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51. 发明授权

US06255041B1 Method for formation of patterned resist layer 有权
标题翻译：图案化抗蚀剂层的形成方法
公开(公告)号：US06255041B1
公开(公告)日：2001-07-03
申请号：US09291114
申请日：1999-04-14
申请人： Katsumi Oomori , Hiroto Yukawa , Ryusuke Uchida , Kazufumi Sato
发明人： Katsumi Oomori , Hiroto Yukawa , Ryusuke Uchida , Kazufumi Sato
IPC分类号： G03F726
CPC分类号： G03F7/38 , G03F7/0045 , G03F7/039
摘要： Disclosed is a method for forming an extremely finely patterned resist layer on a substrate surface by using a positive-working chemical-amplification photoresist composition in the manufacturing process of semiconductor devices. The method for the formation of a patterned resist layer comprises the steps of: (1) forming, on a substrate, a layer of a photoresist composition comprising: (A) a copolymeric resin consisting of (a) from 50 to 85% by moles of hydroxyl group-containing styrene units, (b) from 15 to 35% by moles of styrene units and (c) from 2 to 20% by moles of acrylate or methacrylate ester units each having a solubility-reducing group capable of being eliminated in the presence of an acid; and (B) a radiation-sensitive acid-generating agent which is an onium salt containing a fluoroalkyl sulfonate ion having 1 to 10 carbon atoms as the anion such as bis(4-tert-butylphenyl) iodonium nonafluorobutane sulfonate; (2) subjecting the photoresist layer to a first heat treatment at a temperature in the range from 120° C. to 140° C.; (3) subjecting the photoresist layer to pattern-wise exposure to light; (4) subjecting the photoresist layer to a second heat treatment at a temperature in the range from 110° C. to 130° C. but lower than the temperature of the first heat treatment; and (5) subjecting the photoresist layer to a development treatment.
摘要翻译：公开了通过在半导体器件的制造过程中使用正性化学扩增光致抗蚀剂组合物在基板表面上形成极细图案化的抗蚀剂层的方法。用于形成图案化抗蚀剂层的方法包括以下步骤：（1）在基材上形成光致抗蚀剂组合物层，该层包含：（A）由（a）50-85摩尔％的含羟基的苯乙烯单元，（b）15〜35摩尔％的苯乙烯单元，和（c）2〜20摩尔％的具有能够除去的溶解性降低基团的丙烯酸酯或甲基丙烯酸酯单元酸的存在; 和（B）辐射敏感的酸产生剂，其是含有具有1-10个碳原子的氟烷基磺酸根离子作为阴离子的鎓盐，例如双（4-叔丁基苯基）碘鎓九氟丁烷磺酸盐; （2）在120℃至140℃的温度下对光致抗蚀剂层进行第一次热处理; （3）对光致抗蚀剂层进行图案曝光; （4）使光致抗蚀剂层在110℃至130℃的温度下进行第二次热处理，但低于第一次热处理的温度; 和（5）对光致抗蚀剂层进行显影处理。

52. 发明授权

US5976760A Chemical-sensitization resist composition 失效
标题翻译：化学增感抗蚀剂组合物
公开(公告)号：US5976760A
公开(公告)日：1999-11-02
申请号：US898105
申请日：1997-07-22
申请人： Katsumi Oomori , Hideo Hada , Fumitake Kaneko , Mitsuru Sato , Kazufumi Sato , Toshimasa Nakayama
发明人： Katsumi Oomori , Hideo Hada , Fumitake Kaneko , Mitsuru Sato , Kazufumi Sato , Toshimasa Nakayama
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027 , G03C1/492
CPC分类号： G03F7/0045 , Y10S430/12 , Y10S430/122
摘要： Proposed is a novel chemical-sensitization resist composition capable of giving a positively or negatively patterned resist layer of excellent pattern resolution and cross sectional profile of the patterned resist layer with high sensitivity. Characteristically, the resist composition is formulated, as combined with a resinous ingredient which is subject to changes in the solubility behavior in an alkaline developer solution by interaction with an acid, with a specific oximesulfonate compound as the radiation-sensitive acid-generating agent represented by the general formulaR.sup.1 --C(CN).dbd.N--O--SO.sub.2 --R.sup.2,in which R.sup.1 is an inert organic group and R.sup.2 is an unsubstituted or substituted polycyclic monovalent hydrocarbon group selected from the group consisting of polycyclic aromatic hydrocarbon groups such as naphthyl and polycyclic non-aromatic hydrocarbon groups such as a terpene or camphor residue.
摘要翻译：提出了一种能够以高灵敏度赋予图案化抗蚀剂层优异图案分辨率和截面轮廓的正或负图案化抗蚀剂层的新型化学增感抗蚀剂组合物。特别地，将抗蚀剂组合物配制成与通过与酸相互作用而在碱性显影剂溶液中溶解度行为发生变化的树脂成分与特定的肟磺酸酯化合物作为辐射敏感性产酸剂，通式为R1-C（CN）= NO-SO2-R2，其中R1为惰性有机基团，R2为未取代或取代的多环一价烃基，选自多环芳烃基如萘基和多环非芳族烃基如萜烯或樟脑残基。

53. 发明授权

US5929271A Compounds for use in a positive-working resist composition 失效
标题翻译：用于正性抗蚀剂组合物的化合物
公开(公告)号：US5929271A
公开(公告)日：1999-07-27
申请号：US912123
申请日：1997-08-15
申请人： Hideo Hada , Kazufumi Sato , Hiroshi Komano , Toshimasa Nakayama
发明人： Hideo Hada , Kazufumi Sato , Hiroshi Komano , Toshimasa Nakayama
IPC分类号： C07C69/013 , G03F7/004 , G03F7/039 , C07C69/74
CPC分类号： C07C69/013 , G03F7/0045 , G03F7/039 , Y10S430/115 , Y10S430/122
摘要： Proposed is novel compounds for use in a chemical-sensitization positive-working photoresist composition used in the photolithographic patterning process for the manufacture of fine electronic devices, which is capable of giving, with high photosensitivity to ArF excimer laser beams, a patterned resist layer having an excellently orthogonal cross sectional profile and high resistance against dry etching and exhibiting good adhesion to the substrate surface. While the composition comprises (A) a film-forming resinous ingredient which causes an increase of alkali solubility by interacting with an acid and (B) a radiation-sensitive acid-generating agent, the most characteristic feature of the invention consists in the use of a specific acrylic resin as the component (A), which comprises the monomeric units of a (meth)acrylic acid ester of hydroxy bicyclo�3.1.1!heptanone unsubstituted or substituted by an alkyl group such as hydroxypinanone (meth)acrylate, optionally, in combination with the monomeric units derived from (meth)acrylic acid and/or tert-butyl (meth)acrylate in a molar fraction of 3:7 to 7:3.
摘要翻译：提出了用于制造精细电子器件的光刻图案化方法中使用的化学增感正性光致抗蚀剂组合物中的新化合物，其能够赋予ArF准分子激光束具有高光敏性的图案化抗蚀剂层，其具有具有优异的正交横截面轮廓和高耐干腐蚀性，并且对基材表面表现出良好的粘合性。虽然组合物包含（A）通过与酸相互作用引起碱溶解度增加的成膜树脂成分和（B）辐射敏感的酸产生剂，但是本发明的最特征在于使用作为组分（A）的特定丙烯酸树脂，其包含未被取代或被烷基如羟基酮（甲基）丙烯酸酯取代的羟基双环[3.1.1]庚酮的（甲基）丙烯酸酯的单体单元，与来自（甲基）丙烯酸和/或（甲基）丙烯酸叔丁酯的单体单元组合，摩尔分数为3:7至7:3。

54. 发明授权

US4990836A Motorized automobile antenna control device 失效
标题翻译：电动汽车天线控制装置
公开(公告)号：US4990836A
公开(公告)日：1991-02-05
申请号：US281177
申请日：1988-12-07
申请人： Kazuhiko Nakase , Kazufumi Sato
发明人： Kazuhiko Nakase , Kazufumi Sato
IPC分类号： B60R11/02 , H01Q1/10 , H04B1/08 , H04Q9/00
CPC分类号： H01Q1/103
摘要： In a motorized automobile antenna control device for an antenna system wherein an antenna is raised when power supply of a radio receiver is switched on and lowered when the power supply is switched off, the antenna is prevented from being lowered for a predetermined period of time, for example two to ten seconds, after the power supply of the radio receiver is turned off by a timer so that unnecessary raising and lowering motions of the antenna are prevented when an ignition switch of an automobile is turned on.
摘要翻译：在一种用于天线系统的电动汽车天线控制装置中，当电源关闭时，在无线电接收机的电源被接通和降低时天线被升高，防止天线降低预定时间段，例如在通过定时器关闭无线电接收机的电源之后的两到十秒钟，当汽车的点火开关接通时，防止天线的不必要的升高和降低运动。

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