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61. 发明授权

US08865389B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern 有权
标题翻译：光化学射线或辐射敏感性树脂组合物，其光化学射线或辐射敏感膜及其形成图案的方法
公开(公告)号：US08865389B2
公开(公告)日：2014-10-21
申请号：US13246618
申请日：2011-09-27
申请人： Shuji Hirano , Hidenori Takahashi , Hideaki Tsubaki
发明人： Shuji Hirano , Hidenori Takahashi , Hideaki Tsubaki
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397
摘要： Provided is an actinic-ray- or radiation-sensitive resin composition, including a resin comprising a repeating unit (A), the a repeating unit (A) containing a structural moiety (S1) that when acted on by an acid, is decomposed to thereby generate an alkali-soluble group and a structural moiety (S2) that when acted on by an alkali developer, is decomposed to thereby increase its rate of dissolution in the alkali developer, and a repeating unit (B) that when exposed to actinic rays or radiation, generates an acid.
摘要翻译：本发明提供一种光化学射线或辐射敏感性树脂组合物，其包含含有重复单元（A）的树脂，含有结构部分（S1）的重复单元（A），其在被酸作用时分解成从而产生碱溶性基团和结构部分（S2），当被碱显影剂作用时，其分解，从而增加其在碱性显影剂中的溶解速率，以及当暴露于光化射线时的重复单元（B）或辐射，产生酸。

62. 发明授权

US08808947B2 Polymer compound and production method thereof, pigment dispersing agent, pigment dispersion composition, photocurable composition, and color filter and production method thereof 有权
标题翻译：高分子化合物及其制造方法，颜料分散剂，颜料分散组合物，光固化性组合物及滤色器及其制造方法
公开(公告)号：US08808947B2
公开(公告)日：2014-08-19
申请号：US12293226
申请日：2007-03-13
申请人： Hidenori Takahashi , Shuichiro Osada
发明人： Hidenori Takahashi , Shuichiro Osada
IPC分类号： C09B67/00 , G02B5/20
CPC分类号： C08F20/36 , C08F2/38 , C08F20/04 , C08F20/10 , C08F20/26 , C08F20/52 , C08F220/14 , C08F220/18 , C08F220/26 , C09B67/009 , C09B69/101 , C09B69/109 , G02B5/20 , G03C1/73 , G03C1/735 , G03F7/0007 , G03F7/032 , G03F7/033
摘要： The present invention provides a polymer compound represented by the following Formula (1) and a method for production thereof, a pigment dispersant, a pigment dispersion composition, and a photocurable composition respectively using the polymer compound, and a color filter and a method for production thereof [R1: an organic linking group having a valency of (m+n); R2: a single bond or a divalent organic linking group; A1: a monovalent organic group containing at least one moiety selected from an organic dye structure, a heterocyclic structure, an acidic group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, and a hydroxyl group; m=1 to 8, n=2 to 9 (m+n=3 to 10); and P1: polymer skeleton].
摘要翻译：本发明提供由下述通式（1）表示的高分子化合物及其制造方法，颜料分散剂，颜料分散组合物和使用该高分子化合物的光固化性组合物，以及滤色器及其制造方法 [R1：具有（m + n）价的有机连接基团; R2：单键或二价有机连接基团; A1：含有选自有机染料结构，杂环结构，酸性基团，具有碱性氮原子的基团，脲基，氨基甲酸酯基，具有配位氧原子的基团的至少一个部分的一价有机基团，具有4个以上碳原子的烃基，烷氧基甲硅烷基，环氧基，异氰酸酯基和羟基; m = 1〜8，n = 2〜9（m + n = 3〜10）。和P1：聚合物骨架]。

63. 发明授权

US08790860B2 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film, pattern forming method, method for preparing electronic device, and electronic device, each using the same 有权
标题翻译：光敏感或辐射敏感性树脂组合物，抗蚀剂膜，图案形成方法，电子器件的制备方法和电子器件，各自使用它们
公开(公告)号：US08790860B2
公开(公告)日：2014-07-29
申请号：US13610271
申请日：2012-09-11
申请人： Kosuke Koshijima , Hidenori Takahashi , Shuhei Yamaguchi , Kei Yamamoto
发明人： Kosuke Koshijima , Hidenori Takahashi , Shuhei Yamaguchi , Kei Yamamoto
IPC分类号： G03F7/038 , G03F7/039 , G03F7/20 , G03F7/30 , G03F7/32
CPC分类号： G03F7/325 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/0755 , G03F7/0758 , G03F7/11 , G03F7/2041 , G03F7/40 , Y10T428/24479
摘要： An actinic ray-sensitive or radiation-sensitive resin composition capable of forming a hole pattern which has an ultrafine pore diameter (for example, 60 nm or less) and has an excellent cross-sectional shape with excellent local pattern dimensional uniformity; and a resist film, a pattern forming method, a method for preparing an electronic device, and an electronic device, each using the same, are provided.The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin containing 30 mol % or more of a repeating unit (a) represented by the following general formula (I) based on all the repeating units; (B) a compound capable of generating an acid upon irradiation of actinic rays or radiation; and (G) a compound having at least one of a fluorine atom and a silicon atom, and further having basicity or being capable of increasing the basicity by an action of an acid:
摘要翻译：能够形成具有超细孔径（例如60nm以下）的孔图案并且具有优异的局部图案尺寸均匀性的截面形状优异的光化射线敏感或辐射敏感性树脂组合物; 并且提供了各自使用它们的抗蚀剂膜，图案形成方法，制备电子设备的方法和电子设备。光化射线敏感性或辐射敏感性树脂组合物包含（P）基于所有重复单元含有30mol％以上由以下通式（I）表示的重复单元（a）的树脂的树脂; （B）能够在光化射线或辐射照射时能产生酸的化合物; 和（G）具有氟原子和硅原子中的至少一个的化合物，并且还具有碱性或能够通过酸的作用增加碱度：

64. 发明申请

US20140203735A1 ELECTRIC STORAGE SYSTEM AND CONTROL METHOD OF ELECTRIC STORAGE SYSTEM 有权
标题翻译：电力储存系统及电力储存系统的控制方法
公开(公告)号：US20140203735A1
公开(公告)日：2014-07-24
申请号：US13392372
申请日：2011-09-21
申请人： Yoshinobu Sugiyama , Hidenori Takahashi
发明人： Yoshinobu Sugiyama , Hidenori Takahashi
IPC分类号： B60L11/18 , H02J7/00
CPC分类号： B60L11/1816 , B60L3/0046 , B60L11/1803 , B60L11/1859 , B60L11/1861 , B60L11/1864 , B60L2210/14 , B60L2210/30 , B60L2240/545 , B60L2240/547 , B60L2240/549 , B60L2250/10 , B60L2250/16 , B60L2270/20 , H02J1/00 , H02J5/00 , H02J7/00 , H02J7/0029 , H02J7/007 , H02J7/02 , Y02T10/7005 , Y02T10/7044 , Y02T10/7061 , Y02T10/7072 , Y02T10/7225 , Y02T10/7241 , Y02T90/127 , Y02T90/14
摘要： An electric storage system includes a charger which supplies power from an external power source to an electric storage apparatus and supplies power of the electric storage apparatus to an external device. A first and a second system main relay allow connection between a positive electrode terminal and a negative electrode terminal of the electric storage apparatus and a load, respectively. A third system main relay is connected in series with a current limiting resistor and, together with the current limiting resistor, is connected in parallel with the first system main relay. A first and a second charge relay allow connection between the positive electrode terminal and the negative electrode terminal of the electric storage apparatus and the charger, respectively. A third charge relay is connected in series with the abovementioned current limiting resistor and, together with the current limiting resistor, is connected in parallel with the first charge relay.
摘要翻译：电气存储系统包括从外部电源向蓄电装置供电并将蓄电装置的电力供给到外部装置的充电器。第一和第二系统主继电器分别允许蓄电装置的正极端子和负极端子与负载之间的连接。第三系统主继电器与限流电阻串联连接，并与限流电阻一起与第一系统主继电器并联连接。第一和第二充电继电器分别允许蓄电装置的正极端子和负极端子与充电器之间的连接。第三充电继电器与上述限流电阻串联连接，并与限流电阻一起与第一充电继电器并联连接。

65. 发明授权

US08741897B2 Glucocorticoid mimetics, methods of making them, pharmaceutical compositions and uses thereof 有权
标题翻译：糖皮质激素模拟物，其制备方法，药物组合物及其用途
公开(公告)号：US08741897B2
公开(公告)日：2014-06-03
申请号：US10947420
申请日：2004-09-22
申请人： Younes Bekkali , Rajashekhar Betageri , Michel J. Emmanuel , Abdelhakim Hammach , Christian Hanke Justus Joachim Harcken , Thomas Martin Kirrane, Jr. , Daniel Kuzmich , Thomas Wai-Ho Lee , Pingrong Liu , Usha R. Patel , John Robert Proudfoot , Hossein Razavi , Doris Riether , Hidenori Takahashi , David S. Thomson , Ji Wang , Renee Zindell
发明人： Younes Bekkali , Rajashekhar Betageri , Michel J. Emmanuel , Abdelhakim Hammach , Christian Hanke Justus Joachim Harcken , Thomas Martin Kirrane, Jr. , Daniel Kuzmich , Thomas Wai-Ho Lee , Pingrong Liu , Usha R. Patel , John Robert Proudfoot , Hossein Razavi , Doris Riether , Hidenori Takahashi , David S. Thomson , Ji Wang , Renee Zindell
IPC分类号： C07D487/04 , A61K31/519 , A61K31/5377 , A61K31/4355 , A61K31/5025 , A61P25/28 , A61P9/00 , A61P35/00 , A61K31/4402 , A61K31/4409 , A61K31/4418 , A61K31/4406 , A61K31/497 , A61K31/506 , A61K31/4184 , A61K31/404 , A61K31/416 , A61K31/47
CPC分类号： C07D213/75 , A61K31/4745 , A61K31/52 , C07D209/08 , C07D209/12 , C07D213/30 , C07D215/14 , C07D231/12 , C07D231/56 , C07D237/20 , C07D239/42 , C07D307/79 , C07D319/06 , C07D319/08 , C07D333/56 , C07D403/10 , C07D405/04 , C07D405/06 , C07D405/10 , C07D405/14 , C07D407/06 , C07D471/04 , C07D487/04 , C07D491/04 , C07D495/04
摘要： Compounds of Formula (IA), (IB), (IC), and (ID) wherein R1, R2, R3, R4, R5, and R6 are as respectively defined herein for Formula (IA), (IB), (IC), and (ID), or a tautomer, prodrug, solvate, or salt thereof; pharmaceutical compositions containing such compounds, and methods of modulating the glucocorticoid receptor function and methods of treating disease-states or conditions mediated by the glucocorticoid receptor function or characterized by inflammatory, allergic, or proliferative processes in a patient using these compounds.
摘要翻译：式（IA），（IB），（IC）和（ID）的化合物，其中R 1，R 2，R 3，R 4，R 5和R 6如本文中对于式（IA），（IB），和（ID），或互变异构体，前药，溶剂合物或其盐; 含有这些化合物的药物组合物，以及调节糖皮质激素受体功能的方法和治疗由糖皮质激素受体功能介导的疾病状态或病症的方法，或其特征在于使用这些化合物的患者的炎症，过敏或增殖过程。

66. 发明授权

US08329379B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same 有权
标题翻译：光化学敏感性或辐射敏感性树脂组合物，抗蚀剂膜和使用其的图案形成方法
公开(公告)号：US08329379B2
公开(公告)日：2012-12-11
申请号：US12748728
申请日：2010-03-29
申请人： Takayuki Ito , Hidenori Takahashi , Tomotaka Tsuchimura , Shohei Kataoka , Takeshi Inasaki
发明人： Takayuki Ito , Hidenori Takahashi , Tomotaka Tsuchimura , Shohei Kataoka , Takeshi Inasaki
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0045 , G03F7/0048 , G03F7/0392 , G03F7/0397
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition, a resist film formed with the composition, and a pattern-forming method using the same. The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin that contains the following repeating units (A), (B) and (C); and a solvent having a boiling temperature of 150° C. or less, (A) a repeating unit containing a group capable of decomposing and forming an acid upon irradiation with an actinic ray or radiation, (B) a repeating unit containing a group capable of decomposing and forming a carboxylic acid by the action of an acid, and (C) a repeating unit containing a carbon-carbon unsaturated bond.
摘要翻译：提供了一种光化射线敏感或辐射敏感性树脂组合物，由该组合物形成的抗蚀剂膜和使用其的图案形成方法。光化射线敏感性或辐射敏感性树脂组合物包含（P）含有以下重复单元（A），（B）和（C）的树脂; 和沸点为150℃以下的溶剂，（A）含有能够在光化射线或辐射照射时能够分解形成酸的基团的重复单元，（B）含有能够具有基团的重复单元通过酸的作用分解和形成羧酸，和（C）含有碳 - 碳不饱和键的重复单元。

67. 发明授权

US08280572B2 Secondary battery temperature-increasing control apparatus, vehicle including the same, and secondary battery temperature-increasing control method 有权
标题翻译：二次电池升温控制装置，包括该二次电池升温控制装置的车辆和二次电池升温控制方法
公开(公告)号：US08280572B2
公开(公告)日：2012-10-02
申请号：US13382625
申请日：2010-07-07
申请人： Hidenori Takahashi , Yuji Nishi , Masatoshi Tazawa , Masanobu Matsusaka
发明人： Hidenori Takahashi , Yuji Nishi , Masatoshi Tazawa , Masanobu Matsusaka
IPC分类号： B60L11/18
CPC分类号： B60L11/1872 , B60L11/1875 , B60L2240/526 , B60L2240/545 , B60L2260/56 , Y02T10/7011 , Y02T10/705
摘要： A first calculating section (118) calculates an allowable output power (WoutA) of the secondary battery before a ripple temperature increase operation for increasing the temperature of a secondary battery by causing a ripple current to flow in the secondary battery is performed, the allowable output power being determined in advance based on the temperature and a state of charge (SOC) of the secondary battery. A second calculating section (120) calculates the allowable output power (WoutB) achieved when the ripple temperature increase operation is performed. A determining section (122) determines whether to perform the ripple temperature increase operation so that when the allowable output power (WoutB) is equal to or greater than the allowable output power (WoutA), the ripple temperature increase operation is performed and, when the allowable output power (WoutB) is smaller than the allowable output power (WoutA), the ripple temperature increase operation is not performed.
摘要翻译：第一计算部分（118）在通过使二次电池中的纹波电流流动来提高二次电池的温度的纹波升高操作之前，计算二次电池的容许输出功率（WoutA），允许输出基于二次电池的温度和充电状态（SOC）预先确定电力。第二计算部（120）计算进行纹波升温动作时的容许输出功率（WoutB）。确定部分（122）确定是否进行纹波温度升高操作，使得当允许输出功率（WoutB）等于或大于容许输出功率（WoutA）时，执行纹波升高操作，并且当允许输出功率（WoutB）小于容许输出功率（WoutA）时，不进行纹波升温动作。

68. 发明申请

US20120082939A1 ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME 失效
标题翻译：活性光敏敏感性或放射性敏感性敏感性树脂组合物和主动光敏敏感或放射性敏感性膜和使用其的图案形成方法
公开(公告)号：US20120082939A1
公开(公告)日：2012-04-05
申请号：US13252657
申请日：2011-10-04
申请人： Takeshi KAWABATA , Hidenori Takahashi , Tomotaka Tsuchimura , Shuji Hirano , Hideaki Tsubaki
发明人： Takeshi KAWABATA , Hidenori Takahashi , Tomotaka Tsuchimura , Shuji Hirano , Hideaki Tsubaki
IPC分类号： G03F7/30 , C08F228/02 , H01L21/02 , C08F220/38
CPC分类号： C08F220/38 , C08F228/02 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： An active light ray sensitive or radioactive ray sensitive resin composition which satisfies high sensitivity, high resolution, good pattern configuration, and good line edge roughness at the same time to a great extent, while having sufficiently good outgassing performance during exposure, and an active light ray sensitive or radioactive ray sensitive film formed by using the composition, and a pattern-forming method, are provided.The active light ray sensitive or radioactive ray sensitive resin composition according to the present invention includes a resin (P) containing a repeating unit (A) which decomposes by irradiation with active light ray or radioactive ray to generate an acid, and a repeating unit (C) containing a primary or secondary hydroxyl group.
摘要翻译：一种主动光线敏感或放射线敏感性树脂组合物，同时在很大程度上满足高灵敏度，高分辨率，良好的图案构造和良好的线边缘粗糙度，同时在曝光期间具有足够好的除气性能，以及活性光提供通过使用该组合物形成的射线敏感或放射线敏感膜和图案形成方法。根据本发明的活性光线敏感或放射线敏感性树脂组合物包括含有通过用活性光线照射或放射线分解以产生酸的重复单元（A）的树脂（P）和重复单元（ C）含有伯或仲羟基。

69. 发明申请

US20100085758A1 LIGHT SOURCE DEVICE 有权
标题翻译：光源设备
公开(公告)号：US20100085758A1
公开(公告)日：2010-04-08
申请号：US12541684
申请日：2009-08-14
申请人： Hidenori Takahashi , Noriyoshi Kumazawa
发明人： Hidenori Takahashi , Noriyoshi Kumazawa
IPC分类号： F21V9/00
CPC分类号： G02B5/289 , F21V9/08 , H01L33/50 , H01L33/58
摘要： Disclosed is a light source device that has lower costs and lower power consumption compared to a halogen lamp, and has the same spectral characteristics as the halogen lamp.The light source device includes a white LED that emits white light having an emission peak in a blue range and an optical filter that partially reduces the quantity of light in the blue range in the white light emitted from the white LED such that the spectral characteristics of the white light emitted from the white LED are close to those of light emitted from a halogen lamp.
摘要翻译：公开了一种光源装置，其与卤素灯相比具有较低的成本和较低的功率消耗，并且具有与卤素灯相同的光谱特性。光源装置包括白色LED，其发射具有蓝色范围内的发射峰的白光，以及滤光器，其部分地减少从白色LED发射的白色光中的蓝色范围内的光量，使得光学特性从白色LED发出的白光与卤素灯发出的光接近。

70. 发明授权

US07580133B2 Interferometric apparatus for measuring moving object and optical interferometry method for measuring moving object 失效
标题翻译：用于测量移动物体的干涉仪和用于测量移动物体的光学干涉测量方法
公开(公告)号：US07580133B2
公开(公告)日：2009-08-25
申请号：US11447164
申请日：2006-06-06
申请人： Nobuaki Ueki , Hidenori Takahashi
发明人： Nobuaki Ueki , Hidenori Takahashi
IPC分类号： G01N21/84 , G01B11/02
CPC分类号： G01N21/45 , G01B11/0675
摘要： A moving-object measuring interferometric apparatus comprises: a light beam output section outputting a measuring beam; an interference optical system obtaining interference light by projecting the measuring beam onto an object and by allowing light reflected from the object or transmitted light having passed through the object to interfere with reference light; an image pickup section obtaining image information by receiving the interference light on an image pickup surface; and an image pickup timing control section setting a momentary image pickup period during which the object is regarded as being stationary to be contained in a light reception acceptable period of the image pickup surface and controlling the interference light to enter the image pickup surface only during the momentary image pickup period.
摘要翻译：移动物体测量干涉仪包括：输出测量光束的光束输出部分; 干涉光学系统通过将测量光束投射到物体上并且允许从物体反射的光或穿过物体的透射光干涉参考光来获得干涉光; 图像拾取部分，通过在图像拾取表面上接收干涉光来获得图像信息; 以及图像拾取定时控制部分，其设置将所述对象视为静止的瞬时图像拾取周期，以被包含在所述图像拾取表面的光接收可接受周期中，并且仅在所述摄像表面期间控制所述干涉光进入所述图像拾取表面瞬间图像拾取期。

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