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61. 发明申请

US20120290497A1 FAILURE DIAGNOSIS SYSTEM, FAILURE DIAGNOSIS DEVICE AND FAILURE DIAGNOSIS PROGRAM 审中-公开
标题翻译：故障诊断系统，故障诊断设备和故障诊断程序
公开(公告)号：US20120290497A1
公开(公告)日：2012-11-15
申请号：US13574314
申请日：2010-11-25
申请人： Hiroyuki Magara , Shunji Maeda , Hisae Shibuya
发明人： Hiroyuki Magara , Shunji Maeda , Hisae Shibuya
IPC分类号： G06Q10/00
CPC分类号： G06Q10/00
摘要： In the failure diagnosis system of the present invention, the maintenance case information including data ambiguity and a partially deficient portion is utilized even in the case where maintenance case information having a high similarity is not sufficiently provided. The failure diagnosis system is provided with: a failure diagnosis rule creation unit 31 which, by utilizing maintenance case information accumulated in the past, creates a failure diagnosis rule used for listing up candidates of maintenance parts required for recovering the equipment from a failure phenomenon; a failure diagnosis execution unit 32 which, upon occurrence of a failure, outputs the candidates of maintenance parts required for recovering from the failure phenomenon to a maintenance work assist terminal with reference to the failure diagnosis rule; and a failure diagnosis rule updating unit 33 for updating the failure diagnosis rule, and the failure diagnosis rule creation unit 31 has a factor-information link creation unit, which creates links among pieces of factor information composed of pieces of information relating to the failure phenomenon, information relating to the subject component, and information relating to the corresponding treatment in the maintenance case information accumulated in the past.
摘要翻译：在本发明的故障诊断系统中，即使在没有充分提供具有高相似度的维护案例信息的情况下，也利用包括数据模糊性和部分缺陷部分的维护案例信息。故障诊断系统具备：故障诊断规则生成部31，利用过去累积的维护案例信息，创建故障诊断规则，用于从故障现象列出恢复设备所需的维护部件的候补; 故障诊断执行单元32，在故障发生时，参照故障诊断规则将从故障现象中恢复所需的维护部件的候补输出到维护作业辅助终端; 故障诊断规则更新单元33用于更新故障诊断规则，故障诊断规则创建单元31具有因素信息链接创建单元，该单元创建由与故障现象相关的信息组成的因素信息之间的链接与主题部分有关的信息，以及与过去积累的维护案例信息中的对应处理有关的信息。

62. 发明申请

US20120166142A1 Anomaly Detection and Diagnosis/Prognosis Method, Anomaly Detection and Diagnosis/Prognosis System, and Anomaly Detection and Diagnosis/Prognosis Program 有权
标题翻译：异常检测和诊断/预后方法，异常检测和诊断/预后系统，异常检测与诊断/预后程序
公开(公告)号：US20120166142A1
公开(公告)日：2012-06-28
申请号：US13384463
申请日：2010-06-16
申请人： Shunji Maeda , Hisae Shibuya
发明人： Shunji Maeda , Hisae Shibuya
IPC分类号： G06F15/00
CPC分类号： G05B23/0227 , G06K9/00536 , G06K9/6251
摘要： Provided is an anomaly detection method and system capable of constructing determination condition rules of anomaly detection from case-based anomaly detection by way of multivariate analysis of a multi-dimensional sensor signal, applying the rules to design-based anomaly detection of individual sensor signals, and also appropriately executing setting and control of threshold values for highly sensitive, early, and clearly visible detection of anomalies. Anomaly detection on the basis of a case base by way of multivariate analysis controls design-based anomaly detection. That is to say, (1) anomaly detection on the basis of a case base performs selection of sensor signals and anomaly detection according to various types of anomalies. Specifically, anomaly detection (characteristic conversion), evaluation of level of effect of each signal, construction of determination conditions (rules), and display and selection of sensor signals corresponding to the anomaly are performed. (2) Design-based anomaly detection for individual sensor signals performs anomaly detection after the above have been performed. Specifically, setting and control of thresholds, display of thresholds, and anomaly detection and display are performed.
摘要翻译：提供了一种异常检测方法和系统，其能够通过多维传感器信号的多元分析来构建基于病例的异常检测的异常检测的判定条件规则，将规则应用于各个传感器信号的基于设计的异常检测，并且还适当地执行阈值的设置和控制，以便高度敏感，早期和清晰地检测异常。在多变量分析的基础上进行异常检测，控制基于设计的异常检测。也就是说，（1）基于病例库的异常检测，根据各种异常进行传感器信号的选择和异常检测。具体地说，进行异常检测（特征变换），各信号的效果评价，确定条件（规则）的构成以及对应于异常的传感器信号的显示和选择。（2）单个传感器信号的基于设计的异常检测在执行上述之后进行异常检测。具体地，执行阈值的设置和控制，阈值的显示以及异常检测和显示。

63. 发明授权

US08149396B2 Defect inspection apparatus and its method 有权
标题翻译：缺陷检查装置及其方法
公开(公告)号：US08149396B2
公开(公告)日：2012-04-03
申请号：US13099530
申请日：2011-05-03
申请人： Akira Hamamatsu , Hisae Shibuya , Shunji Maeda
发明人： Akira Hamamatsu , Hisae Shibuya , Shunji Maeda
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N2021/8822
摘要： A defect inspection apparatus for inspecting defects on an inspecting object includes an illuminator which irradiates a beam of light on the inspecting object, a photo-detector which detects rays of light from the inspecting object due to the irradiation of the light beam by the illuminator, a defect detector which detects a defect by processing a signal obtained through detection by the photo-detector, a characteristic quantity calculator which calculates a characteristic quantity related to a size of the defect, and a defect size calculator which uses a relation between size and characteristic quantity which is calculated by an optical simulation and calculates a size of the detected defect.
摘要翻译：用于检查检查对象的缺陷的缺陷检查装置包括：在检查对象物上照射光束的照明器，由于照射器照射光束而检测来自被检查物体的光的光检测器，缺陷检测器，其通过处理通过光检测器的检测获得的信号来检测缺陷;计算与缺陷的尺寸相关的特征量的特征量计算器;以及使用尺寸和特性之间的关系的缺陷尺寸计算器通过光学模拟计算的量，并计算检测到的缺陷的尺寸。

64. 发明授权

US07751036B2 Apparatus of inspecting defect in semiconductor and method of the same 失效
标题翻译：检测半导体缺陷的装置及其方法
公开(公告)号：US07751036B2
公开(公告)日：2010-07-06
申请号：US12349373
申请日：2009-01-06
申请人： Akira Hamamatsu , Shunji Maeda , Hisae Shibuya
发明人： Akira Hamamatsu , Shunji Maeda , Hisae Shibuya
IPC分类号： G01N21/88
CPC分类号： G01N21/956
摘要： When size of a defect on an increasingly miniaturized pattern is obtained by defect inspection apparatus in the related art, a value is inconveniently given, which is different from a measured value of the same defect by SEM. Thus, a dimension value of a defect detected by defect inspection apparatus needs to be accurately calculated to be approximated to a value measured by SEM. To this end, size of the defect detected by the defect inspection apparatus is corrected depending on feature quantity or type of the defect, thereby defect size can be accurately calculated.
摘要翻译：当通过现有技术的缺陷检查装置获得越来越小型化的图案的缺陷的尺寸时，不方便地给出不同于SEM的相同缺陷的测量值的值。因此，需要精确地计算由缺陷检查装置检测到的缺陷的尺寸值，以近似于通过SEM测量的值。为此，由缺陷检查装置检测到的缺陷的尺寸根据缺陷的特征量或类型进行修正，从而可以精确地计算缺陷尺寸。

65. 发明申请

US20070019185A1 Apparatus of inspecting defect in semiconductor and method of the same 有权
标题翻译：检测半导体缺陷的装置及其方法
公开(公告)号：US20070019185A1
公开(公告)日：2007-01-25
申请号：US11488622
申请日：2006-07-19
申请人： Akira Hamamatsu , Shunji Maeda , Hisae Shibuya
发明人： Akira Hamamatsu , Shunji Maeda , Hisae Shibuya
IPC分类号： G01N21/88
CPC分类号： G01N21/956
摘要： When size of a defect on an increasingly miniaturized pattern is obtained by defect inspection apparatus in the related art, a value is inconveniently given, which is different from a measured value of the same defect by SEM. Thus, a dimension value of a defect detected by defect inspection apparatus needs to be accurately calculated to be approximated to a value measured by SEM. To this end, size of the defect detected by the defect inspection apparatus is corrected depending on feature quantity or type of the defect, thereby defect size can be accurately calculated.
摘要翻译：当通过现有技术的缺陷检查装置获得越来越小型化的图案的缺陷的尺寸时，不方便地给出不同于SEM的相同缺陷的测量值的值。因此，需要精确地计算由缺陷检查装置检测到的缺陷的尺寸值，以近似于通过SEM测量的值。为此，由缺陷检查装置检测到的缺陷的尺寸根据缺陷的特征量或类型进行修正，从而可以精确地计算缺陷尺寸。

66. 发明申请

US20060078188A1 Method and its apparatus for classifying defects 审中-公开
标题翻译：分类缺陷的方法及其设备
公开(公告)号：US20060078188A1
公开(公告)日：2006-04-13
申请号：US11190829
申请日：2005-07-28
申请人： Masaki Kurihara , Hisae Shibuya , Toshifumi Honda , Naoki Hosoya , Atsushi Miyamoto
发明人： Masaki Kurihara , Hisae Shibuya , Toshifumi Honda , Naoki Hosoya , Atsushi Miyamoto
IPC分类号： G06K9/00 , G06K9/62
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： In an automatic defect classifying method, defects not reviewed are assigned with defect classes having the same definitions as those of reviewed defects in order to effectively use information on defects not reviewed, the defects not reviewed occupying most of defects on a wafer. Defects not reviewed are assigned defect classes having the same definitions, by using defect data of defects detected with an inspection equipment and defect classes of already reviewed defects given by ADC of a review equipment. Since all defects are assigned the defect classes having the same definitions, more detailed analysis is possible in estimating the generation reasons of defects.
摘要翻译：在自动缺陷分类方法中，未评估的缺陷被分配具有与经检查的缺陷相同的定义的缺陷类，以便有效地使用未被评估的缺陷的信息，未被评估的缺陷占据了晶片上的大多数缺陷。未审查的缺陷被分配具有相同定义的缺陷类别，通过使用检查设备检测到的缺陷缺陷数据和审查设备的ADC给出的已经评估的缺陷的缺陷类别。由于所有缺陷都分配有相同定义的缺陷类别，因此可以在估计缺陷的生成原因时进行更详细的分析。

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