会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 62. 发明授权
    • Force sense presentation device, mixed reality system, information processing method, and information processing apparatus
    • 力感知呈现装置,混合现实系统,信息处理方法和信息处理装置
    • US07920124B2
    • 2011-04-05
    • US11846133
    • 2007-08-28
    • Toshinobu TokitaAtsushi NogamiNaoki Nishimura
    • Toshinobu TokitaAtsushi NogamiNaoki Nishimura
    • G09G5/00
    • G06F3/016G06F3/011G06F3/0346
    • A force sense presentation device for presenting a sense of force in virtual space to a user, comprises: a fixed unit which is gripped by the user; a force sense presentation unit which presents a sense of force; an actuator which supplies a driving force and operates the force sense presentation unit relative to the fixed unit; a joint unit which is provided between the fixed unit and the force sense presentation unit, and guides the relative operation of the force sense presentation unit; and a force sense rendering unit which controls the relative operation of the force sense presentation unit by the actuator, wherein the force sense presentation device simulates a device which is gripped and used by the user, and the force sense rendering unit controls the relative operation of the force sense presentation unit based on a position and orientation of the device in the virtual space.
    • 一种用于向用户呈现虚拟空间中的力感觉的力感知呈现装置,包括:由用户抓住的固定单元; 呈现力的力感知呈现单元; 提供驱动力并相对于固定单元操作力检测表示单元的致动器; 连接单元,其设置在所述固定单元和所述力检测表示单元之间,并且引导所述力感测呈现单元的相对操作; 以及力感觉渲染单元,其通过所述致动器来控制所述力感测呈现单元的相对操作,其中所述力感测呈现装置模拟由所述用户抓握并使用的装置,并且所述力感觉渲染单元控制所述力感测呈现单元的相对操作 基于所述虚拟空间中的所述设备的位置和方向的所述力感知呈现单元。
    • 63. 发明授权
    • Exposure apparatus and method
    • 曝光装置和方法
    • US07751028B2
    • 2010-07-06
    • US11622977
    • 2007-01-12
    • Toshinobu Tokita
    • Toshinobu Tokita
    • G03B27/52G03B27/42G03B27/72G03B27/32
    • G03F7/70341
    • An exposure method includes the steps of introducing fluid to a space between a surface of an object to be exposed, and a final surface of a projection optical system, projecting a pattern on a mask onto the object via the projection optical system and the fluid, wherein the introducing step includes the steps of filling the fluid in the space between the surface of the object and the final surface of the projection optical system, and wherein the filling step changes a capillary attraction of the fluid different from the capillary attraction that operates during the projection step.
    • 曝光方法包括以下步骤:将待曝光物体的表面和投影光学系统的最终表面之间的空间引入到通过投影光学系统和流体将掩模上的图案投射到物体上的步骤; 其中所述引入步骤包括以下步骤:将所述流体填充在所述物体的表面与所述投影光学系统的最终表面之间的空间中,并且其中所述填充步骤改变与所述流体不同的毛细管吸引力的毛细吸引力 投影步骤。
    • 66. 发明授权
    • Liquid immersion type exposure apparatus
    • 液浸式曝光装置
    • US07053983B2
    • 2006-05-30
    • US10931572
    • 2004-09-01
    • Toshinobu Tokita
    • Toshinobu Tokita
    • G03B27/42G03B27/52
    • G03F7/70341
    • Disclosed is an exposure apparatus which includes a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of the projection optical system which optical element is nearest to the substrate, a supplying system for supplying a liquid medium, a collecting system for collecting a liquid medium, and an exhausting system for removing a bubble in the liquid medium through a bubble removing material having such property that it passes a gas but it does not pass a liquid.
    • 公开了一种曝光装置,其包括用于将掩模版图案投影到基板上的投影光学系统,其中基板通过至少保持在基板和投影光学系统的光学元件之间的部分中的液体介质曝光, 光学元件最靠近基板,用于供应液体介质的供应系统,用于收集液体介质的收集系统和用于通过具有这样的特性的除泡材料去除液体介质中的气泡的排气系统 气体,但它不通过液体。
    • 67. 发明申请
    • Liquid immersion type exposure apparatus
    • 液浸式曝光装置
    • US20050233081A1
    • 2005-10-20
    • US10931572
    • 2004-09-01
    • Toshinobu Tokita
    • Toshinobu Tokita
    • B05D5/00G03F7/20H01L21/027
    • G03F7/70341
    • Disclosed is an exposure apparatus which includes a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of the projection optical system which optical element is nearest to the substrate, a supplying system for supplying a liquid medium, a collecting system for collecting a liquid medium, and an exhausting system for removing a bubble in the liquid medium through a bubble removing material having such property that it passes a gas but it does not pass a liquid.
    • 公开了一种曝光装置,其包括用于将掩模版图案投影到基板上的投影光学系统,其中基板通过至少保持在基板和投影光学系统的光学元件之间的部分中的液体介质曝光, 光学元件最靠近基板,用于供应液体介质的供应系统,用于收集液体介质的收集系统和用于通过具有这样的特性的除泡材料去除液体介质中的气泡的排气系统 气体,但它不通过液体。