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    • 63. 发明申请
    • METHODS FOR PERFORMING MODEL-BASED LITHOGRAPHY GUIDED LAYOUT DESIGN
    • 用于执行基于模型的LITHOGRAPHY指导布局设计的方法
    • US20100203430A1
    • 2010-08-12
    • US12663121
    • 2008-06-03
    • Jun YeYu CaoHanying Feng
    • Jun YeYu CaoHanying Feng
    • G03F1/00G06F17/50
    • G06F17/5009G03F1/36G03F7/70433G03F7/70441G03F7/70666
    • Methods are disclosed to create efficient model-based Sub-Resolution Assist Features (MB-SRAF). An SRAF guidance map is created, where each design target edge location votes for a given field point on whether a single-pixel SRAF placed on this field point would improve or degrade the aerial image over the process window. In one embodiment, the SRAF guidance map is used to determine SRAF placement rules and/or to fine-tune already-placed SRAFs. The SRAF guidance map can be used directly to place SRAFs in a mask layout. Mask layout data including SRAFs may be generated, wherein the SRAFs are placed according to the SRAF guidance map. The SRAF guidance map can comprise an image in which each pixel value indicates whether the pixel would contribute positively to edge behavior of features in the mask layout if the pixel is included as part of a sub-resolution assist feature.
    • 公开了创建有效的基于模型的子分辨率辅助特征(MB-SRAF)的方法。 创建SRAF指南图,其中每个设计目标边缘位置对于给定的场点投票,放置在该场点上的单像素SRAF是否将改善或降级过程窗口上的空中图像。 在一个实施例中,SRAF引导图用于确定SRAF放置规则和/或微调已经放置的SRAF。 SRAF引导图可以直接用于将SRAF放置在掩码布局中。 可以生成包括SRAF的掩模布局数据,其中根据SRAF引导图放置SRAF。 SRAF引导图可以包括图像,其中每个像素值指示如果像素被包括为子分辨率辅助特征的一部分,则像素是否将对掩模布局中的特征的边缘行为贡献积极。
    • 64. 发明申请
    • METHODS AND SYSTEM FOR MODEL-BASED GENERIC MATCHING AND TUNING
    • 基于模型的通用匹配和调谐的方法和系统
    • US20100146475A1
    • 2010-06-10
    • US12613285
    • 2009-11-05
    • Yu CaoHanying FengJun Ye
    • Yu CaoHanying FengJun Ye
    • G06F17/50
    • G06F17/5081G03F1/144G03F1/36G03F1/70G03F7/70483G03F7/705G03F7/70525G03F7/70991G06F17/5068
    • The present invention relates to a method for tuning lithography systems so as to allow different lithography systems to image different patterns utilizing a known process that does not require a trial and error process to be performed to optimize the process and lithography system settings for each individual lithography system. According to some aspects, the present invention relates to a method for a generic model-based matching and tuning which works for any pattern. Thus it eliminates the requirements for CD measurements or gauge selection. According to further aspects, the invention is also versatile in that it can be combined with certain conventional techniques to deliver excellent performance for certain important patterns while achieving universal pattern coverage at the same time.
    • 本发明涉及一种用于调整光刻系统的方法,以便允许不同的光刻系统利用不需要进行试验和误差处理的已知工艺对不同的图案进行成像,以优化每个单独光刻的工艺和光刻系统设置 系统。 根据一些方面,本发明涉及一种用于任何模式的基于模型的通用匹配和调整的方法。 因此,它消除了对CD测量或量规选择的要求。 根据其它方面,本发明也是通用的,因为它可以与某些常规技术相结合,以在同时实现通用图案覆盖的同时为某些重要图案提供优异的性能。
    • 65. 发明申请
    • METHODS AND SYSTEM FOR LITHOGRAPHY CALIBRATION
    • LITHOGRAPHY校准的方法和系统
    • US20100119961A1
    • 2010-05-13
    • US12613221
    • 2009-11-05
    • Jun YEYu CaoHanying Feng
    • Jun YEYu CaoHanying Feng
    • G03F7/20G03B27/32
    • G06F17/50G03F1/144G03F1/36G03F1/68G03F7/70433G03F7/705G03F7/70516
    • A method of efficient optical and resist parameters calibration based on simulating imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and generating the simulated image utilizing the function, where the simulated image represents the imaging result of the target design for the lithographic process. Systems and methods for calibration of lithographic processes whereby a polynomial fit is calculated for a nominal configuration of the optical system and which can be used to estimate critical dimensions for other configurations.
    • 一种基于模拟用于对具有多个特征进行成像的目标设计的光刻工艺的成像性能的有效的光学和抗蚀剂参数校准的方法。 该方法包括以下步骤:确定用于产生模拟图像的功能,其中该功能考虑到与光刻工艺相关联的工艺变化; 并利用该功能产生模拟图像,其中模拟图像表示用于光刻工艺的目标设计的成像结果。 用于校准光刻过程的系统和方法,由此针对光学系统的标称配置计算多项式拟合,并且其可以用于估计其他配置的关键尺寸。
    • 68. 发明授权
    • Method for lithography model calibration
    • 光刻模型校准方法
    • US07488933B2
    • 2009-02-10
    • US11461929
    • 2006-08-02
    • Jun YeYu CaoGuangqing ChenStefan Hunsche
    • Jun YeYu CaoGuangqing ChenStefan Hunsche
    • G12B13/00
    • G03F7/70516G03F7/705
    • A method for separately calibrating an optical model and a resist model of lithography process using information derived from in-situ aerial image measurements to improve the calibration of both the optical model and the resist model components of the lithography simulation model. Aerial images produced by an exposure tool are measured using an image sensor array loaded into the exposure tool. Multiple embodiments of measuring aerial image information and using the measured aerial image information to calibrate the optical model and the resist model are disclosed. The method of the invention creates more accurate and separable optical and resist models, leading to better predictability of the pattern transfer process from mask to wafer, more accurate verification of circuit patterns and how they will actually print in production, and more accurate model-based process control in the wafer fabrication facility.
    • 使用从原位空间图像测量得到的信息分别校准光学模型和光刻工艺的抗蚀剂模型的方法,以改进光刻模拟和光刻模拟模型的抗蚀剂模型组件的校准。 使用装载到曝光工具中的图像传感器阵列来测量由曝光工具产生的空中影像。 公开了测量空间图像信息和使用所测量的空间图像信息来校准光学模型和抗蚀剂模型的多个实施例。 本发明的方法创建更精确和可分离的光学和抗蚀剂模型,导致从掩模到晶片的图案转移过程更好的可预测性,电路图案的更准确的验证以及它们将如何在生产中实际打印,以及更准确的基于模型 晶圆制造设备中的过程控制。
    • 70. 发明申请
    • Searching with Consideration of User Convenience
    • 考虑用户便利性的搜索
    • US20070282813A1
    • 2007-12-06
    • US11694930
    • 2007-03-30
    • Yu CaoFeng LuKai LuWoodrow Cannon
    • Yu CaoFeng LuKai LuWoodrow Cannon
    • G06F17/30
    • G06Q30/0273G06F16/951G06Q30/0275G06Q30/0277
    • A system that enables the search for providers of services or products, for a given user query that's in free text, and typically the services or products are focused on a particular area, such as an industry, a sector, etc. The system thus enables a searcher to submit queries that are substantially similar to those asked to an expert in the area, and get back results that are helpful in their decision making in obtaining services or products. Thus the searcher's experience is substantially similar to that of consulting a human expert. The system employs methods in matching and placing advertisements in relation to user queries and the concepts contained in these queries. Still further, it employs other various methods to enhance the searcher's effectiveness in their decision making. Finally, the system searches for queries that are composes of at least two languages. The system further comprises a method to (a) turn a large number of records, typically web pages crawled from the entire Web, into hundreds or even thousands of logical partitions, where each partition is associated with an identifier; and (b) take a user query that typically contains an identifier or several identifiers, and match records in those partitions with the identifier(s), or alternatively, take a user query, return multiple results, and then take the user's selection of identifier(s) and re-process the results so that only those associated with the selected identifier(s) are returned to the user.
    • 一种能够搜索服务或产品提供商的系统,针对给定的用户查询是免费文本,通常是服务或产品集中在一个特定的领域,如行业,部门等。因此,系统启用 搜索者提交与该地区的专家所提出的查询大致相似的查询,并返回有助于他们在获取服务或产品方面的决策。 因此,搜索者的经验与咨询人类专家的经验基本相似。 该系统采用与用户查询和这些查询中包含的概念相匹配和放置广告的方法。 此外,它采用其他各种方法来提高搜索者在决策中的有效性。 最后,系统搜索至少包含两种语言的查询。 该系统还包括以下方法:(a)将大量记录(通常是从整个Web爬行的网页)转换成数百或甚至数千个逻辑分区,其中每个分区与标识符相关联; (b)采取通常包含标识符或多个标识符的用户查询,并在具有标识符的那些分区中匹配记录,或者替代地,进行用户查询,返回多个结果,然后取得用户对标识符的选择 并重新处理结果,使得只有与所选择的标识符相关联的那些被返回给用户。