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    • 51. 发明授权
    • Coating treatment apparatus and coating treatment method
    • 涂层处理装置和涂层处理方法
    • US07479190B2
    • 2009-01-20
    • US11232241
    • 2005-09-22
    • Yoshiteru FukudaTomohiro IsekiTakayuki Ishii
    • Yoshiteru FukudaTomohiro IsekiTakayuki Ishii
    • B05C11/00B05B7/06B05B3/00
    • H01L21/67184H01L21/6708H01L21/6715
    • In the present invention, a plurality of solvent supply nozzles for solvents having different solubility parameters are provided in a coating treatment apparatus. For a solvent supply nozzle for use at the time of edge rinse, a solvent supply nozzle is selected that discharges a removal solvent having a solubility parameter different by a set value or more from that of a coating solvent contained in a coating solution. During coating treatment, the coating solution is discharged from a coating solution supply nozzle onto the central portion of a rotated substrate to form a solution film having a predetermined film thickness. Immediately after the formation, edge rinse is started with the coating solution on the substrate not dry yet, in which the removal solvent is supplied to the peripheral portion of the substrate from the selected solvent supply nozzle. In this event, the supplied removal solvent repels the coating solution on the substrate, so that only the coating solution on the peripheral portion is appropriately removed. According to the present invention, a series of coating treatments including the edge rinse can be carried out in a shorter time.
    • 在本发明中,在涂布处理装置中设置多个用于溶解度参数不同的溶剂的溶剂供给喷嘴。 对于在边缘冲洗时使用的溶剂供给喷嘴,选择将溶解度参数与涂布溶液中所含的涂布溶剂的溶解度参数设定为不同的设定值以上的除去溶剂的溶剂供给喷嘴。 在涂布处理中,将涂布液从涂布液供给喷嘴排出到旋转基板的中央部,形成具有规定膜厚的溶液膜。 在形成之后,立即开始边缘冲洗,底物上的涂布液不干燥,其中从选择的溶剂供应喷嘴将去除溶剂供应到基材的周边部分。 在这种情况下,所提供的去除溶剂将涂布溶液排斥在基材上,从而仅适当地除去外围部分上的涂布溶液。 根据本发明,可以在更短的时间内进行包括边缘冲洗的一系列涂布处理。
    • 52. 发明申请
    • Coating Treatment Method and Coating Treatment Apparatus
    • 涂层处理方法和涂层处理装置
    • US20080193654A1
    • 2008-08-14
    • US11574888
    • 2005-09-13
    • Yoshiteru FukudaTomohiro IsekiTakayuki Ishii
    • Yoshiteru FukudaTomohiro IsekiTakayuki Ishii
    • B05D3/02B05B17/04
    • H01L21/67184G03F7/162G03F7/2028H01L21/6708H01L21/6715H01L21/67178
    • A laser irradiation unit for applying a laser light is provided in a resist coating unit. At the time of resist coating treatment, the resist solution is discharged onto a central portion of the rotated wafer from a resist solution supply nozzle to form a resist film on the wafer. Thereafter, the laser irradiation unit moves to an outer peripheral portion of the wafer and applies the laser light onto the resist film on the outer peripheral portion to dry the resist film on the outer peripheral portion. After the resist film on the outer peripheral portion dries, the application of laser light is continued, and the solvent supply nozzle moves to a position above the edge portion of the wafer and supplies the solvent to the resist film on the edge portion of the wafer. The supply of the solvent dissolves and removes the resist film on the edge portion of the wafer.
    • 在抗蚀剂涂布单元中设置用于施加激光的激光照射单元。 在抗蚀剂涂布处理时,抗蚀剂溶液从抗蚀剂溶液供给喷嘴排出到旋转的晶片的中心部分,以在晶片上形成抗蚀剂膜。 此后,激光照射单元移动到晶片的外周部,并将激光施加到外周部分的抗蚀剂膜上,以干燥外周部分上的抗蚀剂膜。 在外围部分的抗蚀剂膜干燥之后,继续施加激光,并且溶剂供应喷嘴移动到晶片的边缘部分上方的位置,并将溶剂供应到晶片的边缘部分上的抗蚀剂膜 。 溶剂的供应溶解并除去晶片边缘部分上的抗蚀剂膜。
    • 58. 发明授权
    • Ink-jet recording head
    • 喷墨记录头
    • US06554409B2
    • 2003-04-29
    • US09725870
    • 2000-11-30
    • Takayuki Ishii
    • Takayuki Ishii
    • B41J2045
    • B41J2/14233B41J2002/14419
    • An ink-jet recording head can be formed in a small size to use an increased number of kinds of inks. The ink-jet recording head has an actuator unit (1) including a pressure chamber forming plate (10) provided with a plurality of pressure chambers (2), and a plurality of pressure generators (6) that produce pressure in the plurality of pressure chambers (2), respectively, to jet ink; and a passage unit (5) stacked on the actuator unit (1) and including two or more ink storage chamber forming plates (16A, 16B and 16C), each provided with at least one ink storage chamber (4A, 4B, 4C). The pressure chambers are grouped into two or more pressure chamber groups that correspond to two or more kinds of inks, respectively. The ink storage chambers (4A, 4B, 4C) store inks to be supplied to the pressure chamber groups (2A, 2B, 2C), respectively.
    • 可以以小尺寸形成喷墨记录头以使用更多种类的油墨。 喷墨记录头具有致动器单元(1),其包括设置有多个压力室(2)的压力室形成板(10),以及多个压力发生器(6),其产生多个压力 (2)分别喷射墨水; 以及堆叠在所述致动器单元(1)上并包括两个或更多个储墨室形成板(16A,16B和16C)的通道单元(5),每个设置有至少一个储墨室(4A,4B,4C)。 压力室分别对应于两种或更多种油墨的两个或更多个压力室组。 墨水储存室(4A,4B,4C)分别存储要供应到压力室组(2A,2B,2C)的墨水。
    • 59. 发明授权
    • LCD with bimetal switch between panel and heat sink for regulating temperature of panel
    • 液晶显示屏采用面板和散热片之间的双金属开关,用于调节面板温度
    • US06333772B1
    • 2001-12-25
    • US09475176
    • 1999-12-30
    • Shigeki MoriTakayuki Ishii
    • Shigeki MoriTakayuki Ishii
    • G02F11333
    • G02F1/133382
    • A liquid crystal apparatus is constituted by a liquid crystal panel, illumination means for illuminating the liquid crystal panel, a heat dissipation member disposed with a spacing from the liquid crystal panel, and a heat conductive member. The apparatus further includes a heat deformation member which is disposed contactable to the heat conductive member and is deformable on receiving heat from the liquid crystal panel, so as to have the heat conductive member contact both the liquid crystal panel and the heat dissipation member thereby forming a heat conductive path between the liquid crystal panel and the heat dissipation member in a first position at a temperature of at least a prescribed temperature of the liquid crystal panel and to have the heat conductive member be separated from at least one of the liquid crystal panel and the heat dissipation member in a second position at a temperature below the prescribed temperature.
    • 液晶显示装置由液晶面板,用于照亮液晶面板的照明装置,与液晶面板间隔设置的散热构件和导热构件构成。 该装置还包括热变形构件,该热变形构件设置成与导热构件接触并且在从液晶面板接受热量时可变形,从而使导热构件与液晶面板和散热构件接触,从而形成 在液晶面板和散热构件之间的导热路径处于液晶面板的至少规定温度的温度的第一位置,并且使导热构件与液晶面板中的至少一个分离 并且所述散热构件处于低于规定温度的温度的第二位置。