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61. 发明授权

US08231797B2 Process for producing air gaps in microstructures 有权
标题翻译：在微结构中产生气隙的方法
公开(公告)号：US08231797B2
公开(公告)日：2012-07-31
申请号：US12353872
申请日：2009-01-14
申请人： Vincent Jousseaume , Aziz Zenasni
发明人： Vincent Jousseaume , Aziz Zenasni
IPC分类号： B31D3/00 , B32B3/10 , H01L21/44 , C03C15/00
CPC分类号： B81C1/00476 , B81B2203/0127 , B81B2203/0315 , B81B2207/07 , H01L21/7682 , H01L23/5222 , H01L23/5329 , H01L23/53295 , H01L2924/0002 , Y10T428/24273 , H01L2924/00
摘要： A process for producing at least one air gap in a microstructure, which includes the supply of a microstructure comprising at least one gap filled with a sacrificial material, this gap being limited over at least part of its surface by an impermeable membrane but which may be rendered permeable by the action of a chemical etchant, this etchant also being capable of degrading the sacrificial material and the contacting of the microstructure with said chemical etchant in order to make the membrane permeable and degrade the sacrificial material, and the removal of the chemical etchant from the microstructure and in which the chemical etchant is a fluid containing hydrofluoric acid and/or ammonium fluoride. Applications include microelectronics and micro-technology.
摘要翻译：一种用于在微结构中产生至少一个空气间隙的方法，其包括提供包含填充有牺牲材料的至少一个间隙的微结构，该间隙在其表面的至少一部分上被不透水膜限制，但可以是通过化学蚀刻剂的作用使其渗透，该蚀刻剂还能够降解牺牲材料和微结构与所述化学蚀刻剂的接触，以便使膜可渗透和降解牺牲材料，并除去化学蚀刻剂来自微结构，其中化学蚀刻剂是含有氢氟酸和/或氟化铵的流体。应用包括微电子和微电子技术。

62. 发明授权

US08038895B2 Method and appartus for detection of mechanical defects in an ingot piece composed of semiconductor material 有权
标题翻译：用于检测由半导体材料构成的锭块中的机械缺陷的方法和附件
公开(公告)号：US08038895B2
公开(公告)日：2011-10-18
申请号：US11764854
申请日：2007-06-19
申请人： Ludwig Koester , Peter Czurratis , Klaus Kraemer
发明人： Ludwig Koester , Peter Czurratis , Klaus Kraemer
IPC分类号： B31D3/00
CPC分类号： G01N29/28 , G01N29/043 , G01N29/0681 , G01N29/11 , G01N29/265 , G01N2291/044 , G01N2291/2697 , G01N2291/2698 , H01L21/67288
摘要： A method for detection of mechanical defects in a semiconductor ingot section which has at least one planar surface, and a thickness at right angles to this surface of 1 cm to 100 cm, involves scanning the planar surface by at least one ultrasound head which is coupled via a liquid coupling medium to the planar surface and, at each measurement point (x,y) producing at least one ultrasound pulse which is directed at the planar surface of the ingot section, recording the ultrasound-pulse echo as a function of time, such that an echo from the planar surface, an echo from a surface opposite the planar surface, and further echoes are detected, with the positions (xp, yp, zp) of mechanical defects in the ingot section being determined from the further echoes.
摘要翻译：一种用于检测半导体块部分中的机械缺陷的方法，其具有至少一个平坦表面，并且与该表面成直角的厚度为1cm至100cm，包括通过至少一个超声头扫描平面，通过液体耦合介质到平面表面，并且在每个测量点（x，y）处产生至少一个针对晶锭部分的平面表面的超声脉冲，记录超声波脉冲回波作为时间的函数，使得来自平面表面的回波，来自与平坦表面相对的表面的回波和另外的回波被检测，其中铸锭部分中的机械缺陷的位置（xp，yp，zp）由另外的回波确定。

63. 发明授权

US07922924B2 Methods for making internal die filters with multiple passageways which are fluidically in parallel 有权
标题翻译：用于制造具有多个流体平行的多个通道的内部模具过滤器的方法
公开(公告)号：US07922924B2
公开(公告)日：2011-04-12
申请号：US11987492
申请日：2007-11-30
申请人： Gary A. Kneezel
发明人： Gary A. Kneezel
IPC分类号： B31D3/00
CPC分类号： B41J2/17563 , Y10T29/49345 , Y10T29/49794 , Y10T29/49798
摘要： An internal filter includes a lower substrate and an upper substrate. Fluid passages are formed by etching grooves into the surface(s) of the upper and/or lower substrates, and/or in one or more intermediate layers. The filter pores extending between the fluid passages are formed by etching second grooves that fluidly connect the fluid passages. Two or more sets of the one or two intermediate layers can be implemented to provide additional filter passages and/or pores. Each set can be connected to a separate fluid source and/or a separate microfluidic device. In another internal filter, the inlet and outlet passages and the filter pores are formed on the same upper or lower substrate. The inlet and outlet passages are partially formed in a first step. In a second step, the inlet and outlet passages are completed at the same time that the filter pores are formed.
摘要翻译：内部滤波器包括下基板和上基板。通过将凹槽蚀刻到上基板和/或下基板的表面中和/或在一个或多个中间层中形成流体通道。通过蚀刻流体连接流体通道的第二凹槽来形成在流体通道之间延伸的过滤器孔。可以实施两组或更多套一个或两个中间层，以提供额外的过滤通道和/或孔。每组可以连接到单独的流体源和/或单独的微流体装置。在另一个内部过滤器中，入口和出口通道和过滤器孔形成在相同的上或下基板上。入口和出口通道部分地形成在第一步骤中。在第二步骤中，入口和出口通道在形成过滤器孔的同时完成。

64. 发明授权

US07910154B2 Nitride-based light emitting devices and methods of manufacturing the same 失效
标题翻译：基于氮化物的发光器件及其制造方法
公开(公告)号：US07910154B2
公开(公告)日：2011-03-22
申请号：US11505341
申请日：2006-08-17
申请人： Sung-soo Park
发明人： Sung-soo Park
IPC分类号： B05D5/06 , B05D3/04 , B29D11/00 , B31D3/00
CPC分类号： H01L33/32 , B82Y20/00 , C30B23/02 , C30B25/18 , C30B29/403 , H01L21/0237 , H01L21/0242 , H01L21/02458 , H01L21/02513 , H01L21/0254 , H01L33/02 , H01L33/16
摘要： A light emitting device may include an n-clad layer formed on a crystalline wafer; a porous layer formed by processing the n-clad layer in a mixed gas atmosphere of HCl and NH3. The light emitting device may further include an active layer and a p-clad layer formed on the porous layer.
摘要翻译：发光器件可以包括形成在晶片上的n覆层; 通过在HCl和NH 3的混合气体气氛中处理n包层形成的多孔层。发光器件还可以包括形成在多孔层上的有源层和p覆盖层。

65. 发明授权

US07900458B2 Turbine airfoils with near surface cooling passages and method of making same 有权
标题翻译：具有近表面冷却通道的涡轮翼型及其制造方法
公开(公告)号：US07900458B2
公开(公告)日：2011-03-08
申请号：US11807389
申请日：2007-05-29
申请人： Allister W. James , Anand A. Kulkarni
发明人： Allister W. James , Anand A. Kulkarni
IPC分类号： B31D3/00
CPC分类号： F01D5/187 , B23P15/04 , B23P2700/06 , C23C28/321 , C23C28/322 , C23C28/3455 , F01D5/186 , F01D5/288 , F05D2230/30 , F05D2230/90 , F05D2300/611 , Y10T29/49337
摘要： The present invention provides near-surface cooled airfoils that can be made with near-surface cooling passages that are completely free of any leachable or otherwise sacrificial material in the recessed portion of the outer surface of the core. The turbine airfoil comprises a metallic core or substrate having an outer surface and one or a plurality of recessed portions of the outer surface; an intermediate metallic skin or foil having a back surface and a top surface, the back surface of the intermediate skin being bonded to the outer surface of the core such that the recessed portion(s) is sufficiently enclosed so as to form at least one or more near-surface cooling passages or pathways; and at least one or more metallic coatings of a high temperature-resistant metallic material deposited on a top surface of the intermediate skin.
摘要翻译：本发明提供了近表面冷却的翼型件，其可以由在芯体的外表面的凹陷部分中完全没有任何可浸出或以其他方式牺牲的材料的近地表面冷却通道制成。涡轮机翼片包括具有外表面和外表面的一个或多个凹部的金属芯或基板; 具有后表面和顶表面的中间金属表皮或箔，所述中间表皮的后表面结合到所述芯的外表面，使得所述凹陷部分被充分地封闭，从而形成至少一个或多个更接近地面的冷却通道或路径; 以及沉积在中间皮肤的顶表面上的耐高温金属材料的至少一种或多种金属涂层。

66. 发明授权

US07862678B2 Drop generator 有权
标题翻译：掉落发电机
公开(公告)号：US07862678B2
公开(公告)日：2011-01-04
申请号：US11398148
申请日：2006-04-05
申请人： John R. Andrews , Jim Stevenson , Bradley J. Gerner
发明人： John R. Andrews , Jim Stevenson , Bradley J. Gerner
IPC分类号： B29C65/00 , C09J5/00 , B65C9/25 , H03M7/12 , C23F3/00 , C03C15/00 , B31D3/00
CPC分类号： B41J2/1634 , B41J2/161 , B41J2/1618 , B41J2/1623 , Y10T156/1052 , Y10T156/1054 , Y10T156/108 , Y10T156/1082
摘要： A method for making a plurality of electromechanical devices including attaching a laminar electromechanical structure to a receiving substrate using a not appreciably cured adhesive in a liquid state, laser cutting the laminar electromechanical structure while the adhesive is not appreciably cured to form a plurality of electromechanical devices, and curing the adhesive.
摘要翻译：一种用于制造多个机电装置的方法，包括使用液态不明显固化的粘合剂将层状机电结构附接到接收基板，激光切割层状机电结构，同时粘合剂不被明显固化以形成多个机电装置，并固化粘合剂。

67. 发明授权

US07850863B2 Process for fabricating amorphous hydrogenated silicon carbide films provided with through-pores and films thus obtained 有权
标题翻译：制造具有通孔的非晶氢化碳化硅膜制造方法
公开(公告)号：US07850863B2
公开(公告)日：2010-12-14
申请号：US12353847
申请日：2009-01-14
申请人： Aziz Zenasni
发明人： Aziz Zenasni
IPC分类号： B31D3/00
CPC分类号： H01L21/3148 , B82Y10/00 , H01L21/316 , H01L21/7682 , H01L29/0665 , H01L29/0669 , H01L29/0673 , H01L2221/1047 , Y10T428/24273
摘要： A process for fabricating a hydrogenated amorphous silicon carbide film having through-pores includes the formation on a substrate of a film consisting of an amorphous hydrogenated silicon carbide matrix in which silicon oxide nanowires are dispersed therethrough, and then the selective destruction by a chemical agent of the silicon oxide nanowires present in the film formed at step a). Applications include microelectronics and micro-technology, in all fabrication processes that involve the degradation of a sacrificial material by diffusion of a chemical agent through a film permeable to this agent for the production of air gaps, in particular the fabrication of air-gap interconnects for integrated circuits.
摘要翻译：用于制造具有通孔的氢化非晶碳化硅膜的工艺包括：在基底上形成由非晶氢化碳化硅基体构成的膜，其中氧化硅纳米线分散在其中，然后通过化学试剂的选择性破坏存在于步骤a）中形成的膜中的氧化硅纳米线。应用包括微电子学和微观技术，在涉及通过化学试剂通过可渗透该试剂的薄膜扩散以产生气隙的牺牲材料降解的所有制造工艺中，特别是制造气隙互连集成电路。

68. 发明授权

US07833405B2 Micromechanical component and corresponding production method 有权
标题翻译：微机械部件及相应的生产方式
公开(公告)号：US07833405B2
公开(公告)日：2010-11-16
申请号：US10450362
申请日：2001-12-13
申请人： Hubert Benzel , Heribert Weber , Hans Artmann , Frank Schaeffer
发明人： Hubert Benzel , Heribert Weber , Hans Artmann , Frank Schaeffer
IPC分类号： B23H3/00 , C23F1/00 , B31D3/00 , C03C25/68 , H01L21/00
CPC分类号： B81C1/00182 , B81B2201/0264 , B81B2203/0127 , B81B2203/0315 , B81C2201/0114 , B81C2201/0115 , B81C2201/0178
摘要： A micromechanical component is described which includes a substrate; a monocrystalline layer, which is provided above the substrate and which has a membrane area; a cavity that is provided underneath the membrane area; and one or more porous areas, which are provided inside the monocrystalline layer and which have a doping that is higher than that of the surrounding layer.
摘要翻译：描述了一种微机械部件，其包括基板; 单晶层，其设置在基板上方并具有膜面积; 设置在膜区域下方的空腔; 以及一个或多个多孔区域，其设置在单晶层内部并且具有高于周围层的掺杂。

69. 发明授权

US07485239B2 Component of glass-like carbon for CVD apparatus and process for production thereof 失效
标题翻译：用于CVD设备的玻璃状碳的成分及其制造方法
公开(公告)号：US07485239B2
公开(公告)日：2009-02-03
申请号：US11493518
申请日：2006-07-27
申请人： Maki Hamaguchi
发明人： Maki Hamaguchi
IPC分类号： B44C1/22 , B31D3/00 , C01B31/00
CPC分类号： C23C16/45591 , C04B35/524 , C04B2235/48 , C04B2235/65 , C04B2235/725 , C04B2235/94 , C04B2235/963 , C04B2235/9638 , C23C16/4404 , C23C16/4581 , Y10T428/30
摘要： Disclosed herein is an inner tube of glass-like carbon for CVD apparatus and a process for production thereof. The inner tube has its surface roughened without increase in metal impurities which cause particles. It has improved adhesion to CVD deposit film and also has a high degree of roundness. The surface roughness (on both the inner and outer surfaces) is 0.1-10 μm measured according to JIS B0601. The concentration of metal impurities (iron, copper, chromium, sodium, potassium, calcium, magnesium, and aluminum) in the surface is less than 50×1010 atoms/cm2.
摘要翻译：本发明公开了一种用于CVD设备的玻璃状碳的内管及其制造方法。内管的表面粗糙而不增加引起颗粒的金属杂质。它具有改善对CVD沉积膜的粘附性，并且还具有高度的圆度。根据JIS B0601测量表面粗糙度（内表面和外表面）为0.1-10μm。表面金属杂质（铁，铜，铬，钠，钾，钙，镁和铝）的浓度小于50×10 10原子/ cm 2。

70. 发明申请

US20080215132A1 IMPLANTABLE DEVICES HAVING TEXTURED SURFACES AND METHODS OF FORMING THE SAME 审中-公开
标题翻译：具有纹理表面的可植入装置及其形成方法
公开(公告)号：US20080215132A1
公开(公告)日：2008-09-04
申请号：US11843402
申请日：2007-08-22
申请人： S. Eric Ryan , Richard Sahagian
发明人： S. Eric Ryan , Richard Sahagian
IPC分类号： A61F2/82 , A61L27/04 , B31D3/00
CPC分类号： A61L31/088 , A61F2/82 , A61F2/91 , C23C14/025 , C23C14/165 , H01J37/3408
摘要： Textured coatings for implantable medical devices can be provided in metallic or polymer surface layers having surface texture factors down to nanometer and sub-nanometer levels. Implantable devices having such textured surfaces and methods of coating such devices comprises providing a substrate surface of an implantable device and forming a coating layer of the substrate surface by directing a mixture of atoms of a first type of material and a second type of material toward the substrate surface while simultaneously and collinearly bombarding the substrate surface with ions, wherein the first type of material is substantially resistant to a removal process and the second type of material is substantially susceptible to a removal process.
摘要翻译：可以在具有低至纳米和亚纳米级的表面纹理因子的金属或聚合物表面层中提供用于可植入医疗装置的纹理涂层。具有这种纹理表面的可植入装置和涂覆这种装置的方法包括提供可植入装置的基底表面，并通过将第一类型材料和第二类型材料的原子混合物朝向衬底表面，同时并且共线地用离子轰击衬底表面，其中第一类型的材料基本上抵抗去除过程，并且第二类型的材料基本上易于去除过程。

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