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    • 62. 发明授权
    • Method of fabricating a single photon avalanche diode imaging sensor
    • 制造单光子雪崩二极管成像传感器的方法
    • US09209320B1
    • 2015-12-08
    • US14454460
    • 2014-08-07
    • OMNIVISION TECHNOLOGIES, INC.
    • Eric A. G. Webster
    • H01L31/02H01L27/146
    • H01L31/02027H01L27/1462H01L27/14621H01L27/14627H01L27/1463H01L27/14685H01L27/14687H01L31/107H01L31/1892Y02E10/50
    • A method of fabricating an avalanche photodiode pixel includes growing a second doped semiconductor layer on a first doped semiconductor layer having a first doping concentration. The second doped semiconductor layer is grown with a second doping concentration and is of an opposite majority charge carrier type as the first doped semiconductor layer. A doped contact region having a third doping concentration is formed in the second doped semiconductor layer between the doped contact region and the first doped semiconductor layer. The doped contact region is of a same majority charge carrier type as the second doped semiconductor layer. The third doping concentration is greater than the second doping concentration. A guard ring region is formed in the second doped semiconductor layer, is of an opposite majority charge carrier type as the second doped semiconductor layer, and extends through the second doped semiconductor layer surrounding the doped contact region.
    • 制造雪崩光电二极管像素的方法包括在具有第一掺杂浓度的第一掺杂半导体层上生长第二掺杂半导体层。 第二掺杂半导体层以第二掺杂浓度生长,并且具有与第一掺杂半导体层相反的多数电荷载流子类型。 在掺杂接触区域和第一掺杂半导体层之间的第二掺杂半导体层中形成具有第三掺杂浓度的掺杂接触区域。 掺杂接触区域具有与第二掺杂半导体层相同的多数电荷载流子类型。 第三掺杂浓度大于第二掺杂浓度。 保护环区形成在第二掺杂半导体层中,具有与第二掺杂半导体层相反的大多数电荷载流子类型,并延伸穿过包围掺杂接触区的第二掺杂半导体层。
    • 64. 发明授权
    • Inverted metamorphic multi-junction (IMM) solar cell and associated fabrication method
    • 反相变质多结(IMM)太阳能电池及相关制造方法
    • US09184332B2
    • 2015-11-10
    • US13176325
    • 2011-07-05
    • Frank F. Ho
    • Frank F. Ho
    • H01L31/04H01L31/0304H01L31/0203H01L31/0264H01L31/18H01L31/0687H01L31/043
    • H01L31/1852H01L31/043H01L31/06875H01L31/1892Y02E10/544
    • An IMM solar cell and an associated method of fabricating an IMM solar cell are provided. In the context of a method, a first subcell may be formed upon a temporary substrate and a second subcell may be formed upon the first subcell. The second subcell may have a smaller band gap than the first subcell. The method may also bond the first and second subcells to a silicon subcell and then remove the temporary substrate. In the context of an IMM solar cell, the IMM solar cell includes first and second subcells with the first subcell disposed upon the second subcell and the second subcell having a smaller band gap than the first subcell. The IMM solar cell may also include a silicon subcell supporting the first and second subcells thereupon with a metal-to-metal bond between the silicon subcell and the second subcell.
    • 提供了IMM太阳能电池和制造IMM太阳能电池的相关方法。 在方法的上下文中,第一子电池可以形成在临时衬底上,并且第二子电池可以形成在第一子电池上。 第二子电池可以具有比第一子电池小的带隙。 该方法还可以将第一和第二子电池结合到硅子电池,然后移除临时衬底。 在IMM太阳能电池的上下文中,IMM太阳能电池包括第一和第二子电池,其中第一子电池设置在第二子电池上,而第二子电池具有比第一子电池小的带隙。 IMM太阳能电池还可以包括支撑第一和第二子电池的硅子电池,随后在硅子电池和第二子电池之间具有金属 - 金属键合。