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51. 发明授权

US06603532B2 Illuminance measurement apparatus, exposure apparatus, and exposure method 失效
公开(公告)号：US06603532B2
公开(公告)日：2003-08-05
申请号：US09927935
申请日：2001-08-13
申请人： Toshihiko Tsuji , Keizaburo Kawada
发明人： Toshihiko Tsuji , Keizaburo Kawada
IPC分类号： G03B2770
CPC分类号： G03F7/70483 , G03B27/42
摘要： An illuminance measurement apparatus of the present invention is comprised of a chassis (20) having a detection surface (22) formed with a light receiving aperture (21) and a light receiving element having a light receiving surface arranged at a position corresponding to the light receiving aperture (21) in the chassis (20), wherein the chassis (20) is provided with a reflection surface (23) for detection light for detecting at least one of the position and posture of the detection surface (22).

52. 发明授权

US06542222B1 Beam output control method, beam output apparatus and exposure system, and device manufacturing method using the exposure system 失效
标题翻译：光束输出控制方法，光束输出装置和曝光系统以及使用曝光系统的装置制造方法
公开(公告)号：US06542222B1
公开(公告)日：2003-04-01
申请号：US09626912
申请日：2000-07-27
申请人： Toshihiko Tsuji , Michiaki Saito
发明人： Toshihiko Tsuji , Michiaki Saito
IPC分类号： G03B2754
CPC分类号： G03F7/70041 , G03F7/70358 , G03F7/70558
摘要： The present invention relates to a beam output control method in which an output from a pulse energy source that emits pulses of exposure beam used in an exposure apparatus is controlled. This method controls an output from the pulse energy source by changing a control mode in accordance with an operation of the exposure apparatus. The control mode includes at least two of: a first mode in which the output from the pulse energy source is controlled based on a detection result of an energy sensor provided within the pulse energy source; a second mode in which the output from the pulse energy source is controlled based on a detection result of an energy sensor provided in the exposure apparatus; a third mode in which the output from the pulse energy source is controlled so that dispersions in the energy for each pulse of the exposure beam emitted from the pulse energy source are suppressed; and a fourth mode in which the output from the pulse energy source is controlled so that dispersions in the integrated energy of a predetermined number of pulses of the exposure beam emitted from the pulse energy source are suppressed.
摘要翻译：本发明涉及一种光束输出控制方法，其中控制在曝光装置中使用的曝光束脉冲的脉冲能量源的输出。该方法通过根据曝光装置的操作改变控制模式来控制来自脉冲能量源的输出。控制模式包括以下中的至少两个：第一模式，其中基于设置在脉冲能量源内的能量传感器的检测结果来控制来自脉冲能量源的输出; 基于设置在曝光装置中的能量传感器的检测结果来控制来自脉冲能量源的输出的第二模式; 控制来自脉冲能量源的输出的第三模式，从而抑制从脉冲能量源发射的曝光光束的每个脉冲的能量的分散; 以及第四模式，其中控制来自脉冲能量源的输出，从而抑制从脉冲能量源发射的曝光光束的预定数量的脉冲的积分能量中的分散。

53. 发明授权

US6002467A Exposure apparatus and method 失效
标题翻译：曝光装置和方法
公开(公告)号：US6002467A
公开(公告)日：1999-12-14
申请号：US616647
申请日：1996-03-15
申请人： Kenji Nishi , Takuzo Kashima , Toshihiko Tsuji
发明人： Kenji Nishi , Takuzo Kashima , Toshihiko Tsuji
IPC分类号： G03F7/20 , G03B27/54 , G02B27/00
CPC分类号： G03F7/70058 , G03F7/70358 , G03F7/70725
摘要： An exposure apparatus for transferring a pattern on a mask onto a photosensitized substrate by exposure, having an illumination optical system, a mask stage for moving the mask and a substrate stage for moving the substrate. An attenuator is disposed between the light source and the photosensitized substrate for attenuating the illumination beam with a variable attenuator rate. A controller controls the output power of the light source and attenuator of the illumination beam such that the exposure energy approaches a predetermined desired value. A stage controller controls the velocities at which the mask stage and the substrate stage are moved for scanning according to the difference between the exposure energy measured by the sensing system and the predetermined desired value.
摘要翻译：一种曝光装置，用于通过曝光将掩模上的图案转印到光敏基板上，具有照明光学系统，用于移动掩模的掩模台和用于移动基板的基板台。衰减器设置在光源和光敏基板之间，用于以可变的衰减器速率衰减照明光束。控制器控制照明光束的光源和衰减器的输出功率，使得曝光能量接近预定的期望值。舞台控制器根据由感测系统测量的曝光能量与预定的期望值之间的差异来控制掩模台和衬底台移动扫描的速度。

54. 发明授权

US5424552A Projection exposing apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5424552A
公开(公告)日：1995-06-13
申请号：US115517
申请日：1993-09-02
申请人： Toshihiko Tsuji , Tetsuo Taniguchi , Yuji Imai , Mizutani Hideo
发明人： Toshihiko Tsuji , Tetsuo Taniguchi , Yuji Imai , Mizutani Hideo
IPC分类号： G03F7/20 , G03F9/00 , G01N21/86
CPC分类号： G03F7/706 , G03F7/70241 , G03F7/70258 , G03F7/70883 , G03F7/70891 , G03F9/70 , G03F9/7034
摘要： A projection exposing apparatus for detecting a state of focus at two or more places in exposure region of a projection optical system by a focus state detection device. In accordance with the result of the detection of the focus state at the two or more places, the image forming characteristics of the projection optical system are measured by an image forming characteristics measuring device. A first pattern extending in the sagittal direction and a second pattern extending in the meridional direction are formed so that the focus state is measured by light beams transmitted these patterns and therefore the astigmatism, eccentricity or the spherical aberration is obtained so as to be corrected.
摘要翻译：一种投影曝光装置，用于通过聚焦状态检测装置检测在投影光学系统的曝光区域中的两个或更多处的焦点状态。根据两个以上的焦点状态的检测结果，通过图像形成特性测量装置测量投影光学系统的图像形成特性。形成沿矢状方向延伸的第一图案和沿子午方向延伸的第二图案，使得通过透射这些图案的光束测量聚焦状态，因此获得像散，偏心或球面像差以进行校正。

55. 发明授权

US5137349A Projection-type optical apparatus 失效
标题翻译：投影式光学装置
公开(公告)号：US5137349A
公开(公告)日：1992-08-11
申请号：US633314
申请日：1990-12-24
申请人： Tetsuo Taniguchi , Kazuaki Suzuki , Toshihiko Tsuji , Masato Hatasawa
发明人： Tetsuo Taniguchi , Kazuaki Suzuki , Toshihiko Tsuji , Masato Hatasawa
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70883 , G03F7/70241 , G03F9/7023
摘要： In a projection-type optical apparatus in which a projection optical system projects an image of an object upon a substrate, a position detecting sensor mechanically connected to the projection optical system detects the position of the projection optical system relative to the substrate along the optical axis of the projection optical system. A displacement measuring device measures relative displacement between the position detecting sensor and the projection optical system along the optical axis. The substrate is brought into coincidence with an optimum image forming plane of the projection optical system on the basis of the position detected by the position detecting sensor and the displacement measured by the displacement measuring device.
摘要翻译：在其中投影光学系统将物体的图像投射到基板的投影型光学装置中，机械地连接到投影光学系统的位置检测传感器沿着光轴检测投影光学系统相对于基板的位置的投影光学系统。位移测量装置测量沿着光轴的位置检测传感器和投影光学系统之间的相对位移。基于由位置检测传感器检测到的位置和由位移测量装置测量的位移，使基板与投影光学系统的最佳图像形成平面一致。

56. 发明授权

US4236200A Semiconductor circuit having a series-connected reactor 失效
标题翻译：具有串联反应器的半导体电路
公开(公告)号：US4236200A
公开(公告)日：1980-11-25
申请号：US938239
申请日：1978-08-30
申请人： Koji Imai , Sumio Kobayashi , Ko Kumai , Toshihiko Tsuji
发明人： Koji Imai , Sumio Kobayashi , Ko Kumai , Toshihiko Tsuji
IPC分类号： H01F37/00 , H01F3/08 , H01F27/255 , H01F38/02 , H02H9/02 , H02M1/08 , H03K17/72 , H03K17/73 , H02M7/515
CPC分类号： H01F38/023 , H01F27/255 , H01F3/08 , H02H9/02
摘要： A semiconductor circuit comprising a reactor including a closed magnetic path core of a compression molding which is formed of a mixture of an insulating material and particles of magnetic substance and a conductor magnetically interlinking to the core, and a semiconductor element connected in series with the reactor.
摘要翻译：一种半导体电路，包括：反应器，包括由绝缘材料和磁性物质的颗粒的混合物形成的压缩成型体的闭合磁路芯和与磁芯磁连接的导体;以及半导体元件，与所述反应器串联连接。

57. 发明授权

US4227166A Reactor 失效
标题翻译：反应堆
公开(公告)号：US4227166A
公开(公告)日：1980-10-07
申请号：US913193
申请日：1978-06-06
申请人： Toshihiko Tsuji , Riyouji Sakai
发明人： Toshihiko Tsuji , Riyouji Sakai
IPC分类号： H01F1/20 , H01F3/08 , H01F17/06 , H01F27/255 , H01F37/00 , H01F27/24
CPC分类号： H01F17/062 , H01F3/08 , H01F37/00
摘要： A reactor comprising an annular iron core constituting a closed magnetic path and a conductor wound on the iron core. The iron core is formed of particles of iron or an iron-based magnetic material. Each particle is covered with an insulative oxide film which contains 0.3 to 0.8% of oxygen by weight based on the particle.
摘要翻译：一种反应器，包括构成闭合磁路的环形铁芯和缠绕在铁芯上的导体。铁芯由铁或铁基磁性材料的颗粒形成。每个颗粒被绝缘氧化物膜覆盖，所述绝缘氧化物膜基于颗粒含有0.3至0.8重量％的氧。

58. 发明授权

US4052588A Electric heater panel 失效
标题翻译：电加热板
公开(公告)号：US4052588A
公开(公告)日：1977-10-04
申请号：US560710
申请日：1975-03-21
申请人： Tatsuji Nakamura , Kenji Fukuda , Toshihiko Tsuji , Takeo Maruyama , Ryouji Sakai , Shohei Sawada , Haruki Miyoshi
发明人： Tatsuji Nakamura , Kenji Fukuda , Toshihiko Tsuji , Takeo Maruyama , Ryouji Sakai , Shohei Sawada , Haruki Miyoshi
IPC分类号： A47K10/06 , F24C7/04 , H05B3/16 , H05B1/00 , F24D13/00 , H05B3/22
CPC分类号： F24C7/043 , A47K10/06 , H05B3/16
摘要： A panel heater with a flat metal sheet of substantially even thickness of from 0.06 to 0.2 mm and having a mesh-like radiation section formed in the central portion of the sheet, the mesh-like radiation section being composed of a plurality of units of wave-like current passageways of uniform width of approximately 2 mm from one end to the other, arranged parallel to each other and connected to each other at the crests of the wave-like current passageways so that the combined width of the passageways at the crests is twice the uniform width. The panel heater also has a pair of heat resistant boards between which the metal sheet is sandwiched; and a frame assembly joining together the heat resistant boards.

59. 发明授权

US09329376B2 Imaging apparatus 有权
标题翻译：成像设备
公开(公告)号：US09329376B2
公开(公告)日：2016-05-03
申请号：US13488601
申请日：2012-06-05
申请人： Yoshinari Higaki , Miyoko Kawashima , Toshihiko Tsuji
发明人： Yoshinari Higaki , Miyoko Kawashima , Toshihiko Tsuji
IPC分类号： G02B21/36 , H04N5/357 , G02B27/00 , G02B13/18
CPC分类号： G02B21/365 , G02B13/18 , G02B27/0068 , H04N5/3572
摘要： An imaging apparatus comprises: an imaging unit having an imaging optical system and an imaging device; a measuring unit that measures, for each of a plurality of regions on a specimen, an optical aberration or a physical quantity causing the aberration before the imaging of the specimen is performed; a plurality of optical elements that are inserted in an optical path of the imaging optical system for correcting the aberration and that differ in correction amount; and a control unit that selects an optical element from among the optical elements on the basis of a measurement result of the measuring unit, and inserts the selected optical element into the optical path of the imaging optical system before the imaging of the specimen. The imaging optical system is configured to be capable of forming simultaneously images of the plurality of regions on the imaging device.
摘要翻译：一种成像装置包括：具有成像光学系统和成像装置的成像单元; 测量单元，其针对样本的多个区域中的每一个测量导致在所述样本的成像之前产生像差的光学像差或物理量; 多个光学元件，其插入到成像光学系统的光路中，用于校正像差，并且校正量不同; 以及控制单元，其基于所述测量单元的测量结果从所述光学元件中选择光学元件，并且在所述样本的成像之前将所选择的光学元件插入所述成像光学系统的光路中。成像光学系统被配置为能够同时形成成像装置上的多个区域的图像。

60. 发明授权

US08891062B2 Illumination optical system, exposure apparatus, and method of manufacturing device 有权
标题翻译：照明光学系统，曝光装置和制造装置的方法
公开(公告)号：US08891062B2
公开(公告)日：2014-11-18
申请号：US13336022
申请日：2011-12-23
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G03F7/20
CPC分类号： G03F7/70075 , G03F7/70091 , G03F7/701 , G03F7/70108 , G03F7/702
摘要： An illumination optical system which illuminates an illumination surface with light from a light source, includes a divider which divides light from the light source to generate a plurality of light beams, a first reflective integrator which uniformizes light intensity distributions of the plurality of light beams generated by the divider, a condenser which condenses the light beam from the first reflective integrator, a second reflective integrator which receives the light beam from the condenser and illuminates the illumination surface, and an aperture stop arranged between the second reflective integrator and the illumination surface, wherein the divider generates the plurality of light beams so that light beams each having a cross-sectional shape different from a cross-sectional shape of the light provided from the light source to the divider enter a plane on which the aperture stop is arranged.
摘要翻译：一种利用来自光源的光来照射照明面的照明光学系统，包括：分割器，其分割来自光源的光以产生多个光束;第一反射积分器，其使产生的多个光束的光强度分布均匀; 通过分压器，聚集来自第一反射积分器的光束的聚光器，接收来自聚光器的光束并照亮照明表面的第二反射积分器，以及布置在第二反射积分器和照明表面之间的孔径光阑，其中，所述分割器产生所述多个光束，使得各自具有不同于从所述光源提供给所述分光器的光的横截面形状的横截面形状的光束进入设置有所述孔径光阑的平面。

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