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71. 发明授权

US08901510B2 Particle beam device having a detector arrangement 有权
标题翻译：具有检测器装置的粒子束装置
公开(公告)号：US08901510B2
公开(公告)日：2014-12-02
申请号：US13430913
申请日：2012-03-27
申请人： Dietmar Dönitz , Christian Wagner
发明人： Dietmar Dönitz , Christian Wagner
IPC分类号： G21K1/08 , H01J37/28
CPC分类号： H01J37/28
摘要： A particle beam device has a first column with a first beam axis, the first column having a first particle beam generator and a first objective lens for focusing the first particle beam on an object. A second column with a second beam axis is provided, the second column having a second particle beam generator and a second objective lens for focusing the second particle beam on the object. A detector, having a detection axis, detects interacting particles and/or radiation. The first beam axis and the second beam axis define a first angle, different from 0° and from 180°. The first and second beam axes are situated in a first plane. The detection axis of the detector and the first beam axis are situated in a second plane. The first plane and the second plane define a second angle having an absolute value in the range of 65° to 80°.
摘要翻译：粒子束装置具有具有第一光束轴的第一列，第一列具有第一粒子束发生器和用于将第一粒子束聚焦在物体上的第一物镜。提供具有第二光束轴的第二列，第二列具有第二粒子束发生器和用于将第二粒子束聚焦在物体上的第二物镜。具有检测轴的检测器检测相互作用的颗粒和/或辐射。第一光束轴线和第二光束轴线限定不同于0°和180°的第一角度。第一和第二光束轴位于第一平面中。检测器和第一光束轴的检测轴位于第二平面中。第一平面和第二平面限定了绝对值在65°至80°范围内的第二角度。

72. 发明申请

US20140326370A1 USE OF A SOLID FOR THE PRODUCTION OF A PROPELLANT POWDER 审中-公开
标题翻译：用于生产丙烯酸粉末的固体的使用
公开(公告)号：US20140326370A1
公开(公告)日：2014-11-06
申请号：US14128443
申请日：2012-03-28
申请人： Beat Vogelsanger , Bruno Ossola , Alexander Huber , Christian Wagner , Oliver Hampel
发明人： Beat Vogelsanger , Bruno Ossola , Alexander Huber , Christian Wagner , Oliver Hampel
IPC分类号： C06B45/04 , B29B13/02
CPC分类号： C06B45/04 , B29B13/021 , C06B21/0083 , C06B45/00 , C06B45/22
摘要： For production of a propellant charge powder, especially for medium and large calibers, in a process in which the solid is incorporated together with a liquid in a mixing and drying process into the channels of a granular green material and compacted therein to form a plug, the solid, under otherwise identical process conditions, is set within a setting range of >0-0.5% by weight based on the weight of the granular green material. For more significant lowering of the maximum pressure within an upper temperature range and for more significant raising of the maximum pressure within a lower temperature range of the application temperature range, an increased amount of solid is used. The solid is a substance whose melting point is at least 10° C., especially 20° C., above a maximum use temperature of the propellant charge powder and which is inert toward the granular green material. Since the plug consists virtually exclusively of inert material, a high ballistic stability is achieved.
摘要翻译：为了生产特别是用于中等和大口径的推进剂装料粉末，其中将固体与混合和干燥过程中的液体一起加入到颗粒状绿色材料的通道中并压实在其中以形成塞子的过程中，在其他相同的工艺条件下，基于颗粒状绿色材料的重量将固体设定在> 0-0.5重量％的设定范围内。为了在更高的温度范围内更大程度地降低最大压力，并且在施加温度范围的较低温度范围内更大程度地提高最大压力，则使用增加量的固体。固体是一种物质，其熔点至少为10℃，特别是20℃，高于推进剂装料粉末的最大使用温度，并且对颗粒状绿色材料是惰性的。由于插头几乎完全由惰性材料组成，所以实现了高的弹道稳定性。

73. 发明授权

US08500435B2 Positioning device 有权
标题翻译：定位装置
公开(公告)号：US08500435B2
公开(公告)日：2013-08-06
申请号：US12308437
申请日：2007-06-01
申请人： Witold Neter , Helmut Thoemmes , Christian Wagner
发明人： Witold Neter , Helmut Thoemmes , Christian Wagner
IPC分类号： B29C49/64
CPC分类号： B29C45/7207 , B29C49/6427 , B29C2045/7214 , B29K2105/258
摘要： A system for the after-treatment of parisons (7) produced in an injection molding mold, comprising at least two after-treatment tools. To provide a system for the after-treatment of parisons produced in an injection molding mold, by means of which a plurality of after-treatment tools can be easily positioned, it is proposed in accordance with the invention that there is provided a positioning device for positioning the first after-treatment tool in at least one positioning direction, and the at least two after-treatment tools are connected together so that with the positioning device for positioning the first after-treatment tool at least one further after-treatment tool can be positioned by suitable positioning of the first after-treatment tool.
摘要翻译：一种用于在注塑模具中生产的用于后处理型坯（7）的系统，其包括至少两种后处理工具。为了提供一种用于在注模模具中生产的型坯的后处理系统，通过该系统可以容易地定位多个后处理工具，根据本发明提出了一种用于将所述第一后处理工具定位在至少一个定位方向上，并且所述至少两个后处理工具连接在一起，使得通过所述定位装置来定位所述第一后处理工具，所述至少一个后处理工具可以是通过第一后处理工具的适当定位来定位。

74. 发明授权

US08216586B2 Lipases and uses thereof 有权
标题翻译：脂肪酶及其用途
公开(公告)号：US08216586B2
公开(公告)日：2012-07-10
申请号：US12453292
申请日：2009-05-06
申请人： Richard Albang , Andreas Fritz , Oliver Heinrich , Hilmar Ilgenfritz , Dieter Maier , Christian Wagner , Ulrike Folkers , Beatrix Gerhard , Fabio Spreafico , Lex De Boer , Roelf Bernhard Meima
发明人： Richard Albang , Andreas Fritz , Oliver Heinrich , Hilmar Ilgenfritz , Dieter Maier , Christian Wagner , Ulrike Folkers , Beatrix Gerhard , Fabio Spreafico , Lex De Boer , Roelf Bernhard Meima
IPC分类号： A61K39/00 , C12N9/20
CPC分类号： C12N9/20
摘要： The invention relates to a newly identified polynucleotide sequence comprising a gene that encodes a novel lipolytic enzyme from Aspergillus niger The invention features the full length nucleotide sequence of the novel gene, the cDNA sequence comprising the full length coding sequence of the novel lipolytic enzyme as well as the amino acid sequence of the full-length functional protein and functional equivalents thereof. The invention also relates to methods of using these enzymes in industrial processes and methods of diagnosing fungal infections. Also included in the invention are cells transformed with a polynucleotide according to the invention and cells wherein a lipolytic enzyme according to the invention is genetically modified to enhance its activity and/or level of expression.
摘要翻译：本发明涉及新鉴定的多核苷酸序列，其包含编码来自黑曲霉的新型脂解酶的基因本发明的特征在于新基因的全长核苷酸序列，cDNA序列还包含新型脂肪分解酶的全长编码序列作为全长功能性蛋白质的氨基酸序列及其功能等同物。本发明还涉及在工业过程中使用这些酶的方法和诊断真菌感染的方法。本发明还包括用根据本发明的多核苷酸转化的细胞和其中根据本发明的脂肪分解酶被遗传修饰以增强其活性和/或表达水平的细胞。

75. 发明授权

US07929116B2 Polarized radiation in lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备中的极化辐射和器件制造方法
公开(公告)号：US07929116B2
公开(公告)日：2011-04-19
申请号：US12010819
申请日：2008-01-30
申请人： Christian Wagner , Wilhelmus Petrus De Boeij , Tilmann Heil , Damian Fiolka , Roel De Jonge
发明人： Christian Wagner , Wilhelmus Petrus De Boeij , Tilmann Heil , Damian Fiolka , Roel De Jonge
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70566 , G03F7/70083 , G03F7/70125 , G03F7/70883 , G03F9/7065
摘要： A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
摘要翻译：光刻设备使用偏振光来改善诸如曝光宽容度的成像特性，同时保持和延长光刻设备中的照明系统的寿命。

76. 发明授权

US07859647B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07859647B2
公开(公告)日：2010-12-28
申请号：US12020947
申请日：2008-01-28
申请人： Arno Jan Bleeker , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
发明人： Arno Jan Bleeker , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/702 , G03F7/70291
摘要： A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.
摘要翻译：系统和方法用于引导辐射束非垂直地照射用于图案化辐射束的单独可控元件的构图阵列。可单独控制的元件可以改变辐射束的远心性。将辐射束投射到可独立控制的元件上可以通过凹面镜或使用放置在单独可控元件的物场中的折叠镜。或者，独立可控元件可以改变辐射束的光轴。

77. 发明申请

US20100047877A1 Novel phospholipases and uses thereof 失效
标题翻译：新型磷脂酶及其用途
公开(公告)号：US20100047877A1
公开(公告)日：2010-02-25
申请号：US12461287
申请日：2009-08-06
申请人： Kaj Albermann , Wolfram Kemmner , Dieter Maier , Fabio Spreafico , Alexander Stock , Christian Wagner , Lex De Boer , Roelf Bernhard Meima
发明人： Kaj Albermann , Wolfram Kemmner , Dieter Maier , Fabio Spreafico , Alexander Stock , Christian Wagner , Lex De Boer , Roelf Bernhard Meima
IPC分类号： C12N15/52 , C12N15/80 , C12N1/15 , C12P19/34 , C12N15/64 , C12P21/02
CPC分类号： A21D8/042 , C07K2319/00 , C12N9/20
摘要： The invention relates to a newly identified polynucleotide sequence comprising a gene that encodes a novel phospholipase isolated from Aspergillus niger. The invention features the full length nucleotide sequence of the novel gene, the cDNA sequence comprising the full length coding sequence of the novel phospholipase as well as the amino acid sequence of the full-length functional protein and functional equivalents thereof. The invention also relates to methods of using these enzymes in industrial processes and methods of diagnosing fungal infections. Also included in the invention are cells transformed with a polynucleotide according to the invention and cells wherein a phospholipase according to the invention is genetically modified to enhance or reduce its activity and/or level of expression.
摘要翻译：本发明涉及新鉴定的多核苷酸序列，其包含编码从黑曲霉分离的新型磷脂酶的基因。本发明的特征在于新基因的全长核苷酸序列，cDNA序列包含新型磷脂酶的全长编码序列以及全长功能蛋白的氨基酸序列及其功能等同物。本发明还涉及在工业过程中使用这些酶的方法和诊断真菌感染的方法。本发明还包括用根据本发明的多核苷酸转化的细胞和其中根据本发明的磷脂酶被遗传修饰以增强或降低其活性和/或表达水平的细胞。

78. 发明授权

US07588925B2 Phospholipases and uses thereof 失效
标题翻译：磷脂酶及其用途
公开(公告)号：US07588925B2
公开(公告)日：2009-09-15
申请号：US11544679
申请日：2006-10-10
申请人： Kaj Albermann , Wolfram Kemmner , Dieter Maier , Fabio Spreafico , Alexander Stock , Christian Wagner , Lex De Boer , Roelf Bernhard Meima
发明人： Kaj Albermann , Wolfram Kemmner , Dieter Maier , Fabio Spreafico , Alexander Stock , Christian Wagner , Lex De Boer , Roelf Bernhard Meima
IPC分类号： A21D2/00 , C12N9/20 , A23C9/12 , C12N1/00 , C12N9/16 , C07H21/04
CPC分类号： A21D8/042 , C07K2319/00 , C12N9/20
摘要： The invention relates to a newly identified polynucleotide sequence comprising a gene that encodes a novel phospholipase isolated from Aspergillus niger. The invention features the full length nucleotide sequence of the novel gene, the cDNA sequence comprising the full length coding sequence of the novel phospholipase as well as the amino acid sequence of the full-length functional protein and functional equivalents thereof. The invention also relates to methods of using these enzymes in industrial processes and methods of diagnosing fungal infections. Also included in the invention are cells transformed with a polynucleotide according to the invention and cells wherein a phospholipase according to the invention is genetically modified to enhance or reduce its activity and/or level of expression.
摘要翻译：本发明涉及新鉴定的多核苷酸序列，其包含编码从黑曲霉分离的新型磷脂酶的基因。本发明的特征在于新基因的全长核苷酸序列，cDNA序列包含新型磷脂酶的全长编码序列以及全长功能蛋白的氨基酸序列及其功能等同物。本发明还涉及在工业过程中使用这些酶的方法和诊断真菌感染的方法。本发明还包括用根据本发明的多核苷酸转化的细胞和其中根据本发明的磷脂酶被遗传修饰以增强或降低其活性和/或表达水平的细胞。

79. 发明申请

US20090212459A1 Method and System for Post-Treating Preforms 审中-公开
标题翻译：预处理预处理方法与系统
公开(公告)号：US20090212459A1
公开(公告)日：2009-08-27
申请号：US12085793
申请日：2006-11-10
申请人： Witold Neter , Helmut Thoemmes , Rainer Petry , Christian Wagner
发明人： Witold Neter , Helmut Thoemmes , Rainer Petry , Christian Wagner
IPC分类号： B29C71/02 , B29C45/72
CPC分类号： B29C45/7207 , B29B2911/1402 , B29B2911/14026 , B29B2911/14033 , B29B2911/1404 , B29B2911/14106 , B29B2911/14133 , B29C49/06 , B29C49/6427 , B29C49/6463 , B29C2045/7214 , B29C2045/7221 , B29C2045/7228 , B29C2045/7264 , B29K2105/253
摘要： The invention concerns a system for the post-treatment of preforms (7) produced in an injection molding mold, comprising at least two post-treatment tools which each have a receiving plate (4) which has a group of receiving cavities (2) and a pin plate (6) which has a group of post-treatment pins (3), and a device for transferring the preforms (7) from the injection molding mold alternately into the at least two post-treatment tools. In order to provide a method of and a system for the post-treatment of preforms produced in an injection molding mold, which on the one hand allows early removal of the preform from the injection molding tool and which on the other hand allows reliable post-treatment in particular of the interior of the preform after removal from the injection molding mold, it is proposed in accordance with the invention that the post-treatment pins (3) remain in the preforms for a period of time which is longer than the mold stand time.
摘要翻译：本发明涉及一种用于后处理在注塑模具中制造的预成型件（7）的系统，其包括至少两个后处理工具，每个后处理工具都具有接收板（4），该接收板具有一组接收腔（2）和具有一组后处理销（3）的销板（6）和用于将预成型件（7）从注模模具交替地转移到至少两个后处理工具中的装置。为了提供在注塑模具中制造的预成型件的后处理方法和系统，其一方面允许从注射模具中早期移除预型件，另一方面允许可靠的后处理，特别是在从注模模具中取出后预处理的内部，根据本发明提出，后处理销（3）保留在预制件中一段时间比模具架长时间。

80. 再颁专利

USRE40743E1 Projection exposure system having a reflective reticle 有权
标题翻译：具有反射型掩模版的投影曝光系统
公开(公告)号：USRE40743E1
公开(公告)日：2009-06-16
申请号：US10916650
申请日：2004-08-11
申请人： Gerhard Fuerter , Christian Wagner , Uwe Goedecke , Henriette Mueller
发明人： Gerhard Fuerter , Christian Wagner , Uwe Goedecke , Henriette Mueller
IPC分类号： G02B17/00
CPC分类号： G03F7/70066 , G03F7/70225 , G03F7/70283
摘要： A projection exposure system for microlithography includes an illuminating system (2), a reflective reticle (5) and reduction objectives (71, 72). In the reduction objective (71, 72), a first beam splitter cube (3) is provided which superposes the illuminating beam path (100) and the imaging beam path (200). In order to obtain an almost telecentric entry at the reticle, optical elements (71) are provided between beam splitter cube (3) and the reflective reticle (5). Advantageously, the reduction objective is a catadioptric objective having a beam splitter cube (3) whose fourth unused side can be used for coupling in light. The illuminating beam path (100) can also be coupled in with a non-parallel beam splitter plate. The illuminating beam path is refractively corrected in passthrough to compensate for aberrations via the special configuration of the rear side of the beam splitter plate. Advantageously, a beam splitter plate of this kind is used within a reduction objective in lieu of a deflecting mirror and only refractive components are introduced between the beam splitter plate and the reflective reticle.
摘要翻译：用于微光刻的投影曝光系统包括照明系统（2），反射掩模版（5）和还原物镜（71,72）。在还原物镜（71,72）中，设有使照明光束路径（100）和成像光束路径（200）叠置的第一分束器立方体（3）。为了在掩模版处获得几乎远心的入射，在分束器立方体（3）和反射标线片（5）之间提供光学元件（71）。有利地，还原目标是具有分束器立方体（3）的反射折射物镜，其中第四未使用侧可以用于光耦合。照明光束路径（100）也可以与非平行光束分离板耦合。通过透射度折射校正照明光束路径，以通过分束板后侧的特殊配置补偿像差。有利地，这种分束板在减速目标下用于偏转反射镜，并且只有折射分量被引入分束板和反射光罩之间。

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