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    • 61. 发明申请
    • SOLUTION TO OPTICAL CONSTRAINT ON MICROTRUSS PROCESSING
    • 微波加工中光学约束的解决方案
    • US20110195361A1
    • 2011-08-11
    • US12700800
    • 2010-02-05
    • Jeffrey A. Rock
    • Jeffrey A. Rock
    • G03F7/20G03B27/54
    • G03F1/50G02B2006/1219G03F7/201G03F7/2041
    • A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material having a first refractive index; a mask formed from a mask material having a second refractive index; and a radiation source. The mask is disposed between the radiation source and the radiation-sensitive material, and has a plurality of substantially radiation transparent apertures. The radiation source is configured to generate radiation beams for at least one of initiating, polymerizing, and crosslinking the radiation-sensitive material. The system includes at least one of a) an at least one normalizing surface disposed between the radiation source and the mask, b) a refractive fluid having a third refractive index disposed between the radiation source and the mask, and c) the refractive fluid having the third refractive index disposed between the mask and the radiation-sensitive material. A method for fabricating the radiation-cured structure is also provided.
    • 提供了一种用于制造辐射固化结构的系统。 该系统包括具有第一折射率的辐射敏感材料; 由具有第二折射率的掩模材料形成的掩模; 和辐射源。 掩模设置在辐射源和辐射敏感材料之间,并且具有多个基本上辐射的透明孔。 辐射源被配置为产生用于使辐射敏感材料起始,聚合和交联中的至少一个的辐射束。 所述系统包括以下至少一个:a)设置在所述辐射源和所述掩模之间的至少一个归一化表面,b)具有设置在所述辐射源和所述掩模之间的具有第三折射率的折射流体,以及c)所述折射流体具有 设置在掩模和辐射敏感材料之间的第三折射率。 还提供了一种制造辐射固化结构的方法。