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    • 58. 发明授权
    • Method for producing high energy electroluminescent devices
    • 高能电致发光器件的制造方法
    • US5151383A
    • 1992-09-29
    • US307154
    • 1989-02-06
    • Bernard S. MeyersonBruce A. ScottDonald J. Wolford, Jr.
    • Bernard S. MeyersonBruce A. ScottDonald J. Wolford, Jr.
    • C23C16/24C23C16/46H01L33/00H01L33/18
    • H01L33/18C23C16/24C23C16/46C23C16/463H01L33/0012H01L33/0033H01L33/0058
    • A method is described for fabricating electroluminescent devices exhibiting visible electroluminescence at room temperature, where the devices include at least one doped layer of amorphous hydrogenated silicon (a-Si:H). The a-Si:H layer is deposited on a substrate by homogeneous chemical vapor deposition (H-CVD) in which the substrate is held at a temperature lower than about 200.degree. C. and the a-Si:H layer is doped in-situ during deposition, the amount of hydrogen incorporated in the deposited layer being 12-50 atomic percent. The bandgap of the a-Si:H layer is between 1.6 and 2.6 eV, and in preferrable embodiments is between 2.0 and 2.6 eV. The conductivity of the a-Si:H layer is chosen in accordance with device requirements, and can be 10.sup.16 -10.sup.19 carriers/cm.sup.2. The bandgap of the a-Si:H layer depends at least in part on the temperature of the substrate on which the layer is deposited, and can be "tuned" by changing the substrate temperature.
    • 描述了一种用于制造在室温下显示可见电致发光的电致发光器件的方法,其中器件包括至少一个非晶氢化硅掺杂层(a-Si:H)。 通过均匀化学气相沉积(H-CVD)将a-Si:H层沉积在衬底上,其中衬底保持在低于约200℃的温度,并且a-Si:H层被掺杂在 在沉积期间原位,沉积层中掺入的氢的量为12-50原子%。 a-Si:H层的带隙在1.6和2.6eV之间,优选的实施方案是在2.0和2.6eV之间。 a-Si:H层的电导率根据器件要求选择,可以为1016-1019载体/ cm2。 a-Si:H层的带隙至少部分取决于沉积该层的衬底的温度,并且可以通过改变衬底温度“调谐”。
    • 60. 发明授权
    • Electroluminescent device
    • 电致发光器件
    • US3786315A
    • 1974-01-15
    • US3786315D
    • 1972-04-03
    • INTEL CORP
    • MEAD CMCCALDIN J
    • H01L21/441H01L33/00H01L33/02H01L33/28H01L3/00H05B33/00
    • H01L33/28H01L21/441H01L33/00H01L33/0033H01L33/025
    • A direct current electroluminescent device for room temperature generation of blue and green light at low voltages and power levels, comprising a body of n-type zinc sulfide of low resistivity and high luminescent efficiency containing a first surface region treated to form an ohmic electron injection contact and a second region treated to contain within a thin layer of below 1 micron at least 1017 cm 3 of a Group I metal hole injection states which have an energy level intermediate the valence band of zinc sulfide and the Fermi level of a metal contact electrode and states which generate under bias a net negative charge within the layer. An electronegative metal electrode is applied to the layer and a relatively electropositive metal electrode is applied by to the first surface region. When a forward bias is applied to the device, electrons are injected into the first region and the net negative charge generated in the layer raises the energy of the hole injection states toward the metal Fermi level to permit hole injection. The injected holes and electrons combine at recombination centers in sufficient numbers at room temperature to emit radiation visible under ordinary illumination.
    • 一种用于在低电压和功率水平下产生蓝绿色光的室温直流电致发光器件,包括具有低电阻率和高发光效率的n型硫化锌体,其包含处理以形成欧姆电子注入接触的第一表面区域 以及第二区域,被处理为在具有中等于硫化锌的价带和金属的费米能级的能级处于1微米以下的至少1017厘米3的I类金属空穴注入状态的薄层中 接触电极和在该偏压下产生净负电荷的状态。