会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 73. 发明授权
    • Direct write nanolithographic deposition of nucleic acids from nanoscopic tips
    • 从纳米尖端直接写入纳米光刻的核酸
    • US07361310B1
    • 2008-04-22
    • US10307515
    • 2002-12-02
    • Chad A. MirkinLinette DemersDavid S. Ginger
    • Chad A. MirkinLinette DemersDavid S. Ginger
    • B01L3/02
    • G03F7/0002G01Q80/00Y10T436/2575
    • The use of direct-write nanolithography to generate anchored, nanoscale patterns of nucleic acid on different substrates is described, including electrically conductive and insulating substrates. Modification of nucleic acid, including oligonucleotides, with reactive groups such as thiol groups provides for patterning with use of appropriate scanning probe microscopic tips under appropriate conditions. The reactive groups provide for chemisorption or covalent bonding to the substrate surface. The resulting nucleic acid features, which exhibit good stability, can be hybridized with complementary nucleic acids and probed accordingly with use of, for example, nanoparticles functionalized with nucleic acids. Patterning can be controlled by selection of tip treatment, relative humidity, and nucleic acid structure.
    • 描述了使用直写式纳米光刻技术在不同基底上产生锚定的纳米级核酸图案,包括导电和绝缘基底。 含有反应性基团如硫醇基团的核酸(包括寡核苷酸)的修饰使得在合适的条件下使用合适的扫描探针显微镜尖端进行图案化。 反应性基团提供化学吸附或共价结合到基底表面。 所得到的表现出良好稳定性的核酸特征可与互补核酸杂交,并使用例如用核酸官能化的纳米颗粒进行相应的探测。 可以通过选择尖端处理,相对湿度和核酸结构来控制图案化。