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61. 发明授权

US06808869B1 Bottom anti-reflective coating material composition and method for forming resist pattern using the same 失效
标题翻译：底部防反射涂料组合物和使用其形成抗蚀剂图案的方法
公开(公告)号：US06808869B1
公开(公告)日：2004-10-26
申请号：US09615708
申请日：2000-07-13
申请人： Kazuyoshi Mizutani , Makoto Momota
发明人： Kazuyoshi Mizutani , Makoto Momota
IPC分类号： G03F711
CPC分类号： G03F7/091
摘要： A composition for a bottom anti-reflective coating material and a method for forming a resist pattern using the composition, which are high in the dry etching rate, high in the resolution, excellent in the resist film thickness dependency and high in the effect of preventing reflective light against exposure light, and provide no intermixing with the photoresist layer, are disclosed, wherein the composition for a bottom anti-reflective coating material comprises a naphthalene group-containing polymer compound having a specific structure.
摘要翻译：用于底部抗反射涂层材料的组合物和使用该组合物形成抗蚀剂图案的方法，其干蚀刻速率高，分辨率高，抗蚀剂膜厚度依赖性优异，防止效果高公开了防曝光的反射光，并且不提供与光致抗蚀剂层的混合，其中用于底部抗反射涂层材料的组合物包含具有特定结构的含萘基的聚合物化合物。

62. 发明授权

US06387590B1 Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06387590B1
公开(公告)日：2002-05-14
申请号：US09671177
申请日：2000-09-28
申请人： Kazuyoshi Mizutani , Shoichiro Yasunami
发明人： Kazuyoshi Mizutani , Shoichiro Yasunami
IPC分类号： G03F7004
CPC分类号： G03F7/0757 , G03F7/0392
摘要： Disclosed is a positive photoresist composition comprising a polysiloxane containing as a copolymerization component at least a structural unit represented by the following formula (I): wherein L represents a single bond or an arylene group, A′ represents an aromacyclic or alicyclic structure which may have a substituent, and n represents an integer of 1 to 6.
摘要翻译：公开了一种正型光致抗蚀剂组合物，其包含至少由下式（I）表示的结构单元作为共聚成分的聚硅氧烷：其中L表示单键或亚芳基，A'表示可具有的单环或脂环结构取代基，n表示1〜6的整数。

63. 发明授权

US06346363B2 Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06346363B2
公开(公告)日：2002-02-12
申请号：US09729178
申请日：2000-12-05
申请人： Kazuyoshi Mizutani , Shoichiro Yasunami
发明人： Kazuyoshi Mizutani , Shoichiro Yasunami
IPC分类号： G03F7004
CPC分类号： G03F7/0757 , G03F7/0045
摘要： A positive type photoresist composition comprising an alkali-soluble or acid-decomposable polysiloxane containing repeating structural units represented by formula (I): wherein L represents at least one divalent connecting group selected from the group consisting of —A—NHCO—, —A—NHCOO— and —A—NHCONH—, wherein A represents a single bond, an alkylene group or an arylene group; X represents a single bond or a divalent connecting group; and Z represents either a group represented by or a group represented by wherein Y represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group, an atomic group represented by Y may be straight-chain, branched or cyclic, R represents a hydrogen atom or an acid-decomposable group, l represents an integer of from 1 to 3, and m also represents an integer of from 1 to 3.
摘要翻译：一种正型光致抗蚀剂组合物，其包含含有由式（I）表示的重复结构单元的碱溶性或酸可分解聚硅氧烷：其中L表示至少一个选自-A-NHCO-，-A- NHCOO-和-A-NHCONH-，其中A表示单键，亚烷基或亚芳基; X表示单键或二价连接基团; Z表示由Y代表氢原子，烷基，芳基或芳烷基表示的基团，由Y表示的原子团可以是直链，支链或环状的，R表示氢原子原子或酸可分解基团，l表示1〜3的整数，m也表示1〜3的整数。

64. 发明授权

US6132935A Negative-working image recording material 失效
标题翻译：负工作图像记录材料
公开(公告)号：US6132935A
公开(公告)日：2000-10-17
申请号：US691371
申请日：1996-08-02
申请人： Fumikazu Kobayashi , Kazuyoshi Mizutani , Keitaro Aoshima
发明人： Fumikazu Kobayashi , Kazuyoshi Mizutani , Keitaro Aoshima
IPC分类号： B41C1/10 , B41M5/36 , G03C1/73
CPC分类号： B41C1/1008 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/145 , Y10S430/146
摘要： A negative-working image recording material is disclosed, which comprises a substance which absorbs light to generate heat, a water-insoluble and aqueous alkali-soluble resin, and a phenol derivative having in its molecule from 4 to 8 benzene rings, at least one phenolic hydroxyl group and at least two groups represented by the following general formula (I):--CH.sub.2 OR.sup.1 (I)wherein R.sup.1 represents a hydrogen atom, an alkyl group or an acyl group. The negative-working image recording material can perform recording independent of the emission wavelength of the exposing light source, particularly with light in the range of from near infrared to infrared (heat irradiation).
摘要翻译：公开了一种负性图像记录材料，其包括吸收光以产生热的物质，水不溶性和碱溶性水溶性树脂，以及分子中具有4至8个苯环的苯酚衍生物，至少一种酚羟基和由以下通式（I）表示的至少两个基团：-CH 2 OR 1（I）其中R 1表示氢原子，烷基或酰基。负工作图像记录材料可以独立于曝光光源的发射波长执行记录，特别是在近红外到红外（热照射）的范围内的光。

65. 发明授权

US5460917A Positive working photosensitive lithographic printing plate utilizing phenol derivative compound containing photosensitive composition 失效
标题翻译：使用含有感光性组合物的苯酚衍生物的正性感光性平版印刷版
公开(公告)号：US5460917A
公开(公告)日：1995-10-24
申请号：US296425
申请日：1994-08-26
申请人： Fumikazu Kobayashi , Kazuyoshi Mizutani , Akira Nagashima
发明人： Fumikazu Kobayashi , Kazuyoshi Mizutani , Akira Nagashima
IPC分类号： G03F7/00 , G03F7/004 , G03F7/022 , G03F7/039 , G03F7/023
CPC分类号： G03F7/0226
摘要： A positive working photosensitive lithographic printing plate comprising a support having thereon a photosensitive layer comprising a positive photosensitive composition, wherein the positive photosensitive composition comprises a mixture of (a) a phenol derivative, (b) a water-soluble and aqueous alkali-soluble resin, and (c) o-quinonediazide or a mixture of a compound capable of forming an acid on exposure and a compound having at least one C--O--C group which is decomposable with an acid, and wherein the phenol derivative is a mixture of a compound represented by the following formula (I) and a compound represented by the following formula (II): ##STR1## wherein X.sup.1, X.sup.2, X.sup.3, X.sup.4, X.sup.5 and X.sup.6 are the same or different and each represents --CH.sub.2 OH or a hydrogen atom, provided that at least three of them are each --CH.sub.2 OH; ##STR2## wherein Y.sup.1, Y.sup.2, Y.sup.3, Y.sup.4, Y.sup.5 and Y.sup.6 are the same or different and each represents --CH.sub.2 OCH.sub.3, --CH.sub.2 OH or a hydrogen atom, provided that at least three of them are each --CH.sub.2 OCH.sub.3 or --CH.sub.2 OH, and at least one of the three is --CH.sub.2 OCH.sub.3.
摘要翻译：一种正性感光性平版印刷版，其特征在于，具有包含正性感光性组合物的感光层的支持体，其中，所述正性感光性组合物包含（a）苯酚衍生物，（b）水溶性和水溶性碱溶性树脂，和（c）邻醌二叠氮化合物或能够在暴露时形成酸的化合物与具有至少一个可与酸分解的COC基团的化合物的混合物，并且其中所述酚衍生物是由下式（I）表示的化合物和下式（II）表示的化合物：其中X 1，X 2，X 3，X 4，X 5和X 6相同或不同，各自表示-CH 2 OH或氢原子条件是它们中的至少三个各自为-CH 2 OH; 其中Y 1，Y 2，Y 3，Y 4，Y 5和Y 6相同或不同，各自表示-CH 2 OCH 3，-CH 2 OH或氢原子，条件是它们中至少有三个为-CH 2 OCH 3或-CH 2 OH ，三个中的至少一个是-CH 2 OCH 3。

66. 发明申请

US20120321855A1 PATTERN FORMING METHOD AND RESIST COMPOSITION 审中-公开
标题翻译：图案形成方法和阻力组成
公开(公告)号：US20120321855A1
公开(公告)日：2012-12-20
申请号：US13580921
申请日：2011-02-24
申请人： Kaoru Iwato , Shohei Kataoka , Shinji Tarutani , Sou Kamimura , Keita Kato , Yuichiro Enomoto , Kazuyoshi Mizutani , Toru Tsuchihashi , Kana Fujii
发明人： Kaoru Iwato , Shohei Kataoka , Shinji Tarutani , Sou Kamimura , Keita Kato , Yuichiro Enomoto , Kazuyoshi Mizutani , Toru Tsuchihashi , Kana Fujii
IPC分类号： G03F7/027 , B32B3/30 , G03F7/004 , G03F7/20 , C08F224/00
CPC分类号： G03F7/30 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/0757 , G03F7/0758 , G03F7/11 , G03F7/2041 , G03F7/325 , G03F7/38 , Y10T428/24479
摘要： Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.
摘要翻译：提供了形成图案的方法，确保优异的灵敏度，限制分辨率，粗糙度特性，曝光宽容度（EL），对曝光后烘烤（PEB）温度和聚焦宽度（焦深DOF）的依赖性以及抗蚀剂组合物用于该方法。该方法包括（A）由抗蚀剂组合物形成膜，所述抗蚀剂组合物含有含有重复单元的树脂，所述树脂含有当被酸作用时分解的基团，从而产生醇羟基，所述树脂当被酸作用时降低其在含有有机溶剂的显影剂中的溶解度，（B）将膜曝光，和（C）使用含有有机溶剂的显影剂显影曝光膜。

67. 发明申请

US20110081612A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH 有权
标题翻译：丙酸敏感或辐射敏感性树脂组合物及其形成方法
公开(公告)号：US20110081612A1
公开(公告)日：2011-04-07
申请号：US12895504
申请日：2010-09-30
申请人： Kana FUJII , Takamitsu Tomiga , Toru Tsuchihashi , Kazuyoshi Mizutani , Jiro Yokoyama , Shinichi Sugiyama , Shuji Hirano , Toru Fujimori
发明人： Kana FUJII , Takamitsu Tomiga , Toru Tsuchihashi , Kazuyoshi Mizutani , Jiro Yokoyama , Shinichi Sugiyama , Shuji Hirano , Toru Fujimori
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0392 , C08F8/12 , C08F12/22 , C08F214/18 , C08F220/18 , C08F220/22 , C08F220/32 , C08F2220/282 , C08K5/375 , C08K5/42 , C08L33/068 , C08L51/04 , C08L67/02 , C09D125/14 , C09D125/18 , G03F7/0045 , G03F7/0046 , C08F212/14 , C08F2220/1825 , C08F2220/185 , C08F220/14
摘要： According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.
摘要翻译：根据一个实施方案，光化射线敏感或辐射敏感性树脂组合物包含（A）含有式（I），（II）和（III）的重复单元的树脂，当被酸作用时，其变得易溶于碱显影剂和（B）当用光化射线或辐射照射时产生含氟酸的化合物，其中R 1各自独立地表示氢原子或任选取代的甲基，R 2表示卤素原子，任选地取代的烷基，任选取代的环烷基，任选取代的芳基或任选取代的芳烷基，n为0至5的整数，条件是当n为2或更大时，多个R 2可以相同或不同彼此。

68. 发明申请

US20110014570A1 RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权
标题翻译：使用它的耐蚀组合物和图案形成方法
公开(公告)号：US20110014570A1
公开(公告)日：2011-01-20
申请号：US12921354
申请日：2009-03-13
申请人： Kazuyoshi Mizutani , Jiro Yokoyama , Shinichi Sugiyama
发明人： Kazuyoshi Mizutani , Jiro Yokoyama , Shinichi Sugiyama
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0045 , C08F8/12 , C08F12/24 , C09D125/14 , G03F7/0046 , G03F7/0392 , G03F7/0397 , C08F212/14 , C08F2220/1825
摘要： A resist composition and a pattern forming method using the composition are provided, the resist composition including: (A) a resin that decomposes by an action of an acid to increase a solubility of the resin (A) in an alkali developer; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a compound represented by formula (C1); and (D) a solvent: wherein n represents an integer of 1 to 6; w represents an integer of 1 to 6; p represents an integer of 1 to 6; m represents an integer of 1 to 6; Ra, Rb, Rc and Rd each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group, provided that Ra and Rb may combine together to form a ring, and Rc and Rd may combine together to form a ring.
摘要翻译：提供了使用该组合物的抗蚀剂组合物和图案形成方法，该抗蚀剂组合物包括：（A）通过酸的作用分解以提高树脂（A）在碱性显影剂中的溶解度的树脂; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; （C）由式（C1）表示的化合物; 和（D）溶剂：其中n表示1至6的整数; w表示1〜6的整数， p表示1〜6的整数， m表示1〜6的整数， Ra，Rb，Rc和Rd各自独立地表示氢原子，烷基，环烷基，芳基或芳烷基，条件是Ra和Rb可以结合在一起形成环，Rc和Rd可以结合在一起形成一个戒指。

69. 发明授权

US07625690B2 Positive resist composition and pattern forming method using the same 有权
标题翻译：正型抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US07625690B2
公开(公告)日：2009-12-01
申请号：US11717618
申请日：2007-03-14
申请人： Kazuyoshi Mizutani , Kaoru Iwato , Kunihiko Kodama , Masaomi Makino , Toru Tsuchihashi
发明人： Kazuyoshi Mizutani , Kaoru Iwato , Kunihiko Kodama , Masaomi Makino , Toru Tsuchihashi
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0392 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents an aryl group; Rn represents an alkyl group, a cycloalkyl group or an aryl group; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.
摘要翻译：一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中AR表示芳基; Rn表示烷基，环烷基或芳基; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

70. 发明授权

US07592118B2 Positive resist composition and pattern forming method using the same 有权
标题翻译：正型抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US07592118B2
公开(公告)日：2009-09-22
申请号：US12053675
申请日：2008-03-24
申请人： Kazuyoshi Mizutani , Shuji Hirano , Shinichi Sugiyama
发明人： Kazuyoshi Mizutani , Shuji Hirano , Shinichi Sugiyama
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/091 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (B) in an aqueous alkali solution; and (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method uses the composition.
摘要翻译：正型抗蚀剂组合物包括：（B）含有本说明书中定义的由式（Ia）或（Ib）表示的重复单元的树脂，其在酸的作用下分解以增加树脂（B）的溶解度，在碱性水溶液中; 和（A）能够在用光化射线或辐射照射时能够产生酸的化合物，并且图案形成方法使用该组合物。

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