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    • 71. 发明申请
    • CONVEYANCE SYSTEM INCLUDING OPPOSED FLUID DISTRIBUTION MANIFOLDS
    • 包括流体分配管理的输送系统
    • US20110097491A1
    • 2011-04-28
    • US12606234
    • 2009-10-27
    • David H. LevyRoger S. KerrTodd M. Spath
    • David H. LevyRoger S. KerrTodd M. Spath
    • C23C16/00B65G53/40
    • C23C16/54C23C16/45551C23C16/45565C23C16/45574C23C16/45589C23C16/545
    • A fluid conveyance system for thin film material deposition includes a first fluid distribution manifold and a second distribution manifold. The first fluid distribution manifold includes an output face that includes a plurality of elongated slots. The plurality of elongated slots includes a source slot and an exhaust slot. The second fluid distribution manifold includes an output face that includes a plurality of openings. The plurality of openings include a source opening and an exhaust opening. The second fluid distribution manifold is positioned spaced apart from and opposite the first fluid distribution manifold such that the source opening of the output face of the second fluid distribution manifold mirrors the source slot of the output face of the first fluid distribution manifold and the exhaust opening of the output face of the second fluid distribution manifold mirrors the exhaust slot of the output face of the first fluid distribution manifold.
    • 用于薄膜材料沉积的流体输送系统包括第一流体分配歧管和第二分配歧管。 第一流体分配歧管包括包括多个细长槽的输出面。 多个细长槽包括源槽和排气槽。 第二流体分配歧管包括包括多个开口的输出面。 多个开口包括源开口和排气口。 第二流体分配歧管与第一流体分配歧管间隔开并相对设置,使得第二流体分配歧管的输出面的源开口反映第一流体分配歧管的输出面的源槽和排气口 所述第二流体分配歧管的输出面与第一流体分配歧管的输出面的排气槽反映。
    • 79. 发明申请
    • DEPOSITION SYSTEM FOR THIN FILM FORMATION
    • 薄膜形成沉积系统
    • US20090081885A1
    • 2009-03-26
    • US11861359
    • 2007-09-26
    • David H. LevyRoger S. KerrJeffrey T. Carey
    • David H. LevyRoger S. KerrJeffrey T. Carey
    • H01L21/311C23C16/00
    • C23C16/45551B33Y80/00C23C16/45519C23C16/545
    • A process for depositing a thin film material on a substrate is disclosed, comprising simultaneously directing a series of gas flows from the output face of a delivery head of a thin film deposition system toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material, wherein one or more of the gas flows provides a pressure that at least contributes to the separation of the surface of the substrate from the face of the delivery head. A system capable of carrying out such a process is also disclosed.
    • 公开了一种在衬底上沉积薄膜材料的方法,包括同时引导一系列气体流从薄膜沉积系统的输送头的输出面朝向衬底的表面,并且其中一系列气体流动 包括至少第一反应性气体材料,惰性吹扫气体和第二反应性气体材料,其中第一反应性气体材料能够与用第二反应性气态材料处理的基底表面反应,其中一个或多个气体 流动提供至少有助于将衬底的表面与输送头的表面分离的压力。 还公开了能够进行这种处理的系统。