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61. 发明授权

US08605252B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08605252B2
公开(公告)日：2013-12-10
申请号：US13473438
申请日：2012-05-16
申请人： Naoyuki Kobayashi , Soichi Owa , Shigeru Hirukawa , Yasuhiro Omura
发明人： Naoyuki Kobayashi , Soichi Owa , Shigeru Hirukawa , Yasuhiro Omura
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/7075 , G03F7/70891
摘要： An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.
摘要翻译：曝光装置通过液体将基板上的曝光光照射而曝光基板。曝光装置具有用于保持基板的基板保持件，能够移动由基板保持件保持的基板的基板台和用于调整基板保持器的温度的温度调节系统。控制基板的温度，使得基板和液体之间的温度没有差异，从而防止由液体温度变化引起的曝光精度的降低。

62. 发明授权

US08435723B2 Pattern forming method and device production method 有权
标题翻译：图案形成方法和装置制作方法
公开(公告)号：US08435723B2
公开(公告)日：2013-05-07
申请号：US12585079
申请日：2009-09-02
申请人： Yuichi Shibazaki , Shigeru Hirukawa
发明人： Yuichi Shibazaki , Shigeru Hirukawa
IPC分类号： G03F7/26
CPC分类号： G03F7/265 , G03F7/095 , G03F7/405 , H01L21/0274
摘要： A pattern forming method includes coating, on a wafer, a negative resist and a positive resist which has a higher sensitivity; exposing the positive resist and the negative resist on the wafer with an image of a line-and-space pattern; and developing the positive resist and the negative resist in a direction parallel to a normal line of a surface of the wafer. A fine pattern, which exceeds the resolution limit of an exposure apparatus, can be formed by using the lithography process without performing the overlay exposure.
摘要翻译：图案形成方法包括在晶片上涂布具有较高灵敏度的负光刻胶和正光刻胶; 用线间距图案将晶片上的正光刻胶和负光刻胶曝光; 并且在与晶片的表面的法线平行的方向上显影正性抗蚀剂和负性抗蚀剂。可以通过使用光刻处理而不进行重叠曝光来形成超过曝光装置的分辨率极限的精细图案。

63. 发明授权

US08405816B2 Pattern formation method, pattern formation apparatus, exposure method, exposure apparatus, and device manufacturing method 有权
标题翻译：图案形成方法，图案形成装置，曝光方法，曝光装置和装置制造方法
公开(公告)号：US08405816B2
公开(公告)日：2013-03-26
申请号：US12330870
申请日：2008-12-09
申请人： Shigeru Hirukawa , Soichi Owa
发明人： Shigeru Hirukawa , Soichi Owa
IPC分类号： G03B27/42
CPC分类号： H01L21/0274 , G03F7/70283 , G03F7/70291 , G03F7/70508 , H01L21/0275
摘要： A drive system determines a combination of basic patterns (type of basic patterns to be generated and the number of pulses of each basic pattern) based on design data of patterns and pattern combination information stored in a memory. Then, based on the determined result, each micro mirror of a variable molding mask is individually controlled such that a plurality of basic patterns are sequentially generated according to each of the number of pulses, and each basic pattern generated by the variable molding mask is sequentially image-formed on a plate via a projection optical system. Thus, a pattern with a desired line width corresponding to the design data is formed at a desired position on the object with a good accuracy.
摘要翻译：驱动系统基于存储在存储器中的模式和模式组合信息的设计数据来确定基本模式（要生成的基本模式的类型和每个基本模式的脉冲数）的组合。然后，基于所确定的结果，分别控制可变成型掩模的每个微反射镜，使得根据脉冲数量顺次产生多个基本图案，并且依次形成由可变成型掩模产生的每个基本图案通过投影光学系统在板上形成图像。因此，具有对应于设计数据的期望线宽的图案以高精度形成在物体上的期望位置。

64. 发明授权

US08208117B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
标题翻译：曝光方法，基材台，曝光装置和装置制造方法
公开(公告)号：US08208117B2
公开(公告)日：2012-06-26
申请号：US12232063
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/54 , G03B27/60
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
摘要翻译：曝光装置通过液体将图案图像投影到基板上来曝光基板。曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。

65. 发明申请

US20120057141A1 PATTERN FORMING METHOD AND APPARATUS, EXPOSURE METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD AND DEVICE 审中-公开
标题翻译：图案形成方法和装置，曝光方法和装置以及装置制造方法和装置
公开(公告)号：US20120057141A1
公开(公告)日：2012-03-08
申请号：US13292724
申请日：2011-11-09
申请人： Soichi OWA , Shigeru Hirukawa
发明人： Soichi OWA , Shigeru Hirukawa
IPC分类号： G03B27/42
CPC分类号： G03F9/7003 , G03F7/70291 , G03F7/70475 , G03F9/7015 , G03F9/7019
摘要： During a period after starting exposure to a plurality of shot areas subject to exposure on a wafer until completing the exposure, a light via a slit pair arranged on a stage that holds the wafer, of illumination light via a pattern generating device, is received, and information on a positional relation between an illumination light and the stage (and hence a positional relation between the illumination light and the wafer) is detected. With this operation, even if the information on the positional relation between the illumination light and the wafer varies due to some reason, information on the variation can be detected while performing the exposure to the plurality of shot areas. Accordingly, high-precision exposure can be achieved in an exposure operation, by considering this detection results.
摘要翻译：在开始曝光到在晶片上曝光的多个照射区域直到完成曝光之前的期间，接收经由图案生成装置经由经由经由经由图案生成装置保持晶片的台阶上的狭缝对的照明光的光，并且检测关于照明光和舞台之间的位置关系的信息（因此照明光和晶片之间的位置关系）。通过该操作，即使关于照明光和晶片之间的位置关系的信息由于某些原因而变化，也可以在对多个拍摄区域进行曝光的同时检测关于变化的信息。因此，通过考虑该检测结果，可以在曝光操作中实现高精度的曝光。

66. 发明授权

US07817244B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US07817244B2
公开(公告)日：2010-10-19
申请号：US11585824
申请日：2006-10-25
申请人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
发明人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F9/7019 , G03F7/70341 , G03F9/7011 , G03F9/7015 , G03F9/7034 , G03F9/7046 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus/leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus/leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.
摘要翻译：曝光装置通过用液体填充投影光学系统和基板之间的空间来对基板进行曝光，并且通过使用投影光学系统通过液体将图案的图像投影到基板上。曝光装置包括用于保持基板的基板台，用于将液体供给到投影光学系统的像面的一侧的液体供应单元，以及用于检测关于投影光学系统的表面的表面信息的聚焦/调平检测系统底物不通过液体。曝光装置在基于通过投影光学系统和液体形成的图像平面之间的位置关系的基础上，对基板进行液浸曝光，基于由聚焦/调平检测系统。可以以令人满意的图案转印精度进行液浸曝光。

67. 发明申请

US20100068660A1 Pattern forming method and device production method 有权
标题翻译：图案形成方法和装置制作方法
公开(公告)号：US20100068660A1
公开(公告)日：2010-03-18
申请号：US12585079
申请日：2009-09-02
申请人： Yuichi Shibazaki , Shigeru Hirukawa
发明人： Yuichi Shibazaki , Shigeru Hirukawa
IPC分类号： G03F7/20
CPC分类号： G03F7/265 , G03F7/095 , G03F7/405 , H01L21/0274
摘要： A pattern forming method includes coating, on a wafer, a negative resist and a positive resist which has a higher sensitivity; exposing the positive resist and the negative resist on the wafer with an image of a line-and-space pattern; and developing the positive resist and the negative resist in a direction parallel to a normal line of a surface of the wafer. A fine pattern, which exceeds the resolution limit of an exposure apparatus, can be formed by using the lithography process without performing the overlay exposure.
摘要翻译：图案形成方法包括在晶片上涂布具有较高灵敏度的负光刻胶和正光刻胶; 用线间距图案将晶片上的正光刻胶和负光刻胶曝光; 并且在与晶片的表面的法线平行的方向上显影正光刻胶和负光刻胶。可以通过使用光刻处理而不进行重叠曝光来形成超过曝光装置的分辨率极限的精细图案。

68. 发明授权

US07589821B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07589821B2
公开(公告)日：2009-09-15
申请号：US11878076
申请日：2007-07-20
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58 , G03B27/32
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.
摘要翻译：光刻投影装置被布置成通过限定在与基板相邻的空间的液体将图案从图案形成装置投影到基板上。该装置包括在该空间中的液体转向器，以促进流过空间的液体流动。

69. 发明申请

US20090135399A1 PATTERN FORMATION METHOD, PATTERN FORMATION APPARATUS, EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：图案形成方法，图案形成装置，曝光方法，曝光装置和装置制造方法
公开(公告)号：US20090135399A1
公开(公告)日：2009-05-28
申请号：US12330870
申请日：2008-12-09
申请人： Shigeru HIRUKAWA , Soichi OWA
发明人： Shigeru HIRUKAWA , Soichi OWA
IPC分类号： G03F7/20 , G02B26/02
CPC分类号： H01L21/0274 , G03F7/70283 , G03F7/70291 , G03F7/70508 , H01L21/0275
摘要： A drive system determines a combination of basic patterns (type of basic patterns to be generated and the number of pulses of each basic pattern) based on design data of patterns and pattern combination information stored in a memory. Then, based on the determined result, each micro mirror of a variable molding mask is individually controlled such that a plurality of basic patterns are sequentially generated according to each of the number of pulses, and each basic pattern generated by the variable molding mask is sequentially image-formed on a plate via a projection optical system. Thus, a pattern with a desired line width corresponding to the design data is formed at a desired position on the object with a good accuracy.
摘要翻译：驱动系统基于存储在存储器中的模式和模式组合信息的设计数据来确定基本模式（要生成的基本模式的类型和每个基本模式的脉冲数）的组合。然后，基于所确定的结果，分别控制可变成型掩模的每个微反射镜，使得根据脉冲数量顺次产生多个基本图案，并且依次形成由可变成型掩模产生的每个基本图案通过投影光学系统在板上形成图像。因此，具有对应于设计数据的期望线宽的图案以高精度形成在物体上的期望位置。

70. 发明申请

US20090015808A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
标题翻译：曝光方法，基材台，曝光装置和装置制造方法
公开(公告)号：US20090015808A1
公开(公告)日：2009-01-15
申请号：US12232063
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
摘要翻译：曝光装置通过液体将图案图像投影到基板上来曝光基板。曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。

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