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61. 再颁专利

USRE42065E1 Illumination system particularly for microlithography 失效
标题翻译：照明系统特别适用于微光刻
公开(公告)号：USRE42065E1
公开(公告)日：2011-01-25
申请号：US11981032
申请日：2001-09-28
申请人： Martin Antoni , Wolfgang Singer , Johannes Wangler
发明人： Martin Antoni , Wolfgang Singer , Johannes Wangler
IPC分类号： G03B27/42 , G03B27/54 , G21K5/00
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/70891 , G21K1/067 , G21K2201/06 , G21K2201/064
摘要： There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed at least partially on a field in the image plane. The second optical component comprises a first optical system that includes at least a third field mirror with positive optical power and a second optical system that includes at least a second field mirror with positive optical power. The first optical system images the plurality of secondary light sources in a plane between the first optical system and the second optical system, forming a plurality of tertiary light sources, and the second optical system images the plurality of tertiary light sources in the exit pupil.
摘要翻译：提供了一种用于具有波长＆nlE; 193nm的微光刻的照明系统。照明系统包括主光源，第一光学部件，第二光学部件，图像平面和出射光瞳。第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，产生至少部分地叠加在像平面中的场上的多个图像。第二光学部件包括第一光学系统，其包括具有正光焦度的至少第三场反射镜和包括至少具有正光焦度的第二场反射镜的第二光学系统。第一光学系统在第一光学系统和第二光学系统之间的平面内成像多个次级光源，形成多个第三光源，并且第二光学系统在出射光瞳中成像多个第三光源。

62. 再颁专利

USRE41667E1 Illumination system particularly for microlithography 失效
标题翻译：照明系统特别适用于微光刻
公开(公告)号：USRE41667E1
公开(公告)日：2010-09-14
申请号：US11981033
申请日：2001-09-28
申请人： Martin Antoni , Wolfgang Singer , Johannes Wangler
发明人： Martin Antoni , Wolfgang Singer , Johannes Wangler
IPC分类号： G03F7/20 , G21K5/04 , G21K1/06
CPC分类号： G21K1/06 , B82Y10/00 , G02B27/0905 , G02B27/0961 , G02B27/0983 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G03F7/70891 , G21K1/067 , G21K2201/06 , G21K2201/064
摘要： There is provided an illumination system for microlithography with wavelengths≦193 nm that includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical element and the second optical element are reflective. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed, at least partially, on a field in the image plane. The first optical component includes a collector unit and a second optical element having a plurality of second raster elements. The illumination system also includes a first optical axis between the collector unit and the first optical element, a second optical axis between the first optical element and the second optical element, and a third optical axis between the second optical element and the second optical component. A directional vector of the first optical axis and a directional vector of the second optical axis define a plane and wherein the first and second optical elements are tilted to cause a crossing of the projection of the third optical axis in to the plane and the first optical axis.
摘要翻译：提供了一种用于微波光刻的照明系统，其具有包括初级光源，第一光学部件，第二光学部件，图像平面和出射光瞳的波长＆amp; 193nm。第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。第一光学元件和第二光学元件是反射性的。第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，至少部分地叠加在图像平面中的场上产生多个图像。第一光学部件包括收集器单元和具有多个第二光栅元件的第二光学元件。所述照明系统还包括在所述收集单元与所述第一光学元件之间的第一光轴，所述第一光学元件和所述第二光学元件之间的第二光轴以及所述第二光学元件和所述第二光学元件之间的第三光轴。第一光轴的方向矢量和第二光轴的方向矢量限定一个平面，并且其中第一和第二光学元件被倾斜以使第三光轴的投影与平面交叉，并且第一光学轴。

63. 发明授权

US07542217B2 Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统的光束整形单元
公开(公告)号：US07542217B2
公开(公告)日：2009-06-02
申请号：US11015312
申请日：2004-12-17
申请人： Wolfgang Singer , Markus Deguenther , Birgit Kuerz , Rafael Egger , Johannes Wangler , Manfred Maul
发明人： Wolfgang Singer , Markus Deguenther , Birgit Kuerz , Rafael Egger , Johannes Wangler , Manfred Maul
IPC分类号： G02B13/08 , G02B3/02 , G02B9/00 , G02B3/00 , G03B27/54
CPC分类号： G03F7/70108 , G03F7/70183
摘要： A beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus includes a first beam reshaping element having a first beam reshaping surface and a second beam reshaping element having a second beam reshaping surface which faces the first beam reshaping surface. The two beam reshaping surfaces are rotationally symmetrical with respect to an optical axis of the beam reshaping unit. At least the first beam reshaping surface has a concavely or convexly curved region.
摘要翻译：用于微光刻投影曝光装置的照明系统的光束整形单元包括具有第一光束重塑表面的第一光束重塑元件和具有面向第一光束重塑表面的第二光束重塑表面的第二光束重塑元件。两个光束整形表面相对于光束整形单元的光轴旋转对称。至少第一光束整形表面具有凹或凸曲面的区域。

64. 发明授权

US07473907B2 Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination 有权
标题翻译：波长<= 193 nm的照明系统，具有用于确定照明的传感器
公开(公告)号：US07473907B2
公开(公告)日：2009-01-06
申请号：US11091238
申请日：2005-03-28
申请人： Wolfgang Singer , Martin Antoni , Johannes Wangler , Markus Weiss , Vadim Yevgenyevich Banine , Marcel Dierichs , Roel Moors , Karl Heinz Schuster , Axel Scholz , Philipp Bosselmann , Bernd Warm
发明人： Wolfgang Singer , Martin Antoni , Johannes Wangler , Markus Weiss , Vadim Yevgenyevich Banine , Marcel Dierichs , Roel Moors , Karl Heinz Schuster , Axel Scholz , Philipp Bosselmann , Bernd Warm
IPC分类号： G01G1/00 , G01J1/42
CPC分类号： G03F7/7085 , G03F7/70141 , G03F7/70558
摘要： There is provided an illumination system that includes (a) a light source that emits light having a wavelength ≦193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.
摘要翻译：提供了一种照明系统，其包括（a）发射波长<= 193nm的光的光源，其中所述光在远离光源的平面中提供预定照明并且在平面中限定使用区域，以及（b）位于或靠近平面的传感器，用于检测使用区域外的光。

65. 发明授权

US07456408B2 Illumination system particularly for microlithography 有权
公开(公告)号：US07456408B2
公开(公告)日：2008-11-25
申请号：US12009984
申请日：2008-01-23
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
IPC分类号： G02B27/14 , G02B5/30 , G02B17/00
CPC分类号： B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
摘要： There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.

66. 发明申请

US20080225258A1 EUV illumination system having a folding geometry 审中-公开
标题翻译： EUV照明系统具有折叠几何形状
公开(公告)号：US20080225258A1
公开(公告)日：2008-09-18
申请号：US12072592
申请日：2008-02-27
申请人： Wolfgang Singer , Martin Antoni , Johannes Wangler
发明人： Wolfgang Singer , Martin Antoni , Johannes Wangler
IPC分类号： G03B27/54
CPC分类号： B82Y10/00 , G03B27/54 , G03F7/70083 , G03F7/70166 , G03F7/702 , G03F7/70233 , G21K2201/061
摘要： There is provided an illumination system. The illumination system includes a source of light having a wavelength of less than or equal to about 193 nm, a first facet, a second facet, and a reflective element. The light is incident on the first facet via a first path, propagates from the first facet to the second facet via a second path, and propagates from the second facet to the reflective element via a third path. The second path and the third path are in substantially opposite directions from one another and substantially parallel to each other.
摘要翻译：提供照明系统。照明系统包括波长小于或等于约193nm的光源，第一刻面，第二刻面和反射元件。光通过第一路径入射在第一刻面上，经由第二路径从第一刻面传播到第二刻面，并且经由第三路径从第二面传播到反射元件。第二路径和第三路径彼此基本上相反的方向并且基本上彼此平行。

67. 发明授权

US07348565B2 Illumination system particularly for microlithography 有权
标题翻译：照明系统特别适用于微光刻
公开(公告)号：US07348565B2
公开(公告)日：2008-03-25
申请号：US11649199
申请日：2007-01-03
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
IPC分类号： G02B27/14 , G02B5/30 , G02B17/00
CPC分类号： B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
摘要： There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element is situated in or near a plane defined by the real entrance pupil.
摘要翻译：提供了使用波长小于或等于193nm的微光刻的投影曝光装置。该装置包括具有光瞳光栅元件的光学元件和具有真实入射光瞳的投影物镜。光学元件位于由真正的入射光瞳限定的平面内或附近。

68. 发明申请

US20070146853A1 Optical device with raster elements, and illumination system with the optical device 有权
标题翻译：具有光栅元件的光学装置，以及具有光学装置的照明系统
公开(公告)号：US20070146853A1
公开(公告)日：2007-06-28
申请号：US11598180
申请日：2006-11-10
申请人： Wolfgang Singer , Johannes Wangler , Markus Deguenther , Birgit Kuerz , Christoph Menke
发明人： Wolfgang Singer , Johannes Wangler , Markus Deguenther , Birgit Kuerz , Christoph Menke
IPC分类号： G02B26/08
CPC分类号： G02B27/0961 , G02B17/0657 , G02B27/0983 , G03F7/70075
摘要： The invention relates to an optical device that includes (a) a first optical element with at least one first raster element, where the first raster element has a first axis, (b) a second optical element with at least one second raster element, where the second raster element has a second axis. The first raster element can be changed in its position relative to the second raster element, so that a distance between the first axis and the second axis is variable.
摘要翻译：本发明涉及一种光学装置，其包括（a）具有至少一个第一光栅元件的第一光学元件，其中第一光栅元件具有第一轴，（b）具有至少一个第二光栅元件的第二光学元件，其中第二光栅元件具有第二轴。可以将第一光栅元件相对于第二光栅元件的位置改变，使得第一轴与第二轴之间的距离是可变的。

69. 发明申请

US20070024836A1 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置照明系统
公开(公告)号：US20070024836A1
公开(公告)日：2007-02-01
申请号：US11460644
申请日：2006-07-28
申请人： Wolfgang Singer , Johannes Wangler
发明人： Wolfgang Singer , Johannes Wangler
IPC分类号： G03B27/54
CPC分类号： G03F7/70108 , G03F7/70158
摘要： An Illumination system for a microlithographic projection exposure apparatus has a light source and a first optical raster element that is positioned in or in close proximity to a first plane. The first plane is conjugated to a pupil plane of the illumination system by Fourier transformation. A second optical raster element is positioned in or in close proximity to the pupil plane. A third optical raster element is positioned in or in close proximity to a second plane that is also conjugated to the pupil plane by Fourier transformation. The third optical raster element, which can be a diffractive optical element, introduces an additional degree of design freedom for the modification of the angular distribution of the projection light bundle.
摘要翻译：用于微光刻投影曝光装置的照明系统具有光源和位于第一平面中或紧邻第一平面的第一光栅元件。第一平面通过傅里叶变换与照明系统的光瞳平面共轭。第二光栅元件位于或靠近瞳孔平面。第三光栅元件位于或接近第二平面，第二平面也通过傅里叶变换与光瞳平面共轭。可以是衍射光学元件的第三光栅元件引入了用于修改投影光束的角分布的附加设计自由度。

70. 发明授权

US06964485B2 Collector for an illumination system with a wavelength of less than or equal to 193 nm 有权
标题翻译：用于波长小于或等于193nm的照明系统的集电极
公开(公告)号：US06964485B2
公开(公告)日：2005-11-15
申请号：US10055608
申请日：2002-01-23
申请人： Wolfgang Singer , Johannes Wangler
发明人： Wolfgang Singer , Johannes Wangler
IPC分类号： G02B5/10 , G02B5/09 , G02B17/06 , G02B19/00 , G03F1/16 , G03F7/20 , G21K1/06 , G21K5/00 , G21K5/02 , G21K5/04 , H01L21/027 , G02B7/182
CPC分类号： G21K1/06 , B82Y10/00 , G02B5/09 , G02B17/006 , G02B19/0014 , G02B19/0019 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70108 , G03F7/70158 , G03F7/70166 , G03F7/70175 , G03F7/702 , G03F7/70233 , G03F7/70825 , G21K2201/065 , G21K2201/067
摘要： There is provided a collector for guiding light with a wavelength of ≦193 nm onto a plane. The collector includes a first mirror shell for receiving a first ring aperture section of the light and irradiating a first planar ring section of the plane with a first irradiance, and a second mirror shell for receiving a second ring aperture section of the light and irradiating a second planar ring section of the plane with a second irradiance. The first and second mirror shells are rotationally symmetrical and concentrically arranged around a common axis of rotation, the first and second ring aperture sections do not overlap with one another, the first planar ring section substantially abuts the second planar ring section, and the first irradiance is approximately equal to the second irradiance.
摘要翻译：提供了用于将波长<= 193nm的光引导到平面上的收集器。收集器包括第一反射镜壳体，用于接收光的第一环孔部分并以第一辐照度照射平面的第一平面环部分，以及用于接收光的第二环孔部分并照射光具有第二辐照度的平面的第二平面环部分。第一和第二镜壳围绕公共旋转轴线旋转对称并且同心地布置，第一和第二环孔部分彼此不重叠，第一平面环部分基本上邻接第二平面环部分，并且第一辐照度大约等于第二辐照度。

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