会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 62. 发明授权
    • Method of producing a calibration standard for 2-D and 3-D profilometry in the sub-nanometer range
    • 在亚纳米范围内制作2-D和3-D轮廓测量法的校准标准的方法
    • US06218264B1
    • 2001-04-17
    • US09314410
    • 1999-05-19
    • Johann W. BarthaThomas BayerJohann GreschnerMartin NonnenmacherHelga Weiss
    • Johann W. BarthaThomas BayerJohann GreschnerMartin NonnenmacherHelga Weiss
    • H01L21311
    • G01Q40/02Y10S438/975Y10S977/852Y10S977/878Y10T428/24926
    • A calibration standard comprises a supporting structure (1) of single crystal material with at least one pair of different kinds of structures consisting of a raised line (2) and a trench (3). These structures have the identical width in the range of about 500 nm. The single crystal material preferably is silicon with (110)-orientation. A method of producing the calibration standard comprises the steps: providing two polished wafers of the same single crystal material and with the same crystal orientation, forming an oxide layer on the polished surface of the first wafer, bonding the second wafer to the first oxidized wafer with the polished surfaces of the wafers facing each other, cutting the bonded structure transverse to the polished surfaces, selectively etching both the wafers to a defined depth to expose a portion of the oxide layer, masking the portions of the oxide layer now representing the raised line (2) and selectively etching the oxide layer in the unmasked areas to a defined depth to form the trench (3). The calibration standard overcomes the problem of measuring the diameter of an ultrafine tip for AFM/STM profilometry in the sub-nanometer range.
    • 校准标准包括具有由凸起线(2)和沟槽(3)组成的至少一对不同种类的结构的单晶材料的支撑结构(1)。 这些结构具有在约500nm范围内相同的宽度。 单晶材料优选为具有(110)取向的硅。 一种生产校准标准的方法包括以下步骤:提供相同单晶材料的两个抛光晶片并具有相同的晶体取向,在第一晶片的抛光表面上形成氧化物层,将第二晶片接合到第一氧化晶片 其中晶片的抛光表面彼此面对,切割与抛光表面横向的结合结构,选择性地将两个晶片刻蚀到限定的深度以暴露氧化物层的一部分,掩盖现在代表凸起的氧化物层的部分 线(2),并且将未掩模区域中的氧化物层选择性蚀刻到限定的深度以形成沟槽(3)。 校准标准克服了在亚纳米范围内测量AFM / STM轮廓测量法的超细尖端直径的问题。
    • 64. 发明授权
    • High aspect ratio probes with self-aligned control electrodes
    • 具有自对准控制电极的高纵横比探针
    • US5844251A
    • 1998-12-01
    • US573308
    • 1995-12-15
    • Noel C. MacDonaldZ. Lisa Zhang
    • Noel C. MacDonaldZ. Lisa Zhang
    • B81B1/00H01L21/00H01L29/06
    • G01Q60/04B82Y35/00G01Q60/16G01Q60/38G01Q70/10Y10S977/878
    • A high aspect ratio field emission or tunnelling probe is fabricated utilizing a single crystal reactive etching and metallization process. The resulting field emission probes have self-aligned single crystal silicon sharp tips, high aspect ratio supporting posts for the tips, and integrated, self-aligned gate electrodes surrounding an electrically isolated from the tips. The gate electrodes are spaced from the tips by between 200 and 800 nm and metal silicide or metal can be applied on the tips to achieve emitter turn on at low operational gate voltages. The resulting tips have a high aspect ratio for use in probing various surface phenomena, and for this purpose, the probes can be mounted on or integrated in a three-dimensional translator for mechanical scanning across the surface and for focusing by adjusting the height of the emitter above the surface.
    • 使用单晶反应蚀刻和金属化工艺制造高纵横比场致发射或隧道探针。 所产生的场致发射探针具有自对准单晶硅尖尖,用于尖端的高纵横比支撑柱,以及围绕与尖端电隔离的集成的自对准栅电极。 栅电极与尖端间隔200至800nm,并且金属硅化物或金属可以施加在尖端上,以在低操作栅极电压下实现发射极导通。 所得到的尖端具有高的纵横比用于探测各种表面现象,并且为此目的,探针可以安装在三维平移机上或集成在三维平移机中,用于穿过表面进行机械扫描,并通过调整高度来进行聚焦 发射体在表面以上。
    • 65. 发明授权
    • Optical fiber with tapered end of core protruding from clad
    • 带有锥形末端的光纤从包层突出
    • US5812723A
    • 1998-09-22
    • US704615
    • 1997-01-17
    • Motoichi OhtsuShuji MononobeUma Maheswari Rajagopalan
    • Motoichi OhtsuShuji MononobeUma Maheswari Rajagopalan
    • G01Q60/18G02B6/24G02B6/245G02B6/42G02B6/02
    • G02B6/4203B82Y20/00B82Y35/00G01Q60/22G02B6/245G02B6/241Y10S977/862Y10S977/878
    • An optical fiber made up of a core for propagating the light and a clad covering the core for confining the light propagated in the core. The optical fiber has a tapering protrusion at the apex for entrance and exiting of light. The optical fiber is used in a photon scanning tunneling microscope detecting the evanescent light localized in an area smaller in size than the wavelength of light on the surface of an sample as an optical probe disposed in proximity to the surface of the sample for scattering the evanescent light for detecting the scattered light. The optical fiber is optically coupled to an optical waveguide for constituting an optically coupled element. With this optically coupled element, a protrusion of the optical fiber operates as a collection unit for collecting the light propagated in the core. The light collected by the protrusion enters the optical waveguide.
    • PCT No.PCT / JP94 / 00906 Sec。 371日期1997年1月17日 102(e)日期1997年1月17日PCT Filed 1994年6月3日PCT公布。 第WO95 / 25972号公报 日期1995年9月28日由用于传播光的芯构成的光纤和覆盖芯的包层以限制在芯中传播的光。 光纤在顶点处具有锥形突起,用于入射和离开光。 该光纤用于光子扫描隧道显微镜,其检测位于比样品表面上的光的波长小的区域中的ev逝光,作为设置在样品表面附近的光学探针,用于散射ev逝 用于检测散射光的光。 光纤光学耦合到光波导,用于构成光耦合元件。 利用该光耦合元件,光纤的突起作为用于收集在芯中传播的光的收集单元。 由突起收集的光进入光波导。