid pressure operated brake booster includes a valve mechanism which is urged by a force of depression applied to a brake pedal BP to switch a flow path to cause the brake booster to develop an output which depends on the magnitude of the force of depression. A solenoid SOL urges the valve mechanism in the same direction as or in the opposite direction from the force of depression. A controller ECU is responsive to a braking effort increase/decrease demand signal to increase or decrease the urging force which is applied by the solenoid to the valve mechanism, thus increasing or decreasing the output from the brake booster. An output from the brake booster can be freely controlled independently from the force of depression applied to the brake pedal in response to a braking effort increase/decrease demand. The arrangement is applicable to a wide variety of brake systems onboard a vehicle such as a regenerative brake unit, an engine brake or an exhaust gas brake unit or a brake assisting apparatus.
    • 本发明涉及一种包括制动助力器的制动系统。 气动压力驱动的制动助力器VBB或液压操纵的制动助力器包括一个阀机构,该阀机构被施加到制动踏板BP的压力推动,以切换流动路径,以使制动助力器产生取决于 沮丧的力量的大小。 螺线管SOL在与凹陷力相反的方向上推动阀机构。 控制器ECU响应于制动力增加/减少需求信号,以增加或减少由螺线管施加到阀机构的作用力,从而增加或减少来自制动助力器的输出。 来自制动助力器的输出可以独立于响应于制动力增加/减少需求而施加到制动踏板的压力的力量而被自由地控制。 该装置适用于诸如再生制动单元,发动机制动器或排气制动单元或制动辅助装置的车辆上的各种制动系统。
    • 74. 发明授权
    • Light-receiving member for electrophotography having a photoconductive
layer composed of a first layer region and a second layer region having
different energy bandgaps and characteristic energies
    • 具有由第一层区域构成的光电导层和具有不同能量带隙和特征能量的第二层区域的光电接收构件
    • US5738963A
    • 1998-04-14
    • US698925
    • 1996-08-16
    • Hiroaki Niino
    • Hiroaki Niino
    • G03G5/08G03G5/082G03G5/153
    • G03G5/08228G03G5/08214G03G5/08221
    • To improve photoconductive and photoelectric-conversionary properties, e.g., to improve charging performance and at the same time make its temperature dependence lower, and to prevent exposure memory to achieve good image quality, a light-receiving member comprises a support and a photoconductive layer formed of a non-single-crystal (e.g., amorphous) material mainly composed of silicon atoms and containing at least one kind of hydrogen atoms and halogen atoms, wherein the photoconductive layer has a first layer region and a second layer region which have values different from each other in specific ranges in respect of optical bandgap (Eg) and characteristic energy (Eu) obtained from the linear relationship portion or exponential tail of a function represented by Expression (I): ln .alpha.=(1/Eu).multidot.h.nu.+.alpha..sub.1 (I) where photon energy h.nu. is set as an independent variable, and absorptivity coefficient .alpha. of light absorption spectrum as a dependent variable.
    • 为了提高光导和光电转换性能,例如,为了改善充电性能,同时降低其温度依赖性,并且为了防止曝光记忆获得良好的图像质量,光接收元件包括支撑体和形成的光电导层 的主要由硅原子组成并且含有至少一种氢原子和卤素原子的非单晶(例如,无定形)材料,其中光电导层具有第一层区域和第二层区域,其具有不同于 相对于由表达式(I)表示的函数的线性关系部分或指数尾部获得的光学带隙(Eg)和特征能量(Eu)的特定范围:lnα=(1 / Eu)xh nu +α 1(I)其中光子能量h nu被设置为独立变量,光吸收光谱的吸收系数α作为因变量。
    • 75. 发明授权
    • Microwave plasma CVD apparatus with a deposition chamber having a
circumferential wall comprising a curved moving substrate web and a
microwave applicator means having a specific dielectric member on the
exterior thereof
    • 具有沉积室的微波等离子体CVD装置,其具有包括弯曲移动衬底腹板的周向壁和在其外部具有特定电介质构件的微波施加器装置
    • US5514217A
    • 1996-05-07
    • US261655
    • 1994-06-07
    • Hiroaki NiinoTetsuya TakeiMasahiro KanaiRyuji Okamura
    • Hiroaki NiinoTetsuya TakeiMasahiro KanaiRyuji Okamura
    • C23C16/50C23C16/511C23C16/54H01L21/205H01L31/04H01L31/20C23C16/00
    • C23C16/511C23C16/545H01L31/202Y02E10/50Y02P70/521
    • An apparatus for continuously forming a functional deposited film on a continuously moving web member by microwave plasma CVD process, said apparatus comprises: a substantially enclosed columnar film-forming chamber having a curved circumferential wall formed by curving and projecting said web member as said web member is moving in the longitudinal direction by curved portion-forming means, said film-forming chamber having a film-forming space defined by a curved moving web member constituting said circumferential in which plasma is generated; at least a microwave applicator means capable of radiating a microwave energy in the direction of microwave to propagate, said microwave applicator means being mounted to said film forming chamber through one of the two side faces thereof such that part of said microwave applicator means is plunged into said film-forming space, at least said part of microwave applicator means having a dielectric exterior constituted by a dielectric material having a value of 2.times.10.sup.-2 or less in the product of the dielectric constant (.epsilon.) and the dielectric dissipation factor (tan .delta.) with respect to the frequency of microwave used;means for evacuating said film-forming chamber; means for introducing a film-forming raw material gas into said film-forming chamber; and a temperature controlling means.
    • 一种用于通过微波等离子体CVD工艺在连续移动的网状构件上连续地形成功能沉积膜的装置,所述装置包括:基本上封闭的柱状成膜室,具有弯曲周向壁,该弯曲周壁通过弯曲和突出所述腹板构件而形成, 通过弯曲部分形成装置在纵向方向上移动,所述成膜室具有由形成有等离子体的周向的弯曲移动幅材构成的成膜空间; 至少一个能够沿微波方向辐射微波能量以传播的微波施加器装置,所述微波施加器装置通过其两个侧面之一安装到所述成膜室,使得所述微波施加装置的一部分被插入 所述成膜空间,所述微波施加器装置的至少所述部分具有由介电常数(ε)和介电损耗因数(tanδ)的乘积中的介电材料构成的电介质材料,所述电介质外部具有2×10 -2或更小的值 )相对于使用微波的频率; 用于抽出所述成膜室的装置; 用于将成膜原料气体引入所述成膜室的装置; 和温度控制装置。