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    • 71. 发明授权
    • Semiconductor element and manufacturing method therefor
    • 半导体元件及其制造方法
    • US08563988B2
    • 2013-10-22
    • US13878742
    • 2011-10-27
    • Masao UchidaKoutarou Tanaka
    • Masao UchidaKoutarou Tanaka
    • H01L21/00
    • H01L21/26506H01L21/046H01L29/1608H01L29/66068H01L29/7828
    • As viewed along a normal to the principal surface of a substrate 101, this semiconductor element 100 has a unit cell region 100ul and a terminal region 100f located between the unit cell region and an edge of the semiconductor element. The terminal region 100f includes a ring region 103f of a second conductivity type which is arranged in a first silicon carbide semiconductor layer 102 so as to contact with a drift region 102d. The ring region includes a high concentration ring region 103af which contacts with the surface of the first silicon carbide semiconductor layer and a low concentration ring region 103bf which contains an impurity of the second conductivity type at a lower concentration than in the high concentration ring region and of which the bottom contacts with the first silicon carbide semiconductor layer. A side surface of the high concentration ring region 103af contacts with the drift region 102d. As viewed along a normal to the principal surface of the semiconductor substrate, the high concentration ring region and the low concentration ring region are identical in contour.
    • 沿着基板101的主表面的法线观察,该半导体元件100具有位于单位电池区域和半导体元件的边缘之间的单位电池区域100ul和端子区域100f。 端子区域100f包括布置在第一碳化硅半导体层102中以与漂移区域102d接触的第二导电类型的环形区域103f。 环区域包括与第一碳化硅半导体层的表面接触的高浓度环区域103af以及含有比在高浓度环区域低的浓度的第二导电型杂质的低浓度环区域103bf,以及 其底部与第一碳化硅半导体层接触。 高浓度环区域103af的侧表面与漂移区域102d接触。 沿着与半导体衬底的主表面正交的方向观察,高浓度环区域和低浓度环区域的轮廓相同。
    • 73. 发明申请
    • SEMICONDUCTOR ELEMENT AND MANUFACTURING METHOD THEREFOR
    • 半导体元件及其制造方法
    • US20100295062A1
    • 2010-11-25
    • US12676212
    • 2009-07-03
    • Masao UchidaMasashi HayashiKoichi Hashimoto
    • Masao UchidaMasashi HayashiKoichi Hashimoto
    • H01L29/78H01L29/24H01L21/04
    • H01L29/7802H01L29/0696H01L29/1608H01L29/66068H01L29/7828
    • A semiconductor device includes: a semiconductor layer including silicon carbide, which has been formed on a substrate; a semiconductor region 15 of a first conductivity type defined on the surface of the semiconductor layer 10; a semiconductor region 14 of a second conductivity type, which is defined on the surface 10s of the semiconductor layer so as to surround the semiconductor region 15 of the first conductivity type; and a conductor 19 with a conductive surface 19s that contacts with the semiconductor regions 15 and 14 of the first and second conductivity types. On the surface 10s of the semiconductor layer, the semiconductor region 15 of the first conductivity type has at least one first strip portion 60 that runs along a first axis i. The width C1 of the semiconductor region 15 of the first conductivity type as measured along the first axis i is greater than the width A1 of the conductive surface 19s as measured along the first axis i. And the periphery of the conductive surface 19s crosses the at least one first strip portion 60, 61.
    • 半导体器件包括:已经形成在衬底上的包含碳化硅的半导体层; 限定在半导体层10的表面上的第一导电类型的半导体区域15; 限定在半导体层的表面10s上以包围第一导电类型的半导体区域15的第二导电类型的半导体区域14; 以及具有与第一和第二导电类型的半导体区域15和14接触的导电表面19s的导体19。 在半导体层的表面10s上,第一导电类型的半导体区域15具有沿着第一轴线i延伸的至少一个第一条带部分60。 沿着第一轴线i测量的第一导电类型的半导体区域15的宽度C1大于沿着第一轴线i测量的导电表面19s的宽度A1。 并且导电表面19s的周边与至少一个第一条带部分60,61交叉。
    • 74. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20100193800A1
    • 2010-08-05
    • US12665556
    • 2009-05-11
    • Masao UchidaKazuya UtsunomiyaKoichi Hashimoto
    • Masao UchidaKazuya UtsunomiyaKoichi Hashimoto
    • H01L29/24H01L23/52H01L29/772
    • H01L29/812H01L23/544H01L29/045H01L29/0696H01L29/1608H01L29/66068H01L29/7828H01L2223/54426H01L2223/5446H01L2924/0002H01L2924/00
    • A semiconductor device is fabricated on an off-cut semiconductor substrate 11. Each unit cell 10 thereof includes: a first semiconductor layer 12 on the surface of the substrate 11; a second semiconductor layer 16 stacked on the first semiconductor layer 12 to have an opening 16e that exposes first and second conductive regions 15 and 14 at least partially; a first conductor 19 located inside the opening 16e of the second semiconductor layer 16 and having a conductive surface 19s that contacts with the first and second conductive regions 15 and 14; and a second conductor 17 arranged on the second semiconductor layer 16 and having an opening 18e corresponding to the opening 16s of the second semiconductor layer 16. In a plane that is defined parallel to the surface of the substrate 11, the absolute value of a difference between the respective lengths of the second semiconductor layer 16 and the second conductor 18 as measured in the off-cut direction is greater than the absolute value of their difference as measured perpendicularly to the off-cut direction.
    • 半导体器件制造在截止半导体衬底11上。每个单电池10包括:在衬底11的表面上的第一半导体层12; 堆叠在第一半导体层12上以具有至少部分地暴露第一和第二导电区域15和14的开口16e的第二半导体层16; 第一导体19位于第二半导体层16的开口16e的内部,并且具有与第一和第二导电区域15和14接触的导电表面19s; 以及布置在第二半导体层16上并具有对应于第二半导体层16的开口16s的开口18e的第二导体17.在与衬底11的表面平行定义的平面中,差异的绝对值 在沿切断方向测量的第二半导体层16和第二导体18的各自长度之间的距离大于垂直于偏离方向测量的它们的差的绝对值。