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    • 51. 发明申请
    • METHOD INTEGRATING TARGET OPTIMIZATION AND OPTICAL PROXIMITY CORRECTION
    • 方法集成目标优化和光学近似校正
    • US20160291458A1
    • 2016-10-06
    • US14753192
    • 2015-06-29
    • Daquan HeFang WeiJun ZhuYukun LvXusheng Zhang
    • Daquan HeFang WeiJun ZhuYukun LvXusheng Zhang
    • G03F1/36G06F17/50
    • G03F1/36
    • A method integrating target optimization and optical proximity correction including: fragmenting sides of a target pattern in the metal layer to form a plurality of fragments; simulating the target pattern and calculating image log slope of each fragment; calculating a target pattern optimal parameter for each fragment which is a product of three parameters including the image log slope, overlap ratio of the target pattern and a via pattern in a via layer, and critical dimension; optimizing the target pattern based on the target pattern optimal parameter; preforming optical proximity correction to the optimized target pattern; determining whether the corrected target pattern meets requirements; if yes, ending the target optimization and optical proximity correction; otherwise, using the corrected target pattern as a current target pattern and iterate from the step of simulating the target pattern and calculating image log slope of each fragment.
    • 一种集成目标优化和光学邻近校正的方法,包括:金属层中的目标图案的碎裂边以形成多个碎片; 模拟目标模式并计算每个片段的图像对数斜率; 计算每个片段的目标图案最优参数,该三个参数的乘积包括图像对数斜率,目标图案的重叠率和通孔层中的通孔图案以及临界尺寸; 基于目标模式优化参数优化目标模式; 对优化的目标图案进行光学邻近校正; 确定校正的目标模式是否满足要求; 如果是,结束目标优化和光学邻近校正; 否则,使用校正的目标图案作为当前目标图案,并且从模拟目标图案的步骤并且计算每个片段的图像对数斜率来迭代。