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    • 61. 发明申请
    • Thin film transistor array panel and liquid crystal display
    • 薄膜晶体管阵列面板和液晶显示器
    • US20070085797A1
    • 2007-04-19
    • US11546156
    • 2006-10-10
    • Dong-Gyu Kim
    • Dong-Gyu Kim
    • G09G3/36
    • G02F1/136286G09G3/3607G09G3/3614G09G3/3659G09G2310/0205
    • A thin film transistor array panel includes: a plurality of pixels including pixel electrodes arranged in a matrix and switching elements connected to the pixel electrodes; first and second gate lines that are connected to the switching elements extend in a row direction and correspond to one row of pixel electrodes; and first and second data lines that are connected to the switching elements extend in a column direction and correspond to three pixel columns. In the thin film transistor array panel, when the three pixel columns are referred to as first to third pixel columns, the pixel electrodes in the first and second pixel columns are connected to the first data line through the switching elements, and the pixel electrodes in the third pixel column are connected to the second data line through the switching elements.
    • 薄膜晶体管阵列面板包括:包括排列成矩阵的像素电极和连接到像素电极的开关元件的多个像素; 连接到开关元件的第一和第二栅极线在行方向上延伸并且对应于一行像素电极; 并且连接到开关元件的第一和第二数据线在列方向上延伸并对应于三个像素列。 在薄膜晶体管阵列面板中,当三像素列被称为第一至第三像素列时,第一和第二像素列中的像素电极通过开关元件连接到第一数据线,并且像素电极 第三像素列通过开关元件连接到第二数据线。
    • 62. 发明申请
    • Liquid crystal display
    • 液晶显示器
    • US20070057257A1
    • 2007-03-15
    • US11517521
    • 2006-09-07
    • Dong-Gyu Kim
    • Dong-Gyu Kim
    • H01L29/04
    • G02F1/136286G02F1/134336H01L27/12H01L27/124
    • A liquid crystal display includes a substrate, a plurality of gate lines formed on the substrate, a plurality of data lines intersecting the plurality of gate lines, a plurality of thin film transistors connected to the plurality of gate lines and the plurality of data lines, and a plurality of pixel electrodes connected to the plurality of thin film transistors and arranged in a matrix, wherein each of the pixel electrodes includes a first side parallel to each gate line and a second side being shorter than the first side, the second side being formed next to the first side, wherein the plurality of pixel electrodes that are adjacent to each other in a column direction are connected to different data lines from each other.
    • 液晶显示器包括基板,形成在基板上的多个栅极线,与多条栅极线交叉的多条数据线,连接到多条栅极线和多条数据线的多条薄膜晶体管, 以及多个像素电极,与所述多个薄膜晶体管连接并配置成矩阵状,其中,所述各像素电极具有平行于各栅极线的第一侧和比所述第一侧短的第二侧,所述第二面为 形成在第一侧附近,其中在列方向上彼此相邻的多个像素电极彼此连接到不同的数据线。
    • 67. 发明授权
    • Thin film transistor array panel and a method for manufacturing the same
    • US07098480B2
    • 2006-08-29
    • US10273298
    • 2002-10-18
    • Dong-Gyu KimJong-Soo Yoon
    • Dong-Gyu KimJong-Soo Yoon
    • H01L29/00
    • G02F1/13458G02F1/136227G02F2001/136222H01L27/12H01L27/124H01L27/1285H01L27/1288H01L27/1292H01L29/4908H01L29/66765H01L29/78633
    • Disclosed is a simplified method for manufacturing a liquid crystal display. A gate wire including a gate line, a gate pad, and a gate electrode are formed on a substrate. A gate insulating layer, a semiconductor layer, and an ohmic contact layer are sequentially deposited, and a photoresist layer is coated thereon. The photoresist layer is exposed to light through a mask and developed to form a photoresist pattern. At this time, a first portion of the photoresist pattern which is located between the source electrode and the drain electrode is thinner than a second portion which is located on the data wire, and the photoresist layer is totally removed on other parts. The thin portion is made by controlling the amount of irradiating light or by a reflow process to form a thin portion, and the amount of light is controlled by using a mask that has a slit, a small pattern smaller than the resolution of the exposure device, or a partially transparent layer. Next, the exposed portions of conductor layer are removed by wet etch or dry etch, and thereby the underlying ohmic contact layer is exposed. Then the exposed ohmic contact layer and the underlying semiconductor layer are removed by dry etching along with the first portion of the photoresist layer. The residue of the photoresist layer is removed by ashing. Source/drain electrodes are separated by removing the portion of the conductor layer at the channel and the underlying ohmic contact layer pattern. Then, the second portion of the photoresist layer is removed, and red, green, and blue color filters, a pixel electrode, a redundant gate pad, and a redundant data pad are formed.
    • 70. 发明申请
    • Thin film transistor array panel used for a liquid crystal display and a manufacturing method thereof
    • 用于液晶显示器的薄膜晶体管阵列面板及其制造方法
    • US20060033102A1
    • 2006-02-16
    • US11249278
    • 2005-10-14
    • Dong-Gyu Kim
    • Dong-Gyu Kim
    • H01L29/04
    • H01L27/1288G02F1/1368H01L27/1214H01L29/78633
    • A gate insulating layer, an amorphous silicon layer, an n+ amorphous silicon layer and a metal layer are deposited in sequence after a gate line, a gate electrode and a gate pad are formed on a substrate, using a first mask. The metal layer is etched to form a data line, a source electrode, a drain electrode and a data pad through a photolithography process, using a second mask, and the n+ amorphous silicon layer is etched, using the patterned data line, the source electrode, the drain electrode and the data pad as the mask. A light shielding film and a passivation film, or a passivation film also having a function of the light shielding film are deposited, and is etched through the photolithography process, using a third mask which leaves a portion covering the gate line, the gate electrode, the gate pad and the data line, the source electrode, and the drain electrode. The amorphous silicon layer and the gate insulating layer are etched, using the patterned light shielding film and passivation film, or the patterned passivation film also having the function of the light shielding film as the mask. Here, the gate pad, the data pad and a part of the drain electrode are exposed. A pixel electrode connected to the drain electrode, is formed and indium tin oxide (ITO) pads covering the exposed gate pad and the exposed data pad, is formed by depositing an ITO film and etching thorough the photolithography, using a fourth mask. As a result, a thin film transistor array panel used for a liquid crystal display is fabricated by only four masks.
    • 在栅极线,栅电极和栅极焊盘形成在基板上之后,依次沉积栅绝缘层,非晶硅层,n + +非晶硅层和金属层,使用 第一个面具。 通过使用第二掩模的光刻工艺蚀刻金属层以形成数据线,源电极,漏电极和数据焊盘,并使用第二掩模蚀刻n + 图案化数据线,源电极,漏电极和数据焊盘作为掩模。 沉积还具有遮光膜功能的遮光膜和钝化膜或钝化膜,并通过光刻工艺蚀刻,使用第三掩模,该第三掩模留下覆盖栅极线的部分,栅电极, 栅极焊盘和数据线,源电极和漏电极。 使用图案化的遮光膜和钝化膜蚀刻非晶硅层和栅极绝缘层,或者也具有遮光膜功能的图案化的钝化膜作为掩模。 这里,露出栅极焊盘,数据焊盘和漏电极的一部分。 形成连接到漏电极的像素电极,并且通过使用第四掩模沉积ITO膜并彻底蚀刻来形成覆盖暴露的栅极焊盘和暴露的数据焊盘的氧化铟锡(ITO)焊盘。 结果,仅用四个掩模制造用于液晶显示器的薄膜晶体管阵列面板。