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51. 发明授权

US09484187B2 Arrangement for transporting radicals 有权
公开(公告)号：US09484187B2
公开(公告)日：2016-11-01
申请号：US14805509
申请日：2015-07-22
申请人： MAPPER LITHOGRAPHY IP B.V.
发明人： Pieter Kruit , Marc Smits
IPC分类号： H01J37/00 , H01J37/317 , H01J37/30 , G03F7/20 , H01J37/32 , B82Y10/00 , B82Y40/00 , F15D1/02 , H01J9/38
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , F15D1/025 , G03F7/70925 , G21K2201/06 , H01J9/38 , H01J37/3007 , H01J37/3177 , H01J37/32862 , H01J2237/006 , H01J2237/022 , H01J2237/327 , Y10T137/2082 , Y10T137/87571
摘要： The invention relates to an arrangement for transporting radicals. An electron beam system is presented comprising a beamlet generator; a beamlet manipulator (204) comprising an array of apertures; a plasma generator comprising a chamber for forming a plasma, an inlet receiving input gas and outlets removing plasma or radicals created therein, the plasma generator further comprising outlets in flow connection with the plasma chamber outlets; and a hollow guiding body (309b) guiding radicals formed in the plasma towards the array of apertures for removing contaminant deposition. The hollow guiding body (309b) is removably connectable to an extended portion (307b) of the plasma generator outlet. A cover (400) can be placed over a connection between the hollow guiding body (309b) and the extended portion (307b). The extended portion (307b) of the plasma generator outlet and the hollow guiding body (309b) can be similarly formed as a slit.

52. 发明授权

US09460954B2 Method of clamping a substrate and clamp preparation unit using capillary clamping force 有权
标题翻译：使用毛细管夹紧力夹紧基板和夹紧准备单元的方法
公开(公告)号：US09460954B2
公开(公告)日：2016-10-04
申请号：US12708543
申请日：2010-02-19
申请人： Hendrik Jan De Jong , Marco Jan-Jaco Wieland
发明人： Hendrik Jan De Jong , Marco Jan-Jaco Wieland
IPC分类号： H01L21/687 , G03F7/20 , H01L21/683
CPC分类号： G03F7/707 , H01L21/6838 , H01L21/68707 , H01L21/68742 , H01L21/6875 , H01L21/68785 , Y10T29/49815 , Y10T29/49998 , Y10T29/53
摘要： The invention relates to a method of clamping a substrate on a surface of a substrate support structure. First, a liquid is applied on a surface of the substrate support structure. The surface is provided with a plurality of contact elements. The liquid is applied such that the contact elements are fully covered by a liquid layer. Then the substrate is provided and placed onto the liquid layer. Finally, liquid underneath the substrate is removed such that the substrate rests on the plurality of contact elements and is clamped by means of a capillary clamping force exerted by a capillary layer of the liquid between the substrate and the surface of the substrate support structure.
摘要翻译：本发明涉及一种在衬底支撑结构的表面上夹持衬底的方法。首先，在衬底支撑结构的表面上施加液体。该表面设置有多个接触元件。施加液体使得接触元件完全被液体层覆盖。然后将衬底提供并放置在液体层上。最后，去除衬底下面的液体，使得衬底搁置在多个接触元件上，并且通过由衬底和衬底支撑结构的表面之间的液体的毛细管层施加的毛细管夹紧力来夹紧。

53. 发明授权

US09244726B2 Network architecture for lithography machine cluster 有权
公开(公告)号：US09244726B2
公开(公告)日：2016-01-26
申请号：US13453008
申请日：2012-04-23
申请人： Erwin Slot , Marcel Nicolaas Jacobus Van Kervinck , Vincent Sylvester Kuiper
发明人： Erwin Slot , Marcel Nicolaas Jacobus Van Kervinck , Vincent Sylvester Kuiper
IPC分类号： G05B15/00 , G06F9/48 , G03F7/20 , H01J37/317 , B82Y10/00 , B82Y40/00
CPC分类号： G06F9/48 , B82Y10/00 , B82Y40/00 , G03F7/70483 , G03F7/70508 , G03F7/70525 , G03F7/70991 , G05B19/41865 , G06F9/4881 , H01J37/3177
摘要： The invention relates to a clustered substrate processing system comprising a plurality of lithography elements. Each lithography element is arranged for independent exposure of substrates according to pattern data, and comprises a plurality of lithography subsystems, a control network arranged for communication of control information between the lithography subsystems and at least one element control unit, the element control unit arranged to transmit commands to the lithography subsystems and the lithography subsystems arranged to transmit responses to the element control unit, and a data network arranged for communication of data logging information from the lithography subsystems to at least one data network hub, the lithography subsystems arranged to transmit data logging information to the data network hub and the data hub arranged for receiving and storing the data logging information. The system further comprises a cluster front-end for interface to an operator or host system.

54. 发明授权

US09201315B2 Lithography system for processing a target, such as a wafer, a method for operating a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system 有权
标题翻译：用于处理诸如晶片的目标的平版印刷系统，用于操作用于处理诸如晶片和用于这种光刻系统的基板的目标的光刻系统的方法
公开(公告)号：US09201315B2
公开(公告)日：2015-12-01
申请号：US13453989
申请日：2012-04-23
申请人： Guido De Boer , Niels Vergeer , Godefridus Cornelius Antonius Couweleers , Laurens Plandsoen , Cor Verburg
发明人： Guido De Boer , Niels Vergeer , Godefridus Cornelius Antonius Couweleers , Laurens Plandsoen , Cor Verburg
IPC分类号： G03B27/68 , G03B27/42 , G03B27/52 , G03B27/32 , G03F9/00 , G03F7/20 , G03B27/58
CPC分类号： G03F9/7088 , G03F7/70616 , G03F7/70666 , G03F7/70775 , G03F7/7085 , G03F9/7023 , G03F9/7053
摘要： The invention relates to a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system. The lithography system comprises a beam source arranged for providing a patterning beam, a final projection system arranged for projecting a pattern on the target surface, a chuck arranged for supporting the target and a mark position system arranged for detecting a position mark on a surface.
摘要翻译：本发明涉及一种用于处理诸如用于这种光刻系统中的晶片和基板的靶的光刻系统。光刻系统包括布置成提供图案化光束的光束源，布置成用于在目标表面上投影图案的最终投影系统，布置成用于支撑目标的卡盘和布置成用于检测表面上的位置标记的标记位置系统。

55. 发明授权

US09163664B2 Guidance for target processing tool 有权
标题翻译：目标处理工具指导
公开(公告)号：US09163664B2
公开(公告)日：2015-10-20
申请号：US13610398
申请日：2012-09-11
申请人： Jerry Johannes Martinus Peijster
发明人： Jerry Johannes Martinus Peijster
IPC分类号： F16C29/00 , G03F7/20 , F16C29/04 , F16C29/12
CPC分类号： F16C29/002 , F16C29/04 , F16C29/123 , F16C2370/00 , G03F7/2014 , G03F7/70816
摘要： The invention relates to a target processing tool, comprising a target carrier guidance assembly, said target carrier guidance assembly comprising: a guide surface having a longitudinal axis in a first direction, a target carrier for carrying and displacing a target along said first direction, a bearing support mounted to the target carrier by means of a flexible mount, a bearing arranged between the guide surface and the bearing support, and a biasing element, connected to the target carrier and to the bearing support, adapted for biasing said bearing support along a second direction against the bearing, wherein preferably said second direction is perpendicular to said first direction.
摘要翻译：本发明涉及一种目标处理工具，其包括目标载体引导组件，所述目标载体引导组件包括：具有沿第一方向的纵轴的引导表面，用于沿着所述第一方向承载和移位目标的目标载体，轴承支撑件通过柔性安装件安装到目标载体上，布置在引导表面和轴承支撑件之间的轴承以及连接到目标载体和轴承支撑件的偏置元件，该偏置元件适于沿着第二方向抵靠轴承，其中优选地，所述第二方向垂直于所述第一方向。

56. 发明授权

US09117631B2 Method of handling a substrate support structure in a lithography system 有权
标题翻译：在光刻系统中处理衬底支撑结构的方法
公开(公告)号：US09117631B2
公开(公告)日：2015-08-25
申请号：US13860620
申请日：2013-04-11
申请人： Mapper Lithography IP B.V.
发明人： Hendrik Jan De Jong
IPC分类号： H01J37/00 , H01J37/317 , B82Y10/00 , B82Y40/00 , H01L21/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01L21/00
摘要： Method of handling a substrate support structure for clamping a substrate on a surface thereof in a lithography system. First, a substrate support structure adapted to absorb energy from a substrate clamped thereon and a substrate are provided. The substrate is clamped on a surface of the substrate support structure. The substrate support structure with the substrate clamped thereon is transferred to a lithography apparatus, in which a lithographic process is performed on the substrate clamped onto the substrate support structure. The substrate support structure with the substrate clamped thereon is then removed from the lithography system. The substrate is removed from the substrate support structure, and the substrate support structure is conditioned by removing energy stored in the substrate support structure before providing a new substrate onto the substrate support structure.
摘要翻译：处理基板支撑结构以在基板的表面上夹持基板的方法。首先，提供适于从夹持在其上的基板和基板吸收能量的基板支撑结构。衬底被夹持在衬底支撑结构的表面上。将其上夹有衬底的衬底支撑结构转移到光刻设备，其中在夹持在衬底支撑结构上的衬底上进行光刻工艺。然后将其上夹有衬底的衬底支撑结构从光刻系统移除。从衬底支撑结构移除衬底，并且通过在将衬底提供到衬底支撑结构上之前去除存储在衬底支撑结构中的能量来调节衬底支撑结构。

57. 发明申请

US20150144789A1 VACUUM CHAMBER WITH BASE PLATE 有权
标题翻译：真空室与基板
公开(公告)号：US20150144789A1
公开(公告)日：2015-05-28
申请号：US14344067
申请日：2012-09-12
申请人： Jerry Johannes Martinus Peijster
发明人： Jerry Johannes Martinus Peijster
IPC分类号： G03F7/20 , G01N21/88 , H01J37/26 , H01J37/317 , H01J37/16 , H01J37/20
CPC分类号： G03F7/2014 , B82Y10/00 , B82Y40/00 , G01N21/88 , G01N2201/022 , G03F7/70841 , G03F7/7085 , H01J37/16 , H01J37/18 , H01J37/20 , H01J37/24 , H01J37/261 , H01J37/3174 , H01J37/3177 , H01J2237/28 , H01L21/6719
摘要： A target processing machine (100), such as a lithography or inspection machine, comprising a rigid base plate (150), a projection column (101) for projecting one or more optical or particle beams on to a target (130), a support frame (102) supporting the projection column, the support frame being supported by and fixed to the base plate, a stage comprising a movable part (128) for carrying the target and a fixed part (132, 133) being supported by and fixed to the base plate, a beam sensor (160) for detecting one or more of the beams projected by the column, the beam sensor at least in part being supported by and fixed to the base plate, and a vacuum chamber (110) enclosing the support frame and the column, for maintaining a vacuum environment in the interior space of the chamber, the vacuum chamber formed with the base plate forming part thereof and supporting a plurality of wall panels (171, 172) including a plurality of side wall panels (171) supported by and fixed thereto.
摘要翻译：目标处理机（100），例如光刻或检查机器，其包括刚性基板（150），用于将一个或多个光学或粒子束投射到目标（130）的投影柱（101），支撑框架（102），其支撑所述突出柱，所述支撑框架由所述基板支撑并固定到所述基板;舞台，包括用于承载所述目标的可移动部分（128）和固定部分（132,133）所述基板，用于检测由所述列突出的一个或多个光束的光束传感器（160），所述光束传感器至少部分地由所述基板支撑并固定到所述基板;以及真空室（110），其围绕所述支撑框架和柱，用于在室的内部空间中保持真空环境，真空室形成有基板，形成其一部分，并且支撑包括多个侧壁板（171）的多个壁板（171,172））由其支撑并固定。

58. 发明授权

US08916837B2 Charged particle lithography system with intermediate chamber 有权
标题翻译：具有中间室的带电粒子光刻系统
公开(公告)号：US08916837B2
公开(公告)日：2014-12-23
申请号：US14061847
申请日：2013-10-24
申请人： Mapper Lithography IP B.V.
发明人： Laura Dinu-Gürtler , Willem Henk Urbanus , Marco Jan-Jaco Wieland , Stijn Willem Herman Karel Steenbrink
IPC分类号： H01J37/147 , H01J37/10 , G03B27/26 , G21K5/04 , H01J37/317 , H01J37/301 , H01J37/16 , B82Y10/00 , H01J37/09 , H01J37/18 , B82Y40/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/16 , H01J37/18 , H01J37/301 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/188
摘要： A charged particle lithography system for transferring a pattern onto the surface of a target, comprising a source for generating a charged particle beam, a first chamber housing the source, a collimating system for collimating the charged particle beam, a second chamber housing the collimating system, and a first aperture array element for generating a plurality of charged particle subbeams from the collimated charged particle beam.
摘要翻译：一种用于将图案转印到目标表面上的带电粒子光刻系统，包括用于产生带电粒子束的源，容纳源的第一室，用于准直带电粒子束的准直系统;容纳准直系统的第二室以及用于从准直带电粒子束产生多个带电粒子子束的第一孔阵列元件。

59. 发明授权

US08890095B2 Reliability in a maskless lithography system 有权
标题翻译：无掩模光刻系统的可靠性
公开(公告)号：US08890095B2
公开(公告)日：2014-11-18
申请号：US11492572
申请日：2006-07-24
申请人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit , Marco Jan-Jaco Wieland
发明人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit , Marco Jan-Jaco Wieland
IPC分类号： H01J37/15 , G03F7/20 , B82Y40/00 , H01J37/317 , B82Y10/00
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , G03F7/70291 , G03F7/70425 , H01J2237/31757
摘要： A maskless lithography system for transferring a pattern onto a surface of a target. At least one beamlet optical unit generates a plurality of beamlets. At least one measuring unit measures properties of each beamlet. At least one control unit generates and delivers pattern data to the beamlet optical unit. The control unit is operationally coupled to the measuring unit for identifying invalid beamlets which have a measured property value outside a predefined range of values for the property. At least one actuator induces a shift of the beamlet optical unit and the target with respect to one another. The actuator is operationally coupled with the control unit. The control unit determines the shift, positioning valid beamlets at the position of the invalid beamlets, thus replacing the invalid beamlets with valid beamlets.
摘要翻译：一种用于将图案转印到目标表面上的无掩模光刻系统。至少一个子束光学单元产生多个子束。至少一个测量单元测量每个子束的性质。至少一个控制单元生成并将模式数据传送到子束光学单元。控制单元可操作地耦合到测量单元，用于识别具有超出该属性的预定义值范围的测量属性值的无效子束。至少一个致动器引起子束光学单元和目标相对于彼此的偏移。致动器可操作地与控制单元耦合。控制单元确定移位，在无效子束的位置定位有效子束，从而用有效的子束替换无效子束。

60. 再颁专利

USRE44908E1 Electron beam exposure system 有权
标题翻译：电子束曝光系统
公开(公告)号：USRE44908E1
公开(公告)日：2014-05-27
申请号：US13343036
申请日：2012-01-04
申请人： Marco Jan-Jaco Wieland , Bert Jan Kampherbeek , Alexander Hendrik Vincent Van Veen , Pieter Kruit
发明人： Marco Jan-Jaco Wieland , Bert Jan Kampherbeek , Alexander Hendrik Vincent Van Veen , Pieter Kruit
IPC分类号： H01J37/30 , H01J37/304 , H01J37/06
CPC分类号： H01J3/02 , B82Y10/00 , B82Y40/00 , H01J37/06 , H01J37/3177 , H01J2237/0435 , H01J2237/06308 , H01J2237/06375 , H01J2237/3045
摘要： The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.
摘要翻译：本发明涉及一种用于将图案转印到目标表面上的电子束曝光装置，包括：用于产生多个电子束的小波发生器; 用于接收所述多个电子子束的调制阵列，包括用于调制电子束的强度的多个调制器; 连接到用于单独控制调制器的调制阵列的控制器，可操作地连接到每个调制器的调节器，用于单独调整每个调制器的控制信号; 一种聚焦电子光学系统，包括静电透镜阵列，其中每个透镜将由所述调制阵列传输的相应单独的子束聚焦成小于300nm的横截面，以及用于将其曝光表面保持在其上的靶保持器其图案将在聚焦电子光学系统的第一焦平面中转印。

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