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51. 发明授权

US07198880B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US07198880B2
公开(公告)日：2007-04-03
申请号：US10422789
申请日：2003-04-25
申请人： Tomoya Sasaki , Kazuyoshi Mizutani , Shinichi Kanna
发明人： Tomoya Sasaki , Kazuyoshi Mizutani , Shinichi Kanna
IPC分类号： G03F7/004
CPC分类号： G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： A positive resist composition comprising: (A1) a resin containing at least one type of repeating unit represented by the specific formula and additionally containing at least one type of repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound which is capable of generating an acid by the action of actinic ray or radiation.
摘要翻译：正性抗蚀剂组合物包含

52. 发明授权

US07138217B2 Positive resist composition 有权
公开(公告)号：US07138217B2
公开(公告)日：2006-11-21
申请号：US10099981
申请日：2002-03-19
申请人： Toshiaki Aoai , Kazuyoshi Mizutani , Shinichi Kanna
发明人： Toshiaki Aoai , Kazuyoshi Mizutani , Shinichi Kanna
IPC分类号： G03F7/004 , G03F7/038 , G03F7/26 , G03F7/32
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111 , Y10S430/122
摘要： A positive resist composition comprises: (A) a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation, wherein the resin (A) contains a specified repeating unit.

53. 发明授权

US07105273B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US07105273B2
公开(公告)日：2006-09-12
申请号：US10634954
申请日：2003-08-06
申请人： Shoichiro Yasunami , Hyou Takahashi , Kazuyoshi Mizutani
发明人： Shoichiro Yasunami , Hyou Takahashi , Kazuyoshi Mizutani
IPC分类号： G03F7/04
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition of the present invention achieving significant performance improvements in high energy-beam lithography, which comprises a phenolic polymer having a property of being insoluble or hardly soluble in an aqueous alkali solution and becoming soluble in an aqueous alkali solution by the action of an acid, in which the phenolic polymer includes a repeating unit containing at least one selected from the group consisting of an acetal-protected phenolic hydroxyl group, a ketal-protected phenolic hydroxyl group, a tertiary ester-protected carboxyl group and a tetrahydropyranyl-protected carboxyl group; and a compound having a phenacylsulfonium structure and capable of generating an acid upon irradiation with one of actinic rays and radiation.
摘要翻译：本发明的正型抗蚀剂组合物在高能束光刻中获得显着性能改进，其包括具有不溶性或几乎不溶于碱性水溶液的性质的酚醛聚合物，并且通过作用于碱性溶液一种酸，其中酚类聚合物包括含有选自缩醛保护的酚羟基，缩酮保护的酚羟基，叔酯保护的羧基和四氢吡喃基保护的羧基中的至少一种的重复单元羧基; 和具有苯甲酰甲基锍结构并能够在用光化射线和辐射之一照射时产生酸的化合物。

54. 发明授权

US06939662B2 Positive-working resist composition 失效
标题翻译：正面抗蚀剂组成
公开(公告)号：US06939662B2
公开(公告)日：2005-09-06
申请号：US10448041
申请日：2003-05-30
申请人： Kazuyoshi Mizutani , Shinichi Kanna , Tomoya Sasaki
发明人： Kazuyoshi Mizutani , Shinichi Kanna , Tomoya Sasaki
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/114
摘要： A positive-working resist composition comprising: (A1) a resin containing a repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation.
摘要翻译：一种正性抗蚀剂组合物，其包含：（A1）含有由所述特定式表示的重复单元的树脂，其通过酸的作用增加在碱性显影液中的溶解度，和（B）能够产生酸的化合物用光化射线和辐射之一照射时。

55. 发明授权

US06830872B2 Planographic printing plate precursor provided with an image forming layer containing a fluorine macromolecular compound 失效
标题翻译：具有含有氟高分子化合物的成像层的平版印刷版原版
公开(公告)号：US06830872B2
公开(公告)日：2004-12-14
申请号：US10247656
申请日：2002-09-20
申请人： Kazuyoshi Mizutani , Shiro Tan
发明人： Kazuyoshi Mizutani , Shiro Tan
IPC分类号： G03F7038
CPC分类号： G03F7/0233 , B41C1/1008 , B41C1/1016 , B41C2201/04 , B41C2201/06 , B41C2201/10 , B41C2201/12 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/0046 , G03F7/033 , G03F7/0382 , G03F7/0392 , Y10S430/108 , Y10S430/165
摘要： Disclosed is planographic printing plate precursor comprising a support having disposed thereon an image forming layer containing a fluorine macromolecular compound having a structural unit derived from a monomer represented by the following general formula (I). In the general formula (I), R0 represents a hydrogen atom, a methyl group, a cyano group or a halogen atom. X represents a single bond or a divalent connecting group. R1 to R6 each independently represent a hydrogen atom, an alkyl group, a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom. Further, at least one of R1 to R6 represents a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom.
摘要翻译：公开了平版印刷版原版，其包括载体，其上设置有含有衍生自由以下通式（I）表示的单体的结构单元的氟高分子化合物的成像层。在通式（I）中，R 0表示氢原子，甲基，氰基或卤素原子。 X表示单键或二价连接基团。 R 1〜R 6各自独立地表示氢原子，烷基，氟原子或至少一个氢原子被氟原子取代的烷基。此外，R 1至R 6中的至少一个表示氟原子或至少一个氢原子被氟原子取代的烷基。

56. 发明授权

US06808869B1 Bottom anti-reflective coating material composition and method for forming resist pattern using the same 失效
标题翻译：底部防反射涂料组合物和使用其形成抗蚀剂图案的方法
公开(公告)号：US06808869B1
公开(公告)日：2004-10-26
申请号：US09615708
申请日：2000-07-13
申请人： Kazuyoshi Mizutani , Makoto Momota
发明人： Kazuyoshi Mizutani , Makoto Momota
IPC分类号： G03F711
CPC分类号： G03F7/091
摘要： A composition for a bottom anti-reflective coating material and a method for forming a resist pattern using the composition, which are high in the dry etching rate, high in the resolution, excellent in the resist film thickness dependency and high in the effect of preventing reflective light against exposure light, and provide no intermixing with the photoresist layer, are disclosed, wherein the composition for a bottom anti-reflective coating material comprises a naphthalene group-containing polymer compound having a specific structure.
摘要翻译：用于底部抗反射涂层材料的组合物和使用该组合物形成抗蚀剂图案的方法，其干蚀刻速率高，分辨率高，抗蚀剂膜厚度依赖性优异，防止效果高公开了防曝光的反射光，并且不提供与光致抗蚀剂层的混合，其中用于底部抗反射涂层材料的组合物包含具有特定结构的含萘基的聚合物化合物。

57. 发明授权

US06387590B1 Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06387590B1
公开(公告)日：2002-05-14
申请号：US09671177
申请日：2000-09-28
申请人： Kazuyoshi Mizutani , Shoichiro Yasunami
发明人： Kazuyoshi Mizutani , Shoichiro Yasunami
IPC分类号： G03F7004
CPC分类号： G03F7/0757 , G03F7/0392
摘要： Disclosed is a positive photoresist composition comprising a polysiloxane containing as a copolymerization component at least a structural unit represented by the following formula (I): wherein L represents a single bond or an arylene group, A′ represents an aromacyclic or alicyclic structure which may have a substituent, and n represents an integer of 1 to 6.
摘要翻译：公开了一种正型光致抗蚀剂组合物，其包含至少由下式（I）表示的结构单元作为共聚成分的聚硅氧烷：其中L表示单键或亚芳基，A'表示可具有的单环或脂环结构取代基，n表示1〜6的整数。

58. 发明授权

US06346363B2 Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06346363B2
公开(公告)日：2002-02-12
申请号：US09729178
申请日：2000-12-05
申请人： Kazuyoshi Mizutani , Shoichiro Yasunami
发明人： Kazuyoshi Mizutani , Shoichiro Yasunami
IPC分类号： G03F7004
CPC分类号： G03F7/0757 , G03F7/0045
摘要： A positive type photoresist composition comprising an alkali-soluble or acid-decomposable polysiloxane containing repeating structural units represented by formula (I): wherein L represents at least one divalent connecting group selected from the group consisting of —A—NHCO—, —A—NHCOO— and —A—NHCONH—, wherein A represents a single bond, an alkylene group or an arylene group; X represents a single bond or a divalent connecting group; and Z represents either a group represented by or a group represented by wherein Y represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group, an atomic group represented by Y may be straight-chain, branched or cyclic, R represents a hydrogen atom or an acid-decomposable group, l represents an integer of from 1 to 3, and m also represents an integer of from 1 to 3.
摘要翻译：一种正型光致抗蚀剂组合物，其包含含有由式（I）表示的重复结构单元的碱溶性或酸可分解聚硅氧烷：其中L表示至少一个选自-A-NHCO-，-A- NHCOO-和-A-NHCONH-，其中A表示单键，亚烷基或亚芳基; X表示单键或二价连接基团; Z表示由Y代表氢原子，烷基，芳基或芳烷基表示的基团，由Y表示的原子团可以是直链，支链或环状的，R表示氢原子原子或酸可分解基团，l表示1〜3的整数，m也表示1〜3的整数。

59. 发明授权

US6132935A Negative-working image recording material 失效
标题翻译：负工作图像记录材料
公开(公告)号：US6132935A
公开(公告)日：2000-10-17
申请号：US691371
申请日：1996-08-02
申请人： Fumikazu Kobayashi , Kazuyoshi Mizutani , Keitaro Aoshima
发明人： Fumikazu Kobayashi , Kazuyoshi Mizutani , Keitaro Aoshima
IPC分类号： B41C1/10 , B41M5/36 , G03C1/73
CPC分类号： B41C1/1008 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/145 , Y10S430/146
摘要： A negative-working image recording material is disclosed, which comprises a substance which absorbs light to generate heat, a water-insoluble and aqueous alkali-soluble resin, and a phenol derivative having in its molecule from 4 to 8 benzene rings, at least one phenolic hydroxyl group and at least two groups represented by the following general formula (I):--CH.sub.2 OR.sup.1 (I)wherein R.sup.1 represents a hydrogen atom, an alkyl group or an acyl group. The negative-working image recording material can perform recording independent of the emission wavelength of the exposing light source, particularly with light in the range of from near infrared to infrared (heat irradiation).
摘要翻译：公开了一种负性图像记录材料，其包括吸收光以产生热的物质，水不溶性和碱溶性水溶性树脂，以及分子中具有4至8个苯环的苯酚衍生物，至少一种酚羟基和由以下通式（I）表示的至少两个基团：-CH 2 OR 1（I）其中R 1表示氢原子，烷基或酰基。负工作图像记录材料可以独立于曝光光源的发射波长执行记录，特别是在近红外到红外（热照射）的范围内的光。

60. 发明授权

US5460917A Positive working photosensitive lithographic printing plate utilizing phenol derivative compound containing photosensitive composition 失效
标题翻译：使用含有感光性组合物的苯酚衍生物的正性感光性平版印刷版
公开(公告)号：US5460917A
公开(公告)日：1995-10-24
申请号：US296425
申请日：1994-08-26
申请人： Fumikazu Kobayashi , Kazuyoshi Mizutani , Akira Nagashima
发明人： Fumikazu Kobayashi , Kazuyoshi Mizutani , Akira Nagashima
IPC分类号： G03F7/00 , G03F7/004 , G03F7/022 , G03F7/039 , G03F7/023
CPC分类号： G03F7/0226
摘要： A positive working photosensitive lithographic printing plate comprising a support having thereon a photosensitive layer comprising a positive photosensitive composition, wherein the positive photosensitive composition comprises a mixture of (a) a phenol derivative, (b) a water-soluble and aqueous alkali-soluble resin, and (c) o-quinonediazide or a mixture of a compound capable of forming an acid on exposure and a compound having at least one C--O--C group which is decomposable with an acid, and wherein the phenol derivative is a mixture of a compound represented by the following formula (I) and a compound represented by the following formula (II): ##STR1## wherein X.sup.1, X.sup.2, X.sup.3, X.sup.4, X.sup.5 and X.sup.6 are the same or different and each represents --CH.sub.2 OH or a hydrogen atom, provided that at least three of them are each --CH.sub.2 OH; ##STR2## wherein Y.sup.1, Y.sup.2, Y.sup.3, Y.sup.4, Y.sup.5 and Y.sup.6 are the same or different and each represents --CH.sub.2 OCH.sub.3, --CH.sub.2 OH or a hydrogen atom, provided that at least three of them are each --CH.sub.2 OCH.sub.3 or --CH.sub.2 OH, and at least one of the three is --CH.sub.2 OCH.sub.3.
摘要翻译：一种正性感光性平版印刷版，其特征在于，具有包含正性感光性组合物的感光层的支持体，其中，所述正性感光性组合物包含（a）苯酚衍生物，（b）水溶性和水溶性碱溶性树脂，和（c）邻醌二叠氮化合物或能够在暴露时形成酸的化合物与具有至少一个可与酸分解的COC基团的化合物的混合物，并且其中所述酚衍生物是由下式（I）表示的化合物和下式（II）表示的化合物：其中X 1，X 2，X 3，X 4，X 5和X 6相同或不同，各自表示-CH 2 OH或氢原子条件是它们中的至少三个各自为-CH 2 OH; 其中Y 1，Y 2，Y 3，Y 4，Y 5和Y 6相同或不同，各自表示-CH 2 OCH 3，-CH 2 OH或氢原子，条件是它们中至少有三个为-CH 2 OCH 3或-CH 2 OH ，三个中的至少一个是-CH 2 OCH 3。

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