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71. 发明授权

US07714983B2 Illumination system for a microlithography projection exposure installation 有权
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US07714983B2
公开(公告)日：2010-05-11
申请号：US10571475
申请日：2004-09-13
申请人： Jess Koehler , Johannes Wangler , Markus Brotsack , Wolfgang Singer , Damian Fiolka , Manfred Maul
发明人： Jess Koehler , Johannes Wangler , Markus Brotsack , Wolfgang Singer , Damian Fiolka , Manfred Maul
IPC分类号： G03B27/54 , G03B27/72 , G03B27/42
CPC分类号： G03F7/70116 , G03F7/702
摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.
摘要翻译：用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中。配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

72. 发明授权

US07605386B2 Optical device with raster elements, and illumination system with the optical device 有权
标题翻译：具有光栅元件的光学装置，以及具有光学装置的照明系统
公开(公告)号：US07605386B2
公开(公告)日：2009-10-20
申请号：US11598180
申请日：2006-11-10
申请人： Wolfgang Singer , Johannes Wangler , Markus Deguenther , Birgit Kuerz , Christoph Menke
发明人： Wolfgang Singer , Johannes Wangler , Markus Deguenther , Birgit Kuerz , Christoph Menke
IPC分类号： G03B27/54 , G03B27/42 , G21K5/04
CPC分类号： G02B27/0961 , G02B17/0657 , G02B27/0983 , G03F7/70075
摘要： The invention relates to an optical device that includes (a) a first optical element with at least one first raster element, where the first raster element has a first axis, (b) a second optical element with at least one second raster element, where the second raster element has a second axis. The first raster element can be changed in its position relative to the second raster element, so that a distance between the first axis and the second axis is variable.
摘要翻译：本发明涉及一种光学装置，其包括（a）具有至少一个第一光栅元件的第一光学元件，其中第一光栅元件具有第一轴，（b）具有至少一个第二光栅元件的第二光学元件，其中第二光栅元件具有第二轴。可以将第一光栅元件相对于第二光栅元件的位置改变，使得第一轴与第二轴之间的距离是可变的。

73. 发明申请

US20050219495A1 Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统的光束整形单元
公开(公告)号：US20050219495A1
公开(公告)日：2005-10-06
申请号：US11015312
申请日：2004-12-17
申请人： Wolfgang Singer , Markus Deguenther , Birgit Kuerz , Rafael Egger , Johannes Wangler , Manfred Maul
发明人： Wolfgang Singer , Markus Deguenther , Birgit Kuerz , Rafael Egger , Johannes Wangler , Manfred Maul
IPC分类号： G03B27/54 , G03F7/20
CPC分类号： G03F7/70108 , G03F7/70183
摘要： A beam reshaping unit for an illumination system (10) of a microlithographic projection exposure apparatus comprises a first beam reshaping element (62) having a first beam reshaping surface (68) and a second beam reshaping element having a second beam reshaping surface (74) which faces the first beam reshaping surface (68). The two beam reshaping surfaces (68; 74) are rotationally symmetrical with respect to an optical axis (22) of the beam reshaping unit. At least the first beam reshaping surface (68, 74) has a concavely or convexly curved region (70, 76).
摘要翻译：用于微光刻投影曝光装置的照明系统（10）的光束整形单元包括具有第一光束重塑表面（68）的第一光束重塑元件（62）和具有第二光束重塑表面（74）的第二光束重塑元件，其面向第一光束重塑表面（68）。两个光束整形表面（68; 74）相对于光束整形单元的光轴（22）旋转对称。至少第一光束整形表面（68,74）具有凹或凸弯曲的区域（70,76）。

74. 发明授权

US06836530B2 Illumination system with a plurality of individual gratings 有权
标题翻译：具有多个单独光栅的照明系统
公开(公告)号：US06836530B2
公开(公告)日：2004-12-28
申请号：US10163262
申请日：2002-06-05
申请人： Wolfgang Singer , Markus Weiss , Bernd Kleemann , Karlfried Osterried , Johannes Wangler , Frank Melzer , Andreas Heisler , Vadim Yevgenyevich Banine
发明人： Wolfgang Singer , Markus Weiss , Bernd Kleemann , Karlfried Osterried , Johannes Wangler , Frank Melzer , Andreas Heisler , Vadim Yevgenyevich Banine
IPC分类号： G21K500
CPC分类号： G03F7/70158 , G03F7/702 , G21K1/06
摘要： There is provided an illumination system for wavelengths of ≦100 nm, having an object plane and a field plane. The illumination system includes a grating element having a plurality of gratings, and a diaphragm. The diaphragm is arranged after the grating element in a beam path from the object plane to the field plane.
摘要翻译：提供了具有物体平面和场平面的<= 100nm波长的照明系统。照明系统包括具有多个光栅的光栅元件和隔膜。隔膜设置在从物体平面到场平面的光束路径中的光栅元件之后。

75. 发明申请

US20080225259A1 ILLUMINATION SYSTEM WITH VARIABLE ADJUSTMENT OF THE ILLUMINATION 审中-公开
标题翻译：具有可变调整照明的照明系统
公开(公告)号：US20080225259A1
公开(公告)日：2008-09-18
申请号：US12127310
申请日：2008-05-27
申请人： Wolfgang Singer , Jorg Schultz , Johannes Wangler
发明人： Wolfgang Singer , Jorg Schultz , Johannes Wangler
IPC分类号： G03B27/54
CPC分类号： G03F7/70075 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/70891 , G03F7/70983 , G21K1/06 , G21K5/00 , G21K5/04
摘要： An illumination system comprises (a) a first optical element upon which a light beam impinges, where the first optical element has first raster elements that partition said light beam into light channels; (b) a second optical element that receives said light channels, where the second optical element has a second raster elements; (c) an object plane that receives said light channels via said second optical element; and (d) an exit pupil that is provided with an illumination via said object plane. The system is characterized by an assignment of a member of said first raster elements and a member of said second raster elements to each of said light channels to provide a continuous beam path from said first optical element to said object plane for each of said plurality of light channels. The assignment is changeable to provide an adjustment of said illumination in said exit pupil.
摘要翻译：照明系统包括：（a）第一光学元件，光束入射到该第一光学元件上，其中第一光学元件具有将所述光束分成光通道的第一光栅元件; （b）第二光学元件，其接收所述光通道，其中所述第二光学元件具有第二光栅元件; （c）通过所述第二光学元件接收所述光通道的物平面; 和（d）通过所述物平面设置照明的出射光瞳。该系统的特征在于将所述第一光栅元件的成员和所述第二光栅元件的成员分配给每个所述光通道，以提供从所述第一光学元件到所述物平面的连续光束路径，用于所述多个光通道。所述分配是可变的以提供所述出射光瞳中的所述照明的调整。

76. 发明申请

US20080111983A1 Illumination System for a Microlithographic Projection Exposure Apparatus 审中-公开
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US20080111983A1
公开(公告)日：2008-05-15
申请号：US11813529
申请日：2005-12-30
申请人： Wolfgang Singer , Dieter Bader , Johannes Wangler , Markus Deguenther
发明人： Wolfgang Singer , Dieter Bader , Johannes Wangler , Markus Deguenther
IPC分类号： G03B27/72
CPC分类号： G03F7/70066 , G03F7/70075 , G03F7/70083
摘要： An illumination system (12) of a microlithographic exposure system comprises a plurality of light emitting elements (24) that have light exit facets that are positioned in or in close proximity to a field plane (OP) or a pupil plane and are configured to be individually activated. Light collecting elements, for example microlenses of a fly-eye lens or arrays of cylinder lenses, may be used to collect the light bundles emitted by the light emitting elements (24). Homogenizing means, for example a rod integrator or an optical raster element (40), may be provided for improving the intensity uniformity in a reticle plane (RP).
摘要翻译：微光刻曝光系统的照明系统（12）包括多个发光元件（24），该发光元件具有光出射面，其位于或靠近场平面（OP）或光瞳平面，并被配置为单独激活。可以使用光收集元件，例如蝇眼透镜的微透镜或圆柱透镜阵列来收集由发光元件（24）发射的光束。可以提供均匀化装置，例如棒状积分器或光学光栅元件（40），以改善光罩平面（RP）中的强度均匀性。

77. 发明授权

US08134687B2 Illumination system of a microlithographic exposure apparatus 有权
标题翻译：微光刻曝光设备的照明系统
公开(公告)号：US08134687B2
公开(公告)日：2012-03-13
申请号：US11660754
申请日：2005-08-23
申请人： Wolfgang Singer , Johannes Wangler , Rafael Egger , Wilhelm Ulrich
发明人： Wolfgang Singer , Johannes Wangler , Rafael Egger , Wilhelm Ulrich
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70108 , G03F7/70183
摘要： An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, around the optical axis. The device further includes a second mirror with a second reflective surface having a shape that is defined by rotating a curved line around the optical axis. At least one of the mirrors has a central aperture containing the optical axis. This device may form a zoom-collimator for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.
摘要翻译：微光刻曝光装置的照明系统具有光轴和光束变换装置。该装置包括具有第一反射表面的第一反射镜，该第一反射表面具有围绕光轴旋转相对于光轴倾斜的直线所限定的形状。该装置还包括具有第二反射表面的第二反射镜，其具有通过围绕光轴旋转曲线而限定的形状。至少一个反射镜具有包含光轴的中心孔。该装置可以形成EUV照明系统的变焦准直器，其将发散的光束变换成可变形状和/或直径的准直光束。

78. 发明授权

US07312462B2 Illumination system having a nested collector for annular illumination of an exit pupil 失效
标题翻译：具有用于出射光瞳的环形照明的嵌套收集器的照明系统
公开(公告)号：US07312462B2
公开(公告)日：2007-12-25
申请号：US10930302
申请日：2004-08-31
申请人： Wolfgang Singer , Johannes Wangler , Eric Sohmen
发明人： Wolfgang Singer , Johannes Wangler , Eric Sohmen
IPC分类号： G03F7/20
CPC分类号： B82Y10/00 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70108 , G03F7/70166
摘要： There is provided an illumination system. The illumination system includes a source for light having a wavelength ≦193 nm, a field plane, and a collector having a mirror shell for receiving a part of the light. The mirror shell is arranged so that a real image of the source is formed and comes to lie in a plane that is defocused relative to the field plane by more than 30 mm, so that the field plane is illuminated in a predetermined region, substantially homogeneously.
摘要翻译：提供照明系统。照明系统包括波长<= 193nm的光源，场平面和具有用于接收一部分光的镜壳的收集器。镜壳布置成使得源的真实图像形成并且位于相对于场平面散焦大于30mm的平面中，使得场平面基本上均匀地被照射在预定区域中。

79. 发明申请

US20070216887A1 Illumination System for a Microlithographic Projection Exposure Apparatus 审中-公开
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US20070216887A1
公开(公告)日：2007-09-20
申请号：US11568204
申请日：2004-04-23
申请人： Wolfgang Singer , Johannes Wangler
发明人： Wolfgang Singer , Johannes Wangler
IPC分类号： G03F7/20
CPC分类号： G03F7/70075
摘要： An illumination system for a microlithographic projection exposure apparatus comprises a light source, a first optical unit having an exit pupil, an optical raster element positioned in or in close proximity to the exit pupil of the first optical unit and a field plane that is conjugated to the exit pupil of the first optical unit by Fourier transformation. The illumination system further comprises a second optical unit imaging the field plane into an image plane and having at its object side a homocentric entrance pupil that at least substantially coincides with the exit pupil of the first optical unit. This allows to dispense with a condenser lens that is usually required for conjugating the exit pupil to the field plane.
摘要翻译：用于微光刻投影曝光装置的照明系统包括光源，具有出射光瞳的第一光学单元，位于第一光学单元的出射光瞳处或紧邻第一光学单元的出射光瞳的光栅元件和与通过傅里叶变换使第一光学单元的出射光瞳。照明系统还包括第二光学单元，其将场平面成像为图像平面，并且在其物体侧具有至少基本上与第一光学单元的出射光瞳重合的同心入射光瞳。这允许省略通常用于将出射光瞳共轭到场平面所需的聚光透镜。

80. 发明申请

US20050280821A1 Illumination system having a light mixer for the homogenization of radiation distributions 审中-公开
标题翻译：具有用于辐射分布均匀化的光混合器的照明系统
公开(公告)号：US20050280821A1
公开(公告)日：2005-12-22
申请号：US11147931
申请日：2005-06-08
申请人： Damian Fiolka , Wolfgang Singer , Johannes Wangler
发明人： Damian Fiolka , Wolfgang Singer , Johannes Wangler
IPC分类号： G01B11/00 , G02B27/28 , G03F7/20
CPC分类号： G03F7/70583 , G02B27/283 , G03F7/70075
摘要： An illumination system of a microlithographic projection exposure apparatus contains a light mixer for the homogenization of radiation distributions. The latter may, in one embodiment, comprise at least one plane beam-splitter layer which is arranged between two transparent sub-elements, parallel to an optical axis of the illumination system. An alternative embodiment of a light mixer contains at least one row of beam splitters, wherein the beam splitters in at least one row are arranged mutually parallel, at an inclination angle with respect to an entry-side optical axis of the illumination system, and offset behind one another in a direction perpendicular to the entry-side optical axis.
摘要翻译：微光刻投影曝光装置的照明系统包含用于辐射分布均匀化的光混合器。在一个实施例中，后者可以包括布置在平行于照明系统的光轴的两个透明子元件之间的至少一个平面分束器层。光混合器的替代实施例包含至少一排分束器，其中至少一排中的分束器相对于照明系统的入射侧光轴以倾斜角相互平行地布置，并且偏移在与入射侧光轴垂直的方向上彼此相邻。

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