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51. 发明申请

US20060055907A1 Projection optical system, exposure apparatus, and device manufacturing method 失效
标题翻译：投影光学系统，曝光装置和装置制造方法
公开(公告)号：US20060055907A1
公开(公告)日：2006-03-16
申请号：US11267858
申请日：2005-11-03
申请人： Takashi Kato , Chiaki Terasawa
发明人： Takashi Kato , Chiaki Terasawa
IPC分类号： G03B27/54
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A projection optical system for projecting an image of a first object onto a second object includes a first imaging optical system that forms a first intermediate image of the first object, and includes a lens, a second imaging optical system that forms a second intermediate image of the first object, and includes a lens and a concave mirror, and a third imaging optical system that forms an image of the first object onto the second object, and includes a lens, wherein the first, second and third imaging optical systems are arranged along an optical path from the first object in this order, and 0.7
摘要翻译：一种用于将第一物体的图像投影到第二物体上的投影光学系统包括形成第一物体的第一中间图像的第一成像光学系统，并且包括透镜，第二成像光学系统，其形成第二物镜的第二中间图像第一物体，并且包括透镜和凹面镜，以及第三成像光学系统，其在第二物体上形成第一物体的图像，并且包括透镜，其中第一，第二和第三成像光学系统沿着第一成像光学系统的近轴放大倍数为β1，第二成像光学系统的近轴倍率为β2，满足0.7 <| lbeta1beta2 | <3.0的光路。

52. 发明授权

US07006284B2 Apparatus for viewing and analyzing ultraviolet beams 有权
标题翻译：用于观察和分析紫外线的装置
公开(公告)号：US07006284B2
公开(公告)日：2006-02-28
申请号：US10847548
申请日：2004-05-17
申请人： William C. Fricke
发明人： William C. Fricke
IPC分类号： G02B13/14 , G01J1/58
CPC分类号： G03F7/70133 , G02B13/143 , G02B13/16
摘要： An imaging apparatus for DUV beams is provided which includes a lens for receiving a DUV beam and producing an image of the DUV beam, wherein the lens has an aplanatic surface and a hemispheric surface, and wherein at least the aplanatic surface is made from or otherwise has a down-converting medium for producing a down-converted beam; an image sensing member for viewing an image of the down-converted beam; and optics for relaying the image of the down-converted beam from the lens to the image sensing member. A processor can be communicated with the image sensing member for analyzing the image of the DUV beam.
摘要翻译：提供了一种用于DUV光束的成像装置，其包括用于接收DUV光束并产生DUV光束的图像的透镜，其中所述透镜具有平坦表面和半球面，并且其中至少所述平行表面由或由其制成具有用于产生下变频束的下变频介质; 用于观看下变频束的图像的图像感测构件; 以及用于将下转换的光束的图像从透镜中继到图像感测部件的光学装置。处理器可以与图像感测构件通信，用于分析DUV光束的图像。

53. 发明申请

US20060007532A1 Catadioptric optical system and exposure apparatus having the same 审中-公开
标题翻译：反折射光学系统和具有该反射光学系统的曝光装置
公开(公告)号：US20060007532A1
公开(公告)日：2006-01-12
申请号：US11225721
申请日：2005-09-13
申请人： David Shafer
发明人： David Shafer
IPC分类号： G02B17/00 , G02B21/00 , G02B23/00
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A projection exposure lens system has an object side catadioptric system, an intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.
摘要翻译：投影曝光透镜系统具有物体侧反射折射系统，中间像和折射透镜系统。折射透镜系统从其中间像侧并且在其图像平面的方向上具有正屈光力的第一透镜组，负折光力的第二透镜组，正折光力的第三透镜组，第四透镜组负折射光焦度和正屈光力的第五透镜组。

54. 发明申请

US20050254122A1 Apparatus for viewing and analyzing ultraviolet beams 有权
标题翻译：用于观察和分析紫外线的装置
公开(公告)号：US20050254122A1
公开(公告)日：2005-11-17
申请号：US10847548
申请日：2004-05-17
申请人： William Fricke
发明人： William Fricke
IPC分类号： G02B13/14 , G02B13/16 , G03F7/20
CPC分类号： G03F7/70133 , G02B13/143 , G02B13/16
摘要： An imaging apparatus for DUV beams is provided which includes a lens for receiving a DUV beam and producing an image of the DUV beam, wherein the lens has an aplanatic surface and a hemispheric surface, and wherein at least the aplanatic surface is made from or otherwise has a down-converting medium for producing a down-converted beam; an image sensing member for viewing an image of the down-converted beam; and optics for relaying the image of the down-converted beam from the lens to the image sensing member. A processor can be communicated with the image sensing member for analyzing the image of the DUV beam.
摘要翻译：提供了一种用于DUV光束的成像装置，其包括用于接收DUV光束并产生DUV光束的图像的透镜，其中所述透镜具有平坦表面和半球面，并且其中至少所述平行表面由或以其他方式制成具有用于产生下变频束的下变频介质; 用于观看下变频束的图像的图像感测构件; 以及用于将下转换的光束的图像从透镜中继到图像感测部件的光学装置。处理器可以与图像感测构件通信，用于分析DUV光束的图像。

55. 发明授权

US06961186B2 Contact printing using a magnified mask image 有权
标题翻译：使用放大掩模图像联系打印
公开(公告)号：US06961186B2
公开(公告)日：2005-11-01
申请号：US10672620
申请日：2003-09-26
申请人： Christophe Pierrat , Alfred Kwok-Kit Wong
发明人： Christophe Pierrat , Alfred Kwok-Kit Wong
IPC分类号： G02B13/14 , G03F7/20 , G02B9/00
CPC分类号： G03F7/70241 , G02B13/143
摘要： Improvements in the fabrication of integrated circuits are driven by the decrease of the size of the features printed on the wafers. Current lithography techniques limits have been extended through the use of phase-shifting masks, off-axis illumination, and proximity effect correction. More recently, liquid immersion lithography has been proposed as a way to extend even further the limits of optical lithography. This invention described a methodology based on contact printing using a projection lens to define the image of the mask onto the wafer. As the imaging is performed in a solid material, larger refractive indices can be obtained and the resolution of the imaging system can be increased.
摘要翻译：集成电路制造的改进由印刷在晶片上的特征的尺寸的减小驱动。通过使用相移掩模，离轴照明和接近效应校正，目前的光刻技术限制已得到扩展。最近，已经提出液浸光刻作为进一步扩展光学光刻的限制的一种方式。本发明描述了基于使用投影透镜的接触印刷将掩模的图像定义在晶片上的方法。当以固体材料进行成像时，可以获得更大的折射率并且可以提高成像系统的分辨率。

56. 发明申请

US20050219707A1 Projection objective of a microlithographic exposure apparatus 有权
标题翻译：微光刻曝光设备的投影目标
公开(公告)号：US20050219707A1
公开(公告)日：2005-10-06
申请号：US11097398
申请日：2005-04-01
申请人： Karl-Heinz Schuster , Hans-Juergen Rostalski , Aurelian Dodoc
发明人： Karl-Heinz Schuster , Hans-Juergen Rostalski , Aurelian Dodoc
IPC分类号： G02B3/00 , G02B3/12 , G02B13/14 , G02B27/00 , G03F7/20
CPC分类号： G03F7/70266 , G02B3/12 , G02B13/143 , G02B27/0068 , G03F7/70883 , G03F7/70958
摘要： A projection objective of a microlithographic projection exposure apparatus has a correction device which can correct photoinduced imaging errors without optical elements having to be removed for this purpose. The correction device includes a first optical element and a second optical element, whose surface facing the first optical element is provided with a local surface deformation for improving the imaging properties of the projection objective. In a wall, which seals an intermediate space formed between the first optical element and the second optical element, an opening is provided through which the intermediate space can be filled with a fluid. By modifying the refractive index of the fluid adjacent to the surface, the effect of the surface deformation can be modified in a straightforward way.
摘要翻译：微光刻投影曝光装置的投影物镜具有校正装置，该校正装置可以校正光诱导的成像误差，而不需要为此而移除光学元件。校正装置包括第一光学元件和第二光学元件，其面向第一光学元件的表面设置有用于改善投影物镜的成像特性的局部表面变形。在密封形成在第一光学元件和第二光学元件之间的中间空间的壁中，设置有可以用流体填充中间空间的开口。通过改变与表面相邻的流体的折射率，可以以直接的方式修改表面变形的影响。

57. 发明申请

US20050200966A1 Objective with birefringent lenses 失效
标题翻译：目标双折射镜片
公开(公告)号：US20050200966A1
公开(公告)日：2005-09-15
申请号：US11071523
申请日：2005-03-02
申请人： Michael Totzeck , Vladimer Kamenov , Daniel Kraehmer , Wilhelm Ulrich
发明人： Michael Totzeck , Vladimer Kamenov , Daniel Kraehmer , Wilhelm Ulrich
IPC分类号： G02B1/02 , G02B5/30 , G02B13/14 , G02B13/18 , G03F7/20 , H01L21/027 , G02B3/00 , G02B9/00 , G02B15/14
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G02B13/143 , G03F7/70241 , G03F7/705 , G03F7/70966
摘要： Objective (1, 601), in particular a projection objective for a microlithography projection apparatus, with first birefringent lenses (L108, L109, L129, L130) and with second birefringent lenses (L101-L107, L110-L128). The first lenses (L108, L109, L129, L130) are distinguished from the second lenses (L101-L107, L110-L128) by the lens material used or by the material orientation. After passing through the first lenses (L108, L109, L129, L130) and the second lenses (L101-L107, L110-L128), an outer aperture ray (5, 7) and a principal ray (9) are subject to optical path differences for two mutually orthogonal states of polarization. The difference between these optical path differences is smaller than 25% of the working wavelength. In at least one first lens (L129, L130), the aperture angle of the outer aperture ray (5, 7) is at least 70% of the largest aperture angle occurring for said aperture ray in all of the first lenses (L108, L109, L129, L130) and second lenses (L101-L107, L110-L128). This arrangement has the result that the first lenses (L108, L109, L129, L130) have a combined material volume of no more than 20% of the combined total material volume of the first lenses (L108, L109, L129, L130) and second lenses (L101-L107, L110-L128).
摘要翻译：目的（1，601），特别是具有第一双折射透镜（L 108，L 109，L 129，L 130）和第二双折射透镜（L 101 -L 107，L 110-110）的微光刻投影装置的投影物镜， L 128）。第一透镜（L 108，L 109，L 129，L 130）与所使用的透镜材料或材料取向与第二透镜（L 101 -L 107，L 110 -L 128）不同。在穿过第一透镜（L 108，L 109，L 129，L 130）和第二透镜（L 101 -L 107，L 110 -L 128）之后，外孔光线（5,7）和主光线（9）对于两个相互正交的极化状态经受光程差。这些光程差之差小于工作波长的25％。在至少一个第一透镜（L 129，L 130）中，外孔径光线（5,7）的孔径角度是所有第一透镜中的所述孔径光线发生的最大孔径角的至少70％（L 108，L 109，L 129，L 130）和第二透镜（L 101 -L 107，L 110 -L 128）。这种结构的结果是，第一透镜（L 108，L 109，L 129，L 130）的组合材料体积不超过第一透镜（L 108，L 109，L 130， L 129，L 130）和第二透镜（L 101 -L 107，L 110 -L 128）。

58. 发明申请

US20050180023A1 Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lenses 失效
标题翻译：氟化物晶体透镜优化目标的方法，以及氟化物晶体透镜的目标
公开(公告)号：US20050180023A1
公开(公告)日：2005-08-18
申请号：US11071699
申请日：2005-03-02
申请人： Michael Totzeck , Vladimir Kamenov , Toralf Gruner
发明人： Michael Totzeck , Vladimir Kamenov , Toralf Gruner
IPC分类号： G02B1/02 , G02B5/30 , G02B13/14 , G03F7/20 , G02B3/00
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G02B13/143 , G03F7/70241 , G03F7/705 , G03F7/70966 , Y10S359/90
摘要： A numerical optimizing method serves to reduce harmful effects caused by intrinsic birefringence in lenses of a fluoride crystal material of cubic crystal structure in an objective, particularly a projection objective for a microlithography system. Under the optimizing method, an optimizing function which takes at least one birefringence-related image aberration into account is minimized. The birefringence-related image aberration is determined from a calculation for a light ray passing through the fluoride crystal lenses. To the extent that the birefringence-related image aberration is a function of parameters of the light ray, it depends only on geometric parameters of the light ray. The numerical optimizing method is used to produce objectives in which an optical retardation as well as an asymmetry of the optical retardation are corrected. The lenses are arranged in homogeneous groups, where each homogeneous group is corrected for the optical retardation asymmetry.
摘要翻译：数值优化方法用于减少物镜中的立方晶体结构的氟化物晶体材料的透镜中的固有双折射引起的有害影响，特别是微光刻系统的投影物镜。在优化方法下，考虑到至少一个双折射相关图像像差的优化函数被最小化。从通过氟化物晶体透镜的光线的计算确定双折射相关图像像差。在双折射相关图像像差是光线参数的函数的程度上，其仅取决于光线的几何参数。使用数值优化方法来产生其中光学延迟以及光学延迟的不对称性被校正的目标。透镜被排列成均匀的组，其中每个均匀组被校正用于光学延迟不对称。

59. 发明申请

US20050141098A1 Very high-aperture projection objective 有权
标题翻译：非常高孔径的投影物镜
公开(公告)号：US20050141098A1
公开(公告)日：2005-06-30
申请号：US10935321
申请日：2004-09-08
申请人： Karl-Heinz Schuster
发明人： Karl-Heinz Schuster
IPC分类号： G02B13/24 , G02B13/14 , G02B13/18 , G03F7/20 , H01L21/027 , G02B3/00 , G02B9/00
CPC分类号： G02B13/143 , G03F7/70241 , G03F7/70341
摘要： A very high-aperture, purely refractive projection objective having a multiplicity of optical elements has a system diaphragm (5) arranged at a spacing in front of the image plane. The optical element next to the image plane (3) of the projection objective is a planoconvex lens (34) having a substantially spherical entrance surface and a substantially flat exit surface. The planoconvex lens has a diameter that is at least 50% of the diaphragm diameter of the system diaphragm (5). It is preferred to arrange only positive lenses (32, 33, 34) between the system diaphragm (5) and image plane (3). The optical system permits imaging in the case of very high apertures of NA≧0.85, if appropriate of NA≧1.
摘要翻译：具有多个光学元件的非常高孔径的纯折射投影物镜具有在像平面前方以间隔排列的系统光阑（5）。靠近投影物镜的像面（3）的光学元件是具有基本上球形的入射表面和基本上平坦的出射表面的平凸透镜（34）。平凸透镜的直径至少为系统隔膜（5）的膜片直径的50％。优选仅在系统隔膜（5）和图像平面（3）之间布置正透镜（32,33,34）。在NA> = 0.85的非常高的孔径的情况下，如果NA> = 1，光学系统允许成像。

60. 发明授权

US06898025B2 Projection aligner and optical system therefor 有权
标题翻译：投影对准器及其光学系统
公开(公告)号：US06898025B2
公开(公告)日：2005-05-24
申请号：US10452236
申请日：2003-06-03
申请人： Shuichi Takeuchi , Yutaka Takakubo
发明人： Shuichi Takeuchi , Yutaka Takakubo
IPC分类号： G02B13/14 , G03F7/20 , G02B17/00
CPC分类号： G03F7/70225 , G02B13/143 , G03F7/70241
摘要： A projection optical system, which is telecentric with respect to an object side and an image side, projects a pattern onto an image plane, which is substantially parallel with the pattern, at a substantial equi-magnification. The projecting optical system is provided with first and second condenser lenses having a common (first) optical axis which is perpendicular to the pattern and the image plane. The projection optical system further includes an imaging lens having a second optical axis that intersects with the first optical axis at an intermediate position between the first and second condenser lenses. A first mirror reflects a beam from the pattern and passed through the first condenser lens toward the imaging lens. A second mirror reflects the beam passed through the imaging lens to the imaging lens, and a third mirror reflects the beam passed through the imaging lens toward the second condenser lens.
摘要翻译：相对于物体侧和图像侧是远心的投影光学系统以基本上等倍的方式将图案投影到基本上与图案平行的图像平面上。投影光学系统设置有具有垂直于图案和图像平面的公共（第一）光轴的第一和第二聚光透镜。投影光学系统还包括具有在第一和第二聚光透镜之间的中间位置处与第一光轴相交的第二光轴的成像透镜。第一反射镜反射来自图案的光束并且经过第一聚光透镜朝向成像透镜。第二反射镜将通过成像透镜的光束反射到成像透镜，并且第三反射镜将通过成像透镜的光束反射到第二聚光透镜。

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