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    • 55. 发明申请
    • Three-Dimensional Photonic Crystal and its Manufacturing Method Thereof
    • 三维光子晶体及其制造方法
    • US20080131660A1
    • 2008-06-05
    • US11885546
    • 2006-03-03
    • Susumu NodaMakoto OkanoMasahiro ImadaShigeki Takahashi
    • Susumu NodaMakoto OkanoMasahiro ImadaShigeki Takahashi
    • B32B3/10B29D11/00
    • H01S5/10B82Y20/00G02B6/1225G02B6/136H01S5/105Y10T428/24331
    • An object of the present invention is to provide a three-dimensional photonic crystal which allows an internal formation of a defect structure with an arbitrary shape and size. Multiple holes extending to two different directions are formed obliquely to a base body surface in order to form a first crystal and a second crystal. Base body left between the holes are made to be rods. Moreover, a connection crystal layers is formed by a part of rods having a size different from that of the rods in the first crystal and the second crystal. The connection crystal layer is held between the first crystal and the second crystal and they are fused. In a three-dimensional photonic crystal thus obtained, the rod becomes a point defect. The shape and size of the point defect can be arbitrarily set in any directions within the connection crystal layer. The shape and size of the point defect can also be controlled by adjusting the thickness of the connection crystal layer.
    • 本发明的目的是提供一种能够内部形成任意形状和尺寸的缺陷结构的三维光子晶体。 延伸到两个不同方向的多个孔相对于基体表面倾斜地形成,以便形成第一晶体和第二晶体。 留在孔之间的基体被制成棒。 此外,连接晶体层由具有与第一晶体和第二晶体中的棒的尺寸不同的尺寸的棒的一部分形成。 连接晶体层保持在第一晶体和第二晶体之间并且熔合。 在由此获得的三维光子晶体中,棒变成点缺陷。 点缺陷的形状和尺寸可以在连接晶体层内的任何方向任意设置。 也可以通过调整连接晶体层的厚度来控制点缺陷的形状和尺寸。
    • 56. 发明申请
    • Two-dimensional photonic crystal LED
    • 二维光子晶体LED
    • US20070158662A1
    • 2007-07-12
    • US11640837
    • 2006-12-19
    • Dai OhnishiSusumu Noda
    • Dai OhnishiSusumu Noda
    • H01L33/00
    • H01L33/24H01L33/0095H01L33/20H01L2933/0083
    • A two-dimensional photonic crystal LED composed of a p-type semiconductor cladding layer 12, an active layer 11 of light-emitting material, and an n-type semiconductor cladding layer 13 placed between a pair of electrodes, where air holes 16 penetrating through the layers 12, 11 and 13 and arranged periodically in the layers 12, 11 and 13 are provided. At least a part of the inner wall of the air holes 16 is oxidized 17 in either one or both of the p-type semiconductor cladding layer 12 and the n-type semiconductor cladding layer 13. The holes and electrons injected from the electrodes avoid the oxidized region 17 and enter the active layer 11 apart from the air holes 16, which minimizes the recombination (surface recombination) of the holes and electrons producing heat instead of light.
    • 由p型半导体包层12,发光材料的有源层11和放置在一对电极之间的n型半导体包层13构成的二维光子晶体LED,其中气孔16穿透 设置层12,11和13并周期性地布置在层12,11和13中。 空气孔16的内壁的至少一部分在p型半导体包覆层12和n型半导体包层13中的任一个或两个中被氧化17。从电极注入的空穴和电子避免了 氧化区17并且进入与气孔16分开的有源层11,这使空穴和产生热而不是光的电子的复合(表面复合)最小化。
    • 60. 发明申请
    • PHOTOELECTRIC TRANSDUCER
    • 光电传感器
    • US20120273911A1
    • 2012-11-01
    • US13520126
    • 2010-12-17
    • Hiroaki ShigetaYuhji YashiroYuhsuke TsudaSusumu NodaMasayuki FujitaYoshinori Tanaka
    • Hiroaki ShigetaYuhji YashiroYuhsuke TsudaSusumu NodaMasayuki FujitaYoshinori Tanaka
    • H01L31/0232
    • H01L31/02327
    • A photoelectric transducer (10) including: a semiconductor layer (13); and a photonic crystal (21) formed inside the semiconductor layer, the photonic crystal being formed by providing nanorods (19) inside the semiconductor layer, each of the nanorods having a refractive index lower than that of a medium of the semiconductor layer, the nanorods being provided two-dimensionally and periodically at a pitch of not less than λ/4 nor more than λ, where λ is a wavelength of a peak of resonance caused by the photonic crystal, the photoelectric transducer satisfying the following formula: 0.2QV≦Qα≦5.4QV where Qv is (a) a Q value which indicates a magnitude of an effect of resonance caused by coupling between the photonic crystal and an external world and (b) in proportion to a reciprocal of a coefficient κV indicating a strength of the coupling between the photonic crystal and the external world, and Qa is (a) a Q value which indicates a magnitude of an effect of resonance caused by the medium of the semiconductor layer and (b) in proportion to a reciprocal of a coefficient αa of light absorption by the medium of the semiconductor layer. This allows an increase in light absorption ratio of a photoelectric transducer including a photonic crystal structure.
    • 一种光电变换器(10),包括:半导体层(13); 和形成在所述半导体层内的光子晶体(21),所述光子晶体通过在所述半导体层内部提供纳米棒(19)形成,所述纳米棒的折射率低于所述半导体层的介质的折射率,所述纳米棒 以不小于λ/ 4的间距不大于λ的间隔二维和周期地设置,其中λ是由光子晶体引起的共振峰的波长,光电传感器满足下式:0.2QV≦̸Qα&nlE 其中Qv是(a)Q值,其表示由光子晶体和外部世界之间的耦合引起的谐振的影响的大小,以及(b)与系数的倒数成比例,kgr; V表示强度 的光子晶体与外界之间的耦合,Qa是(a)Q值,其表示由半导体层的介质引起的共振效应的大小,(b)与 由半导体层的介质的光吸收系数αa的倒数。 这允许包括光子晶体结构的光电变换器的光吸收率增加。