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    • 65. 发明授权
    • X-ray source
    • X射线源
    • US06944270B1
    • 2005-09-13
    • US10787264
    • 2004-02-26
    • Bonglea Kim
    • Bonglea Kim
    • H01J35/14H01J35/24H01J35/28H01I35/14
    • H01J35/24H01J35/14
    • The present invention provides an x-ray source including an electron-generation chamber with an electron beam source that emits electrons and a target chamber with a support structure and a target positioned within the support structure. The emitted electrons travel in a direction substantially parallel to a longitudinal axis extending between the electron-generation chamber and the target chamber towards the target and bombard the target to generate x-rays. The target is movable, while being bombarded with electrons, with respect to the support structure in at least one direction perpendicular to a longitudinal axis.
    • 本发明提供一种X射线源,其包括具有发射电子的电子束源的电子发生室和具有支撑结构的目标室和位于支撑结构内的靶。 发射的电子沿着基本上平行于电子发生室和目标室之间延伸的纵轴的方向朝向靶并且轰击靶以产生X射线。 目标是在垂直于纵向轴线的至少一个方向上相对于支撑结构被电子轰击的同时被移动。
    • 66. 发明申请
    • X-RAY SOURCE
    • X射线源
    • US20050190887A1
    • 2005-09-01
    • US10787264
    • 2004-02-26
    • Bonglea Kim
    • Bonglea Kim
    • H01J35/14H01J35/24H01J35/28H01J35/10
    • H01J35/24H01J35/14
    • The present invention provides an x-ray source including an electron-generation chamber with an electron beam source that emits electrons and a target chamber with a support structure and a target positioned within the support structure. The emitted electrons travel in a direction substantially parallel to a longitudinal axis extending between the electron-generation chamber and the target chamber towards the target and bombard the target to generate x-rays. The target is movable, while being bombarded with electrons, with respect to the support structure in at least one direction perpendicular to a longitudinal axis.
    • 本发明提供一种X射线源,其包括具有发射电子的电子束源的电子发生室和具有支撑结构的靶室和位于支撑结构内的靶。 发射的电子沿着基本上平行于电子发生室和目标室之间延伸的纵轴的方向朝向靶并且轰击靶以产生X射线。 目标是在垂直于纵向轴线的至少一个方向上相对于支撑结构被电子轰击的同时被移动。