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61. 发明授权

US07145720B2 Objective with fluoride crystal lenses 有权
公开(公告)号：US07145720B2
公开(公告)日：2006-12-05
申请号：US10367989
申请日：2003-02-12
申请人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
发明人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
IPC分类号： G02B5/30
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

62. 发明申请

US20060077369A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060077369A1
公开(公告)日：2006-04-13
申请号：US10959403
申请日：2004-10-07
申请人： Christian Wagner
发明人： Christian Wagner
IPC分类号： G03B27/52
CPC分类号： G03F7/70258 , G03F7/70341
摘要： A final element of a projection system of an immersion lithographic apparatus is configured for a liquid having a refractive index greater than a refractive index of the final element. In an embodiment, the final element comprises a convex meniscus shaped lens. Such a final element enables the effective numerical aperture of the lithographic apparatus to be increased and reduce total internal reflection of the projected beam as it passes through the final element to the liquid.
摘要翻译：浸没式光刻设备的投影系统的最终元件被配置为具有大于最终元件的折射率的折射率的液体。在一个实施例中，最终元件包括凸起的弯月面形透镜。这样的最终元件使得能够增加光刻设备的有效数值孔径，并且当投影光束通过最终元件到液体时，能够减少投射光束的全内反射。

63. 发明申请

US20050134967A1 PROJECTION LENS AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：投影镜头和微观投影曝光装置
公开(公告)号：US20050134967A1
公开(公告)日：2005-06-23
申请号：US10906737
申请日：2005-03-03
申请人： Martin Brunotte , Jurgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
发明人： Martin Brunotte , Jurgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
IPC分类号： G02B7/02 , G02B1/02 , G02B5/30 , G03F7/20 , H01L21/027 , G02B3/00 , G02B9/00
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G03F7/70241 , G03F7/70825 , G03F7/70966
摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.
摘要翻译：用于微光刻的投影曝光装置具有光源，照明系统，掩模定位系统和投影透镜。后者具有系统孔径平面和图像平面，并且包含由具有取决于透射角的双折射材料制成的至少一个透镜。曝光装置还具有光学元件，其具有位置相关的偏振旋转效果或位置相关的双折射。靠近投影曝光装置的光瞳平面设置的该元件至少部分补偿由至少一个透镜在图像平面中产生的双折射效应。

64. 发明申请

US20050083506A1 Projection exposure system for microlithography and method for generating microlithographic images 失效
公开(公告)号：US20050083506A1
公开(公告)日：2005-04-21
申请号：US10984161
申请日：2004-11-09
申请人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
发明人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
IPC分类号： G02B19/00 , G02B5/30 , G02B17/08 , G02B27/28 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/54
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/28 , G03B27/72 , G03F7/70125 , G03F7/70225 , G03F7/70566
摘要： A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.

65. 发明授权

US06879379B2 Projection lens and microlithographic projection exposure apparatus 失效
标题翻译：投影镜头和微光刻投影曝光装置
公开(公告)号：US06879379B2
公开(公告)日：2005-04-12
申请号：US10714573
申请日：2003-11-14
申请人： Martin Brunotte , Jürgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
发明人： Martin Brunotte , Jürgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
IPC分类号： G02B7/02 , G02B1/02 , G02B5/30 , G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G03F7/70241 , G03F7/70825 , G03F7/70966
摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.
摘要翻译：用于微光刻的投影曝光装置具有光源，照明系统，掩模定位系统和投影透镜。后者具有系统孔径平面和图像平面，并且包含由具有取决于透射角的双折射材料制成的至少一个透镜。曝光装置还具有光学元件，其具有位置相关的偏振旋转效果或位置相关的双折射。靠近投影曝光装置的光瞳平面设置的该元件至少部分补偿由至少一个透镜在图像平面中产生的双折射效应。

66. 发明授权

US06825913B1 Reticle with crystal support material and pellicle 失效
标题翻译：带有晶体支撑材料和防护薄膜的标线片
公开(公告)号：US06825913B1
公开(公告)日：2004-11-30
申请号：US09261080
申请日：1999-03-02
申请人： Karl-Heinz Schuster , Christian Wagner
发明人： Karl-Heinz Schuster , Christian Wagner
IPC分类号： G03B2752
CPC分类号： G03F1/62 , G03F1/60 , G03F1/64 , G03F7/70566 , G03F7/70875 , G03F7/7095
摘要： An illumination equipment for microlithography has an illumination system, and a reticle with magnesium fluoride as the support material. The illumination system provides radially polarized light, and the magnesium fluoride is oriented with its principal axis about in the direction of the optical axis (A) at the reticle. In addition, a suitable cooling system is described.
摘要翻译：用于微光刻的照明设备具有照明系统和具有氟化镁作为支撑材料的掩模版。照明系统提供径向偏振光，并且氟化镁以其主轴线在光罩的光轴（A）方向上定向。此外，描述了合适的冷却系统。

67. 发明授权

US06388823B1 Optical system, especially a projection light facility for microlithography 有权
标题翻译：光学系统，特别是用于微光刻的投影光设备
公开(公告)号：US06388823B1
公开(公告)日：2002-05-14
申请号：US09486017
申请日：2000-07-22
申请人： Erwin Gaber , Christian Wagner , Hubert Holderer , Michael Gerhard , Erich Merz , Jochen Becker , Arie Cornelis Scheiberlich
发明人： Erwin Gaber , Christian Wagner , Hubert Holderer , Michael Gerhard , Erich Merz , Jochen Becker , Arie Cornelis Scheiberlich
IPC分类号： G02B702
CPC分类号： G03F7/70825 , G02B7/023 , G02B7/028 , G02B27/0068 , G03F7/70241 , G03F7/70358 , G03F7/70783
摘要： An optical system, in particular a projection exposure device for microlithography, with a slit-shaped image field or illumination which is not rotationally symmetrical, has an optical element, in particular, a lens or a mirror which is arranged in a mount (2), and actuators (3) which engage on the optical element (1) at least approximately perpendicularly to the optical axis. The actuators (3) bring about forces and or moments, which are not rotationally symmetrical and which deviate from the radial, on the optical element (1), for the production of bendings which take place substantially without thickness changes.
摘要翻译：光学系统，特别是用于微光刻的投影曝光装置，具有狭缝形的图像场或不是旋转对称的照明，具有光学元件，特别是布置在安装件（2）中的透镜或反射镜，，以及致动器（3），其至少大致垂直于光轴接合在光学元件（1）上。致动器（3）在光学元件（1）上产生不是旋转对称的并且与径向偏离的力或力矩，用于产生基本上没有厚度变化的弯曲。

68. 发明授权

US10125057B2 Use of a solid for the production of a propellant powder 有权
公开(公告)号：US10125057B2
公开(公告)日：2018-11-13
申请号：US14128443
申请日：2012-03-28
申请人： Beat Vogelsanger , Bruno Ossola , Alexander Huber , Christian Wagner , Oliver Hampel
发明人： Beat Vogelsanger , Bruno Ossola , Alexander Huber , Christian Wagner , Oliver Hampel
IPC分类号： C06B45/04 , C06B21/00 , C06B45/00 , C06B45/22 , B29B13/02
摘要： For production of a propellant charge powder, especially for medium and large calibers, in a process in which the solid is incorporated together with a liquid in a mixing and drying process into the channels of a granular green material and compacted therein to form a plug, the solid, under otherwise identical process conditions, is set within a setting range of >0-0.5% by weight based on the weight of the granular green material. For more significant lowering of the maximum pressure within an upper temperature range and for more significant raising of the maximum pressure within a lower temperature range of the application temperature range, an increased amount of solid is used. The solid is a substance whose melting point is at least 10° C., especially 20° C., above a maximum use temperature of the propellant charge powder and which is inert toward the granular green material. Since the plug consists virtually exclusively of inert material, a high ballistic stability is achieved.

69. 发明授权

US09119280B2 Radiation source 有权
标题翻译：辐射源
公开(公告)号：US09119280B2
公开(公告)日：2015-08-25
申请号：US14234982
申请日：2011-12-13
申请人： Antonius Theodorus Wilhelmus Kempen , Erik Roelof Loopstra , Christian Wagner , Henricus Gerardus Tegenbosch , Gerardus Hubertus Petrus Maria Swinkels
发明人： Antonius Theodorus Wilhelmus Kempen , Erik Roelof Loopstra , Christian Wagner , Henricus Gerardus Tegenbosch , Gerardus Hubertus Petrus Maria Swinkels
IPC分类号： G21K5/00 , H05G2/00 , G03F7/20
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： A radiation source includes a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser radiation directed at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma; and a catch configured to catch fuel droplets that pass the plasma formation location. The catch includes a container configured to contain a fluid; a driver configured to drive the fluid, to cause the fluid to move; the catch being configured such that the fuel droplets are incident on that moving fluid.
摘要翻译：辐射源包括：喷嘴，其构造成沿着等离子体形成位置的轨迹引导燃料液滴流; 配置成输出激光辐射的激光器，引导到等离子体形成位置处的燃料液滴处的激光辐射，以在使用中产生辐射产生等离子体; 以及构造成捕获通过等离子体形成位置的燃料液滴的挡块。捕获器包括构造成容纳流体的容器; 驱动器，配置成驱动流体，使流体移动; 捕捉器构造成使得燃料液滴入射到该移动流体上。

70. 发明授权

US08901942B2 System for locating and identifying at least two separate items 有权
标题翻译：用于定位和识别至少两个单独项目的系统
公开(公告)号：US08901942B2
公开(公告)日：2014-12-02
申请号：US13469727
申请日：2012-05-11
申请人： Immanuel Fergen , Martin Schmitt-Lewen , Christian Wagner
发明人： Immanuel Fergen , Martin Schmitt-Lewen , Christian Wagner
IPC分类号： G01R27/26 , G06F3/044 , G06K7/08
CPC分类号： G06F3/044 , G06K7/081
摘要： A system for locating and identifying at least two separate items, for example packaging, includes a capacitive first sensor detecting a first measuring region at a first position of a sensor device, for example a sensor film on a shelf bottom for packaging, a capacitive second sensor detecting a second measuring region at a second position, differing from the first position, of the sensor device, an electrically conductive first mark of a first item in the measuring region of one sensor, an electrically conductive second mark of a second item in the measuring region of the other sensor, and an evaluation device evaluating signals from the sensors, the signals caused or changed by electrical conductivity of the marks. Items can be capacitively detected and information obtained can be used to improve warehousing. The sensors and the marks can be produced quickly and cost-effectively by printing processes or film transfer.
摘要翻译：用于定位和识别至少两个分开的物品（例如包装）的系统包括电容式第一传感器，其检测传感器设备的第一位置处的第一测量区域，例如用于包装的搁板底部的传感器膜，电容式第二传感器传感器检测与传感器装置的第一位置不同的第二位置处的第二测量区域，一个传感器的测量区域中的第一项目的导电第一标记，第二项目的导电第二标记另一传感器的测量区域，以及评估来自传感器的信号的评估装置，由标记的电导率引起或改变的信号。物品可以被电容检测，所获得的信息可用于改进仓储。传感器和标记可以通过印刷过程或胶片转印快速，经济高效地生产。

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