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71. 发明授权

US5196366A Method of manufacturing electric devices 失效
标题翻译：制造电气设备的方法
公开(公告)号：US5196366A
公开(公告)日：1993-03-23
申请号：US567352
申请日：1990-08-15
申请人： Shunpei Yamazaki , Kenji Itoh , Masaya Kadono , Naoki Hirose
发明人： Shunpei Yamazaki , Kenji Itoh , Masaya Kadono , Naoki Hirose
IPC分类号： H01L21/20 , H01L33/00
CPC分类号： H01L33/0054 , H01L21/02381 , H01L21/02527 , H01L21/0259 , H01L21/0262 , H01L21/02658 , Y10S117/913 , Y10S438/932
摘要： A method of manufacturing electric devices is described. Discrete single crystals are formed on a substrate to be coated. The formation of these crystals is carried out by forming discrete crystallization centers in the surface of the substrate and growing a single crystal from each center. The spaces separating these crystals are filled with an insulating material in order not to form short current paths therein. The top surfaces of the crystals are exposed in order to make contact with an upper electrode.

72. 发明授权

US5190824A Electrostatic-erasing abrasion-proof coating 失效
标题翻译：静电消除耐磨涂层
公开(公告)号：US5190824A
公开(公告)日：1993-03-02
申请号：US660949
申请日：1991-02-26
申请人： Kenji Itoh
发明人： Kenji Itoh
IPC分类号： C03C17/34 , C03C17/42 , C04B41/50 , C04B41/52 , C04B41/85 , C04B41/89 , C23C16/26 , C23C16/509 , H01L31/0216
CPC分类号： C04B41/009 , C03C17/3441 , C03C17/3488 , C03C17/42 , C04B41/5001 , C04B41/52 , C04B41/85 , C04B41/89 , C23C16/26 , C23C16/509 , H01L31/02161 , C04B2111/00405 , Y10T428/24942 , Y10T428/24983 , Y10T428/30 , Y10T428/31511 , Y10T428/31522 , Y10T428/31533 , Y10T428/31678 , Y10T428/31721 , Y10T428/31786 , Y10T428/31935
摘要： An abrasion-proof and static-erasing coating is formed on the contact surface of a contact image sensor. The coating comprises a first film having a high hardness and a low conductivity, a second film formed on the first film and having a low hardness and a high conductivity, and a third film having a high hardness and a high resistivity providing an abrasion-proof insulating external surface.
摘要翻译：在接触图像传感器的接触表面上形成耐磨损和防静电涂层。涂层包括具有高硬度和低导电性的第一膜，形成在第一膜上并具有低硬度和高导电性的第二膜，以及具有高硬度和高电阻率的第三膜，提供耐磨性绝缘外表面。

73. 发明授权

US5176791A Method for forming carbonaceous films 失效
标题翻译：形成碳质膜的方法
公开(公告)号：US5176791A
公开(公告)日：1993-01-05
申请号：US731353
申请日：1991-07-15
申请人： Kenji Itoh , Osamu Aoyagi
发明人： Kenji Itoh , Osamu Aoyagi
IPC分类号： B08B7/00 , C23C16/44 , C23G5/00
CPC分类号： B08B7/0035 , B08B7/00 , C23C16/4405 , C23G5/00
摘要： Cleaning a device to make a film made from carbon or containing carbon as a main ingredient is carried out by etching the interior of a deposition chamber where the film is formed, with an etching gas in a plasma state selected from the group of hydrogen, oxygen, and a gaseous fluoride, and then cleaning the interior of the deposition chamber with a cleaning gas selected from the group of argon and hydrogen in a plasma state.
摘要翻译：以碳或碳为主要成分制成薄膜的装置是通过用选自氢，氧等离子体状态的蚀刻气体蚀刻形成薄膜的沉积室的内部进行的和气态氟化物，然后用等离子体状态的选自氩和氢的清洁气体清洗沉积室的内部。

74. 发明授权

US4975144A Method of plasma etching amorphous carbon films 失效
标题翻译：等离子体蚀刻无定形碳膜的方法
公开(公告)号：US4975144A
公开(公告)日：1990-12-04
申请号：US324663
申请日：1989-03-17
申请人： Shunpei Yamazaki , Kenji Itoh
发明人： Shunpei Yamazaki , Kenji Itoh
IPC分类号： H01L21/311 , H01L21/3213 , H01L21/48
CPC分类号： H01L21/481 , H01L21/31116 , H01L21/31144 , H01L21/32139
摘要： An etching method for selectively eliminating carbon material deposited on a substrate is described. A layer of masking material may be applied over areas of the carbon coating whose removal is not desired. After disposing the substrate coated with the carbon material in a CVD reaction chamber, NF.sub.3 is admitted to the chamber and converted into a plasma etchant comprising fluorine ions or radicals by inputting high frequency energy. The fluorine ions or radicals remove all unmasked carbon, leaving a carbon film pattern on the substrate which may be used in the manufacture of an IC. The carbon material elimination method can also be used for chamber cleaning to removing carbon deposited debris from the inside of the CVD reaction chamber.
摘要翻译：描述了用于选择性地去除沉积在基板上的碳材料的蚀刻方法。可以将一层掩模材料施加在不需要去除的碳涂层的区域上。将涂覆有碳材料的基材设置在CVD反应室中之后，通过输入高频能量，将NF3进入室并转化为包含氟离子或自由基的等离子体蚀刻剂。氟离子或自由基除去所有未掩蔽的碳，在基板上留下可用于制造IC的碳膜图案。碳材料消除方法也可以用于室内清洁以从CVD反应室的内部除去碳沉积的碎屑。

75. 发明授权

US4970369A Electronic device manufacturing methods 失效
标题翻译：电子元件制造方法
公开(公告)号：US4970369A
公开(公告)日：1990-11-13
申请号：US333911
申请日：1989-04-06
申请人： Shunpei Yamazaki , Kenji Itoh , Susumu Nagayama
发明人： Shunpei Yamazaki , Kenji Itoh , Susumu Nagayama
IPC分类号： B41M5/26 , H01L21/302 , H01L27/142 , H01L31/0224 , H01L31/0392 , H05K3/02
CPC分类号： H01L31/03921 , H01L21/302 , H01L31/022466 , H01L31/046 , H01L31/0463 , H05K3/027 , Y02E10/50 , Y10S438/94
摘要： In a method of making an electronic device having at least a transparent conductive layer, which includes at least a step of forming a transparent conductive layer member and a step of forming a transparent conductive layer by patterning the transparent conductive layer member using a spot-shaped or linear laser beam or beams, each of which has a short wavelength of 400 nm or less and optical energy greater than the optical energy band gap of the transparent conductive layer.

76. 发明授权

US4680855A Electronic device manufacturing methods 失效
标题翻译：电子元件制造方法
公开(公告)号：US4680855A
公开(公告)日：1987-07-21
申请号：US791733
申请日：1985-10-28
申请人： Shunpei Yamazaki , Kenji Itoh , Susumu Nagayama
发明人： Shunpei Yamazaki , Kenji Itoh , Susumu Nagayama
IPC分类号： H01L21/268 , H01L21/311 , H01L21/3213 , H05K3/02 , H01L21/302 , H01L21/461
CPC分类号： H01L21/32131 , H01L21/268 , H01L21/31105 , H05K3/027 , Y10S438/94
摘要： An electronic device manufacturing method including a step of forming a layer member to be patterned, which is a conductive metal layer member, a laminate member of a transparent conductive layer and a non-transparent or reflective layer or a non-single-crystal semiconductor layer member, and a step of scanning the layer member by a spot-shaped laser beam or exposing the layer member to radiation by one or more linear pulsed laser beams, thereby forming the patterned layer.
摘要翻译：一种电子器件制造方法，包括形成作为导电金属层构件的图案化层构件的步骤，透明导电层和非透明或反射层或非单晶半导体层的层叠构件以及通过点形激光束扫描层构件或者通过一个或多个线性脉冲激光束将层构件暴露于辐射的步骤，从而形成图案化层。

77. 发明授权

US4670065A Cold rolled steel suitable for enamel coating and method for making 失效
标题翻译：适用于搪瓷涂层的冷轧钢板及其制造方法
公开(公告)号：US4670065A
公开(公告)日：1987-06-02
申请号：US792697
申请日：1985-10-15
申请人： Akira Yasuda , Junko Ikehira , Kenji Itoh , Junsuke Takasaki , Kozou Tsunoyama
发明人： Akira Yasuda , Junko Ikehira , Kenji Itoh , Junsuke Takasaki , Kozou Tsunoyama
IPC分类号： C22C38/00 , C21D8/02 , C21D8/04 , C21D9/46 , C21D9/48 , C22C38/16 , C22C38/60 , C23D5/00 , C25C20060101 , C25D20060101 , C21D1/00
CPC分类号： C22C38/60
摘要： A cold rolled steel sheet suitable for enamel coating is provided which consists essentially of, on a weight basis,C: up to 0.005%,P: up to 0.02%,S: up to 0.03%,N: 0.005% to 0.012%,Ti: up to 0.15% andTi.gtoreq.(48/12C+48/14N+48/32S)%,Cu: up to 0.08%, andat least one member selected from As, Sb, and Bi in a total amount of 0.003% to 0.03% or Se and/or Te in a total amount of 0.003% to 0.05% or their combination in a total amount of 0.002 to 0.05%, the balance being Fe and concomitant impurities. The steel is produced by continuously casting a molten steel having the same composition as above, hot rolling and then cold rolling the steel, and continuously annealing the steel at a temperature in the range from the recrystallization temperature to the Ac.sub.3 point. It is also produced by substantially the same procedure but by box annealing the steel having a titanium content increased at a temperature in the range from the recrystallization temperature to 800.degree. C.
摘要翻译：提供了适用于搪瓷涂层的冷轧钢板，其基本上由重量计C：高达0.005％，P：至多0.02％，S：至多0.03％，N：0.005％至0.012％， Ti：高达0.15％，Ti> / =（48 / 12C + 48 / 14N + 48 / 32S）％，Cu：高达0.08％，以及选自As，Sb和Bi中的至少一种总量 0.003〜0.03％，Se和/或Te总量为0.003〜0.05％，或其组合为0.002〜0.05％，余量为Fe和伴随杂质。钢通过连续铸造具有与上述相同组成的钢水，热轧，然后冷轧钢而制成，并且在从再结晶温度到Ac3点的温度下连续退火钢。它也通过基本上相同的方法制造，但是通过对在从再结晶温度到800℃的温度范围内钛含量增加的钢进行盒式退火。

78. 发明授权

US4353979A Light-sensitive silver halide photographic materials 失效
标题翻译：感光卤化银照相材料
公开(公告)号：US4353979A
公开(公告)日：1982-10-12
申请号：US169423
申请日：1980-07-16
申请人： Sadatugu Terada , Hideaki Arai , Kenji Itoh , Hiroshi Sugita , Katsumi Matsuura , Thuneo Wada
发明人： Sadatugu Terada , Hideaki Arai , Kenji Itoh , Hiroshi Sugita , Katsumi Matsuura , Thuneo Wada
IPC分类号： G03C7/26 , G03C1/06 , G03C7/388 , G03C7/00 , G03C1/40
CPC分类号： G03C7/3885 , Y10S430/158
摘要： A silver halide photographic material containing a solution of a 5-pyrazolone type magneta coupler and a high-boiling organic solvent of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 each represent an aliphatic or aromatic group with a carbon atom of R.sub.3 directly bonded to the phosphorus atom.
摘要翻译：含有5-吡唑啉酮型磁性偶合剂和下式的高沸点有机溶剂的卤化银照相材料：其中R 1，R 2和R 3各自代表具有直接碳原子的R 3的脂族或芳族基团与磷原子键合。

79. 发明授权

US08472090B2 Image display system 有权
标题翻译：图像显示系统
公开(公告)号：US08472090B2
公开(公告)日：2013-06-25
申请号：US12897986
申请日：2010-10-05
申请人： Kenji Itoh
发明人： Kenji Itoh
IPC分类号： H04N1/04
CPC分类号： H04N1/00482 , G06Q30/02 , H04N1/00347 , H04N1/34 , H04N2201/0081 , H04N2201/0089 , H04N2201/3212 , H04N2201/3222 , H04N2201/3273
摘要： The image display system includes an image reading apparatus having an image reading portion for reading a document to output as first image data, and a data output portion for outputting the first image data accompanied with a plurality of specific image data or locations of the plurality of specific image data and display information data including a display time and display order of each specific image data, and a display apparatus having an image display portion for displaying the specific image data based on display information data of the specific image data in displaying the first image data.
摘要翻译：图像显示系统包括具有用于读取作为第一图像数据输出的文档的图像读取部分的图像读取装置，以及用于输出伴随着多个特定图像数据的多个第一图像数据或多个图像数据的位置的数据输出部分特定图像数据和包括每个特定图像数据的显示时间和显示顺序的显示信息数据，以及具有用于在显示第一图像时基于特定图像数据的显示信息数据显示特定图像数据的图像显示部分的显示装置数据。

80. 发明授权

US08298378B2 Method for treating waste water containing oxygen-containing compound having phenolic hydroxyl group of carbonyl group 失效
标题翻译：含有含羰基酚羟基的含氧化合物的废水的处理方法
公开(公告)号：US08298378B2
公开(公告)日：2012-10-30
申请号：US11909304
申请日：2006-03-24
申请人： Kenji Itoh
发明人： Kenji Itoh
IPC分类号： B01D3/34 , B01D8/00 , C02F1/04 , C02F1/66 , C07C37/74
CPC分类号： C02F1/66 , B01D3/14 , C02F1/04 , C02F1/048 , C02F1/16 , C02F1/722 , C02F1/725 , C02F2101/34 , C02F2101/345 , C02F2103/36
摘要： A method for treating a wastewater containing oxygen-containing compound having a phenolic hydroxyl group or a carbonyl group, including a step of adding an alkali agent to the wastewater containing the oxygen-containing compound having a phenolic hydroxyl group or a carbonyl group to control a pH of the wastewater to 10 or more; and a step of separating a discharge in which the oxygen-containing compound having a phenolic hydroxyl group or a carbonyl group is concentrated through distillation of the wastewater to which the alkali agent has been added.
摘要翻译：一种处理含有酚羟基或羰基的含氧化合物的废水的方法，包括向含有酚羟基或羰基的含氧化合物的废水中加入碱剂的步骤，以控制废水pH值在10以上; 并且通过蒸馏加入碱性试剂的废水，分离其中含有酚羟基或羰基的含氧化合物的放电的浓缩步骤。

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