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71. 发明申请

US20090275265A1 ENDPOINT DETECTION IN CHEMICAL MECHANICAL POLISHING USING MULTIPLE SPECTRA 审中-公开
标题翻译：使用多个光谱的化学机械抛光中的端点检测
公开(公告)号：US20090275265A1
公开(公告)日：2009-11-05
申请号：US12431532
申请日：2009-04-28
申请人： Jun Qian , Sivakumar Dhandapani , Harry Q. Lee , Thomas H. Osterheld , Zhize Zhu
发明人： Jun Qian , Sivakumar Dhandapani , Harry Q. Lee , Thomas H. Osterheld , Zhize Zhu
IPC分类号： B24B49/04 , B24B49/12
CPC分类号： B24B37/013 , B24B49/12
摘要： A computer implemented method includes obtaining at least one current spectrum with an in-situ optical monitoring system, comparing the current spectrum to a plurality of different reference spectra, and determining based on the comparing whether a polishing endpoint has been achieved for the substrate having the outermost layer undergoing polishing. The current spectrum is a spectrum of light reflected from a substrate having an outermost layer undergoing polishing and at least one underlying layer. The plurality of reference spectra represent spectra of light reflected from substrates with outermost layers having the same thickness and underlying layers having different thicknesses.
摘要翻译：计算机实现的方法包括：利用原位光学监测系统获得至少一个当前频谱，将当前频谱与多个不同的参考光谱进行比较，并且基于比较是否已经实现了具有最外层进行抛光。当前的光谱是从具有正在研磨的最外层的基底和至少一个下层反射的光的光谱。多个参考光谱表示从具有相同厚度的最外层和具有不同厚度的下层的基底反射的光的光谱。

72. 发明授权

US5681215A Carrier head design for a chemical mechanical polishing apparatus 失效
标题翻译：用于化学机械抛光设备的载体头设计
公开(公告)号：US5681215A
公开(公告)日：1997-10-28
申请号：US549651
申请日：1995-10-27
申请人： Michael T. Sherwood , Harry Q. Lee , Norm Shendon , Semyon Spektor
发明人： Michael T. Sherwood , Harry Q. Lee , Norm Shendon , Semyon Spektor
IPC分类号： B24B37/30 , B24B37/32 , H01L21/304 , B24B5/02 , B24B29/02
CPC分类号： B24B37/30 , B24B37/32
摘要： A carrier uses multiple bellows to form two pressure chambers between the housing and carrier base and retaining ring assembly. By pressurizing the first chamber, an even load can be applied across the substrate. By pressurizing the second chamber, the retaining ring can pressed against the polishing pad. The bellows allow the carrier base to pivot with respect to the housing, but the downward force is evenly applied to the substrate through the first pressure chamber. Torque is transferred from the carrier housing to the carrier base through the bellows.
摘要翻译：载体使用多个波纹管在壳体和载体基座和保持环组件之间形成两个压力室。通过对第一腔室进行加压，可以跨衬底施加均匀的负载。通过对第二腔室进行加压，保持环可压靠抛光垫。波纹管允许载体基座相对于壳体枢转，但是向下的力通过第一压力室均匀地施加到基板。扭矩通过波纹管从载体壳体转移到载体基座。

73. 发明授权

US5599423A Apparatus and method for simulating and optimizing a chemical mechanical polishing system 失效
标题翻译：用于模拟和优化化学机械抛光系统的装置和方法
公开(公告)号：US5599423A
公开(公告)日：1997-02-04
申请号：US497362
申请日：1995-06-30
申请人： Norman W. Parker , Robert D. Tolles , Harry Q. Lee
发明人： Norman W. Parker , Robert D. Tolles , Harry Q. Lee
IPC分类号： B24B37/04 , B24B49/00 , B24B51/00 , H01L21/00
CPC分类号： B24B49/00 , B24B37/042 , B24B51/00
摘要： Apparatus and concomitant method for simulating a chemical mechanical polishing (CMP) system containing a polishing pad, a chuck for supporting a substrate, a positioner for positioning the polishing pad with respect to the substrate, a chuck rotator for rotating the chuck, and a polishing pad rotator for rotating the polishing pad. The CMP system simulation method comprises: defining polishing pad and substrate parameters; defining simulation parameters; determining, in response to said polishing pad, substrate and simulation parameters, a polishing result; and displaying the polishing result. Additionally, the simulation optimizes selected parameters to achieve a specified polishing non-uniformity across a substrate. Also, the simulation and optimization routines are interfaced to CMP system hardware to optimally control a substrate polishing process to achieve predetermined substrate polishing non-uniformity.
摘要翻译：用于模拟包含抛光垫的化学机械抛光（CMP）系统的装置和伴随方法，用于支撑基板的卡盘，用于将抛光垫相对于基板定位的定位器，用于旋转卡盘的卡盘旋转器和抛光垫轮旋转器，用于旋转抛光垫。 CMP系统模拟方法包括：定义抛光垫和衬底参数; 定义模拟参数; 响应于所述抛光垫确定衬底和模拟参数抛光结果; 并显示抛光结果。另外，模拟优化所选择的参数以在基板上实现特定的抛光不均匀性。此外，仿真和优化例程与CMP系统硬件接口，以最佳地控制衬底抛光工艺以实现预定的衬底抛光不均匀性。

74. 发明授权

US5422724A Multiple-scan method for wafer particle analysis 失效
标题翻译：晶圆颗粒分析的多重扫描方法
公开(公告)号：US5422724A
公开(公告)日：1995-06-06
申请号：US116232
申请日：1993-08-31
申请人： Patrick D. Kinney , Yuri S. Uritsky , Harry Q. Lee
发明人： Patrick D. Kinney , Yuri S. Uritsky , Harry Q. Lee
IPC分类号： G01B11/00 , G01N15/00 , G01R31/305 , G01R31/307 , H01J37/22 , H01L21/66
CPC分类号： G01R31/305 , G01R31/307 , H01L22/20 , H01L22/12
摘要： A method for reducing targeting errors encountered when trying to locate contaminant particles in a high-magnification imaging device, based on estimates of the particle positions obtained from a scanning device. The method of the invention includes scanning a semiconductor wafer in a scanning device, then preferably moving the wafer to a different orientation, and scanning the wafer again, to obtain at least two sets of particle coordinates that may differ slightly because of uncertainties in the scanning process. The multiple sets of coordinates are averaged to reduce the targeting errors, but only after transforming the coordinates to a common coordinate system. The transformation step includes computing transformation parameters for each possible pair of particles detected in at least two scans, averaging the results, and then transforming all of the particle coordinates to the common coordinate system. Optionally, the method may include discarding any transformation parameters that deviate too far from the average, and then computing the average transformation parameters again.
摘要翻译：基于从扫描装置获得的粒子位置的估计，减少在高倍率成像装置中定位污染物颗粒时遇到的瞄准误差的方法。本发明的方法包括在扫描装置中扫描半导体晶片，然后优选地将晶片移动到不同的取向，并再次扫描晶片，以获得由于扫描中的不确定性而可能略有不同的至少两组粒子坐标处理。对多组坐标进行平均以减少目标误差，但仅在将坐标转换为公共坐标系之后。变换步骤包括计算在至少两次扫描中检测到的每个可能的一对颗粒的变换参数，对结果求平均值，然后将所有粒子坐标转换为公共坐标系。可选地，该方法可以包括丢弃偏离平均值太远的任何变换参数，然后再次计算平均变换参数。

75. 发明授权

US5267017A Method of particle analysis on a mirror wafer 失效
标题翻译：在镜片上进行粒子分析的方法
公开(公告)号：US5267017A
公开(公告)日：1993-11-30
申请号：US886541
申请日：1992-05-20
申请人： Yuri S. Uritsky , Harry Q. Lee , Patrick D. Kinney , Kang-Ho Ahn
发明人： Yuri S. Uritsky , Harry Q. Lee , Patrick D. Kinney , Kang-Ho Ahn
IPC分类号： G01R31/305 , G01R31/307 , G01B11/00
CPC分类号： G01R31/305 , G01R31/307
摘要： A method for reducing targeting errors encountered when trying to locate contaminant particles in a high-magnification imaging device, based on estimates of the particle positions obtained from a scanning device. The method of the invention uses three techniques separately and in combination. The first technique includes selecting at least three reference particles, to provide multiple unique pairs of reference particles for computation of an averaged set of coordinate transformation parameters, used to transform particle position coordinates from the coordinate system of the scanning device to the coordinate system of the imaging device. The averaged transformation parameters result in much smaller targeting errors between the estimated and actual positions of the particles. The targeting errors are further reduced by the use of multiple scans of the scanning device. In a third technique, accumulated reference particle targeting errors observed in prior processing of other wafers are used to reduce these targeting errors when processing a new wafer.
摘要翻译：基于从扫描装置获得的粒子位置的估计，减少在高倍率成像装置中定位污染物颗粒时遇到的瞄准误差的方法。本发明的方法分别使用三种技术组合。第一技术包括选择至少三个参考粒子，以提供用于计算平均坐标变换参数集合的多个独特的参考粒子对，用于将粒子位置坐标从扫描装置的坐标系转换为坐标系的坐标系成像装置。平均变换参数导致粒子的估计位置和实际位置之间的目标误差小得多。通过使用扫描设备的多次扫描，进一步减少了定位错误。在第三种技术中，在处理新晶片时，使用在其它晶片的先前处理中观察到的累积参考粒子瞄准误差来减少这些瞄准误差。

76. 发明授权

US09579767B2 Automatic generation of reference spectra for optical monitoring of substrates 有权
标题翻译：自动生成基板光学监测参考光谱
公开(公告)号：US09579767B2
公开(公告)日：2017-02-28
申请号：US13087789
申请日：2011-04-15
申请人： Jun Qian , Harry Q. Lee
发明人： Jun Qian , Harry Q. Lee
IPC分类号： B24B49/12 , B24B37/013 , B24B37/04 , B24B37/10 , B24B37/20 , B24B49/04
CPC分类号： B24B37/013 , B24B37/042 , B24B37/10 , B24B37/205 , B24B49/045 , B24B49/12
摘要： A computer-implemented method of generating reference spectra includes polishing a first substrate in a polishing apparatus having a rotatable platen, measuring a sequence of spectra from the substrate during polishing with an in-situ monitoring system, associating each spectrum in the sequence of spectra with a index value equal to a number of platen rotations at which the each spectrum was measured, and storing the sequence of spectra as reference spectra.
摘要翻译：计算机实现的产生参考光谱的方法包括在具有可旋转压板的抛光装置中抛光第一衬底，在用原位监测系统抛光期间测量来自衬底的光谱序列，将光谱序列中的每个光谱与指示值等于测量每个光谱的平板旋转数，并将光谱序列存储为参考光谱。

77. 发明授权

US09296084B2 Polishing control using weighting with default sequence 有权
标题翻译：使用默认序列加权抛光控制
公开(公告)号：US09296084B2
公开(公告)日：2016-03-29
申请号：US13553038
申请日：2012-07-19
申请人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
发明人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
IPC分类号： B24B37/013 , B24B37/10 , B24B49/12
CPC分类号： B24B37/013 , B24B37/105 , B24B49/12
摘要： A method of controlling polishing includes storing a sequence of default values, polishing a substrate, monitoring the substrate during polishing with an in-situ monitoring system, generating a sequence of measured values from measurements from the in-situ monitoring system, combining the sequence of measured values with the sequence of default values to generate a sequence of modified values, fitting a function to the sequence of modified values, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the function.
摘要翻译：控制抛光的方法包括存储默认值序列，抛光衬底，用原位监测系统在抛光期间监测衬底，从原位监测系统的测量产生测量值序列，将序列测量值与默认值序列以生成修改值序列，将功能拟合到修改值序列，以及基于该函数确定抛光终点或抛光速率调整中的至少一个。

78. 发明授权

US09248544B2 Endpoint detection during polishing using integrated differential intensity 有权
标题翻译：使用积分差分强度的抛光期间的端点检测
公开(公告)号：US09248544B2
公开(公告)日：2016-02-02
申请号：US13552317
申请日：2012-07-18
申请人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Wen-Chiang Tu
发明人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Wen-Chiang Tu
IPC分类号： B24B37/013 , B24B37/04 , H01L21/66 , B24B49/12 , B24B37/10
CPC分类号： B24B37/013 , B24B37/042 , B24B37/105 , B24B49/12 , H01L22/12 , H01L22/26
摘要： A method of controlling a polishing operation includes polishing a substrate, during polishing obtaining a sequence over time of measured spectra from the substrate with an in-situ optical monitoring system, for each measured spectrum from the sequence of measured spectra determining a difference between the measured spectrum and an immediate previous spectrum from the sequence, accumulating the difference for each measured spectrum to generate a total difference, comparing the total difference to a threshold, and detecting a polishing endpoint based on the comparison of the total difference to the threshold.
摘要翻译：一种控制抛光操作的方法包括：在抛光过程中，利用原位光学监测系统从基板测量的光谱中获得随时间变化的序列，从测量光谱序列测得的每个测量光谱，从而确定基板的测量值频谱和来自序列的立即上一个频谱，累积每个测量频谱的差以产生总差，将总差与阈值进行比较，以及基于总差与阈值的比较来检测抛光端点。

79. 发明申请

US20140024292A1 Polishing Control Using Weighting With Default Sequence 有权
标题翻译：抛光控制使用加权默认序列
公开(公告)号：US20140024292A1
公开(公告)日：2014-01-23
申请号：US13553038
申请日：2012-07-19
申请人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
发明人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
IPC分类号： B24B37/005
CPC分类号： B24B37/013 , B24B37/105 , B24B49/12
摘要： A method of controlling polishing includes storing a sequence of default values, polishing a substrate, monitoring the substrate during polishing with an in-situ monitoring system, generating a sequence of measured values from measurements from the in-situ monitoring system, combining the sequence of measured values with the sequence of default values to generate a sequence of modified values, fitting a function to the sequence of modified values, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the function.
摘要翻译：控制抛光的方法包括存储默认值序列，抛光衬底，用原位监测系统在抛光期间监测衬底，从原位监测系统的测量产生测量值序列，将序列测量值与默认值序列以生成修改值序列，将功能拟合到修改值序列，以及基于该函数确定抛光终点或抛光速率调整中的至少一个。

80. 发明申请

US20120100781A1 MULTIPLE MATCHING REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING 审中-公开
标题翻译：用于现场光学监测的多重匹配参考光谱
公开(公告)号：US20120100781A1
公开(公告)日：2012-04-26
申请号：US13271023
申请日：2011-10-11
申请人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
发明人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
IPC分类号： B24B49/12
CPC分类号： B24B37/013 , B24B49/12
摘要： A method of controlling polishing includes storing a plurality libraries, each library including a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, and for each measured spectrum of the sequence of spectra, finding a best matching first reference spectrum from a first library from the plurality of libraries and finding a best matching second reference spectrum from a different second library from the plurality of libraries, determining a first value associated with the best matching first reference spectrum and determining a second value from the best matching second reference spectrum, and calculating a third value from the first value and the second value to generate a sequence of calculated third values. At least one of a polishing endpoint or an adjustment for a polishing rate can be determined based on the sequence of calculated third values.
摘要翻译：控制抛光的方法包括存储多个库，每个库包括多个参考光谱，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，以及对于光谱序列的每个测量光谱，找到从来自多个库的第一库中最佳匹配第一参考频谱，并从多个库中找到来自不同第二库的最佳匹配的第二参考频谱，确定与最佳匹配的第一参考频谱相关联的第一值并确定第二值并且从第一值和第二值计算第三值以生成计算出的第三值的序列。可以基于计算的第三值的顺序来确定抛光终点或抛光速率的调整中的至少一个。

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