会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 72. 发明授权
    • Method for manufacture of a selective chemical sensitive FET transducer
    • 选择性化学敏感型FET换能器的制造方法
    • US4354308A
    • 1982-10-19
    • US118774
    • 1980-02-05
    • Kiyoo ShimadaMasayuki MatuoMasayoshi Esashi
    • Kiyoo ShimadaMasayuki MatuoMasayoshi Esashi
    • G01N27/00G01N27/414H01L29/78H01L21/22
    • G01N27/414
    • A selective chemical sensitive field-effect transistor device for use in detection and measurement of chemical properties of substances to which the device is exposed is disclosed. The chemical sensitive FET device comprises a semiconductor substrate, at least one pair of spaced apart diffusion layers formed on one surface of the semiconductor substrate and forming source and drain regions, respectively, and a double layer structure consisting of a silicon oxide layer and an electrically insulating layer overlaying the silicon oxide layer. A gate region located on a portion of the surface of the semiconductor substrate between the diffusion layers is overlaid with a chemical selective membrane adapted to interact with certain substances. A method for the manufacture of the above described FET device is also disclosed.
    • 公开了一种选择性化学敏感场效应晶体管器件,用于检测和测量器件暴露于物质的化学性质。 化学敏感FET器件包括半导体衬底,分别形成在半导体衬底的一个表面上并分别形成源极和漏极区域的至少一对间隔开的扩散层,以及由氧化硅层和电 覆盖氧化硅层的绝缘层。 位于扩散层之间的半导体衬底的表面的一部分上的栅极区域覆盖有适于与某些物质相互作用的化学选择膜。 还公开了制造上述FET器件的方法。
    • 73. 发明授权
    • Selective chemical sensitive FET transducer
    • 选择性化学敏感FET传感器
    • US4218298A
    • 1980-08-19
    • US957433
    • 1978-11-03
    • Kiyoo ShimadaMasayuki MatuoMasayoshi Esashi
    • Kiyoo ShimadaMasayuki MatuoMasayoshi Esashi
    • G01N27/00G01N27/414H01L29/78G01N27/30
    • G01N27/414
    • A selective chemical sensitive field-effect transistor device for use in detection and measurement of chemical properties of substances to which the device is exposed is disclosed. The chemical sensitive FET device comprises a semiconductor substrate, at least one pair of spaced apart diffusion layers formed on one surface of the semiconductor substrate and forming source and drain regions, respectively, and a double layer structure consisting of a silicon oxide layer and an electrically insulating layer overlaying the silicon oxide layer. A gate region located on a portion of the surface of the semiconductor substrate between the diffusion layers is overlaid with a chemical selective membrane adapted to interact with certain substances. A method for the manufacture of the above described FET device is also disclosed.
    • 公开了一种选择性化学敏感场效应晶体管器件,用于检测和测量器件暴露于物质的化学性质。 化学敏感FET器件包括半导体衬底,分别形成在半导体衬底的一个表面上并分别形成源极和漏极区域的至少一对间隔开的扩散层,以及由氧化硅层和电 覆盖氧化硅层的绝缘层。 位于扩散层之间的半导体衬底的表面的一部分上的栅极区域覆盖有适于与某些物质相互作用的化学选择膜。 还公开了制造上述FET器件的方法。