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    • 63. 发明授权
    • Liquid-crystal display device
    • 液晶显示装置
    • US4857907A
    • 1989-08-15
    • US043342
    • 1987-04-28
    • Mitsuhiro Koden
    • Mitsuhiro Koden
    • G02F1/1368H01L27/12
    • H01L27/12G02F1/1368
    • A liquid-crystal display device comprising thin-film transistors arrayed in a matrix, wherein each of said thin-film transistors comprises an insulating substrate, a gate electrode disposed on said insulating substrate, a first insulating film covering said gate electrode, an a-Si semiconductor film disposed on said first insulating film, a second insulating film disposed on said a-Si semiconductor film, a p-doped n+-amorphous Si film forming both a source and a drain on said a-Si semiconductor film and said second insulating film, a third insulating film covering said p-doped n+-amorphous Si film, except for a part of said p-doped n+-amorphous Si film, and said a-Si semiconductor film, a source electrode and a drain electrode forming junctions with said part of the p-doped n+-amorphous Si film and covering said third insulating film, and a picture-element electrode, a part of which is superposed on said drain electrode.
    • 一种液晶显示装置,包括以矩阵形式排列的薄膜晶体管,其中每个所述薄膜晶体管包括绝缘基板,设置在所述绝缘基板上的栅电极,覆盖所述栅电极的第一绝缘膜, Si半导体膜,设置在所述a-Si半导体膜上的第二绝缘膜,在所述a-Si半导体膜上形成源极和漏极的p掺杂的n +非晶Si膜,所述第二绝缘膜 膜,覆盖所述p掺杂的n + - 无定形Si膜的第三绝缘膜,除了所述p掺杂的n +无定形Si膜的一部分,并且所述a-Si半导体膜,源电极和漏电极形成与 所述部分p掺杂n +无定形Si膜并覆盖所述第三绝缘膜,以及图像元素电极,其一部分叠置在所述漏极上。