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61. 发明申请

US20070194818A1 Phase locked loop circuit having set initial locking level and control method thereof 失效
标题翻译：具有设定初始锁定电平的锁相环电路及其控制方法
公开(公告)号：US20070194818A1
公开(公告)日：2007-08-23
申请号：US11640965
申请日：2006-12-19
申请人： Yong-Ju Kim , Kun-Woo Park , Hyung-Soo Kim , Ic-Su Oh , Hee-Woong Song , Jong-Woon Kim , Tae-Jin Hwang
发明人： Yong-Ju Kim , Kun-Woo Park , Hyung-Soo Kim , Ic-Su Oh , Hee-Woong Song , Jong-Woon Kim , Tae-Jin Hwang
IPC分类号： H03L7/06
CPC分类号： H03L7/107 , H03L7/1075
摘要： A phase locked loop circuit and a control method thereof. A phase locked loop circuit includes a phase detecting and correcting block configured to detect a phase difference between a reference clock and a feedback clock, and to correct the phase of the feedback clock such that the phase of the reference clock and the phase of the feedback clock are consistent with each other, and an initial locking level setting block configured to set a locking level in a normal operation mode in the phase detecting and correcting block. The initial locking level setting block includes a digital-to-analog converting unit configured to generate an analog voltage according to a digital code corresponding to the set frequency, and charges the capacitive element with the analog voltage, and a switching unit configured to connect the digital-to-analog converting unit and the capacitive element in response to an input of an operation start signal.
摘要翻译：一种锁相环电路及其控制方法。锁相环电路包括相位检测和校正块，被配置为检测参考时钟和反馈时钟之间的相位差，并且校正反馈时钟的相位，使得参考时钟的相位和反馈的相位时钟彼此一致，并且初始锁定电平设置块被配置为在相位检测和校正块中将正常操作模式中的锁定电平设置为1。初始锁定电平设置块包括数模转换单元，被配置为根据与设定频率相对应的数字码产生模拟电压，并且用模拟电压对电容元件充电;以及开关单元，被配置为将数字模拟转换单元和电容元件，以响应于操作开始信号的输入。

62. 发明授权

US08013593B2 Voltage measuring apparatus for semiconductor integrated circuit and voltage measuring system having the same 有权
标题翻译：具有该半导体集成电路和电压测量系统的电压测量装置
公开(公告)号：US08013593B2
公开(公告)日：2011-09-06
申请号：US11961988
申请日：2007-12-20
申请人： Hyung-Soo Kim , Yong-Ju Kim , Jong-Woon Kim , Hee-Woong Song , Ic-Su Oh , Tae-Jin Hwang
发明人： Hyung-Soo Kim , Yong-Ju Kim , Jong-Woon Kim , Hee-Woong Song , Ic-Su Oh , Tae-Jin Hwang
IPC分类号： G01R25/00
CPC分类号： G01R31/3004 , G01R29/26
摘要： A voltage measuring apparatus for a semiconductor integrated circuit includes a first delay unit configured to delay a reference clock in a first region, a second delay unit configured to delay the reference clock in a second region and an analysis unit configured to analyze a difference in voltage level between the regions based on the phases of associated with the delayed clock signals generated by the first and second delay units.
摘要翻译：一种用于半导体集成电路的电压测量装置包括：第一延迟单元，被配置为延迟第一区域中的参考时钟;第二延迟单元，被配置为在第二区域中延迟参考时钟;以及分析单元，被配置为分析电压差基于与由第一延迟单元和第二延迟单元生成的延迟时钟信号相关联的相位，区域之间的电平。

63. 发明授权

US07161660B2 Photolithography system and method of monitoring the same 有权
标题翻译：光刻系统及其监控方法相同
公开(公告)号：US07161660B2
公开(公告)日：2007-01-09
申请号：US11017783
申请日：2004-12-22
申请人： Yo-Han Ahn , Seok-Ryeul Lee , Jung-Sung Hwang , Tae-Jin Hwang , Byung-Moo Lee
发明人： Yo-Han Ahn , Seok-Ryeul Lee , Jung-Sung Hwang , Tae-Jin Hwang , Byung-Moo Lee
IPC分类号： G03B27/72
CPC分类号： G03F7/70558
摘要： A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.
摘要翻译：公开了一种在曝光过程中的掩模版的管理系统和方法。计算器计算照射到光刻工艺中使用的掩模版上的照射光的累积剂量。计算器连接到曝光装置以暴露半导体衬底上的光致抗蚀剂。比较器将计算的累积剂量与预设的参考剂量进行比较。当计算的累积剂量大于或等于参考剂量时，控制器暂停光刻工艺。最小化掩模版上的雾度污染，从而防止过程故障。

64. 发明授权

US08287774B2 Electrochromic pani films and process thereof 有权
标题翻译：电致变色薄膜及其工艺
公开(公告)号：US08287774B2
公开(公告)日：2012-10-16
申请号：US11919263
申请日：2007-10-15
申请人： Tae-Jin Hwang
发明人： Tae-Jin Hwang
IPC分类号： C09K9/00 , G02F1/00 , G02F1/153
CPC分类号： B41M5/20
摘要： A method of manufacturing an electrochromic polyaniline thin film changeable in color in dependency upon the supply of electricity is provided. The method comprises the steps of polymerizing aniline monomer into polyaniline polymer, separating the polyaniline polymer, liquefying the separated polyaniline polymer into a dispersing solution using a mixed surfactant, and dissolving an UV curing adhesive in the dispersing solution, whereby the polyaniline thin film has the ductility and improved adhesion force for an electric substrate, so that it is applicable to development of a flexible display and as a next generation hi-tech material.
摘要翻译：提供了一种根据电力供应制造可变色的电致变色聚苯胺薄膜的方法。该方法包括以下步骤：将苯胺单体聚合成聚苯胺聚合物，分离聚苯胺聚合物，使用混合表面活性剂将分离的聚苯胺聚合物液化成分散溶液，并将UV固化粘合剂溶解在分散溶液中，由此聚苯胺薄膜具有延展性和电气基板的附着力提高，因此适用于柔性显示器的开发和下一代高科技材料的开发。

65. 发明申请

US20100200818A1 Electrochromic pani films and process thereof 有权
标题翻译：电致变色薄膜及其工艺
公开(公告)号：US20100200818A1
公开(公告)日：2010-08-12
申请号：US11919263
申请日：2007-10-15
申请人： Tae-Jin Hwang
发明人： Tae-Jin Hwang
IPC分类号： G02F1/355
CPC分类号： B41M5/20
摘要： A method of manufacturing an electrochromic polyaniline thin film changeable in color in dependency upon the supply of electricity is provided. The method comprises the steps of polymerizing aniline monomer into polyaniline polymer, separating the polyaniline polymer, liquefying the separated polyaniline polymer into a dispersing solution using a mixed surfactant, and dissolving an UV curing adhesive in the dispersing solution, whereby the polyaniline thin film has the ductility and improved adhesion force for an electric substrate, so that it is applicable to development of a flexible display and as a next generation hi-tech material.
摘要翻译：提供了一种根据电力供应制造可变色的电致变色聚苯胺薄膜的方法。该方法包括以下步骤：将苯胺单体聚合成聚苯胺聚合物，分离聚苯胺聚合物，使用混合表面活性剂将分离的聚苯胺聚合物液化成分散溶液，并将UV固化粘合剂溶解在分散溶液中，由此聚苯胺薄膜具有延展性和电气基板的附着力提高，因此适用于柔性显示器的开发和下一代高科技材料的开发。

66. 发明授权

US07326284B2 Contamination control system and air-conditioning system of a substrate processing apparatus using the same 失效
标题翻译：使用其的基板处理装置的污染控制系统和空调系统
公开(公告)号：US07326284B2
公开(公告)日：2008-02-05
申请号：US10883584
申请日：2004-07-01
申请人： Tae-Jin Hwang , Jae-Hyun Yang , Jung-Sung Hwang , Hyun-Joon Kim , Yo-Han Ahn
发明人： Tae-Jin Hwang , Jae-Hyun Yang , Jung-Sung Hwang , Hyun-Joon Kim , Yo-Han Ahn
IPC分类号： B01D47/00
CPC分类号： F24F3/161 , B01D53/14 , B01D53/78 , B01D2255/802 , B01D2257/106 , B01D2257/302 , B01D2257/404 , B01D2257/406 , B01D2257/70 , F24F2003/1617 , F24F2006/006 , Y02A50/21
摘要： An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.
摘要翻译：基板处理装置的空调系统包括用于向洁净室提供空气的进气管线。用于除去空气中的污染物的污染控制装置连接到进气管线。控制器控制空气的温度和湿度，没有污染物。空气出口管路将具有受控温度和湿度的空气提供给设置在洁净室中的基板处理室。污染控制装置包括具有喷射水的至少一个喷嘴的喷射单元。至少一个消除器捕获水以捕获空气中的污染物并将被捕获的水滴入罐中。水循环单元提供包括用于控制喷雾单元的水的pH的添加剂的水。

67. 发明申请

US20050000243A1 Contamination control system and air-conditioning system of a substrate processing apparatus using the same 失效
标题翻译：使用其的基板处理装置的污染控制系统和空调系统
公开(公告)号：US20050000243A1
公开(公告)日：2005-01-06
申请号：US10883584
申请日：2004-07-01
申请人： Tae-Jin Hwang , Jae-Hyun Yang , Jung-Sung Hwang , Hyun-Joon Kim , Yo-Han Ahn
发明人： Tae-Jin Hwang , Jae-Hyun Yang , Jung-Sung Hwang , Hyun-Joon Kim , Yo-Han Ahn
IPC分类号： H01L21/02 , B01D53/14 , B01D53/78 , F24F3/16 , C10K1/08 , F22D1/28 , B01D47/00 , F02M23/14 , F02M31/00 , F25D17/04
CPC分类号： F24F3/161 , B01D53/14 , B01D53/78 , B01D2255/802 , B01D2257/106 , B01D2257/302 , B01D2257/404 , B01D2257/406 , B01D2257/70 , F24F2003/1617 , F24F2006/006 , Y02A50/21
摘要： An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.
摘要翻译：基板处理装置的空调系统包括用于向洁净室提供空气的进气管线。用于除去空气中的污染物的污染控制装置连接到进气管线。控制器控制空气的温度和湿度，没有污染物。空气出口管路将具有受控温度和湿度的空气提供给设置在洁净室中的基板处理室。污染控制装置包括具有喷射水的至少一个喷嘴的喷射单元。至少一个消除器捕获水以捕获空气中的污染物并将被捕获的水滴入罐中。水循环单元提供包括用于控制喷雾单元的水的pH的添加剂的水。

68. 发明申请

US20050134823A1 Photolithography system and method of monitoring the same 有权
标题翻译：光刻系统及其监控方法相同
公开(公告)号：US20050134823A1
公开(公告)日：2005-06-23
申请号：US11017783
申请日：2004-12-22
申请人： Yo-Han Ahn , Seok-Ryeul Lee , Jung-Sung Hwang , Tae-Jin Hwang , Byung-Moo Lee
发明人： Yo-Han Ahn , Seok-Ryeul Lee , Jung-Sung Hwang , Tae-Jin Hwang , Byung-Moo Lee
IPC分类号： H01L21/027 , G03B27/72 , G03F7/20
CPC分类号： G03F7/70558
摘要： A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.
摘要翻译：公开了一种在曝光过程中的掩模版的管理系统和方法。计算器计算照射到光刻工艺中使用的掩模版上的照射光的累积剂量。计算器连接到曝光装置以暴露半导体衬底上的光致抗蚀剂。比较器将计算的累积剂量与预设的参考剂量进行比较。当计算的累积剂量大于或等于参考剂量时，控制器暂停光刻工艺。最小化掩模版上的雾度污染，从而防止过程故障。

69. 发明申请

US20050091781A1 Device for cleaning reticle box 审中-公开
标题翻译：用于清洁标线盒的装置
公开(公告)号：US20050091781A1
公开(公告)日：2005-05-05
申请号：US10980020
申请日：2004-11-03
申请人： Jae-Hyun Yang , Yo-Han Ahn , Tae-Jin Hwang
发明人： Jae-Hyun Yang , Yo-Han Ahn , Tae-Jin Hwang
IPC分类号： H01L21/027 , B08B5/00 , B08B5/02 , B08B11/00 , G03F7/20
CPC分类号： G03F1/66 , B08B5/00 , B08B5/02 , G03F7/70741 , G03F7/70933
摘要： The present invention relates to a reticule storage device. After the reticule storage device influxes external airs using a motor and a fan, it provides the external airs filtered by a filter to a reticule storage shelf in a chamber. According to the present invention, a nitrogen gas supply pipe is installed on one end of the chamber. In addition, the nitrogen gas supplier is installed to be connected from the nitrogen gas supplier to the reticule storage shelf. Several nitrogen gas supply nozzles are installed on an end portion of the nitrogen gas supply pipe, so that nitrogen gas is supplied to maintain a regular pressure in the chamber when a motor inflowing external airs is stopped. As a result, in case that an apparatus is stopped due to a problem of the apparatus for many hours, or an external voltage is not supplied due to a problem of the external problem, nitrogen gases may be purged in the apparatus. Accordingly, the purity in the apparatus can be maintained, so that it is possible to prevent a reticule kept in the apparatus from a particle contamination.
摘要翻译：本发明涉及网状存储装置。在网状存储装置使用马达和风扇冲入外部空气之后，它将由过滤器过滤的外部空气提供到腔室中的网状物存放架。根据本发明，氮气供给管安装在室的一端。此外，氮气供应器安装成从氮气供应器连接到网状物存放架。在氮气供给管的端部安装有若干个氮气供给喷嘴，在电动机流入外部空气停止时，供给氮气来维持室内的规定的压力。结果，由于设备由于该设备的问题停止了许多小时，或由于外部问题而不提供外部电压的情况，在设备中可以清除氮气。因此，可以保持装置中的纯度，使得可以防止保持在装置中的网状物免受颗粒污染。

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